DE69828073T2 - Verfahren zur erhöhung der arbeitsfrequenz eines magnetkreises und korrespondierender magnetkreis - Google Patents
Verfahren zur erhöhung der arbeitsfrequenz eines magnetkreises und korrespondierender magnetkreis Download PDFInfo
- Publication number
- DE69828073T2 DE69828073T2 DE69828073T DE69828073T DE69828073T2 DE 69828073 T2 DE69828073 T2 DE 69828073T2 DE 69828073 T DE69828073 T DE 69828073T DE 69828073 T DE69828073 T DE 69828073T DE 69828073 T2 DE69828073 T2 DE 69828073T2
- Authority
- DE
- Germany
- Prior art keywords
- magnetic
- magnetic circuit
- interruptions
- frequency
- permeability
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005291 magnetic effect Effects 0.000 title claims description 90
- 238000000034 method Methods 0.000 title claims description 11
- 239000010410 layer Substances 0.000 claims description 27
- 239000000696 magnetic material Substances 0.000 claims description 8
- 230000000737 periodic effect Effects 0.000 claims description 5
- 239000002356 single layer Substances 0.000 claims description 3
- 230000035699 permeability Effects 0.000 description 20
- 239000000463 material Substances 0.000 description 17
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 239000002131 composite material Substances 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 230000002500 effect on skin Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000003068 static effect Effects 0.000 description 4
- 229910002555 FeNi Inorganic materials 0.000 description 3
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910002070 thin film alloy Inorganic materials 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/17—Construction or disposition of windings
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/313—Disposition of layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3176—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps
- G11B5/3179—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes
- G11B5/3183—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes intersecting the gap plane, e.g. "horizontal head structure"
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F17/00—Fixed inductances of the signal type
- H01F17/04—Fixed inductances of the signal type with magnetic core
- H01F17/06—Fixed inductances of the signal type with magnetic core with core substantially closed in itself, e.g. toroid
- H01F17/062—Toroidal core with turns of coil around it
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F3/00—Cores, Yokes, or armatures
- H01F3/10—Composite arrangements of magnetic circuits
- H01F3/14—Constrictions; Gaps, e.g. air-gaps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/30—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
- H01F41/302—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F41/308—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices lift-off processes, e.g. ion milling, for trimming or patterning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Composite Materials (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Coils Or Transformers For Communication (AREA)
- Thin Magnetic Films (AREA)
- Manufacturing Cores, Coils, And Magnets (AREA)
- Soft Magnetic Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9712080 | 1997-09-29 | ||
| FR9712080A FR2769122B1 (fr) | 1997-09-29 | 1997-09-29 | Procede pour augmenter la frequence de fonctionnement d'un circuit magnetique et circuit magnetique correspondant |
| PCT/FR1998/002069 WO1999017319A1 (fr) | 1997-09-29 | 1998-09-28 | Procede pour augmenter la frequence de fonctionnement d'un circuit magnetique et circuit magnetique correspondant |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69828073D1 DE69828073D1 (de) | 2005-01-13 |
| DE69828073T2 true DE69828073T2 (de) | 2005-12-01 |
Family
ID=9511576
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69828073T Expired - Lifetime DE69828073T2 (de) | 1997-09-29 | 1998-09-28 | Verfahren zur erhöhung der arbeitsfrequenz eines magnetkreises und korrespondierender magnetkreis |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6940383B2 (enExample) |
| EP (1) | EP1019927B1 (enExample) |
| JP (1) | JP2001518702A (enExample) |
| DE (1) | DE69828073T2 (enExample) |
| FR (1) | FR2769122B1 (enExample) |
| WO (1) | WO1999017319A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2811135B1 (fr) * | 2000-06-29 | 2002-11-22 | Memscap | Microcomposant du type micro-inductance ou microtransformateur |
| FR2813987B1 (fr) * | 2000-09-12 | 2003-01-10 | Memscap | Microcomposant du type micro-inductance ou micro-transformateur |
| CN1522449A (zh) * | 2001-08-31 | 2004-08-18 | Tdk株式会社 | 叠层软磁性部件、软磁性薄片及叠层软磁性部件的制造方法 |
| US7782659B2 (en) * | 2007-05-10 | 2010-08-24 | Macronix International Co., Ltd. | Magnetic memory and memory cell thereof and method of manufacturing the memory cell |
| JP2010182875A (ja) * | 2009-02-05 | 2010-08-19 | Fuji Electric Holdings Co Ltd | コモンモードチョークコイルおよびノイズフィルタ |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3881244A (en) * | 1972-06-02 | 1975-05-06 | Texas Instruments Inc | Method of making a solid state inductor |
| FR2450462A1 (fr) * | 1979-02-27 | 1980-09-26 | Thomson Csf | Magnetometre a ondes magnetostatiques |
| FR2620853B1 (fr) * | 1987-09-18 | 1989-12-01 | Commissariat Energie Atomique | Materiau magnetique composite et son procede de fabrication |
| US5070317A (en) * | 1989-01-17 | 1991-12-03 | Bhagat Jayant K | Miniature inductor for integrated circuits and devices |
| JPH03238804A (ja) * | 1990-02-15 | 1991-10-24 | Nec Corp | マイクロ波用インダクタンス素子 |
| US5165162A (en) * | 1990-12-24 | 1992-11-24 | General Electric Company | Method for making a segmented toroidal inductor |
| JPH04359518A (ja) * | 1991-06-06 | 1992-12-11 | Nec Corp | 半導体装置の製造方法 |
| JPH0562123A (ja) * | 1991-08-30 | 1993-03-12 | Victor Co Of Japan Ltd | 複合型磁気ヘツドの製造方法 |
| US5376912A (en) * | 1992-03-12 | 1994-12-27 | Casagrande; Serge | Combined transformer and inductor |
| FR2724482B1 (fr) * | 1994-09-13 | 1996-12-06 | Commissariat Energie Atomique | Tete magnetique a magnetoresistance multicouche longitudinale sous-jacente |
| JP3346124B2 (ja) * | 1994-10-04 | 2002-11-18 | 松下電器産業株式会社 | 転写導体の製造方法およびグリーンシート積層体の製造方法 |
| FR2726931B1 (fr) * | 1994-11-16 | 1996-12-06 | Commissariat Energie Atomique | Tete magnetique verticale a bobinage integre et son procede de realisation |
| JPH0974016A (ja) * | 1995-09-05 | 1997-03-18 | Res Inst Electric Magnetic Alloys | 高周波低損失磁性薄膜 |
| US6030877A (en) * | 1997-10-06 | 2000-02-29 | Industrial Technology Research Institute | Electroless gold plating method for forming inductor structures |
| US6891461B2 (en) * | 1999-11-23 | 2005-05-10 | Intel Corporation | Integrated transformer |
-
1997
- 1997-09-29 FR FR9712080A patent/FR2769122B1/fr not_active Expired - Fee Related
-
1998
- 1998-09-22 US US09/508,692 patent/US6940383B2/en not_active Expired - Fee Related
- 1998-09-28 DE DE69828073T patent/DE69828073T2/de not_active Expired - Lifetime
- 1998-09-28 EP EP98945384A patent/EP1019927B1/fr not_active Expired - Lifetime
- 1998-09-28 JP JP2000514294A patent/JP2001518702A/ja active Pending
- 1998-09-28 WO PCT/FR1998/002069 patent/WO1999017319A1/fr not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| EP1019927B1 (fr) | 2004-12-08 |
| US20020057172A1 (en) | 2002-05-16 |
| DE69828073D1 (de) | 2005-01-13 |
| EP1019927A1 (fr) | 2000-07-19 |
| JP2001518702A (ja) | 2001-10-16 |
| WO1999017319A1 (fr) | 1999-04-08 |
| FR2769122A1 (fr) | 1999-04-02 |
| US6940383B2 (en) | 2005-09-06 |
| FR2769122B1 (fr) | 2001-04-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE10320707B4 (de) | Verbesserter Resonator mit Keimschicht | |
| DE112016001049B4 (de) | Spulenkomponente | |
| DE3883819T2 (de) | Magnetkopf zum Lesen von Spuren mit sehr schmaler Breite und Herstellungverfahren. | |
| DE102008017967B4 (de) | Resonanzfilter mit geringem Verlust | |
| DE69714613T2 (de) | Magneto-Impedanz-Sensor | |
| DE102019100007A1 (de) | Gleichtaktfilter | |
| DE3344079C2 (enExample) | ||
| DE102018121480A1 (de) | Halbleiterstruktur mit darin integriertem Induktor | |
| DE102007032299B4 (de) | Sensor, insbesondere zur Magnetfeldmessung | |
| DE3888287T2 (de) | Film-Magnetkopf. | |
| DE4322698A1 (de) | Dünnfilm-Magnetkopf | |
| DE69828073T2 (de) | Verfahren zur erhöhung der arbeitsfrequenz eines magnetkreises und korrespondierender magnetkreis | |
| DE102018119214A1 (de) | Magnetsensor | |
| EP1155423B1 (de) | Flacher magnetkern | |
| DE2931825A1 (de) | Magnetblasen-speichervorrichtung | |
| DE102022106912A1 (de) | Magnetsensor | |
| DE102022105016A1 (de) | Magnetsensor | |
| DE102022106002A1 (de) | Magnetsensor und magnetsensorvorrichtung | |
| DE112022000948T5 (de) | Piezoelektrisches element, piezoelektrische vorrichtung und verfahren zum herstellen eines piezoelektrischen elements | |
| DE3740376C2 (de) | Abgestimmtes Dünnschichtfilter mit ferromagnetischer Resonanz | |
| DE60312872T2 (de) | Verfahren um ein Element herzustellen welches einen von magnetischem Material umgebenen elektrischen Leiter enthält | |
| DE102017106923B4 (de) | Akustische Volumenresonator-Vorrichtungen und Prozesse zum Herstellen von akustischen Volumenresonator-Vorrichtungen | |
| DE3300219C2 (de) | Mehrspurmagnetkopf | |
| DE3206058A1 (de) | Duennschicht-magnetkopf und verfahren zu seiner herstellung | |
| DE112020006325T5 (de) | Magnetsensor |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition |