DE69826641D1 - Ausrichtungsgerät mit drei im winkel von jeweils 120 grad zueinander stehenden spulen, sowie hiermit ausgerüstetes lithographisches gerät - Google Patents

Ausrichtungsgerät mit drei im winkel von jeweils 120 grad zueinander stehenden spulen, sowie hiermit ausgerüstetes lithographisches gerät

Info

Publication number
DE69826641D1
DE69826641D1 DE69826641T DE69826641T DE69826641D1 DE 69826641 D1 DE69826641 D1 DE 69826641D1 DE 69826641 T DE69826641 T DE 69826641T DE 69826641 T DE69826641 T DE 69826641T DE 69826641 D1 DE69826641 D1 DE 69826641D1
Authority
DE
Germany
Prior art keywords
spools
standing
degrees
angle
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69826641T
Other languages
English (en)
Other versions
DE69826641T2 (de
Inventor
Bernard Sperling
Roelof Loopstra
Theodorus Peijnenburg
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE69826641D1 publication Critical patent/DE69826641D1/de
Application granted granted Critical
Publication of DE69826641T2 publication Critical patent/DE69826641T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T74/00—Machine element or mechanism
    • Y10T74/20—Control lever and linkage systems
    • Y10T74/20207—Multiple controlling elements for single controlled element
    • Y10T74/20341—Power elements as controlling elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69826641T 1997-12-29 1998-10-22 Ausrichtungsgerät mit drei im winkel von jeweils 120 grad zueinander stehenden spulen, sowie hiermit ausgerüstetes lithographisches gerät Expired - Fee Related DE69826641T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP97204133 1997-12-29
EP97204133 1997-12-29
PCT/IB1998/001687 WO1999034257A1 (en) 1997-12-29 1998-10-22 Positioning device having three coil systems mutually enclosing angles of 120°, and lithographic device comprising such a positioning device

Publications (2)

Publication Number Publication Date
DE69826641D1 true DE69826641D1 (de) 2004-11-04
DE69826641T2 DE69826641T2 (de) 2005-10-06

Family

ID=8229145

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69826641T Expired - Fee Related DE69826641T2 (de) 1997-12-29 1998-10-22 Ausrichtungsgerät mit drei im winkel von jeweils 120 grad zueinander stehenden spulen, sowie hiermit ausgerüstetes lithographisches gerät

Country Status (6)

Country Link
US (1) US6054784A (de)
EP (1) EP0963572B1 (de)
JP (1) JP3978237B2 (de)
KR (1) KR100573670B1 (de)
DE (1) DE69826641T2 (de)
WO (1) WO1999034257A1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6144118A (en) * 1998-09-18 2000-11-07 General Scanning, Inc. High-speed precision positioning apparatus
TW526630B (en) * 1998-11-10 2003-04-01 Asml Netherlands Bv Actuator and transducer
DE10115915A1 (de) * 2001-03-30 2002-10-02 Zeiss Carl Vorrichtung zur Justierung von Einrichtungen und zum Einstellen von Verstellwegen
DE10136387A1 (de) * 2001-07-26 2003-02-13 Zeiss Carl Objektiv, insbesondere Objektiv für die Halbleiter-Lithographie
DE10219514A1 (de) * 2002-04-30 2003-11-13 Zeiss Carl Smt Ag Beleuchtungssystem, insbesondere für die EUV-Lithographie
US7265917B2 (en) * 2003-12-23 2007-09-04 Carl Zeiss Smt Ag Replacement apparatus for an optical element
US7006199B2 (en) * 2004-03-10 2006-02-28 Asml Netherlands B.V. Lithographic positioning device and device manufacturing method
US7385678B2 (en) * 2004-10-05 2008-06-10 Asml Netherlands B.V. Positioning device and lithographic apparatus
JP2009136136A (ja) * 2007-09-26 2009-06-18 Asml Netherlands Bv 合成キャリヤを有するローレンツアクチュエータを有するリソグラフィ装置
DE102008000967B4 (de) * 2008-04-03 2015-04-09 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die EUV-Mikrolithographie
CN101290476B (zh) * 2008-05-20 2010-06-09 上海微电子装备有限公司 六自由度微动台
CN100573340C (zh) * 2008-08-07 2009-12-23 上海微电子装备有限公司 二自由度电机执行机构及相应的六自由度微动台
JP5626206B2 (ja) * 2009-05-15 2014-11-19 株式会社ニコン 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法
CN102207240A (zh) * 2010-03-31 2011-10-05 上海微电子装备有限公司 具有减振装置的精密运动平台
CN102136301B (zh) * 2011-03-10 2012-08-22 清华大学 一种三自由度定位装置
WO2014054034A2 (en) 2012-10-05 2014-04-10 Koninklijke Philips N.V. Rotary positioning device
US10077865B2 (en) * 2014-06-05 2018-09-18 The Regents Of The University Of Michigan Magnet assisted stage for vibration and heat reduction in wafer scanning
CN104385261B (zh) * 2014-09-30 2016-04-27 西安电子科技大学 具有空间三自由度的平动装置及方法
KR102415944B1 (ko) * 2015-06-23 2022-07-04 삼성전자주식회사 지지 유닛 및 기판 처리 장치
CN107015573B (zh) * 2017-03-20 2020-05-29 歌尔科技有限公司 电磁式运动平台的控制方法及系统

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4457664A (en) * 1982-03-22 1984-07-03 Ade Corporation Wafer alignment station
US4516253A (en) * 1983-03-15 1985-05-07 Micronix Partners Lithography system
US4514674A (en) * 1983-12-22 1985-04-30 International Business Machines Corporation Electromagnetic X-Y-Theta precision positioner
JP2523177B2 (ja) * 1989-04-28 1996-08-07 日本写真印刷株式会社 位置決めテ―ブル
NL8902471A (nl) * 1989-10-05 1991-05-01 Philips Nv Tweetraps positioneerinrichting.
NL9100421A (nl) * 1991-03-08 1992-10-01 Asm Lithography Bv Ondersteuningsinrichting met een kantelbare objecttafel alsmede optisch lithografische inrichting voorzien van een dergelijke ondersteuningsinrichting.
JP2714502B2 (ja) * 1991-09-18 1998-02-16 キヤノン株式会社 移動ステージ装置
WO1996038764A1 (en) * 1995-05-30 1996-12-05 Philips Electronics N.V. Lithographic device with a three-dimensionally positionable mask holder
TW316874B (de) * 1995-05-30 1997-10-01 Philips Electronics Nv

Also Published As

Publication number Publication date
EP0963572B1 (de) 2004-09-29
EP0963572A1 (de) 1999-12-15
KR20000075779A (ko) 2000-12-26
KR100573670B1 (ko) 2006-04-24
JP2002505807A (ja) 2002-02-19
JP3978237B2 (ja) 2007-09-19
US6054784A (en) 2000-04-25
WO1999034257A1 (en) 1999-07-08
DE69826641T2 (de) 2005-10-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee