DE69825893D1 - DEVICE AND METHOD FOR PRODUCING A RECORDING CARRIER - Google Patents

DEVICE AND METHOD FOR PRODUCING A RECORDING CARRIER

Info

Publication number
DE69825893D1
DE69825893D1 DE69825893T DE69825893T DE69825893D1 DE 69825893 D1 DE69825893 D1 DE 69825893D1 DE 69825893 T DE69825893 T DE 69825893T DE 69825893 T DE69825893 T DE 69825893T DE 69825893 D1 DE69825893 D1 DE 69825893D1
Authority
DE
Germany
Prior art keywords
producing
recording carrier
recording
carrier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69825893T
Other languages
German (de)
Other versions
DE69825893T2 (en
Inventor
Toshifumi Kamiyama
Toshiaki Kunieda
Sadayuki Okazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of DE69825893D1 publication Critical patent/DE69825893D1/en
Application granted granted Critical
Publication of DE69825893T2 publication Critical patent/DE69825893T2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/265—Apparatus for the mass production of optical record carriers, e.g. complete production stations, transport systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
DE69825893T 1997-05-08 1998-05-07 DEVICE AND METHOD FOR PRODUCING A RECORDING SUPPORT Expired - Fee Related DE69825893T2 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP11786497 1997-05-08
JP11786497 1997-05-08
JP26956397 1997-10-02
JP26956397 1997-10-02
PCT/JP1998/002020 WO1998050916A1 (en) 1997-05-08 1998-05-07 Device and method for manufacturing an optical recording medium

Publications (2)

Publication Number Publication Date
DE69825893D1 true DE69825893D1 (en) 2004-09-30
DE69825893T2 DE69825893T2 (en) 2005-09-08

Family

ID=26455906

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69825893T Expired - Fee Related DE69825893T2 (en) 1997-05-08 1998-05-07 DEVICE AND METHOD FOR PRODUCING A RECORDING SUPPORT

Country Status (7)

Country Link
US (1) US6340501B1 (en)
EP (1) EP0987700B1 (en)
KR (1) KR100353774B1 (en)
CN (1) CN1144198C (en)
DE (1) DE69825893T2 (en)
TW (1) TW411458B (en)
WO (1) WO1998050916A1 (en)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3840355B2 (en) * 1999-12-14 2006-11-01 富士写真フイルム株式会社 Manufacturing method of optical information recording medium
TW490714B (en) * 1999-12-27 2002-06-11 Semiconductor Energy Lab Film formation apparatus and method for forming a film
US8382902B2 (en) * 2000-04-12 2013-02-26 Seagate Technology Llc Single disc vapor lubrication
US6613151B1 (en) * 2000-04-12 2003-09-02 Seagate Technology Llc Single disc vapor lubrication
US20020011205A1 (en) * 2000-05-02 2002-01-31 Shunpei Yamazaki Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device
US7517551B2 (en) * 2000-05-12 2009-04-14 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a light-emitting device
MY141175A (en) 2000-09-08 2010-03-31 Semiconductor Energy Lab Light emitting device, method of manufacturing the same, and thin film forming apparatus
US6467427B1 (en) * 2000-11-10 2002-10-22 Helix Technology Inc. Evaporation source material supplier
JP4704605B2 (en) * 2001-05-23 2011-06-15 淳二 城戸 Continuous vapor deposition apparatus, vapor deposition apparatus and vapor deposition method
US6902623B2 (en) * 2001-06-07 2005-06-07 Veeco Instruments Inc. Reactor having a movable shutter
JP4078813B2 (en) * 2001-06-12 2008-04-23 ソニー株式会社 Film forming apparatus and film forming method
JP2003113466A (en) * 2001-07-31 2003-04-18 Fuji Photo Film Co Ltd Vacuum deposition apparatus
TW591202B (en) * 2001-10-26 2004-06-11 Hermosa Thin Film Co Ltd Dynamic film thickness control device/method and ITS coating method
SG149680A1 (en) 2001-12-12 2009-02-27 Semiconductor Energy Lab Film formation apparatus and film formation method and cleaning method
SG113448A1 (en) * 2002-02-25 2005-08-29 Semiconductor Energy Lab Fabrication system and a fabrication method of a light emitting device
JP4068377B2 (en) * 2002-03-29 2008-03-26 株式会社ニデック Vacuum deposition equipment
EP1369499A3 (en) * 2002-04-15 2004-10-20 Semiconductor Energy Laboratory Co., Ltd. Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device
US20040035360A1 (en) * 2002-05-17 2004-02-26 Semiconductor Energy Laboratory Co., Ltd. Manufacturing apparatus
US20030221620A1 (en) * 2002-06-03 2003-12-04 Semiconductor Energy Laboratory Co., Ltd. Vapor deposition device
KR101006938B1 (en) 2002-09-20 2011-01-10 가부시키가이샤 한도오따이 에네루기 켄큐쇼 Fabrication system and manufacturing method of light emitting device
TW574398B (en) * 2002-10-25 2004-02-01 Ritek Display Technology Corp Evaporation method and equipment for evaporation
JP5072184B2 (en) * 2002-12-12 2012-11-14 株式会社半導体エネルギー研究所 Deposition method
US7232588B2 (en) * 2004-02-23 2007-06-19 Eastman Kodak Company Device and method for vaporizing temperature sensitive materials
JP4653419B2 (en) 2004-05-17 2011-03-16 芝浦メカトロニクス株式会社 Vacuum processing equipment
US20060099344A1 (en) * 2004-11-09 2006-05-11 Eastman Kodak Company Controlling the vaporization of organic material
US7465475B2 (en) * 2004-11-09 2008-12-16 Eastman Kodak Company Method for controlling the deposition of vaporized organic material
JP4789551B2 (en) * 2005-09-06 2011-10-12 株式会社半導体エネルギー研究所 Organic EL film forming equipment
WO2008117690A1 (en) * 2007-03-26 2008-10-02 Ulvac, Inc. Evaporation source, vapor deposition apparatus and method of film formation
US8039052B2 (en) * 2007-09-06 2011-10-18 Intermolecular, Inc. Multi-region processing system and heads
WO2009094622A2 (en) * 2008-01-24 2009-07-30 Microcontinuum, Inc. Vacuum coating techniques
CN101619446A (en) * 2008-06-30 2010-01-06 鸿富锦精密工业（深圳）有限公司 Coating evaporation carrier and vacuum coater using same
US9416448B2 (en) * 2008-08-29 2016-08-16 Tokyo Electron Limited Film deposition apparatus, substrate processing apparatus, film deposition method, and computer-readable storage medium for film deposition method
JP5195174B2 (en) * 2008-08-29 2013-05-08 東京エレクトロン株式会社 Film forming apparatus and film forming method
JP5107185B2 (en) 2008-09-04 2012-12-26 東京エレクトロン株式会社 Film forming apparatus, substrate processing apparatus, film forming method, and recording medium recording program for executing this film forming method
JP5253933B2 (en) 2008-09-04 2013-07-31 東京エレクトロン株式会社 Film forming apparatus, substrate processing apparatus, film forming method, and storage medium
CN101665920A (en) * 2008-09-04 2010-03-10 东京毅力科创株式会社 Film deposition apparatus, substrate process apparatus, and turntable
US9297072B2 (en) 2008-12-01 2016-03-29 Tokyo Electron Limited Film deposition apparatus
DE102009060649A1 (en) * 2009-12-22 2011-06-30 EISENMANN Anlagenbau GmbH & Co. KG, 71032 Plant for surface treatment of objects
WO2013116215A1 (en) * 2012-01-31 2013-08-08 First Solar, Inc. Integrated vapor transport deposition method and system
ITMI20121358A1 (en) 2012-08-01 2014-02-02 Tapematic Spa PAINTING AND LINE MACHINE FOR FINISHING THREE-DIMENSIONAL OBJECTS OF SMALL DIMENSIONS AND RELATED METHODS
CN103305803B (en) * 2013-05-23 2015-05-20 四川虹视显示技术有限公司 Temperature control system-based evaporation temperature control method for OLED (Organic Light Emitting Diode) organic layer
SG11201606084RA (en) 2014-01-27 2016-08-30 Veeco Instr Inc Wafer carrier having retention pockets with compound radii for chemical vapor deposition systems
JP6262115B2 (en) 2014-02-10 2018-01-17 東京エレクトロン株式会社 Substrate processing method and substrate processing apparatus
KR20160049319A (en) * 2014-10-27 2016-05-09 삼성전자주식회사 Device and Method for vacuum evaporating
JP6548586B2 (en) 2016-02-03 2019-07-24 東京エレクトロン株式会社 Deposition method
JP6733516B2 (en) 2016-11-21 2020-08-05 東京エレクトロン株式会社 Method of manufacturing semiconductor device
CN107254673B (en) * 2017-06-12 2019-07-19 京东方科技集团股份有限公司 The evaporation coating method of deposition system and deposition system
CN109609910B (en) * 2019-01-10 2021-04-13 深圳市致远动力科技有限公司 Thin film battery preparation device and method

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3552352A (en) * 1968-02-13 1971-01-05 Du Pont Electron beam vaporization coating apparatus
GB8332394D0 (en) * 1983-12-05 1984-01-11 Pilkington Brothers Plc Coating apparatus
JPS60159167A (en) * 1984-01-30 1985-08-20 Matsushita Electric Ind Co Ltd Vacuum deposition device
JPS6164880A (en) * 1984-09-06 1986-04-03 Matsushita Electric Ind Co Ltd Vacuum deposition device
US4803947A (en) * 1986-01-15 1989-02-14 Canon Kabushiki Kaisha Apparatus for forming deposited film
JPS62229550A (en) * 1986-03-29 1987-10-08 Toshiba Corp Method and apparatus for producing optical disk
DE3902862A1 (en) * 1989-02-01 1990-08-02 Philips & Du Pont Optical METHOD FOR REMOVING PARTICLES ON SUBSTRATE SURFACES
JPH02308431A (en) * 1989-05-22 1990-12-21 Pioneer Electron Corp Pickup device for multi-layer optical disk
JPH0320731A (en) 1989-06-16 1991-01-29 Matsushita Electric Ind Co Ltd Production of optical recording medium
JPH03132391A (en) * 1989-10-18 1991-06-05 Teijin Ltd Erasable high reflectivity optical recording medium
JP2581272B2 (en) 1990-06-21 1997-02-12 日本電気株式会社 Multiplex conversion circuit
US5293373A (en) * 1990-08-29 1994-03-08 Mitsubishi Denki Kabushiki Kaisha Optical disk and method of manufacturing the same
JP2509362Y2 (en) * 1990-09-10 1996-09-04 東芝イーエムアイ株式会社 Optical information recording disk manufacturing equipment
JPH04337536A (en) 1991-05-14 1992-11-25 Tdk Corp Film forming device
JPH05271913A (en) 1992-03-30 1993-10-19 Sony Corp Vapor-deposition device
JPH05314540A (en) 1992-05-08 1993-11-26 Kuraray Co Ltd Sputtering device
DE69304038T2 (en) * 1993-01-28 1996-12-19 Applied Materials Inc Device for a vacuum process with improved throughput
JPH06342535A (en) * 1993-04-05 1994-12-13 Canon Inc Optical recording medium and its production
DE69422079T2 (en) * 1993-04-05 2000-05-25 Canon Kk Manufacturing process for optical recording media
US5616208A (en) 1993-09-17 1997-04-01 Tokyo Electron Limited Vacuum processing apparatus, vacuum processing method, and method for cleaning the vacuum processing apparatus
JP3085145B2 (en) * 1995-06-23 2000-09-04 松下電器産業株式会社 Manufacturing method of optical recording medium
US5770293A (en) * 1996-04-12 1998-06-23 Eastman Kodak Company Method of forming recordable optical element using low absorption materials

Also Published As

Publication number Publication date
EP0987700B1 (en) 2004-08-25
US6340501B1 (en) 2002-01-22
EP0987700A1 (en) 2000-03-22
EP0987700A4 (en) 2000-08-23
TW411458B (en) 2000-11-11
CN1144198C (en) 2004-03-31
KR20010012369A (en) 2001-02-15
KR100353774B1 (en) 2002-09-27
DE69825893T2 (en) 2005-09-08
CN1269046A (en) 2000-10-04
WO1998050916A1 (en) 1998-11-12

Similar Documents

Publication Publication Date Title
DE69825893D1 (en) DEVICE AND METHOD FOR PRODUCING A RECORDING CARRIER
DE69609840D1 (en) METHOD AND DEVICE FOR PRODUCING AN OPTICAL INFORMATION CARRIER
DE69714849D1 (en) METHOD AND DEVICE FOR PRODUCING A SHEET PACK
DE69835102D1 (en) METHOD AND DEVICE FOR THE SECURE TRANSMISSION OF A DATA SET
DE69807949D1 (en) Method and device for producing a thin film
DE59802100D1 (en) PRINTED PRODUCT AND METHOD FOR PRODUCING A PRINTED PRODUCT
DE59610290D1 (en) Data carrier and method for producing a data carrier
DE69515447T2 (en) Method and device for producing a surface fastener
DE69635651D1 (en) Device and method for data conversion
DE69926583D1 (en) Method and device for producing a two-part piston
DE59607681D1 (en) METHOD AND DEVICE FOR PRODUCING A CONTACT PIECE
DE69838048D1 (en) Apparatus and method for producing a transfer laminate
DE59702373D1 (en) Method and device for producing a single crystal
DE69840840D1 (en) Method and apparatus for producing a semiconductor crystal
DE59804018D1 (en) Press-rolling device and method for producing a face-geared workpiece
DE69606966T2 (en) Method and device for producing a single crystal
DE59505372D1 (en) Device and method for producing a single crystal
DE19681430T1 (en) Semiconductor component and method for producing a semiconductor component
DE69523185D1 (en) METHOD AND DEVICE FOR PRODUCING A CATHETER AND MANUFACTURED CATHETER
ATA126394A (en) METHOD AND DEVICE FOR MANUFACTURING A GRAVEL-FREE TRACK CONSTRUCTION
DE69727574D1 (en) MAGNETIC SENSOR AND METHOD FOR PRODUCING A MAGNETIC SENSOR
DE59601394D1 (en) DEVICE AND METHOD FOR PRODUCING A HONEYCOMB BODY
DE60005108D1 (en) Method and device for producing a recording sheet
DE59803424D1 (en) Method and device for producing a single crystal
DE69517399T2 (en) Method and device for producing a strip material

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PANASONIC CORP., KADOMA, OSAKA, JP

8339 Ceased/non-payment of the annual fee