JPS6164880A - Vacuum deposition device - Google Patents
Vacuum deposition deviceInfo
- Publication number
- JPS6164880A JPS6164880A JP18743784A JP18743784A JPS6164880A JP S6164880 A JPS6164880 A JP S6164880A JP 18743784 A JP18743784 A JP 18743784A JP 18743784 A JP18743784 A JP 18743784A JP S6164880 A JPS6164880 A JP S6164880A
- Authority
- JP
- Japan
- Prior art keywords
- film thickness
- vacuum deposition
- vacuum
- chambers
- evaporation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は光ディスク等の記録膜および反射膜を形成する
真空蒸着装置に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a vacuum deposition apparatus for forming recording films and reflective films for optical discs and the like.
従来例の構成とその問題点
近年、レーザ光を用いて記録再生が可能な光ディスクが
高密度記録媒体として注目されている。2. Description of the Related Art Structures of Conventional Examples and Their Problems In recent years, optical discs capable of recording and reproducing information using laser light have been attracting attention as high-density recording media.
画像、音声、文書の情報記録媒体として、またコンピュ
ータ用のデータメモリ媒体としてその需要が急速に拡大
されようとしており、高品質、低コストの光ディスクを
市場に供給するため高能率な生産方式、生産設備の開発
が要求されている。中でも記録膜形成工法の一つである
真空蒸着法による薄膜形成装置の連続量産化を進める上
で記録膜の。特性を安定して引き出すため蒸着制御の代
表例として水晶振動子によるモニター制御方式があるが
、本ｍｉｌ制御方式においては水晶娠動子仮に寿命があ
り、その都度交換が必要となるため蒸着装置としての連
続化に問題があるのが現状である。The demand for optical discs as information recording media for images, audio, and documents, and as data memory media for computers is rapidly expanding, and in order to supply the market with high-quality, low-cost optical discs, highly efficient production methods and production methods are required. Development of equipment is required. In particular, we are developing recording films in order to promote continuous mass production of thin film forming equipment using vacuum evaporation, which is one of the recording film forming methods. A typical example of vapor deposition control in order to stably bring out the characteristics is a monitor control method using a crystal oscillator, but in this mil control method, the crystal oscillator has a limited lifespan and must be replaced each time, so it is not suitable for use as a vapor deposition device. The current situation is that there is a problem with continuity.
第１図は従来の真空蒸着装置の一般的な構成を示す。１
は真空蒸＠槽、２は基材、３は蒸発物、４は蒸発源、５
は加熱コイル、６は膜厚制御用モニターヘッド、７は規
制用シャッタ、８は制ｔａｌｌ用ケーブル、９は蒸着制
御用装置、１０は蒸着電源、１１は真空ポンプ、１２は
リークボート、１８は基材準備槽、１９は基材取出し槽
である。FIG. 1 shows the general configuration of a conventional vacuum evaporation apparatus. 1
is the vacuum evaporation tank, 2 is the base material, 3 is the evaporated material, 4 is the evaporation source, 5
1 is a heating coil, 6 is a monitor head for film thickness control, 7 is a regulating shutter, 8 is a control tall cable, 9 is a vapor deposition control device, 10 is a vapor deposition power source, 11 is a vacuum pump, 12 is a leak boat, and 18 is a A base material preparation tank, 19 is a base material removal tank.
このように構成された真空蒸着槽内では次のようにして
蒸着される。真空ポンプ１１によって只空度１０−５〜
１Ｏ−６Ｔｏｒｒに排気維持されている真空蒸着（ａ１
内に、同じく真空度１０＝−１Ｏ−６Ｔｏｒｒに排気維
持されている基材準備槽１８より基材２が搬送セットさ
れ、加熱コイル５に蒸着電源１０で発生させた電流を流
すことにより蒸発源４を加熱して、基材２と膜厚制御用
モニターヘッド６の方向に蒸発物３を飛ばす。蒸発物３
が基材２に積層される速度は、膜厚制御用モニターヘッ
ド６の内部にセットされた水晶撮動子仮に蒸発物３が同
時に積層されてていくことにより水晶振動子板の振動周
波数の変化を蒸着制御２Ｉ］装置９によって読み取り、
これが所定の蒸着速度になるよう蒸＠電源１０のパワー
が制御される。以上の制御ループにより毎回蒸着する蒸
発物３の速度コントロールを安定に供給でき、基材２に
品質の安定した蒸着膜が得ることが出来ている。In the vacuum deposition tank configured as described above, deposition is performed as follows. With the vacuum pump 11, the air pressure is 10-5 ~
Vacuum deposition (a1
The substrate 2 is transferred and set from the substrate preparation tank 18 which is also maintained at a vacuum level of 10=-1O-6 Torr, and the evaporation source is set by passing a current generated by the evaporation power source 10 through the heating coil 5. 4 is heated to blow the evaporated material 3 in the direction of the base material 2 and the monitor head 6 for film thickness control. Evaporated matter 3
The speed at which the evaporated matter 3 is laminated on the base material 2 is determined by the change in the vibration frequency of the crystal oscillator plate set inside the monitor head 6 for film thickness control. is read by the vapor deposition control 2I] device 9,
The power of the evaporation power source 10 is controlled so that the evaporation rate becomes a predetermined evaporation rate. Through the above control loop, the speed control of the evaporated material 3 deposited each time can be stably supplied, and a deposited film of stable quality can be obtained on the substrate 2.
しかしながら、膜厚制御用モニターヘッド６内にセット
された水晶振動子板は、前述のように使用限界があるた
め、規定量の膜が積層づれば取換えが必要となり、真空
蒸着槽１内に基材２を連続的に供給出来ても、水晶撮動
子仮の使用限界を越えた時点で自動的に水晶振動子板の
取換えが出来ない限り真空蒸着槽１内の真室を解除し扉
を開放して取換えなければならない。よって、蒸着の連
続性は水晶振動子板の寿命によって制限されてしまうも
のである。尚、水晶振動子板の寿命は蒸着材料や蒸発源
４との距離によって異なるが金属酸化物を蒸着材料とし
た光ディスクにおいては蒸着枚数は５０枚程度である。However, the crystal oscillator plate set in the monitor head 6 for film thickness control has a usage limit as described above, so it must be replaced once a specified amount of film has been deposited, and the Even if material 2 can be continuously supplied, the true chamber in vacuum deposition tank 1 will be released and the door closed unless the crystal oscillator plate can be automatically replaced when the crystal oscillator plate exceeds its temporary usage limit. must be opened and replaced. Therefore, the continuity of vapor deposition is limited by the life of the crystal resonator plate. Although the life of the crystal resonator plate varies depending on the vapor deposition material and the distance from the evaporation source 4, the number of vapor-deposited optical discs using metal oxide as the vapor-deposited material is about 50.
発明の目的
本発明は＠着制御用モニターヘッドに用いられている水
晶振動子板を、真空蒸着槽内の真空状態を解除せず蒸着
中においても取換えが可能な真空蒸着装置を提供するこ
とを目的とする。Purpose of the Invention The present invention provides a vacuum evaporation apparatus in which a crystal resonator plate used in a monitor head for deposition control can be replaced even during evaporation without releasing the vacuum state in the vacuum evaporation tank. With the goal.
発明の構成
本発明の真空蒸着装置は、真空蒸＠槽の一部に膜厚モニ
ター室を複数箇所設け、前記真空蒸着槽と前記膜厚モニ
ター室の間に気密性を有する開閉自在なシャッタを設け
、前記膜厚モニター空には外部大気と通じる開口部とこ
の開口部に気密性を有する開閉自在なシャッタを設けて
、複数箇所に設けた前記膜厚モニター室の１つに配設さ
れた膜厚制御用モニターヘッドを使用して蒸着実行中に
他の膜厚モニター室の膜厚制御用モニターヘッドを交換
できるようにしたことを￥ｆ徴とする。Structure of the Invention The vacuum evaporation apparatus of the present invention includes a plurality of film thickness monitoring chambers provided in a part of a vacuum evaporation tank, and an airtight shutter that can be opened and closed between the vacuum evaporation tank and the film thickness monitoring chamber. The film thickness monitor is provided with an opening communicating with the outside atmosphere and an airtight shutter that can be freely opened and closed, and the film thickness monitor is disposed in one of the film thickness monitoring chambers provided at a plurality of locations. The feature is that the film thickness control monitor head can be used to replace the film thickness control monitor head in another film thickness monitoring chamber during vapor deposition.
実施例の説明 以下、本発明の一実施例を第２図に基づいて説明する。Description of examples Hereinafter, one embodiment of the present invention will be described based on FIG. 2.
なお、第１図と同様の作用を成すものには同一符号を付
けてその説明を省く。６ａ、６ｂは膜厚制御用モニター
ヘッド、１３ａ、１３ｂ Ｇ、を膜厚モニター室、１４
ａ、１４ｂは取出しロシャツタ、１５ａ。Components having the same functions as those in FIG. 1 are given the same reference numerals and their explanations will be omitted. 6a, 6b are monitor heads for film thickness control, 13a, 13b G are film thickness monitor chambers, 14
a, 14b is a take-out Roshata shutter, and 15a.
１５ｂは膜厚モニター至遮断用シャッタ、１６ａ、１６
ｂはシャッタ駆動装置、１７ａ、１７ｂは膜厚モニター
空リークポートである。15b is a shutter for film thickness monitoring and blocking, 16a, 16
b is a shutter driving device, and 17a and 17b are film thickness monitor empty leak ports.
次に動作と共に第２図の構成を詳細に説明する。Next, the configuration of FIG. 2 will be explained in detail along with the operation.
真空ポンプ１１によって真空度１０−” １Ｏ−６Ｔｏ
ｒｒに排気維持されている真空蒸着槽１内に同じく真空
度１０＝−１Ｏ−６Ｔｏｒｒに排気されている基材準備
槽１８より基材２を搬送セットし、加熱コイル５に蒸着
電源１０で発生させた電流を流すことにより蒸発源４を
加熱して基材２と膜厚制御モニターヘッド６の方向に蒸
発物３を飛ばす。蒸発物３が基材２に積層される速度は
膜厚モニターヘッド５ａ、６ｂの内部にセットされた水
晶振動子板の一方の水晶振動子板に蒸発物３が同時に積
層されていくことにより使用中の水晶振動子板の振動周
波数の変化を蒸着制御ｋｌｌ′ＩＡ置９によって読み取
り、指定した蒸着速度になるよう蒸着電源１０のパワー
を制御する。以上の制御ループにより毎回蒸着する蒸発
物３の速度コントロールを安定に供給し基材２に品質の
安定した蒸着膜が得ることが出来ている。蒸着完了した
基材２は搬送により取出し槽１９へ送られる。The degree of vacuum is 10-” 1O-6To by the vacuum pump 11.
The substrate 2 is transferred from the substrate preparation tank 18, which is also evacuated to a vacuum level of 10=-1O-6 Torr, into the vacuum evaporation tank 1, which is maintained at a vacuum level of 10 Torr. By passing the current, the evaporation source 4 is heated and the evaporated material 3 is thrown in the direction of the base material 2 and the film thickness control monitor head 6. The speed at which the evaporated material 3 is deposited on the base material 2 is determined by simultaneously depositing the evaporated material 3 on one of the crystal oscillator plates set inside the film thickness monitor heads 5a and 6b. The change in the vibration frequency of the crystal resonator plate inside is read by the vapor deposition control kll'IA device 9, and the power of the vapor deposition power source 10 is controlled to achieve the specified vapor deposition speed. Through the above control loop, the speed control of the evaporated material 3 deposited each time is stably supplied, and a deposited film of stable quality can be obtained on the substrate 2. The base material 2 on which vapor deposition has been completed is transported to a take-out tank 19.
前記従来例の構成と問題点の項で指摘したように蒸着制
御のモニターセンサとして使用されている水晶振動子板
には使用限界があり、従来では水晶振動子板の使用限界
毎に真空蒸着槽１内の真空状態を解除し取換えなければ
ならず連続蒸着をストップする必要があったが、本発明
のように真空蒸着槽１内の一部に複数箇所の膜厚モニタ
ー空１３ａ。As pointed out in the section on the configuration and problems of the conventional example, the crystal oscillator plate used as a monitor sensor for vapor deposition control has a usage limit. However, as in the present invention, film thickness monitor holes 13a are provided at a plurality of locations in a part of the vacuum deposition tank 1, as in the present invention.
１３ｂを設け、各々の膜厚モニター室１３ａ、 ？３ｂ
に取出しロシャッタ１４ａ、 １４ｂと、外部からシャ
ッタ駆動装置１６ａ、 １６ｂでそれぞれ任意に開閉が
出来る膜厚モニター至遮断用シャッタ１５ａ、１５ｂと
、膜厚モニター室リークポートの機能を設けて、真空蒸
着槽１とは独自に気密を保てる構成にしているため、一
方の膜厚モニター室′１３ｂに膜厚制御用モニターヘッ
ド６ｂを配備し蒸着制御ループを組み蒸着中においても
、他方の膜厚モニター１１３ａに配備されている膜厚制
御用モニターヘッド６ａ７２膜厚モニター空遮断用シヤ
ツタ１５ａを閉じ、取出しロシャッタ１４ａを開くこと
により外部に取出し使用限界を越えた水晶振動子板を取
換えることが可能となり、水晶振動子板の取換えによる
連続蒸着ストップを解消した装置構造が実現されている
。13b, and each film thickness monitoring chamber 13a, ? 3b
The vacuum evaporation tank is equipped with take-out shutters 14a and 14b, shutters 15a and 15b for film thickness monitoring and cutoff that can be opened and closed arbitrarily by external shutter drive devices 16a and 16b, and a film thickness monitoring chamber leak port function. 1 has a structure that can independently maintain airtightness, so a film thickness control monitor head 6b is installed in one film thickness monitor chamber '13b, and a vapor deposition control loop is established so that even during vapor deposition, the film thickness monitor head 6b is not connected to the other film thickness monitor 113a. By closing the film thickness control monitor head 6a72 and the shutter 15a for film thickness monitoring and opening the take-out shutter 14a, it is possible to take out the crystal to the outside and replace the crystal resonator board that has exceeded its usage limit. An apparatus structure has been realized that eliminates the need to stop continuous evaporation due to replacement of the vibrator plate.
発明の詳細
な説明のように本発明の真空蒸着装置は、真空蒸着槽内
に複数箇所の気密を独自に保てる膜厚モニター室を設け
その内部にＭＱ厚制罪用モニターヘッドを配備すること
によりｆ＋ｊ回安定したに着パワーがｉりられる制御ル
ープを組み蒸着が可能であると共にモニターセンサであ
る水晶振動子板の取換え時においても蒸着をストップす
ることなく基材、蒸発源の連続供給が可能な限り真空蒸
着槽内を大気圧に戻すことなく連続的な制御蒸着を実施
出来、蒸る工程での生産性が向上し、また真２蒸肴槽内
を大気圧に戻し扉を開放する回数が極めて減少したため
真空蒸着Ｉａ内のクリーン度も保て高品質な蒸着膜が得
られるものである。As described in the detailed description of the invention, the vacuum evaporation apparatus of the present invention has a film thickness monitoring chamber that can independently maintain airtightness at multiple locations in the vacuum evaporation tank, and an MQ thickness control monitor head is installed inside the chamber. It is possible to perform evaporation by building a control loop that can stably supply the deposition power f + j times, and also allows continuous supply of the substrate and evaporation source without stopping the evaporation even when replacing the crystal oscillator plate that is the monitor sensor. Continuous controlled vapor deposition can be performed without returning the inside of the vacuum deposition tank to atmospheric pressure as much as possible, improving productivity in the steaming process, and returning the inside of the vacuum deposition tank to atmospheric pressure and opening the door. Since the number of times of deposition is extremely reduced, the cleanliness inside the vacuum deposition Ia can be maintained and a high quality deposited film can be obtained.
第１図は従来の真空蒸着装置の構成図、第２図は本発明
の真空蒸着装置の一実施例の構成図である。
１・・・真空蒸着槽、２・−・基材、３・・・蒸発物、
４・・・蒸発源、５・・・加熱コイル、５ａ、５ｂ・・
・膜厚制御用モニターヘッド、７・・・規制用シャッタ
、９・・・蒸着制御用装置、１１・・・真空ポンプ、１
２・・・リークポート、１３ａ、１３ｂ−＝ｎ’Ａ厚モ
ニター室、１４ａ、１４ｂ −・・取出しロシセッタ、
１５ａ、 １５ｂ・・・膜厚モニターＶ遮断用シャッタ
、ｌｅａ、１６ｂ・・・シャッタ駆動装置、１７ａ。
１７ｂ・・・膜厚モニター室リークポート、１８・・・
基材準備槽、１９・・・基材取出し槽
代理人 森 本 義 弘
第１図FIG. 1 is a block diagram of a conventional vacuum evaporation apparatus, and FIG. 2 is a block diagram of an embodiment of the vacuum evaporation apparatus of the present invention. 1... Vacuum deposition tank, 2... Base material, 3... Evaporated material,
4... Evaporation source, 5... Heating coil, 5a, 5b...
・Monitor head for film thickness control, 7... Regulatory shutter, 9... Evaporation control device, 11... Vacuum pump, 1
2...Leak port, 13a, 13b-=n'A thickness monitor chamber, 14a, 14b--Takeout rosissetter,
15a, 15b... Film thickness monitor V cutoff shutter, lea, 16b... Shutter drive device, 17a. 17b... Film thickness monitor chamber leak port, 18...
Substrate preparation tank, 19... Substrate removal tank agent Yoshihiro Morimoto Figure 1
Claims (1)
、前記真空蒸着槽と前記膜厚モニター室の間に気密性を
有する開閉自在なシャッタを設け、前記膜厚モニター室
には外部大気と通じる開口部とこの開口部に気密性を有
する開閉自在なシャッタを設けて、複数箇所に設けた前
記膜厚モニター室の１つに配設された膜厚制御用モニタ
ーヘッドを使用して蒸着実行中に他の膜厚モニター室の
膜厚制御用モニターヘッドを交換できるようにした真空
蒸着装置。1. A plurality of film thickness monitoring chambers are provided in a part of the vacuum deposition tank, an airtight shutter that can be opened and closed is provided between the vacuum deposition tank and the film thickness monitoring chamber, and an external An opening that communicates with the atmosphere and an airtight shutter that can be freely opened and closed are provided in this opening, and a monitor head for film thickness control is installed in one of the film thickness monitoring chambers provided at multiple locations. A vacuum evaporation device that allows you to replace the film thickness control monitor head in another film thickness monitoring chamber while the evaporation process is in progress.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18743784A JPS6164880A (en) | 1984-09-06 | 1984-09-06 | Vacuum deposition device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18743784A JPS6164880A (en) | 1984-09-06 | 1984-09-06 | Vacuum deposition device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6164880A true JPS6164880A (en) | 1986-04-03 |
Family
ID=16206043
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18743784A Pending JPS6164880A (en) | 1984-09-06 | 1984-09-06 | Vacuum deposition device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6164880A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01224950A (en) * | 1988-03-04 | 1989-09-07 | Fuji Xerox Co Ltd | Manufacture of optical recording medium |
| WO1998050916A1 (en) * | 1997-05-08 | 1998-11-12 | Matsushita Electric Industrial Co., Ltd. | Device and method for manufacturing an optical recording medium |
| JP2010077469A (en) * | 2008-09-25 | 2010-04-08 | Hitachi Zosen Corp | Film-thickness-detecting device of vacuum vapor-deposition facility |
| EP2261388A1 (en) * | 2009-06-12 | 2010-12-15 | Applied Materials Inc. a Corporation of the State of Delaware | Deposition rate monitor device, evaporator, coating installation, method for applying vapor to a substrate and method of operating a deposition rate monitor device |
| EP2436800A1 (en) * | 2005-12-02 | 2012-04-04 | Superconductor Technologies, Inc. | High-throughput deposition system for oxide thin film growth by reactive coevaporation |
| JP2012126938A (en) * | 2010-12-14 | 2012-07-05 | Ulvac Japan Ltd | Vacuum deposition device and method for forming thin film |
| EP3366804A1 (en) * | 2017-02-22 | 2018-08-29 | Satisloh AG | Box coating apparatus for vacuum coating of substrates, in particular spectacle lenses |
| WO2019149382A1 (en) * | 2018-02-05 | 2019-08-08 | Applied Materials, Inc. | Deposition apparatus for depositing evaporated material and methods therefor |
-
1984
- 1984-09-06 JP JP18743784A patent/JPS6164880A/en active Pending
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01224950A (en) * | 1988-03-04 | 1989-09-07 | Fuji Xerox Co Ltd | Manufacture of optical recording medium |
| WO1998050916A1 (en) * | 1997-05-08 | 1998-11-12 | Matsushita Electric Industrial Co., Ltd. | Device and method for manufacturing an optical recording medium |
| US6340501B1 (en) | 1997-05-08 | 2002-01-22 | Matsushita Electric Industrial Co., Ltd. | Device and method for manufacturing an optical recording medium |
| KR100353774B1 (en) * | 1997-05-08 | 2002-09-27 | 마츠시타 덴끼 산교 가부시키가이샤 | Device and method for manufacturing an optical recording medium |
| EP2436800A1 (en) * | 2005-12-02 | 2012-04-04 | Superconductor Technologies, Inc. | High-throughput deposition system for oxide thin film growth by reactive coevaporation |
| JP2010077469A (en) * | 2008-09-25 | 2010-04-08 | Hitachi Zosen Corp | Film-thickness-detecting device of vacuum vapor-deposition facility |
| EP2261388A1 (en) * | 2009-06-12 | 2010-12-15 | Applied Materials Inc. a Corporation of the State of Delaware | Deposition rate monitor device, evaporator, coating installation, method for applying vapor to a substrate and method of operating a deposition rate monitor device |
| JP2012126938A (en) * | 2010-12-14 | 2012-07-05 | Ulvac Japan Ltd | Vacuum deposition device and method for forming thin film |
| EP3366804A1 (en) * | 2017-02-22 | 2018-08-29 | Satisloh AG | Box coating apparatus for vacuum coating of substrates, in particular spectacle lenses |
| US10913999B2 (en) | 2017-02-22 | 2021-02-09 | Satisloh Ag | Box coating apparatus for vacuum coating of substrates, in particular spectacle lenses |
| WO2019149382A1 (en) * | 2018-02-05 | 2019-08-08 | Applied Materials, Inc. | Deposition apparatus for depositing evaporated material and methods therefor |
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