JPH0931633A - Optical thin film forming device - Google Patents

Optical thin film forming device

Info

Publication number
JPH0931633A
JPH0931633A JP7184396A JP18439695A JPH0931633A JP H0931633 A JPH0931633 A JP H0931633A JP 7184396 A JP7184396 A JP 7184396A JP 18439695 A JP18439695 A JP 18439695A JP H0931633 A JPH0931633 A JP H0931633A
Authority
JP
Japan
Prior art keywords
thin film
film forming
reference value
unit
shutter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7184396A
Other languages
Japanese (ja)
Inventor
Masashi Tsukada
昌司 塚田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu General Ltd
Original Assignee
Fujitsu General Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu General Ltd filed Critical Fujitsu General Ltd
Priority to JP7184396A priority Critical patent/JPH0931633A/en
Publication of JPH0931633A publication Critical patent/JPH0931633A/en
Pending legal-status Critical Current

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  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an optical thin film forming device capable of forming optical thin films having accurate optical characteristics by monitoring the forming state of the optical thin films. SOLUTION: A vacuum bell-jar 1 is internally provided with a shutter 13 which separates the upper part to a vacuum film forming chamber 11 for forming the optical thin films by vapor deposition on the end face of an optical fiber 2 and the lower part to an evaporating chamber 13 disposed with an evaporating device 12b, etc., for evaporating the thin film material in a crucible 12a and is controllable in opening and closing between the evaporating chamber and the vacuum film forming chamber and an optical fiber drawing-out port 11b in the prescribed place in the vacuum film forming chamber. The other end of the optical fiber is drawn out to the outside of the vacuum film forming chamber. The outside of the vacuum bell-jar is provided with a half prism 4 which introduces part of the light from a standard light source 3 into the other end of the optical fiber and reflects the rest by 90 deg., an optical sensor 5 which detects the intensity of the reflected light from this half prism and a control circuit 6 which controls the shutter by monitoring the detection signal from this optical sensor.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、光学薄膜形成装置に係
わり、特に、薄膜形成状態を監視して薄膜材料を溶解す
る溶解層のシャッターを制御するものに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical thin film forming apparatus, and more particularly to a device for monitoring a thin film forming state and controlling a shutter of a dissolving layer for dissolving a thin film material.

【0002】[0002]

【従来の技術】従来、光ファイバーの端面に反射防止
膜、ダイクロイックフィルタ等の薄膜を形成する装置は
なく、例えば、図2に示すように、真空成膜室と、蒸発
室と、前記真空成膜室と蒸発室との間に外部より開閉制
御可能なシャッターとを設けなる真空ベルジャを利用し
て光ファイバーの端面に反射防止膜、ダイクロイックフ
ィルタ等の光学薄膜を蒸着形成するには、光ファイバー
を真空成膜室に入れて真空とし、前記シャッターを閉
じ、薄膜材料を蒸発室に備える坩堝に入れて加熱し、シ
ャッターを所定時間開放して光ファイバーの端面に薄膜
材料を蒸着形成することができる。しかし、この構成で
は、薄膜材料、溶解温度、真空状態等の形成条件を所定
の光学特性に合わせて設定するには、予めテストを繰り
返し行って設定値を決めるしかなく、大きな手間と、時
間を必要とし、しかも、出来上がった光学薄膜の光学特
性はバラツキの多く使用できるものではなかった。
2. Description of the Related Art Conventionally, there is no apparatus for forming a thin film such as an antireflection film or a dichroic filter on the end face of an optical fiber. For example, as shown in FIG. 2, a vacuum film forming chamber, an evaporation chamber, and the vacuum film forming unit. A vacuum bell jar is installed between the chamber and the evaporation chamber to control the opening and closing from the outside.To form an optical thin film such as an antireflection film or dichroic filter on the end face of the optical fiber by vacuum evaporation, the optical fiber is vacuum-formed. It is possible to deposit the thin film material on the end face of the optical fiber by putting it in a film chamber to make a vacuum, closing the shutter, putting the thin film material in a crucible provided in the evaporation chamber and heating it, and opening the shutter for a predetermined time. However, with this configuration, in order to set the forming conditions such as the thin film material, the melting temperature, and the vacuum state according to the predetermined optical characteristics, it is necessary to repeat the test in advance to determine the set value, which requires a lot of labor and time. In addition, the optical characteristics of the finished optical thin film required a lot of variations and could not be used.

【0003】[0003]

【発明が解決しようとする課題】本発明は以上述べた問
題点を解決し、光学薄膜の形成状態を監視しながら光学
薄膜を形成することにより、精度のよい光学特性を持つ
光学薄膜を形成することができる光学薄膜形成装置を提
供することを目的としている。
SUMMARY OF THE INVENTION The present invention solves the problems described above and forms an optical thin film while monitoring the formation state of the optical thin film, thereby forming an optical thin film having accurate optical characteristics. It is an object of the present invention to provide an optical thin film forming apparatus that can be used.

【0004】[0004]

【課題を解決するための手段】本発明は上述の課題を解
決するため、真空ベルジャの内部には、上部を光ファイ
バーの端面に光学薄膜を蒸着形成する真空成膜室と、下
部を坩堝内の薄膜材料を蒸発する蒸発装置等を配設する
蒸発室とに分離し、該蒸発室と前記真空成膜室の間に外
部より開閉制御可能なシャッターと、前記真空成膜室の
所定の場所に光ファイバー引き出し口を設けて真空成膜
室の外部に前記光ファイバーの他端を引き出し、真空ベ
ルジャの外部にはレーザ光等の標準光源と、該標準光源
よりの光の一部を通して前記光ファイバーの他端に導入
し、残りの一部を90度反射するハーフプリズムと、該
ハーフプリズムよりの反射光の強度を検出するフォトマ
ルチプライヤー(PM)等の光センサーと、該光センサ
ーよりの検出信号を監視して前記シャッターを制御する
制御回路とを設けた。
In order to solve the above-mentioned problems, the present invention has a vacuum film forming chamber for forming an optical thin film by vapor deposition on the end face of an optical fiber inside a vacuum bell jar, and a lower part inside a crucible. A shutter which is separated into an evaporation chamber in which an evaporation device for evaporating a thin film material and the like is provided, and a shutter which can be opened and closed from the outside between the evaporation chamber and the vacuum film forming chamber and a predetermined place of the vacuum film forming chamber An optical fiber outlet is provided to draw the other end of the optical fiber to the outside of the vacuum film forming chamber, and a standard light source such as a laser beam and a part of the light from the standard light source are passed to the outside of the vacuum bell jar to the other end of the optical fiber. And a light sensor such as a photomultiplier (PM) that detects the intensity of the reflected light from the half prism and a detection signal from the light sensor. It provided a control circuit for controlling the shutter monitor.

【0005】[0005]

【作用】以上のように構成したので、本発明の光学薄膜
形成装置によれば、標準光源よりの光をハーフプリズム
を通して真空成膜室の外部に引き出した光ファイバーの
他端に導き、前記光ファイバーの一端よりの反射光を前
記ハーフプリズムで反射し、この反射光の強度をフォト
マルチプライヤー(PM)等の光センサーで検出し、こ
の検出信号を基準値と比較することにより、前記蒸発室
と真空成膜室の間に設けるシャッターの開放または閉鎖
を制御するようにしている。
According to the optical thin film forming apparatus of the present invention configured as described above, the light from the standard light source is guided to the other end of the optical fiber drawn out of the vacuum film forming chamber through the half prism, and the optical fiber The light reflected from one end is reflected by the half prism, the intensity of the reflected light is detected by an optical sensor such as a photomultiplier (PM), and the detection signal is compared with a reference value, whereby the evaporation chamber and the vacuum chamber are vacuumed. The opening or closing of the shutter provided between the film formation chambers is controlled.

【0006】[0006]

【実施例】以下、図面に基づいて本発明による光学薄膜
形成装置を詳細に説明する。図1は本発明による光学薄
膜形成装置の一実施例を示すシステムブロック図であ
る。図において、1は真空ベルジャで、真空ポンプ11
aと光ファイバー引き出し口11bを備える真空成膜室
11と、薄膜材料を入れる坩堝12aと、該坩堝12の
中の薄膜材料を加熱して蒸発する抵抗加熱装置12bを
有する蒸発室12と、該蒸発室12と前記真空成膜室1
1の間に開閉制御可能なシャッター13とを備えてい
る。尚、本実施例では蒸発装置に抵抗加熱方式の抵抗加
熱装置12bを使用したが、電子ビームを薄膜材料に当
てて蒸発する電子ビーム方式の蒸発装置やアーク放電に
より薄膜材料を蒸発するスパッタリング方式の蒸発装置
を使用することができることはいうまでもない。2は光
ファイバーで、端面に反射防止膜、ダイクロイックフィ
ルタ等の光学薄膜を形成しようとするものである。3は
標準光源で、既知の光強度のレーザ光を発生している。
4はハーフミラーで、入射角90度で入射する光の一部
を通過し、一部を90度反射している。5は光センサー
で、フォトマルチプライヤー(PM)等光の強度等を検
出している。6は制御回路で、後述の基準値記憶部6
1、比較部62、判別部63、シャッター駆動部64及
び、運搬制御部65で構成している。7は運搬部で、前
記運搬制御部65よりの制御により、前記真空ベルジャ
1に備える坩堝12aを移動し、後述の予熱室8に備え
る坩堝12aと入れ換えをしている。8は前記予熱室
で、各種薄膜材料を入れる前記坩堝12aを複数収納
し、抵抗加熱装置8bにて所定の温度に加熱している。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An optical thin film forming apparatus according to the present invention will be described in detail below with reference to the drawings. FIG. 1 is a system block diagram showing an embodiment of an optical thin film forming apparatus according to the present invention. In the figure, reference numeral 1 is a vacuum bell jar, and a vacuum pump 11
a, a vacuum film forming chamber 11 having an optical fiber outlet 11b, a crucible 12a for containing a thin film material, and an evaporation chamber 12 having a resistance heating device 12b for heating and evaporating the thin film material in the crucible 12; Chamber 12 and the vacuum film forming chamber 1
1 and a shutter 13 whose opening and closing can be controlled. In the present embodiment, the resistance heating type resistance heating device 12b is used as the evaporation device, but an electron beam type evaporation device that evaporates by applying an electron beam to the thin film material or a sputtering method that evaporates the thin film material by arc discharge is used. It goes without saying that an evaporator can be used. Reference numeral 2 is an optical fiber for forming an optical thin film such as an antireflection film or a dichroic filter on the end face. Reference numeral 3 denotes a standard light source, which emits laser light having a known light intensity.
Reference numeral 4 denotes a half mirror, which passes a part of light incident at an incident angle of 90 degrees and reflects a part of the light by 90 degrees. An optical sensor 5 detects the intensity of light such as photomultiplier (PM). Reference numeral 6 denotes a control circuit, which is a reference value storage unit 6 described later.
1, a comparison unit 62, a determination unit 63, a shutter drive unit 64, and a transportation control unit 65. Reference numeral 7 denotes a transportation section, which is moved by the control of the transportation control section 65 to move the crucible 12a provided in the vacuum bell jar 1 and replace it with a crucible 12a provided in a preheating chamber 8 described later. Reference numeral 8 denotes the preheating chamber in which a plurality of crucibles 12a containing various thin film materials are housed and heated to a predetermined temperature by a resistance heating device 8b.

【0007】61は前記基準値記憶部で、不揮発性RA
M61a、データ書き込み部61b、データ入力部61
cとで構成し、データ入力部61cより入力した基準値
データをデータ書き込み部61bにて不揮発性RAM6
1aに記憶している。62は前記比較部で、前記光セン
サー5よりの検出信号を前記基準値記憶部61に記憶す
る基準値データと比較して比較信号を出力している。6
3は前記判別部で、前記比較部よりの比較信号に基づい
てシャッターを開放するか閉じるかの判別をして開閉制
御信号を出力している。64はシャッター駆動部で、前
記判別部63よりの開閉制御信号により前記シャッター
13を駆動している。65は運搬制御部で、前記判別部
63よりの開閉制御信号とシャッター駆動部64よりの
駆動信号に基づいて、前記運搬部7を制御している。6
6は基準値制御部で、制御部66aと、手順プログラム
記憶部66bと、手順プログラム入力部66cとでな
り、手順プログラム入力部66cより基準値変更手順プ
ログラムを入力し、該手順プログラムを手順プログラム
記憶部66bに書き込み、該手順プログラム記憶部66
bに記憶する手順に従って、制御部66aが基準値記憶
部に記憶する基準データを読み出すようにしている。
尚、本実施例では、判別部63での判別結果シャッター
64の開放または閉鎖の制御を行うようにしたが、電子
ビーム方式やスパッタリング方式の蒸発装置を使用した
場合は、蒸発制御部67を設け、判別部63よりの判別
結果に基づいて蒸発装置を制御し、薄膜材料の蒸発量を
制御してもよい。
Reference numeral 61 is the reference value storage unit, which is a nonvolatile RA.
M61a, data writing unit 61b, data input unit 61
and the reference value data input from the data input unit 61c in the data writing unit 61b.
It is stored in 1a. Reference numeral 62 denotes the comparison unit, which compares the detection signal from the optical sensor 5 with the reference value data stored in the reference value storage unit 61 and outputs a comparison signal. 6
Reference numeral 3 denotes the discriminating unit that discriminates whether the shutter is opened or closed based on the comparison signal from the comparison unit, and outputs an opening / closing control signal. A shutter drive unit 64 drives the shutter 13 in response to an opening / closing control signal from the determination unit 63. A transportation control unit 65 controls the transportation unit 7 based on an opening / closing control signal from the determination unit 63 and a drive signal from the shutter driving unit 64. 6
A reference value control unit 6 includes a control unit 66a, a procedure program storage unit 66b, and a procedure program input unit 66c. The reference value changing procedure program is input from the procedure program input unit 66c, and the procedure program is changed to the procedure program. The procedure program storage unit 66 is written in the storage unit 66b.
The control unit 66a reads the reference data stored in the reference value storage unit in accordance with the procedure stored in b.
In this embodiment, the determination result of the determination unit 63 is controlled to open or close the shutter 64. However, when an electron beam type or sputtering type evaporation device is used, the evaporation control unit 67 is provided. The evaporation device may be controlled based on the determination result of the determination unit 63 to control the evaporation amount of the thin film material.

【0008】以上の構成において、つぎにその動作を説
明する。まず、真空ベルジャ1の内部では、端面に反射
防止膜、ダイクロイックフィルタ等の光学薄膜を形成し
ようとする光ファイバー2の他端を真空成膜室11に備
える光ファイバー引き出し口11bより外部に引き出
し、真空ポンプ11aを作動して真空成膜室11を真空
にしている。また、薄膜材料を入れた坩堝12aを抵抗
加熱装置12bを作動して加熱し、薄膜材料を所定の温
度で溶解している。坩堝12aの温度が所定温度に達す
るとシャッター13を開放し、真空成膜室11内に薄膜
材料を蒸発させ、光ファイバー2の端面に蒸着させて光
学薄膜を形成するようにしている。
Next, the operation of the above configuration will be described. First, inside the vacuum bell jar 1, the other end of the optical fiber 2 for forming an optical thin film such as an antireflection film and a dichroic filter on the end face is pulled out to the outside from an optical fiber outlet 11b provided in the vacuum film forming chamber 11, and a vacuum pump The vacuum film forming chamber 11 is evacuated by operating 11a. Further, the crucible 12a containing the thin film material is heated by operating the resistance heating device 12b to melt the thin film material at a predetermined temperature. When the temperature of the crucible 12a reaches a predetermined temperature, the shutter 13 is opened to evaporate the thin film material in the vacuum film forming chamber 11 and deposit it on the end face of the optical fiber 2 to form an optical thin film.

【0009】一方、真空ベルジャ1の外部では、標準光
源3よりの標準レーザー光をハーフミラー4を介して前
記光ファイバー引き出し口11bより引き出した光ファ
イバー2の他端に導き入れ、この光ファイバー2からの
反射光を前記ハーフミラー4で反射させ、光サンサー5
でこの反射光の強度を検出し、この検出データ(Ds)
を制御部6に入力している。例えば、光ファイバー2の
反射光が所定の仕様になるように端面に反射防止膜を多
層薄膜で形成する場合、予め、前記基準値記憶部61に
反射光の仕様に基づき、各成膜工程に対応する複数の基
準値データ(Dstdn)を記憶しておくことにより、
基準値制御部66が手順プログラム記憶部66bに記憶
する手順プログラムの手順に従って、前記基準値データ
(Dstdn)から所定の基準値データ(Dstk)を
読み出し、該基準値データ(Dstk)と各成膜工程毎
に制御部6に入力した前記検出データ(Ds)を比較部
62で比較し、検出データ(Ds)が基準値データ(D
stk)以下になると、判別部63がシャッター閉鎖信
号を出力し、シャッター駆動部64を介して前記シャッ
ター13を閉じるようにしている。
On the other hand, outside the vacuum bell jar 1, the standard laser light from the standard light source 3 is guided through the half mirror 4 to the other end of the optical fiber 2 drawn from the optical fiber drawing port 11b, and reflected from the optical fiber 2. The light is reflected by the half mirror 4, and the light sensor 5
The intensity of this reflected light is detected by, and this detection data (Ds)
Is input to the control unit 6. For example, when an antireflection film is formed of a multi-layered thin film on the end face so that the reflected light of the optical fiber 2 has a predetermined specification, it corresponds to each film forming process based on the specification of the reflected light in the reference value storage unit 61 in advance. By storing a plurality of reference value data (Dstdn)
The reference value control unit 66 reads predetermined reference value data (Dstk) from the reference value data (Dstdn) according to the procedure of the procedure program stored in the procedure program storage unit 66b, and the reference value data (Dstk) and each film formation. The detection data (Ds) input to the control unit 6 for each process is compared by the comparison unit 62, and the detection data (Ds) is the reference value data (D
When it becomes stk) or less, the determination unit 63 outputs a shutter closing signal to close the shutter 13 via the shutter driving unit 64.

【0010】また、前記判別部63よりのシャッター閉
鎖信号は運搬制御部65に入力し、所定時間経過後、運
搬部を制御して、真空ベルジャ1に配置する坩堝12a
を移動して予熱室8に配置した所定の坩堝12aと交換
し、つぎの成膜工程に移行するようにしている。基準値
制御部66は前記1成膜工程が完了すると、手順プログ
ラム記憶部66bに記憶する手順プログラムの手順に従
って、基準値記憶部6に記憶する次の基準値データを読
み出すようにしている。
The shutter closing signal from the discriminating unit 63 is input to the transportation control unit 65, and after a lapse of a predetermined time, the transportation unit is controlled to be placed in the vacuum bell jar 1 and the crucible 12a.
Is moved to replace a predetermined crucible 12a arranged in the preheating chamber 8 and the process proceeds to the next film forming step. When the one film forming step is completed, the reference value control unit 66 reads out the next reference value data stored in the reference value storage unit 6 according to the procedure of the procedure program stored in the procedure program storage unit 66b.

【0011】以上は、運搬部7を設けて自動的に坩堝1
2aを交換するようにした例を示したが、運搬部7を設
けず、前記シャッター13を閉じて、1成膜工程完了
後、手動で真空ベルジャ1に配置する坩堝12aを予熱
室8に移動し、予熱室8に配置した所定の坩堝12aと
交換して次成膜工程に移行するようにしてもよい。ま
た、実施例では1本の光ファイバーの端面に薄膜を形成
したが、複数本の光ファイバー束の端面に薄膜を形成す
る場合、その束の中の1本または数本をサンプリングし
てフィードバックすることにより実現可能である。
Above, the carrying section 7 is provided and the crucible 1 is automatically operated.
Although the example in which 2a is exchanged is shown, the transportation part 7 is not provided, the shutter 13 is closed, and after the completion of one film forming process, the crucible 12a manually arranged in the vacuum bell jar 1 is moved to the preheating chamber 8. However, it may be replaced with a predetermined crucible 12a arranged in the preheating chamber 8 to shift to the next film forming step. In the embodiment, the thin film is formed on the end face of one optical fiber. However, when the thin film is formed on the end face of a plurality of optical fiber bundles, one or several of the bundles are sampled and fed back. It is feasible.

【0012】[0012]

【発明の効果】以上説明したように、本発明による光学
薄膜形成装置によれば、標準光源よりの光をハーフプリ
ズムを通して真空成膜室の外部に引き出した光ファイバ
ーの他端に導き、前記光ファイバーの一端よりの反射光
を前記ハーフプリズムで反射し、この反射光の強度をフ
ォトマルチプライヤー(PM)等の光センサーで検出
し、この検出信号を基準値と比較することにより、前記
蒸発室と真空成膜室の間に設けるシャッターの開放また
は閉鎖を制御するようにしているので、光学薄膜の形成
状態を監視しながら光学薄膜を形成することにより、精
度のよい光学特性を持つ光学薄膜を形成することができ
る光学薄膜形成装置を提供することが出来る。
As described above, according to the optical thin film forming apparatus of the present invention, the light from the standard light source is guided through the half prism to the other end of the optical fiber drawn out of the vacuum film forming chamber, and the optical fiber The light reflected from one end is reflected by the half prism, the intensity of the reflected light is detected by an optical sensor such as a photomultiplier (PM), and the detection signal is compared with a reference value, whereby the evaporation chamber and the vacuum chamber are vacuumed. Since the opening or closing of the shutter provided between the film forming chambers is controlled, the optical thin film is formed while monitoring the formation state of the optical thin film, thereby forming the optical thin film having accurate optical characteristics. It is possible to provide an optical thin film forming apparatus capable of performing the above.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による光学薄膜形成装置の一実施例を示
すシステムブロック図である。
FIG. 1 is a system block diagram showing an embodiment of an optical thin film forming apparatus according to the present invention.

【図2】従来の真空ベルジャによる光学薄膜形成方法を
示す。
FIG. 2 shows a conventional optical thin film forming method using a vacuum bell jar.

【符号の説明】[Explanation of symbols]

1 真空ベルジャ 2 光ファイバー 3 標準光源 4 ハーフミラー 5 光学センサー 6 制御部 7 運搬部 8 予熱室 11 真空成膜室 11a 真空ポンプ 11b 引き出し口 12 蒸発室 12a 坩堝 12b 抵抗加熱装置(蒸発装置) 13 シャッター 61 基準データ記憶部 61a 不揮発性RAM 61b 書き込み部 61c データ入力部 62 比較部 63 判別部 64 駆動部 65 運搬制御部 66 基準値制御部 66a 制御部 66b 手順プログラム記憶部 66c 手順プログラム入力部 67 (蒸発制御部) 1 vacuum bell jar 2 optical fiber 3 standard light source 4 half mirror 5 optical sensor 6 control unit 7 transport unit 8 preheating chamber 11 vacuum film forming chamber 11a vacuum pump 11b outlet 12 evaporation chamber 12a crucible 12b resistance heating device (evaporation device) 13 shutter 61 Reference data storage unit 61a Nonvolatile RAM 61b Writing unit 61c Data input unit 62 Comparison unit 63 Discrimination unit 64 Drive unit 65 Transport control unit 66 Reference value control unit 66a Control unit 66b Procedure program storage unit 66c Procedure program input unit 67 (Evaporation control Part)

Claims (10)

【特許請求の範囲】[Claims] 【請求項1】 真空ベルジャの内部には、上部を光ファ
イバーの端面に光学薄膜を蒸着形成する真空成膜室と、
下部を坩堝内の薄膜材料を蒸発する蒸発装置等を配設す
る蒸発室とに分離し、該蒸発室と前記真空成膜室の間に
外部より開閉制御可能なシャッターと、前記真空成膜室
の所定の場所に光ファイバー引き出し口を設けて真空成
膜室の外部に前記光ファイバーの他端を引き出し、真空
ベルジャの外部にはレーザ光等の標準光源と、該標準光
源よりの光の一部を通して前記光ファイバーの他端に導
入し、残りの一部を90度反射するハーフプリズムと、
該ハーフプリズムよりの反射光の強度を検出するフォト
マルチプライヤー(PM)等の光センサーと、該光セン
サーよりの検出信号を監視して前記シャッターを制御す
る制御回路とを設けてなることを特徴とする光学薄膜形
成装置。
1. A vacuum film forming chamber for forming an optical thin film by vapor deposition on an end face of an optical fiber in an upper part inside the vacuum bell jar,
The lower part is separated into an evaporation chamber in which an evaporation device or the like for evaporating the thin film material in the crucible is provided, and a shutter which can be opened / closed between the evaporation chamber and the vacuum film formation chamber from the outside, and the vacuum film formation chamber The other end of the optical fiber is pulled out to the outside of the vacuum film forming chamber by providing an optical fiber outlet at a predetermined location of the vacuum bell jar, and a standard light source such as laser light and a part of the light from the standard light source are passed outside the vacuum bell jar. A half prism which is introduced into the other end of the optical fiber and reflects the remaining part by 90 degrees,
An optical sensor such as a photomultiplier (PM) that detects the intensity of the reflected light from the half prism, and a control circuit that monitors the detection signal from the optical sensor and controls the shutter are provided. Optical thin film forming apparatus.
【請求項2】 前記蒸発室に備える蒸発装置は、抵抗加
熱方式の加熱装置を備えてなることを特徴とする請求項
1記載の光学薄膜形成装置。
2. The optical thin film forming apparatus according to claim 1, wherein the evaporation device provided in the evaporation chamber comprises a resistance heating type heating device.
【請求項3】 前記蒸発室に備える蒸発装置は、電子ビ
ーム方式の加熱装置を備えてなることを特徴とする請求
項1記載の光学薄膜形成装置。
3. The optical thin film forming apparatus according to claim 1, wherein the evaporation device provided in the evaporation chamber includes an electron beam heating device.
【請求項4】 前記蒸発室に備える蒸発装置は、スパッ
タリング方式の放電装置を備えてなることを特徴とする
請求項1記載の光学薄膜形成装置。
4. The optical thin film forming apparatus according to claim 1, wherein the evaporation device provided in the evaporation chamber comprises a sputtering type discharge device.
【請求項5】 前記制御回路は、基準値を記憶する基準
値記憶部と、該基準値記憶部よりの基準値と前記光セン
サーよりの検出信号とを比較する比較器と、比較器より
の比較結果、前記シャッターの開放又は閉鎖を判別する
判別部と、該判別結果に基づいて前記シャッターを駆動
するシャター駆動部とでなることを特徴とする請求項1
記載の光学薄膜形成装置。
5. The control circuit comprises a reference value storage section for storing a reference value, a comparator for comparing the reference value from the reference value storage section with a detection signal from the optical sensor, and 2. A comparison unit, which includes a determination unit that determines whether the shutter is open or closed, and a shutter drive unit that drives the shutter based on the determination result.
The optical thin film forming apparatus as described in the above.
【請求項6】 前記制御回路は、基準値を記憶する基準
値記憶部と、該基準値記憶部よりの基準値と前記光セン
サーよりの検出信号とを比較する比較器と、比較器より
の比較結果、前記シャッターの開放又は閉鎖を判別する
判別部と、該判別結果に基づいて前記シャッターを駆動
するシャター駆動部と、前記判別結果に基づいて前記蒸
発装置を制御して蒸発量を可変する蒸発制御部とでなる
ことを特徴とする請求項1記載の光学薄膜形成装置。
6. The control circuit comprises a reference value storage section for storing a reference value, a comparator for comparing the reference value from the reference value storage section and a detection signal from the optical sensor, and As a result of the comparison, a determination unit that determines whether the shutter is open or closed, a shutter drive unit that drives the shutter based on the determination result, and the evaporation device is controlled based on the determination result to change the evaporation amount. The optical thin film forming apparatus according to claim 1, comprising an evaporation control unit.
【請求項7】 前記蒸発室に備える坩堝は、着脱自在に
配置し、該坩堝を移動する運搬機を設け、真空ベルジャ
の近傍に配置する予熱室に1個以上の薄膜材料を入れた
坩堝を備え、前記運搬機が予熱室に備える所定の坩堝と
真空ベルジャに備える坩堝を交換するようにしてなるこ
とを特徴とする請求項1記載の光学薄膜形成装置。
7. A crucible provided in the evaporation chamber is detachably arranged, a carrier for moving the crucible is provided, and a crucible containing one or more thin film materials is provided in a preheating chamber arranged near the vacuum bell jar. The optical thin film forming apparatus according to claim 1, wherein the transporting machine is configured to exchange a predetermined crucible provided in a preheating chamber and a crucible provided in a vacuum bell jar.
【請求項8】 前記基準値記憶部は、書き込み自在な不
揮発性RAMで構成し、データ書き込み部と、データ入
力部を設け、データ入力部より入力した基準値データを
データ書き込み部が基準値記憶部に書き込むようにして
なることを特徴とする請求項5または請求項6記載の光
学薄膜形成装置。
8. The reference value storage unit is composed of a writable nonvolatile RAM, is provided with a data writing unit and a data input unit, and the data writing unit stores the reference value data input from the data input unit. The optical thin film forming apparatus according to claim 5 or 6, wherein the optical thin film forming apparatus is configured to be written in a portion.
【請求項9】 前記基準値記憶部には1つ以上のデータ
を記憶し、基準値制御部と、手順プログラム記憶部と、
手順プログラム入力部を設け、手順プログラム入力部よ
り基準値変更手順プログラムを入力し、該手順プログラ
ムを手順プログラム記憶部に書き込み、該手順プログラ
ム記憶部に記憶する手順に従って、基準値制御部が基準
値記憶部に記憶する基準データを読み出すようにしてな
ることを特徴とする請求項5または請求項6記載の光学
薄膜形成装置。
9. The reference value storage unit stores one or more data, a reference value control unit, a procedure program storage unit,
A procedure program input unit is provided, a reference value changing procedure program is input from the procedure program input unit, the procedure program is written into the procedure program storage unit, and the reference value control unit follows the procedure of storing in the procedure program storage unit. The optical thin film forming apparatus according to claim 5 or 6, wherein the reference data stored in the storage unit is read out.
【請求項10】 前記制御回路は、基準値を記憶する基
準値記憶部と、該基準値記憶部よりの基準値と前記光セ
ンサーよりの検出信号とを比較する比較器と、比較器よ
りの比較結果、前記シャッターの開放又は閉鎖を判別す
る判別部と、該判別結果に基づいて前記シャッターを駆
動するシャター駆動部と、前記シャッター閉鎖後、前記
真空ベルジャに備える坩堝と予熱室に備える所定の坩堝
と交換するように前記運搬機を制御する運搬制御部とで
なることを特徴とする請求項7記載の光学薄膜形成装
置。
10. The control circuit comprises a reference value storage section for storing a reference value, a comparator for comparing the reference value from the reference value storage section with a detection signal from the optical sensor, and As a result of the comparison, a determination unit that determines whether the shutter is opened or closed, a shutter drive unit that drives the shutter based on the determination result, and a predetermined crucible and a preheating chamber that are provided in the vacuum bell jar after the shutter is closed. The optical thin film forming apparatus according to claim 7, further comprising: a transportation control unit that controls the transportation machine so as to replace it with a crucible.
JP7184396A 1995-07-20 1995-07-20 Optical thin film forming device Pending JPH0931633A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7184396A JPH0931633A (en) 1995-07-20 1995-07-20 Optical thin film forming device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7184396A JPH0931633A (en) 1995-07-20 1995-07-20 Optical thin film forming device

Publications (1)

Publication Number Publication Date
JPH0931633A true JPH0931633A (en) 1997-02-04

Family

ID=16152443

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7184396A Pending JPH0931633A (en) 1995-07-20 1995-07-20 Optical thin film forming device

Country Status (1)

Country Link
JP (1) JPH0931633A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002286937A (en) * 2001-03-26 2002-10-03 Furukawa Electric Co Ltd:The Dielectric film deposition method to optical fiber end face and dielectric film deposition system
WO2011158452A1 (en) * 2010-06-16 2011-12-22 パナソニック株式会社 Method for manufacturing thin film
WO2011158453A1 (en) * 2010-06-16 2011-12-22 パナソニック株式会社 Method for manufacturing thin film
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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002286937A (en) * 2001-03-26 2002-10-03 Furukawa Electric Co Ltd:The Dielectric film deposition method to optical fiber end face and dielectric film deposition system
WO2011158452A1 (en) * 2010-06-16 2011-12-22 パナソニック株式会社 Method for manufacturing thin film
WO2011158453A1 (en) * 2010-06-16 2011-12-22 パナソニック株式会社 Method for manufacturing thin film
CN102482762A (en) * 2010-06-16 2012-05-30 松下电器产业株式会社 Method for manufacturing thin film
CN102482763A (en) * 2010-06-16 2012-05-30 松下电器产业株式会社 Method for manufacturing thin film
US8865258B2 (en) 2010-06-16 2014-10-21 Panasonic Corporation Method of manufacturing thin film which suppresses unnecessary scattering and deposition of a source material
US8877291B2 (en) 2010-06-16 2014-11-04 Panasonic Corporation Method of manufacturing thin film which suppresses unnecessary scattering and deposition of a source material
JP5807217B2 (en) * 2010-06-16 2015-11-10 パナソニックIpマネジメント株式会社 Thin film manufacturing method
JP5807216B2 (en) * 2010-06-16 2015-11-10 パナソニックIpマネジメント株式会社 Thin film manufacturing method
CN115323330A (en) * 2022-07-19 2022-11-11 广东腾胜科技创新有限公司 Electron beam evaporation coating equipment with valve isolation evaporation chamber and winding chamber

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