JPH0350501A - Hard coating film for plastic member and vacuum deposition device thereof - Google Patents

Abstract

PURPOSE:To reform the surface of a plastic member and to improve the performance thereof without impairing the shape accuracy thereof by adopting vacuum deposition and optimizing a material for vapor deposition, film constitution and vapor deposition conditions. CONSTITUTION:The hard coating film in common use as an antireflection film is formed on the surface of the plastic member by the vacuum deposition device. Namely, the control of a film thickness in Angstrom (Angstrom ) unit is possible in the case of formation of the hard coating film by vacuum deposition and, therefore, the shape accuracy of the plastic member can be maintained as it is. The hard coating film which has >=5H pencil hardness and does not peel off in a peeling test using an adhesive cellophane tape is obtd. by optimizing the material for vapor deposition, the film constitution and the vapor deposition conditions. The hard coating film which has the high reliability and in common use as the antireflection film is obtd. in this way.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a technology for surface modification of plastic members, and in particular to a hard coat film for surface hardening and anti-reflection of plastic members by vacuum deposition. (Prior art) In general, plastic parts are beginning to be highly valued in the market for their advantages of being light, impact resistant, and easy to process, and demand as an alternative to glass and metal is increasing.However, plastic parts are It has the disadvantage of low hardness and is easily scratched.For this reason, in the case of parts that require surface hardness, a method of surface treatment by dipping organic silica resin etc. on the surface of the plastic member is known. As described in JP-A-57-201201, a method is disclosed in which an ultraviolet curable resin is formed on a plastic lens by dipping to improve the surface hardness.However, in the case of dipping, the film thickness is This is determined by the viscosity of the solvent used and the pulling speed of the part to be treated. Therefore, in the case of lenses with curvature, it becomes difficult to control the thickness of the coating film.
In addition, when trying to maintain the shape accuracy of parts to be processed by coating, there was a problem in that it required a great deal of time and equipment. The purpose of the present invention is to provide a hard coat film that can modify the surface of a plastic member and improve its performance without impairing the shape accuracy of the plastic member.

[Means to solve the problem]

In order to achieve the above object, the present invention employs vacuum deposition as a method for forming a hard coat film on the surface of a plastic member, and optimizes the deposition material, film configuration, and deposition conditions.

[Effect]

When forming a hard coat film by vacuum deposition, the film thickness can be controlled in units of angstroms (A). Therefore, the shape accuracy of the plastic member can be maintained as it is. Furthermore, in optical components, hard coating films that also serve as anti-reflection coatings can be realized by devising the film structure. Furthermore, by optimizing the vapor deposition material, film structure, and vapor deposition conditions, a hard coat film with a pencil hardness of 5H or more and no peeling in a cellophane adhesive tape peel test can be obtained.

[Example] Examples of the present invention will be described below, but first, the points of view of the present invention will be explained using FIGS. 15 to 20. FIG. 15 shows an outline of the vacuum evaporation equipment.

For vacuum evaporation, the inside of the vacuum chamber 6 is evacuated by an exhaust unit 28 such as a grio bomb to create a high vacuum of around 2 x 0-s Torr, and a evaporation material crucible 24 made of oxygen-free copper or the like is used.
In this method, a vapor deposition material 21 such as SiO, ZrO2, etc. placed in a container is heated and evaporated by an electron beam gun 10, and the evaporated particles are attached to the surface of a substrate such as a plastic lens 4.

The evaporation material crucible 24 is of a rotating type, and a multilayer film can be formed without breaking the vacuum. The start and end of vapor deposition is performed by opening and closing a shutter 22 provided above the vapor deposition material crucible 24. The substrate is heated by a heater such as a halogen heater 26. Film thickness control is performed by reading the reflectance or transmittance of the monitor glass using a photoelectric film thickness meter 13, and controlling the opening and closing of the shutter 22 based on this reading. The holder 5 that holds the substrate rotates on its axis in order to reduce the thickness distribution of the film attached to the substrate.

Next, the deposition conditions will be explained.

The most important thing in the deposition conditions is how to evaporate the deposition material under appropriate conditions, which is determined by the current pattern of the electron beam gun 10. In a typical electric current step, the current is increased to raise the temperature of the deposition material to remove and evaporate impurities contained in the deposition material, and then the current is lowered to make the deposition rate as low as possible to perform the deposition.
Initially, the study was conducted using the current pattern described above.

First, we investigated several types of evaporation materials. In the case of plastic parts, the thermal deformation temperature is low at around 80°C, so hot coating (heating the substrate to 300 to 500°C and vapor deposition, which is conventionally done with anti-reflection coating on glass lenses, etc.) improves hardness and reliability. etc.) cannot be used. For this reason, low temperature (80℃
(Below) The selection criteria was that it would become hard even after vapor deposition. As a result, 2ro2, S i O, is harder than other vapor deposition materials. As mentioned above, Si○2 and Zr○2 were selected as the vapor deposition materials, and then the adhesion was examined. A plastic lens made of polymethyl methacrylate (hereinafter referred to as PMA) was used as the substrate.

Figure 16 shows the relationship between the SiO2 film thickness, the number of evaporated material crucibles, and the adhesion strength. When the number of deposition sources is ↓, if the film thickness is λ/4 (the center value of the wavelength of transmitted light or reflected light), the adhesion will pass the cellophane adhesive tape peeling test described later (no peeling), but the film thickness As R becomes thicker, the adhesion strength decreases, and it does not adhere at all at λ.On the other hand, evaporation R
The adhesion strength improves as the number of sources increases to two or four, and the ratio of one deposition source to 1/2 or 1/4 increases. For example, when using four evaporation sources, vJ of λ. When depositing a thickness of λ/4, the first evaporation source evaporates λ/4, then the evaporation material crucible 24 is rotated, and the material of the next evaporation source is heated and evaporated to λ/4.
4 is vapor-deposited, and then the vapor-deposition material crucible 24 is rotated.

From the above results, more evaporated particles that contribute to adhesion are generated in the first half of the heating process of the evaporation material.

The current pattern of the sin electron beam gun shown in FIG. 17 is a conventional general pattern, and the reason why the current is initially increased is to remove impurities contained in the evaporation material. Thereafter, the current is reduced in order to perform deposition at a slow deposition rate. As is clear from the figure, adhesion can be improved by advancing the start point of steaming 11. This confirms that evaporated particles that contribute to adhesion are generated in the first half of the heating process.

FIG. 18 shows the relationship between vapor deposition rate and adhesion force. As is clear from the figure, the higher the deposition rate, the more v! ! The grip will improve.

From the above contents, V! ! Evaporated particles and a high evaporation rate in the first half of heating are effective for improving adhesion.

Figure 19 shows the relationship between the current pulse of the Sin electron beam gun and the degree of vacuum in the deposition tank. The degree of vacuum in the vapor deposition tank is the number of evaporated particles, and if the shutter is opened at this time to perform vapor deposition, it becomes the vapor deposition rate itself. As is clear from the figure, the degree of vacuum in the deposition tank tends to drop rapidly when the current is rising, and gradually recover when the current becomes constant. This unevenness is expressed by the number of evaporated particles, and evaporation is most active when the current is increasing, and gradually becomes inactive when the current is constant.

From the above phenomenon, one reason why the evaporated particles in the first half of the heating process is effective in improving adhesion is that evaporation becomes active in the first half of the heating process. In order to perform vapor deposition at a higher deposition rate, it is optimal to perform vapor deposition not when the current is constant but when the current is increasing. 20th
As a result of vapor deposition with the current pattern shown in the figure, the 17th
In the conventional current pattern explained using Figure 7, the film thickness of λ could only be formed using four evaporation sources, but in the new current pattern, it is possible to form a film with a thickness of λ with one evaporation source. Furthermore, it was confirmed that even if the film thickness was increased to 2λ or 3λ, good adhesion could be obtained with just one evaporation source.

As described above, a hard coat film having sufficient practicality can be obtained by vacuum deposition.

The explanation of the first embodiment of the present invention will be given below from FIG.
Do this using diagrams.

FIG. 1 shows the film structure of the hard coat film that also serves as antireflection in this embodiment. 4 is a biconvex plastic lens made of PMMA shown in Fig. 2, 1 is the first layer of Sin2.15 provided on the plastic lens 4, and the film thickness is 0.8 μm (2λ; λ is the design wavelength. (in this example, λ=400 nm), 2 is the first layer of Sin2W
The second layer is Zr○2 layer provided on Jl, and the film thickness is 0.
2 μm (λ/2). 3 is the third Si02 layer provided on the second Zro2 layer 2, and the film thickness is 0.1 μrn (μ/
4). The antireflection effect is obtained by the 2M of the second J5Zr○2 layer 2 and the third MSIO2 layer 3. FIG. 3 shows the current ramp of the electron beam gun of this embodiment and the time point at which vapor deposition starts. The maximum current of Zr○2 is S i
The reason why it is larger than O2 is that the melting point of ZrO is higher than that of Sin2. The starting point of vapor deposition is different for Si02 and ZrO, and in the case of Sin, Zr○ starts 20 seconds after the start of heating.
In case 2, the optimum time was 5 seconds after the start of heating.

Figure 4 shows other deposition conditions. The higher the degree of vacuum in the vapor deposition tank when heating the vapor deposition material is started, the higher the quality of the hard coat film obtained. However, increasing the exhaust time directly leads to an increase in the deposition cycle time. Therefore, in consideration of the performance of the hard coat film and the deposition cycle time, 1. '5
It was set at X 1 0-'Torr. Also, although not shown in the figure, in order to replace the vapor deposition material, Sin2 can be hard coated by replenishing the reduced amount in the heated and melted material, as seen from the points of view mentioned above. Membrane performance deteriorates. For this reason, a new material for Si○2 was used for each layer deposited. The shape of the material of Si○ is a granule-like shape of φ2 to φ3 nu. In the case of Zr○2,
The shape of the material is a tablet with a diameter of 20n+m and a thickness of 12 volumes. In the second use, the crucible 24 is placed in the vapor deposition material crucible 24 with the heated and melted surface facing downward. This system includes a vacuum chamber 6,
Vapor deposition state measurement block 7, film thickness state measurement block 12,
Computer controller 15 and control block 19
It consists of

In FIG. 5, a plastic lens 4 is fixed inside a vacuum chamber 6 via a reversible lens holder 5. In FIG. Reference numeral 7 denotes a deposition state measuring block, including a vacuum gauge 8 for measuring the degree of vacuum in the vacuum chamber 6, a substrate thermometer 9 for measuring the surface temperature of the plastic lens 4, and an electron measuring block for measuring the current value supplied to the electron beam gun 10. Beam gun current monitor 1
It has been separated from engineering.

Reference numeral 12 denotes a film thickness state measuring block, which is composed of a photoelectric film thickness meter 13 and a crystal film thickness meter 14 for measuring the state of the deposited film on the plastic lens 4.

15 is a computer controller, an input unit 16 that transfers vapor deposition processing condition data to this system, the vapor deposition condition meter Jl+ block 7, and a film thickness condition measurement block 1.
2 from the data acquisition unit 17 and the controller 18 to the controller Iv. has been done.

The controller 8 constantly monitors the data transferred from the data acquisition unit 7, compares the data with the data set in the input unit 6, and if a deviation occurs, corrects the deviation. It has a function of outputting a corresponding correction signal to the control block 19.

The control block 19 includes an electron beam gun control unit 20 that controls the current value supplied to the electron beam gun 10, and opening and closing of a shutter 22 that regulates the evaporation of the evaporation material 21 and the start and end of evaporation onto the substrate. a crucible control unit 23 for controlling the cylinder, a crucible control unit 1 for controlling the rotational movement of the vapor deposition material crucible 24 in which the vapor deposition material 21 is mounted;
-25, a heater control unit 27 that controls a halogen heater 26 that heats the surface of the plastic lens 4, and an exhaust unit 28 that controls the degree of vacuum in the vacuum chamber 6.

The operation of the vapor deposition processing system control device configured as above will be explained using the above-mentioned antireflection and hard coating of the plastic lens 4 as a specific example.

Plastic lens 4'! The vacuum chamber 6 in which A is attached is sealed and evacuated by the exhaust unit 28 to increase the degree of vacuum. The plastic lens 4 fixed to the reversible lens holder 5 is heated by a halogen heater 26. The controller 18 via the data acquisition unit 17
A vacuum gauge 8 and a thermometer 9 continuously monitor the degree of vacuum in the vacuum M6 and the temperature of the plastic lens 4. The observation results are shown in FIGS. 6(a) and (b). Controller 1
8 is the electron beam gun control unit 2 when the vacuum level Ps for starting heating of the evaporation material set by the input unit l6 is reached.
The electron beam gun current load signal is output to o. As a result, the electron beam generated from the electron beam gun 10 is applied to the vapor deposition material S i O, which is attached to the first layer vapor deposition material crucible 24 .
heat rapidly. The electron beam gun control unit 20 is
A predetermined current is supplied to the electron beam gun 10 based on the electron beam gun current pattern set by the input unit l6.

The controller 18 is the electron beam gun current monitor 11.
The value of the electron beam gun current supplied to the electron beam gun 10 is continuously monitored. This current value is the deposition starting current. When the temperature reaches 1o, the shutter control unit 23 is activated to open the shutter! {Output number i. As a result, the shutter 22 is opened and the plastic lens 4
Deposition begins.

While the deposition process is in progress, the controller 18
The electron beam gun current is supplied to the electron beam gun 10 via the electron beam gun current monitor 11, the photoelectric film thickness gauge 13, and the water thickness gauge 14, and the vapor deposited film formed on the surface of the plastic lens 4. Monitor the film thickness. The thickness of the deposited film is
When the film thickness δ set by the input unit l6 is reached, the controller 18 closes the shutter 22 via the shutter control unit 23 to block the deposition particles onto the plastic lens 4, and also controls the electron beam gun. The electron beam gun current supplied to the electron beam gun 10 via the units 1 and 20 is cut off.

Next, by the same procedure as described above, the second layer Zr○2
, the third J偕Si○2 vapor deposition process is performed.

By the above vapor deposition process, the formation of the vapor deposited film on one side of the plastinoclens 4 is completed. Furthermore, when vapor-depositing the lens surface on the opposite side, the reversible lens holder 5 is inverted and the vapor-deposition process is performed in the same manner as described above. Thereby, vapor deposition films can be formed on both sides of the plastic lens 4 in a short time.

In the above-described vapor deposition process, the controller 18:
The electron beam gun current supplied to the electron beam gun 10 is monitored, and this current value is compared with input data set by the input unit 16. If a deviation occurs between the two data, a correction signal corresponding to the deviation is output to the electron beam control unit 20, and the electron beam gun current supplied to the electron beam gun 10 is corrected and controlled.

This makes it possible to realize an optimal electron beam gun current pattern suitable for each evaporation material, and by this example, it is possible to supply evaporation material molecules with a high activation energy level to the plastic lens surface. The performance of the obtained vapor deposited film (antireflection and hard coat film) will be explained.

FIG. 7 shows the spectral transmittance of the plastic lens 4 obtained in this example. The deposition surfaces are both sides. In the case of a focused plastic lens PMMA that is not subjected to vapor deposition processing, the spectral transmittance is 92%. From this, according to this example, the spectral transmittance is from wavelength 400 nm to 700 nm.
We were able to achieve an average improvement of around 6% within this range. This has made it possible to obtain a plastic lens that can fully satisfy optical performance.

FIG. 8 shows the results of a reliability test of the antireflection/hard coat film obtained in this example.

Before explaining the results, the pencil hardness test and cellophane adhesive tape peeling test will be explained using FIGS. 9 and 10.

FIG. 9 shows a jig for a pencil hardness test. This jig includes a sliding lens holding holder 3'0 that holds a plastic lens 4 and moves on a holding base 29, a button brush 31 whose lead tip is made into a cylindrical shape with side paper and has an edge. a pencil holder 33 that holds the pencil and installs a weight 32 so as to apply a load of 500 g perpendicularly to the edge of the tip of the lead of the pencil 31 that contacts the plastic lens 4 that is the object to be measured; It is composed of a holding member 34 that adjusts and holds the pencil holder 33 in height, and a holding member 35 that connects the two. Next, the test procedure will be explained. First, place the plastic lens 4, which is the object to be measured, on the sliding lens holding holder 30.
to be installed. Next, the pencil 31 with an edge portion provided at the tip of the lead using side paper is attached to the pencil holder 33. Next, the position of the pencil holder 33 in the sliding lens holding holder 30 is adjusted so that the edge of the pencil 31 comes into contact with the outermost periphery of the vapor-deposited surface of the plastic lens 4. In this case, the pencil 31 is placed in the pencil holder 33 in order to ensure that the edge part contacts the surface of the plastic lens 4.
It is desirable that the mounting angle be 45° from the vertical direction. Furthermore, in the case of a lens with curvature, the holding stand 2
9 also has a curvature structure, so that the pencil 3
It is preferable that the angle l is 45'' with respect to the tangential direction of the surface of the plastic lens 4 that contacts the edge of the core.

Next, the sliding lens holding holder is moved so that the edge of the lead of the pencil 31 passes from the outermost periphery of the vapor deposition surface of the plastic lens 4 to the outermost periphery of the opposing vapor deposition surface through the center of the lens.

The moving speed at this time is approximately lcm/sec to 2 km/sec. Each time the test is conducted, the lead of the pencil 31 is polished with side paper to form an edge. Damage is determined visually or visually.

The above is the method of pencil hardness test.

FIG. 10 shows the method of cellophane adhesive tape peel test. The cellophane adhesive tape may be one that is generally commercially available and is within the standards of JIS-Z-1522.

This cellophane adhesive tape is brought into close contact with the plastic lens 4, which is the object to be measured, without any air pockets.

Next, this cellophane adhesive tape 36 is instantly and quickly peeled off in a direction perpendicular to the lens surface of the plastic lens 4. Thereafter, it is determined whether the deposited film is peeled off or not.

Next, the reliability test results of the antireflection/hard coat film of this example will be explained again with reference to FIG. 8.

Five tests were conducted under the test conditions: standard, moisture absorption, high temperature, low temperature, and heat cycle. As a result, the hardness was 5H or higher in all tests. Adhesion strength was also tested using a cellophane adhesive tape peel test. There was no peeling and the result was good.

Next, the relationship between the film thickness and adhesion of the Lrf5SiO2 film in the film structure of the antireflection/hard coat film of this example will be described.

FIG. 11 shows the relationship between the film thickness of the first layer Sin and the adhesion of the antireflection/hard coat film.

As is clear from the figure, in order to obtain good adhesion, the thickness of the first layer Sin2 must be 0.2 μm or more.

On the other hand, in this example, in the membrane configuration, ? Plastic lens - Sin - ZrO2 - Sin film thickness 2λ
-1/2-1/4 structure was used to form an antireflection and hard coat film, but the film structure was as follows: - Plastic lens - Sin, - ZrO2 - S
in2 film thickness 0.24m or more - L/2-λ/4, plastic lens - Sin2- ZrO, - Sin2
Even if a film thickness of 0.2 fim or more - λ/4 - 1/4 is used, the same effect as in this embodiment can be obtained.

Next, a second example will be described.

FIG. 12 shows the screen of a liquid crystal projector.

This screen has the function of enlarging the LCD screen,
There are several types of structures, such as a Fresnel lens 37, a lenticular lens 38, a combination thereof, and a diffusion agent mixed therein. Since these screens are exposed to the outside of the product, fingerprints and the like tend to adhere to them, and when cleaning them, there are problems such as scratches.

In this embodiment, a screen combining a Fresnel lens 37 and a lenticular lens 38 is taken up, and a continuous anti-reflection/hardcoat film 1 to 1 is provided in the first embodiment.

As a result, a screen that was bright and had good scratch resistance could be obtained.

Next, a third embodiment will be described.

Figure 13 shows the front lens concave lens 4 of a zoom lens for a video camera, and the lens material is polycarbonate (hereinafter referred to as p
c). When pc is compared to P MMA,
The hardness of the material itself is low. Therefore, in order to improve the surface hardness of a plastic lens made of PC and satisfy its practical performance, it is necessary to use one of the various configurations of the anti-reflection and hard coat film described in the first embodiment. Among them, it is necessary to form the first layer Si○2 with a film thickness on the order of several μm. However, Si
○2 The thicker the film, the higher the hardness, but the larger the internal strain of the film itself, the lower the {H reliability.

For this reason, the current pattern of the electron beam gun 10 is made into a wave shape.

The vapor deposition process will be explained using FIGS. 14 and 5.

The vacuum chamber 6 equipped with the plastic lens 4 is sealed,
It is evacuated by the exhaust unit 28 and the degree of vacuum increases. The plastinoclens 4 fixed to the reversible lens holder 5 is heated by a halogen heater 26. The controller 18 continuously monitors the degree of vacuum in the vacuum chamber 6 and the temperature of the plastic lens 4 using a vacuum gauge 8 and a thermometer 9 via a data acquisition unit ↓7. The observation results are shown in Figure 14 (a) and (b). Controller 1
8 is the electron beam control unit 2 when the vacuum level Ps for starting heating of the evaporation material set by the input unit L6 is reached.
The electron beam gun current load signal is output to o. As a result, the electron beam generated from the electron beam gun 10 rapidly heats the vapor deposition material Si2 placed in the first layer vapor deposition material crucible 24. The electron beam gun control unit 20 supplies a predetermined current to the electron beam gun 10 based on the electron beam gun current number determined by the input units 1 and ↓6. The controller 18 continuously monitors the value of the electron beam gun current supplied to the electron beam gun IO via the electron beam gun current monitor 11.

This current value is the start of evaporation! Ryuko. At the point in time, a shutter release motion signal is output to the shutter control unit 23. This opens the shutter 22 and starts vapor deposition onto the plastic lens 4.

While the vapor deposition process is in progress, the controller 18 controls the electron beam gun current supplied to the electron beam gun 10 via the electron beam gun current monitor 11 and the crystal film F1 total 14, and the electron beam gun current formed on the surface of the plastic lens 4. } of the vapor-deposited film
Monitor thickness. Electron beam gun current inputs 1 to 1
When the shutter closing current Is set in step 6 is reached, the controller 18 closes the shutter 22 via the shutter control unit 23 to block the deposition particles on the plastic lens 4. The electron beam gun current supplied to the electron beam gun 10 is cut off by passing through the unit 20.The film J'X formed on the surface of the plastic lens 4 has a film thickness set in the unit 1-16. If δ has not been reached, the controller 8
Pass 25 to the melt control unit 1 and transfer the vapor deposition material crucible 2.
4 and set the second crucible containing the first layer vapor deposition material at the vapor deposition source position.

The deposition process then continues in the same manner as described above.

If the electron beam gun current supplied to the second crucible reaches the shutter closing current Is mentioned above, and the film thickness formed on the surface of the plastic lens 4 has not reached the film thickness δ, the same applies. The evaporation process using the evaporation material in the third crucible is continued in accordance with the following steps.

When the film thickness formed on the surface of the plastic lens 4 reaches the film thickness δ, the controller 18 closes the shutter 22 via the shutter control unit 23 and closes the shutter 22 via the electron beam gun control unit 20. The electron beam gun current supplied to the electron beam gun 10 is cut off. Next, the second and third layers are deposited in the same manner as described above.

Through the above vapor deposition process, the thickness of the 115i○2 layer is 5 to 6 cm on the plastinoclens made of PC. rn evaporation,
The 2nd J{jl Z r O■, the 31st JSiO2 are the same films J8! as in the first example! ．． formed. As a result, it is possible to obtain a highly reliable anti-reflection/HardCo-1 film having the same performance as that described in the first embodiment.

〔Effect of the invention〕

In the present invention, since the surface treatment of a plastic member is performed by vacuum deposition as described above, the present invention produces the following effects.

Improve the surface hardness of a plastic member to a pencil hardness of 5I■ or higher without impairing the shape accuracy of the plastic member, and obtain a highly reliable hard coat film that also serves as anti-reflection without peeling off in the cellophane adhesive tape peel test. be able to.

[Brief explanation of drawings]

Figures 1 to 11 are explanatory diagrams of the first embodiment of the present invention, Figure 1 is a sectional view showing the film structure of the reflective fat stopper and hard coat 1, and Figure 2 is a sectional view of the film structure of the plastic lens. The sectional view, FIGS. 3 and 4 are explanatory diagrams of vapor deposition conditions, FIG. 5 is an explanatory diagram of the vapor deposition apparatus, and FIG. 6 is an illustration of the vapor deposition apparatus. Figure 7 is the transmittance, Figure 8 is the reliability test result, Figure 9 is the pencil hardness test, Figure 10 is the cellophane adhesive tape peeling test, Figure 1L is the
FIG. 12 is an explanatory diagram of the relationship between the adhesion force and IJ"J of the layer Si○2. FIG. 12 is a model diagram of a screen according to the second embodiment of the present invention, and FIGS. , is an explanatory diagram of the third embodiment of the present invention. FIG. 13 is a cross-sectional view of the plastic lens, and FIG. 14 is an explanatory diagram of the vapor deposition state. It is an explanatory diagram of the point of view, and the 15th
The figure is an explanatory diagram of the vapor deposition apparatus, and the 16th FJ c. Si
O2(7)IIJ thickness. The relationship between the number of evaporation sources and the adhesion force, Figure 17 shows the relationship between the starting point of evaporation and the density, and the n force, and Figure 18 shows the relationship between S
FIG. 19 is a diagram showing the relationship between the evaporation rate and adhesion force of i○2, FIG. 19 is a diagram showing the relationship between the electron beam gun current percentage and the number of evaporated particles, and FIG. 20 is a diagram showing the new current pattern. Mark X 1...1st rM SiO z, 2...2nd layer ZrO
■, 3...3rd/('5SiO2, 4...Plastinocleanse, 6...True tank, 10...Electron beam gun, 1
3... Photoelectric film thickness meter, 14... Water quality film JT2 meter, 15
...Computer controller 1 Herola,]6...Input unit, 19...Control unit, 20...Electron beam gun control unit. 21... Vapor deposition material, 22... Shutter, 24... Vapor deposition material crucible, 26... Halogen heater. 28...exhaust unit, 3l...pencil, 3
6... Cellophane adhesive tape. 37... Fresnel lens, 38... Lenticular lens.

Claims (1)

[Scope of Claims] 1. A hard coat film for a plastic member, characterized in that it is formed using a vacuum evaporation device and also has antireflection properties. 2. The hard coat film for a plastic member according to claim 1, wherein the hard coat film has a hardness of 5H or more. 3. The above hard coat film consists of a first layer (1) made of silicon dioxide SiO_2 with a thickness of 0.2 μm or more processed and formed on a plastic member using a vacuum evaporation device, and λ being the wavelength of transmitted or reflected light. When the central value of
A second layer (2) made of zirconium dioxide ZrO_2 with a thickness of 1/4λ or 1/2λ, processed and formed on the first layer (1) using a vacuum evaporation device, and on the second layer (2). A third layer made of silicon dioxide SiO_2 with a thickness of 1/4λ was processed and formed using a vacuum evaporation device.
The hard coat film for a plastic member according to claim 1 or 2, comprising a layer (3). 4. The plastic member (4) is sealed in the vacuum chamber 6, and the vapor deposition material (21) attached to the vapor deposition material crucible (24) is heated to transfer the vapor deposition material (21) to the plastic member (4).
In a vacuum evaporation apparatus for performing evaporation processing on the surface of , a evaporation state measurement block 7 for measuring the evaporation state; a film thickness state measurement block (12) for measuring the evaporation film formation state on the surface of the plastic member (4); Condition measurement block (7) and film thickness condition measurement block (1)
2) A vapor deposition device that has a controller (18) that compares the measured data and the set value of the vapor deposition conditions and outputs a correction signal according to the deviation, and corrects the vapor deposition conditions according to the output signal of the controller (18). A vacuum evaporation apparatus for plastic members, comprising: a condition control block (19); 5. In the evaporation state measurement block (7), film thickness state measurement block (12), and evaporation condition control block (19) of the vacuum evaporation apparatus, the evaporation state measurement block (7) measures the degree of vacuum of the vacuum chamber (6). a vacuum gauge (8) that measures the surface temperature of the plastic member (4), a substrate thermometer (9) that measures the surface temperature of the plastic member (4), and an electron beam gun current monitor that measures the current value supplied to the electron beam gun (10). The film thickness state measurement block (12) is comprised of a photoelectric film thickness meter (13) and a crystal film thickness meter (14), and the deposition condition control block (19) is comprised of (11) and (11). , an electron beam gun control unit (20) that controls the current value supplied to the electron beam gun (10), and controls the opening and closing of the shutter (22) that regulates the vapor deposition of the vapor deposition material (21) onto the plastic member (4). shutter control unit (2
3), and a crucible control unit (2) that controls the rotational movement of the vapor deposition material crucible (24) containing the vapor deposition material (21).
5), a heater control unit (27) that controls the heat generation state of the halogen heater (26) that heats the surface of the plastic member (4), and an exhaust unit (28) that controls the degree of vacuum of the vacuum chamber (6). 5. The vacuum evaporation apparatus according to claim 4, comprising: