JPH0320731A - Production of optical recording medium - Google Patents
Production of optical recording mediumInfo
- Publication number
- JPH0320731A JPH0320731A JP15534689A JP15534689A JPH0320731A JP H0320731 A JPH0320731 A JP H0320731A JP 15534689 A JP15534689 A JP 15534689A JP 15534689 A JP15534689 A JP 15534689A JP H0320731 A JPH0320731 A JP H0320731A
- Authority
- JP
- Japan
- Prior art keywords
- recording medium
- optical recording
- recording layer
- vacuum
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims description 27
- 238000004519 manufacturing process Methods 0.000 title claims description 23
- 238000000034 method Methods 0.000 claims abstract description 22
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 17
- 239000000463 material Substances 0.000 claims abstract description 14
- 238000010438 heat treatment Methods 0.000 claims abstract description 7
- 238000007738 vacuum evaporation Methods 0.000 claims description 7
- 238000001704 evaporation Methods 0.000 claims description 5
- 230000008020 evaporation Effects 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims 2
- 239000011368 organic material Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 26
- 230000015572 biosynthetic process Effects 0.000 abstract description 13
- 239000010453 quartz Substances 0.000 abstract description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 9
- 238000007740 vapor deposition Methods 0.000 abstract description 7
- 238000010521 absorption reaction Methods 0.000 description 6
- 238000000862 absorption spectrum Methods 0.000 description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 5
- 229910052753 mercury Inorganic materials 0.000 description 5
- 239000002904 solvent Substances 0.000 description 4
- 241000251468 Actinopterygii Species 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000005191 phase separation Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000004904 shortening Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 241000208140 Acer Species 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- 101001067830 Mus musculus Peptidyl-prolyl cis-trans isomerase A Proteins 0.000 description 1
- 238000004847 absorption spectroscopy Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000009189 diving Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 235000021003 saturated fats Nutrition 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 238000004809 thin layer chromatography Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は デー久 画像等の情報記録用の高密度記録媒
体としての光ディスクなどに利用される光学記録媒体の
製造方法に関すん
従来の技術
従来 有機化合物を用いた書換え可能な光学記録媒体と
してフォトクロミック材料を用いるものが知られていも
この光学記録媒体の動作原理１上波長の異なる２種類
の光源によって可逆的な色の変化を生じるフォトクロミ
ック材料のもつ特性を利用して、吸光ＦＬ遺過永 ある
いは反射率の変化を２値記憶するものであも
スピロビラン構造を有する有機フォトクロミック材料（
６一二トロ−８−ドコサデカノイルオキシメチル−３゛
， ３” −ジメチル−１′−オクタデシルスビロ［２
Ｈ−１−ペンゾピラン−２，２゜一インドリン］、以下
ＳＰ１８２２と略す）｛よ紫外線照射による着色状態で
ある光異性体を熱的に安定なＪ会合体に変化させること
によって、記録寿命を延ばすことが可能な物質として知
られていも
記録層として基板上へのＳＰ１８２２からなる光学記録
媒体の製造方法（よ 従来単成分での作製は困難である
と考えられており、他の支持物質と混合して行なわれて
いる。知られている方法として（よ ラングミュアーブ
口ジェット（以下ＬＢと略す）法を利用して飽和炭化水
魚 直鎖飽和脂肪魚 あるいはその塩やエステル類と混
合した累積を形戊する方法（例えζＬ シン・ソリッド
・フィルムズ第１３３巻第２１頁（１９８５年） （Ｔ
ｈｉｎ ＳｏｌｉｄＦｉ１ｍｓ，ｌｉ３．２１（１９８
５））やＳＰ１８２２を溶解あるいは分散した高分子を
キャストする方法が利用されていも また 安定な着色
状態を得るための会合体形戊処理としては 記録層形成
後に紫外線照蝕 加熱処理を行なう方法が用いられてい
る。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method of manufacturing an optical recording medium used for optical discs as high-density recording media for recording information such as images. Although it is known that a photochromic material is used as a rewritable optical recording medium using a compound, according to the operating principle 1 of this optical recording medium, the photochromic material has the property of causing a reversible color change by two types of light sources with different wavelengths. Organic photochromic materials with a spirobilane structure can be used to store binary values of changes in light absorption FL or reflectance by utilizing the characteristics of organic photochromic materials (
6-bitro-8-docosadecanoyloxymethyl-3',3''-dimethyl-1'-octadecylsubiro[2
H-1-penzopyran-2,2゜-indoline], hereinafter abbreviated as SP1822) {Prolongs the recording life by changing the colored photoisomer into a thermally stable J-aggregate upon irradiation with ultraviolet rays. Although it is known that SP1822 is a material that can be used as a recording layer on a substrate, it has traditionally been considered difficult to manufacture with a single component; A known method is to use the Langmuirve mouth jet (hereinafter abbreviated as LB) method to collect saturated hydrocarbon fish, linear saturated fat fish, or their salts and esters. How to shape (e.g. ζL Thin Solid Films Vol. 133, p. 21 (1985) (T
hin SolidFi1ms, li3.21 (198
5)) or SP1822 dissolved or dispersed in a polymer is used.Also, in order to obtain a stable colored state, the aggregate forming treatment is a method of performing ultraviolet irradiation and heat treatment after forming the recording layer. It is being
発明が解決しようとする課題
従来利用されている方法＠戴 形成方法の原理から戊膜
過程に機械的な基板移動の工程が必要であるため記録層
の製造に時間がかかり、かつ湿式プロセスであるため溶
媒除去の工程が必要であもまな 湿式プロセスであるた
べ 製造工程中の不純’＆ 埃等による汚染を生じや
す（１ そして、この溶媒除去の工程の後に 会合体形
成の工程が行なわれることになる。Problems to be Solved by the Invention Conventionally used methods @Dai Due to the principle of the formation method, the film deposition process requires a step of mechanical substrate movement, which takes time to manufacture the recording layer, and is a wet process. Therefore, the process of removing the solvent is necessary and is a slow wet process.It is easy to cause contamination due to impurities and dust during the manufacturing process (1. And, after this process of removing the solvent, the process of forming aggregates is carried out. become.
さらに 基板移動の工程に起因してＬＢ法では基板引き
上げ方向に平行な力が加わり、その力による分子の配向
の結果 記録層面内に吸収の異方性を生じも 高分子分
散キャスト法でｋ スビン方向あるいはディビング方向
に平行な力が加わって異方性を記録層面内で生じも そ
のたべ 書き込へ 読み出しのレーザ光の偏光状態によ
って記江 再生ムラを生よ 安定な光学記録媒体が形戊
できないという問題点があっｆ，
また 従来の製造方法ではＳＰ１８２２単成分の記録層
形成が困難であり、会合体形戒についてもＳＰ１８２２
単独での形成は固体状態では知られていなかっ九 さら
！，：，ＳＰ１８２２以外のマトリクス材料と混合する
たべ 色素相とマトリクス相との相分離を生じやすく、
その相分離によって信号に対するノイズが多くなり良質
な光学記録媒体が製造できないという問題点もあった課
題を解決するための手段
本発明は上記問題点に鑑へ 記録層がＳＰＩ ８２２単
成分から或る光学記録媒体を、真空蒸着法を用いて作製
する。Furthermore, due to the process of moving the substrate, a force parallel to the substrate lifting direction is applied in the LB method, and as a result of the orientation of molecules due to this force, absorption anisotropy occurs within the plane of the recording layer. Even if a force parallel to the direction or the diving direction is applied and anisotropy occurs within the plane of the recording layer, the polarization state of the laser beam for writing and reading may cause unevenness in reading and writing, making it impossible to form a stable optical recording medium. In addition, it is difficult to form a single-component recording layer of SP1822 using conventional manufacturing methods, and it is difficult to form a recording layer of SP1822 as a single component, and the aggregate shape also
Its formation alone is not known in the solid state.9 Sara! , :, Mixing with matrix materials other than SP1822 tends to cause phase separation between the dye phase and the matrix phase,
The present invention takes into account the above problems and provides a recording layer made of SPI 822 single component. An optical recording medium is produced using a vacuum deposition method.
作用
真空蒸着法（よ 機械的な基板移動の工程を含まず、乾
式プロセスであるため溶媒除去の工程も含まなへ そし
て、従来の製造方法で不可能と考えられていたＳＰｌ８
２２単成分での或膜ができ、さらにこの記録層において
も従来の製造方法で形成した記録層と同様に会合体形成
を行なうことができるた吹 同一装置内で一連の製造工
程の適用が可能であも それ故に 本発明によって、Ｓ
Ｐｌ８２２から或る記録層の形戒において高速な威膜お
よび工程削減が可能となり、製造時間の短縮に有効であ
るため犬量生産性に優れていもさらに 基板面に平行な
力が分子に加わらないため（．ｌ− 記録層面内での吸
収の異方性を生じなＬ１真空中での或膜に加えて真空中
での会合体形戒処理も行なうことができるために 溶媒
中の不純１久空気中の埃等による汚染を避けることがで
きもまた 真空蒸着法を用いることでＳＰｌ８２２を単
戊分で蒸着できるた吹 記録層中に相分離を生じずに構
戊でき、良質な光学記録媒体を提供できる。The active vacuum evaporation method does not involve the step of mechanically moving the substrate, and since it is a dry process, it does not include the step of removing the solvent.
22 A single-component film can be formed, and aggregate formation can be performed in this recording layer in the same way as in recording layers formed by conventional manufacturing methods. A series of manufacturing processes can be applied in the same device. However, therefore, according to the present invention, S
Pl822 enables high-speed film formation and process reduction in the shape of a certain recording layer, which is effective in shortening manufacturing time, so even though it has excellent mass productivity, it also prevents forces parallel to the substrate surface from being applied to the molecules. Because (.l- L1 does not cause anisotropy of absorption in the plane of the recording layer) In addition to forming a certain film in a vacuum, it is also possible to perform aggregate formation treatment in a vacuum. In addition, by using the vacuum evaporation method, SPl822 can be deposited in a single step without causing phase separation in the recording layer, making it possible to produce high-quality optical recording media. Can be provided.
実施例
本発明で使用した真空蒸着装置を第１図に従って説明す
る。排気能力１ ｘ １． Ｏ− ’ Ｔｏｒｒ以下の
真空排気系ｌ３に接続されたベルジャー１２内で真空蒸
着を行なっｔ，，，ＳＰ１８２２原料２の蒸着源ボート
３としては タングステンボート、石英るつぼ等を使用
して、蒸発源用温度制御装置１で蒸着温度を制御しん
光学記録媒体の基板７は 加熱機構の付いた基板ホルダ
ー９にセットして基板用温度制御装置８を用いて蒸着時
の基板温度制御を行なっ九 蒸着源ボート３と基板７と
の間隔は２０ｃｍとま 基板７に隣接して設置した水晶
振動子式膜厚計６で記録層の蒸着膜厚を制御した な叙
べ一スの到達真空度、および記録層の製造中の真空度
は電離真空計４でモニターしている。EXAMPLE A vacuum evaporation apparatus used in the present invention will be explained with reference to FIG. Exhaust capacity 1 x 1. Vacuum evaporation is carried out in a bell jar 12 connected to an evacuation system 13 with a pressure below O' Torr, and a tungsten boat, quartz crucible, etc. is used as the evaporation source boat 3 for the SP1822 raw material 2. The deposition temperature is controlled by temperature control device 1.
The substrate 7 of the optical recording medium is set in a substrate holder 9 equipped with a heating mechanism, and the substrate temperature during vapor deposition is controlled using a substrate temperature control device 8.The distance between the vapor deposition source boat 3 and the substrate 7 is 20 cm. The evaporated film thickness of the recording layer was controlled by a crystal oscillator type film thickness gauge 6 installed adjacent to the substrate 7. I'm monitoring it on 4.
特許請求の範囲第４項または第５項記載の会合体形戊処
理の製造工程で！よ 真空蒸着法によって記録層を基板
７上にそれぞれ形成後または形成中に 基板ホルダー９
、基板用温度制御装置８によって加熱処遇 およびベル
ジャー１２に取り付けた石英窓１０を通して高圧水銀ラ
ンブ１１から可視 赤外カットフィルタで４００ＴＩＩ
Ｉ１以下の波長にした紫外線の照射処理を行なうことが
可能である。In the manufacturing process of the aggregate-forming treatment according to claim 4 or 5! After or during the formation of the recording layer on the substrate 7 by the vacuum evaporation method, the substrate holder 9
, heated by the substrate temperature control device 8 and visible from the high pressure mercury lamp 11 through the quartz window 10 attached to the bell jar 12. 400 TII with the infrared cut filter.
It is possible to perform irradiation treatment with ultraviolet rays having a wavelength of I1 or less.
ＳＰ１８２２の融点は約５０℃であり、蒸発源の温度は
それ以上にＬ，，ＳＰ１８２２を溶融状態として蒸着し
ｔラ な耘 蒸着した膜の評価は薄層クロマトグラフ
ィーおよび可視一葉外吸収スペクトルを用いて行なし＼
原料と同或分であることを確認し九
基板の材料として｛よ ガラ入 石菟 高分子、金属な
どが使用可能である。会合体形成処理に利用される紫外
線の照射源としてζよ 高圧水銀ランプの他に紫外線レ
ーザ負 キセノンランズ 蛍光灯などの光源に可視光を
カット可能なフィルタを用いることで利用できる。The melting point of SP1822 is approximately 50°C, and the temperature of the evaporation source is higher than that.SP1822 is deposited in a molten state.The deposited film is evaluated using thin layer chromatography and visible extra-plane absorption spectroscopy. No line＼
After confirming that they are the same as the raw materials, polymers, metals, etc. can be used as the material for the substrate. In addition to high-pressure mercury lamps, UV lasers, xenon lamps, fluorescent lamps, and other light sources can be used as ultraviolet irradiation sources for aggregate formation treatment by using filters that can cut visible light.
実施例１
石英板を基板として、ＳＰ１８２２から或る記録層を第
１図に示した真空蒸着装置で真空蒸着法によって形成し
た 成長室であるベルジャー内の到達真空度は５ｘ １
０−’Ｔｏｒｒ、蒸着源の温度は２００ａ基板温度は室
温として蒸着を行なＬ％ 層厚１００ｎｍの記録層を
形戊した こうして製造した光学記録媒体は無色であり
、紫外線照射によって着色した状態が記録状態となん
第２図に示す実線（よ 無色である未記録状態の吸収ス
ペクトルである。この光学記録媒体にビーム直径１ ｍ
ａ 波長３４０ｎｍの紫外線レーザを照射すると、吸
収ピーク波長５８０ｎｍの赤色を呈した円形の記録スポ
ットが形成される。このスポットの吸収スペクトルζ上
第２図の点線で示されも従来の方法であるＬＢ法では
層厚１ ００ｎｍの記録層形戊において溶媒除去工程を
含めて３時間以上要した八 本発明の製造方法である真
空蒸着法によると所定真空度に到達徽 ５分で形戊が可
能であるた△ 製造時間の短縮に有効であることが確か
められた また 記録層面内での吸収の異方性も認めら
れずに 均質で均一な光学記録媒体が製造できた
さらに 記録層の層厚を厚くするにつれて、ＳＰ１８２
２膜の均質性が向上して、より良質な光学記録媒体の製
造が可能であることが確認され九実施例２
基板として石英を用し＼ 実施例ｌで示した真空蒸着条
件で層厚１００ｎｍのＳＰ １ ｇ ２ ２記録層を形
成しｆ，ＳＰ１８２２の真空蒸着後、真空蒸着装置の真
空を破ることなく会合体形成処理を行なった基板温度を
３５℃一定にし 高圧水銀ランプを用いて石英窓を通し
て波長４００ｎｍ以下の紫外線を記録層に照射すること
で会合体形成を生じて、吸収ピーク波長６１７ｎｍの安
定な着色状態である青色に呈した光学記録媒体が製造さ
れも この会合体形成にともなう吸収スペクトルの変化
！上 従来の製造方法で形威した光学記緑媒体と同じ変
化であるた△本発明の製造方法によってＳＰ１８２２単
成分で記録層を構成でき、かつ安定状態の会合体形成も
可能であることが判明しｔも この製造方法によって
形成した光学記録媒体（よ この状態が未記録であり、
記録層のピーク吸収波長に対応した６１８ｒｖのレーザ
光の照射によって消色され 記録状態になる。Example 1 Using a quartz plate as a substrate, a certain recording layer from SP1822 was formed by a vacuum evaporation method using the vacuum evaporation apparatus shown in FIG.
Vapor deposition was carried out with the temperature of the vapor deposition source at 0-' Torr and the temperature of the vapor deposition source at 200 a. The solid line shown in Figure 2 is the absorption spectrum of a colorless, unrecorded state.
a When irradiated with an ultraviolet laser with a wavelength of 340 nm, a red circular recording spot with an absorption peak wavelength of 580 nm is formed. The absorption spectrum of this spot ζ is shown by the dotted line in Figure 2. In the conventional LB method, it took more than 3 hours, including the solvent removal process, for a recording layer with a layer thickness of 100 nm. According to the vacuum evaporation method, it was possible to form the product in 5 minutes after reaching the specified degree of vacuum.It was confirmed that it is effective in shortening the manufacturing time.Also, the anisotropy of absorption within the plane of the recording layer was confirmed. A homogeneous and uniform optical recording medium was manufactured without any discrepancies.Furthermore, as the thickness of the recording layer was increased, SP182
It was confirmed that the homogeneity of the two films was improved and it was possible to manufacture a higher quality optical recording medium.9 Example 2 Using quartz as the substrate, a layer thickness of 100 nm was obtained under the vacuum deposition conditions shown in Example 1. After forming the SP 1 g 2 2 recording layer and vacuum evaporating f, SP 1822, aggregate formation processing was performed without breaking the vacuum of the vacuum evaporator.The substrate temperature was kept constant at 35°C, and a quartz window was formed using a high-pressure mercury lamp. By irradiating the recording layer with ultraviolet rays with a wavelength of 400 nm or less through the rays, aggregate formation occurs, and an optical recording medium exhibiting a stable blue color with an absorption peak wavelength of 617 nm is manufactured. Spectrum change! △It was found that the manufacturing method of the present invention allows the recording layer to be composed of a single component of SP1822, and also allows the formation of aggregates in a stable state. However, the optical recording medium formed by this manufacturing method (this state is unrecorded,
The color is erased by irradiation with a laser beam of 618 rv corresponding to the peak absorption wavelength of the recording layer, resulting in a recorded state.
第３図に示す実線は 濃い青色を呈した記録状態のスペ
クトルである。この光学記録媒体にビーム直径１ ｍｍ
，波長６ １ ８ｎｍの記録レーザ光を照射すると、薄
い青色を呈した円形のスポットが形成され記録されも
この記録スポットの吸収スペクトルは 第３図の点線で
示されも さらに この光学記録媒体に３５℃雰囲気で
紫外線照射すると、実線で示される未記録状態となり、
書換え可能で、再現性が良好であることが確かめられｆ
， まな この光学記録媒体の記録にｌ上 Ｈｅ−Ｎ
ｅレーザ（波長６３２． ８ｒｖ＋）の使用も可能であ
っ九実施例ｌと同様に 記録層の層厚を厚くするにつれ
て、会合体を形成したＳＰ１８２２膜の均質性が向上し
て、より良質な光学記録媒体の製造が可能であることが
確認された
実施例３
基板として石英を用１，”ｌ， 戒長室であるベルジ
ャー内の到達真空度５ ｘ １ ０− ’ Ｔｏｒｒ，
蒸着源の温度２００℃の真空蒸着条件でＳＰ１８２２記
録層を形戊する。この真空蒸着工程中に同時に 基板温
度を３５℃一定にし 高圧水銀ランプを用いて石英窓を
通して波長４００ｎｍ以下の紫外線を記録層に照射する
ことで会合体形成を行なＬＸ．安定な着色状態である光
学記録媒体を製造できる。The solid line shown in Fig. 3 is the spectrum of the recorded state, which had a deep blue color. A beam diameter of 1 mm is applied to this optical recording medium.
, when irradiated with a recording laser beam with a wavelength of 618 nm, a circular spot with a pale blue color is formed and no recording is possible.
The absorption spectrum of this recording spot is shown by the dotted line in FIG.
It has been confirmed that it is rewritable and has good reproducibility.
, Mana This optical recording medium is used for recording He-N
It is also possible to use an e-laser (wavelength: 632.8rv+).As in Example 1, as the thickness of the recording layer increases, the homogeneity of the SP1822 film that forms aggregates improves, resulting in better optical quality. Example 3 in which it was confirmed that it was possible to manufacture a recording medium: quartz was used as the substrate, the ultimate vacuum in the bell jar, which was the preceptor's chamber, was 5 x 10-' Torr,
The SP1822 recording layer is formed under vacuum deposition conditions at a deposition source temperature of 200°C. During this vacuum evaporation step, the substrate temperature was kept constant at 35° C., and aggregates were formed by irradiating the recording layer with ultraviolet rays with a wavelength of 400 nm or less through a quartz window using a high-pressure mercury lamp. Optical recording media that are in a stable colored state can be produced.
この光学記録媒体（よ 実施例２と同様に記筑消去を行
なうことが可能であり、真空蒸着工程と会合体形威工程
を同時に行なうことができるた奴製造工程における工程
削減が可能になった発明の効果
以上のように本発明４ｉ 真空蒸着法により記録層を
形成することにより、Ｓ Ｐ １． ８ ２ ２単成分
よりなる記録層を短時間で形戊することができ、かつ記
録層面内の異方性がないという優れた効果を有する。This optical recording medium (as in Example 2, it is possible to write and erase data, and the vacuum deposition process and the aggregate formation process can be performed simultaneously) is an invention that has made it possible to reduce the number of steps in the manufacturing process. Effects of the present invention 4i As described above, by forming the recording layer by the vacuum evaporation method, it is possible to form the recording layer consisting of a single component of S P 1.822 in a short time, and the in-plane It has the excellent effect of having no anisotropy.
第１図は本発明で使用した真空蒸着装置の断面＆ 第２
ＦｇＪは真空蒸着法で形成したＳＰｌ８２２よりなる記
録層の未記録状態の吸収スペクトルと記録状態のものと
を示す特性曲線は 第３図は真空蒸着法による記録層の
製造工程に会合体形成工程を加えて製造した光学記録媒
体の未記録状態の吸収スペクトルと記録状態のものとを
示す特性曲線図であも
ｌ・・・・蒸着源用温度制御装置 ２・・・・ＳＰ１８
２２原Ｋ ３・・・・蒸着源ボート、４・・・・電離真
空！＋．５・・・・シャッター、 ６・・・・水晶振動
子式膜厚託 ７・・・・基楓 ８・・・・基板用温度制
御装置９・・・・基板ホルダー、 １０・・・・石英服
１ｌ・・・・高圧水銀ランプ、 ｌ２・・・・ベルジ
ャー、 １３・・・・真空排気凡Figure 1 shows a cross section of the vacuum evaporation equipment used in the present invention & Figure 2
FgJ is a characteristic curve showing the absorption spectrum in an unrecorded state and that in a recorded state of a recording layer made of SPl822 formed by a vacuum evaporation method. In addition, a characteristic curve diagram showing the absorption spectrum in an unrecorded state and that in a recorded state of the manufactured optical recording medium is also shown.Temperature control device for vapor deposition source 2...SP18
22 original K 3... Evaporation source boat, 4... Ionization vacuum! +. 5...Shutter, 6...Crystal resonator type film thickness depositor 7...Basic maple 8...Temperature control device for substrate 9...Substrate holder, 10...Quartz Clothes 1l...high pressure mercury lamp, l2...bell jar, 13...vacuum exhaust
Claims (5)
材料単成分で記録層が構成された光学記録媒体を、真空
蒸着法を用いて作製することを特徴とする光学記録媒体
の製造方法。 ▲数式、化学式、表等があります▼(1) A method for producing an optical recording medium, which comprises producing an optical recording medium whose recording layer is composed of a single component of an organic photochromic material represented by the following chemical structural formula using a vacuum evaporation method. ▲Contains mathematical formulas, chemical formulas, tables, etc.▼
到達真空度を１×１０＾−＾３Ｔｏｒｒ以下、および蒸
着源の加熱温度を５０℃以上の条件で作製することを特
徴とする請求項１に記載の光学記録媒体の製造方法。(2) A claim characterized in that, in the vacuum evaporation method, the vacuum evaporation device is produced under the conditions that the ultimate vacuum in the growth chamber is 1×10^-^3 Torr or less and the heating temperature of the evaporation source is 50°C or more. 1. The method for manufacturing an optical recording medium according to 1.
光学記録媒体を、４００ｎｍ以下の波長の紫外線照射処
理および５０℃以下の温度での加熱処理を用いて、請求
項１に記載の有機フォトクロミック材料の会合体を形成
することを特徴とする光学記録媒体の製造方法。(3) The optical recording medium produced by the manufacturing method according to claim 1 or 2 is subjected to ultraviolet irradiation treatment with a wavelength of 400 nm or less and heat treatment at a temperature of 50° C. or less to produce an organic material according to claim 1. A method for producing an optical recording medium, comprising forming an aggregate of photochromic materials.
装置の成長室の真空を保ったまま、４００ｎｍ以下の波
長の紫外線照射処理及び５０℃以下の温度での加熱処理
を用いて、請求項１に記載の有機フォトクロミック材料
の会合体を形成することを特徴とする光学記録媒体の製
造方法。(4) After the process according to claim 1 or 2, while maintaining the vacuum in the growth chamber of a vacuum evaporation device, ultraviolet irradiation treatment with a wavelength of 400 nm or less and heat treatment at a temperature of 50° C. or less is used. Item 2. A method for producing an optical recording medium, comprising forming an aggregate of the organic photochromic material according to item 1.
光学記録媒体を、真空蒸着法を用いて作製する際に、同
時に４００ｎｍ以下の波長の紫外線照射処理および５０
℃以下の温度での加熱処理を用いて、請求項１に記載の
有機フォトクロミック材料の会合体を形成することを特
徴とする光学記録媒体の製造方法。(5) When the optical recording medium produced by the production method according to claim 1 or 2 is produced using a vacuum evaporation method, simultaneous ultraviolet irradiation treatment with a wavelength of 400 nm or less and 50 nm
A method for producing an optical recording medium, comprising forming an aggregate of the organic photochromic material according to claim 1 using heat treatment at a temperature of .degree. C. or lower.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15534689A JPH0320731A (en) | 1989-06-16 | 1989-06-16 | Production of optical recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15534689A JPH0320731A (en) | 1989-06-16 | 1989-06-16 | Production of optical recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0320731A true JPH0320731A (en) | 1991-01-29 |
Family
ID=15603883
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15534689A Pending JPH0320731A (en) | 1989-06-16 | 1989-06-16 | Production of optical recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0320731A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998050916A1 (en) * | 1997-05-08 | 1998-11-12 | Matsushita Electric Industrial Co., Ltd. | Device and method for manufacturing an optical recording medium |
| JP2007224417A (en) * | 2006-01-27 | 2007-09-06 | Semiconductor Energy Lab Co Ltd | Film deposition method and film deposition device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62147454A (en) * | 1985-12-20 | 1987-07-01 | Matsushita Electric Ind Co Ltd | Optical recording medium |
| JPS62160283A (en) * | 1986-01-08 | 1987-07-16 | Nippon Telegr & Teleph Corp <Ntt> | Rewriting type heat mode optical memory medium |
-
1989
- 1989-06-16 JP JP15534689A patent/JPH0320731A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62147454A (en) * | 1985-12-20 | 1987-07-01 | Matsushita Electric Ind Co Ltd | Optical recording medium |
| JPS62160283A (en) * | 1986-01-08 | 1987-07-16 | Nippon Telegr & Teleph Corp <Ntt> | Rewriting type heat mode optical memory medium |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998050916A1 (en) * | 1997-05-08 | 1998-11-12 | Matsushita Electric Industrial Co., Ltd. | Device and method for manufacturing an optical recording medium |
| US6340501B1 (en) | 1997-05-08 | 2002-01-22 | Matsushita Electric Industrial Co., Ltd. | Device and method for manufacturing an optical recording medium |
| JP2007224417A (en) * | 2006-01-27 | 2007-09-06 | Semiconductor Energy Lab Co Ltd | Film deposition method and film deposition device |
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