JPH02171290A - Information recording medium - Google Patents

Information recording medium

Info

Publication number
JPH02171290A
JPH02171290A JP63325888A JP32588888A JPH02171290A JP H02171290 A JPH02171290 A JP H02171290A JP 63325888 A JP63325888 A JP 63325888A JP 32588888 A JP32588888 A JP 32588888A JP H02171290 A JPH02171290 A JP H02171290A
Authority
JP
Japan
Prior art keywords
gas
recording
recording layer
container
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63325888A
Other languages
Japanese (ja)
Inventor
Hideki Okawa
秀樹 大川
Motonari Matsubara
松原 基成
Norio Ozawa
小沢 則雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP63325888A priority Critical patent/JPH02171290A/en
Publication of JPH02171290A publication Critical patent/JPH02171290A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/243Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/243Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
    • G11B2007/24302Metals or metalloids
    • G11B2007/24312Metals or metalloids group 14 elements (e.g. Si, Ge, Sn)
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/243Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
    • G11B2007/24302Metals or metalloids
    • G11B2007/24314Metals or metalloids group 15 elements (e.g. Sb, Bi)
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/243Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
    • G11B2007/24302Metals or metalloids
    • G11B2007/24316Metals or metalloids group 16 elements (i.e. chalcogenides, Se, Te)
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/243Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
    • G11B2007/24318Non-metallic elements
    • G11B2007/24328Carbon

Abstract

PURPOSE:To increase resistance to environments and at the same time, reduce required laser power for recording and deletion by specifying the flow ratio Q of hydrocarbon in an atmosphere of rare gas and hydrocarbon gas with Sb, Te, Ge alloy of specific composition as target, forming a recording layer using sputtering technique, and sandwiching the recording layer with dielectric films. CONSTITUTION:After air is exhausted from a container with pumps 18, 19, argon gas is introduced into the container from a gas line 20 and an SiO2 protecting film 14 is laminated on a substrate using sputtering technique. Next, air is exhausted from the container and CH4 gas is introduced into the container from a gas line 21 with argon gas so that the mixture ratio Q of CH4 gas is 5%<=Q<=35%. Then power is applied, for a specified time, to a sputtering source 24 where (SbTe1-x)y Ge1-y(0.05<=x<=0.7, 0.4<=y<=0.8) alloy is placed, while the substrate 12 is rotated. The amount of sputtered elements from the sputtering source is monitored with a monitoring device 25, and during this monitoring operation, power supply is adjusted. Consequently, a recording layer 13 is formed on the substrate 12. Furthermore, an SiO2 protecting film 14 is laminated on the recording layer 13 to form an information recording medium.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、光の照射により記録膜に原子配列の変化を生
起させて情報の記録を行う情報記録媒体に関する。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to an information recording medium in which information is recorded by causing a change in atomic arrangement in a recording film by irradiation with light.

(従来の技術) 情報の記録、消去の繰返し可能な情報記録媒体として光
ビーム照射による相変化を利用したものが開発されてい
る。
(Prior Art) Information recording media that utilize phase change caused by light beam irradiation have been developed as information recording media that can repeatedly record and erase information.

このような情報記録媒体に情報を記録する際には、まず
光ビームを記録媒体全面照射して記録層を結晶性の高い
状態(以下結晶状態とする)とする。次に情報を記録す
るために、短い強いパルス光を記録層に照射して加熱し
急冷して記録層を原子配列が乱れた状態(以下、非晶質
状態とする)とする。記録された情報を消去する場合に
は、長い弱いパルス光を記録層に照射して加熱し徐冷し
て再び結晶状態とする。このような結晶状態と非晶質状
態とでは原子配列の変化に伴って反射率、透過率等の光
学的特性が変化するため、この光学的特性の変化を検出
することにより、情報を再生している。
When recording information on such an information recording medium, first, the entire surface of the recording medium is irradiated with a light beam to bring the recording layer into a highly crystalline state (hereinafter referred to as a crystalline state). Next, in order to record information, the recording layer is irradiated with short, strong pulsed light to heat it and rapidly cool it, thereby bringing the recording layer into a state in which the atomic arrangement is disordered (hereinafter referred to as an amorphous state). When erasing recorded information, the recording layer is irradiated with long, weak pulsed light to heat it and slowly cool it to a crystalline state again. Since optical properties such as reflectance and transmittance change between the crystalline state and the amorphous state due to changes in atomic arrangement, information can be reproduced by detecting changes in these optical properties. ing.

上述の情報記録媒体としては、Teをターゲットとし、
炭化水素を含む雰囲気でPMMA、PMC等の透明の樹
脂及びガラスInk上にTe及びCを含む記録膜を成膜
させることにより製造される更に5bTe’Gcを炭化
水素を含む雰囲気でスパッタして得られるSb、Ge、
Te Cを含む記録膜は高温多湿の環境下でも寿命の長
い記録膜を有する情報記録媒体が開発された。
The above-mentioned information recording medium targets Te,
A recording film containing Te and C is formed on a transparent resin such as PMMA or PMC and glass ink in an atmosphere containing hydrocarbons, and 5bTe'Gc is further produced by sputtering in an atmosphere containing hydrocarbons. Sb, Ge,
An information recording medium has been developed that has a recording film containing Te 2 C that has a long life even in a high temperature and humid environment.

(発明が解決しようとする課題) ところが上述したSb、Ge、Te、Cを含む記録膜を
スパッタ法で成膜する際には、炭化水素の流量比g s
x   炭(し/k 素カフ、    が炭化水素ガス
+希ガス 大きくなると、成膜される記録膜中のC含有率が高くな
り光学的吸収率が減少するため、記録時及び消去時のレ
ーザパワーが大きくなってしまい実用に供さないという
不具合が生した。
(Problems to be Solved by the Invention) However, when forming a recording film containing Sb, Ge, Te, and C as described above by sputtering, the hydrocarbon flow rate g s
When x carbon (shi/k elementary cuff, hydrocarbon gas + rare gas) increases, the C content in the formed recording film increases and the optical absorption rate decreases, so the laser power during recording and erasing increases. This resulted in the problem that it became too large to be put to practical use.

本発明は、耐環境性に優れ、しかも情報の記録及び消去
に必要なレーザパワーが小さい情報記録媒体を提供する
ことを目的とする。
An object of the present invention is to provide an information recording medium that has excellent environmental resistance and requires low laser power for recording and erasing information.

[発明の構成] (課題を解決するための手段) 本発明の情報記2.A媒体は、(SbTc+−8)yG
c l−(0,05≦x≦0.7,0.4≦y≦0.8
)をターゲットとし、希ガスと炭化水素がスの雰囲気中
で炭化水素の流量比 Q−炭イし7に素が8  を5%≦Q≦35%と希ガス
+炭化水素ガス して、スパッタリング成膜された記録膜を何することを
特徴とする。
[Structure of the invention] (Means for solving the problem) Information description of the present invention 2. A medium is (SbTc+-8)yG
c l-(0,05≦x≦0.7, 0.4≦y≦0.8
) is used as a target, and the flow rate ratio of hydrocarbons is Q - carbon, 7 to 8, and rare gas + hydrocarbon gas is used as 5%≦Q≦35%, and sputtering is performed. What is the characteristic of the formed recording film?

本発明に用いられる情報記録媒体の構造を示す断面図は
第1図に示す通りである。
A sectional view showing the structure of the information recording medium used in the present invention is shown in FIG.

第1図中12はガラスやプラスチック材料(例えば、ポ
リメチルメタクリレート樹脂やポリカーボネート樹脂な
ど)からなる基板であり、この基l7f112上の光ビ
ームの照射により層変化を生じる記録層13が形成され
ている。更に該記録層13の両側を誘電体膜14て挾ん
だ構造となっている。
Reference numeral 12 in FIG. 1 is a substrate made of glass or plastic material (for example, polymethyl methacrylate resin or polycarbonate resin), on which a recording layer 13 is formed which undergoes a layer change when irradiated with a light beam on this substrate 17f112. . Further, the recording layer 13 is sandwiched between dielectric films 14 on both sides.

次に前記情報記録媒体の製造方法を第2図に沿って説明
する。第2図は本発明に用いられる成膜装置の側断面図
である。
Next, a method for manufacturing the information recording medium will be explained with reference to FIG. FIG. 2 is a side sectional view of a film forming apparatus used in the present invention.

真空容器17には排出ポートとして、ロータリーポンプ
18及びクライオポンプ19が接続されガス導入ポート
としてA「ガスライン20、CH4ガスライン21、N
2ガスライン22に接続されている。真空容器17中上
部には、支持装置23とこの支持装置に水平に支架され
た基板12が設けられており、基板12は支持装置23
を軸に回転することができる。また、真空容器17中底
部Sb、Te、Geの合金には、基板12に対面してス
パッタ源24として5bTeGe合金を設置し、このス
パッタ源には高周波電源が接続されている。また、スパ
ッタ[24の上方にはモニター装置25が設置されてい
る。
A rotary pump 18 and a cryopump 19 are connected to the vacuum container 17 as exhaust ports, and A gas line 20, CH4 gas line 21, N
2 gas line 22. A support device 23 and a substrate 12 horizontally supported by the support device are provided in the upper part of the vacuum vessel 17.
It can be rotated around the axis. Furthermore, a 5bTeGe alloy is installed as a sputtering source 24 in the middle bottom of the vacuum chamber 17, facing the substrate 12, and a high frequency power source is connected to this sputtering source. Further, a monitor device 25 is installed above the sputter [24].

この装置を用いて第1図に示した断面構造を有する情報
記録媒体を製造するには、まず、ロータリーポンプ18
により容器内の空気を0.2T。
In order to manufacture an information recording medium having the cross-sectional structure shown in FIG. 1 using this apparatus, first, the rotary pump 18
0.2T of air inside the container.

rrまで排気し、続いてクライオポンプ19によりlX
l0−Torrまで排気する。次にアルゴンガスライン
20より、アルゴンガスを導入して真空容器内の圧力を
5x 10−3To r rに保持する。そしてMIR
を設置しSiO2のスパッタ源を設置して、電力を印加
する。モニタ装置25によりスパッタ源からの元素のス
パッタ二を調整して、基板上にSiO2保護膜を積層す
る。
Evacuate to rr, then 1X with cryopump 19
Evacuate to 10-Torr. Next, argon gas is introduced from the argon gas line 20 to maintain the pressure inside the vacuum container at 5×10 −3 Torr. And M.I.R.
A SiO2 sputtering source is installed, and power is applied. The sputtering of elements from the sputtering source is adjusted by the monitor device 25, and a SiO2 protective film is deposited on the substrate.

次に、ロータリーポンプ18により容器内の空気をQ 
、  2T orrまで排気し、続いてクライオポンプ
19によりI X 10−5Torrまで排気する。
Next, the rotary pump 18 pumps the air inside the container to Q.
, evacuated to 2 Torr, and then evacuated to I x 10-5 Torr using the cryopump 19.

次にアルゴンガスライン20よりアルゴンガスをCH4
ガスライン21よりCH4ガスをCH4の混合比Qが5
96≦Q≦35%となるように導入して容器内を所定の
圧力、例えば5 X 10−3Torrに保持する。そ
して基板12を回転させつつ、スパッタ源24に所定時
間電力を印加する。モニタ装置25によりスパッタ源か
らの元素のスパッタWをモニタし、このモニタした量が
所定の値になるようにスパッタ源に投入する電力を調節
するようになっている。これにより基、E 12上に記
録層が形成する。モして膜厚が所定の膜厚(5000A
以下)になったら成膜を停止する。さらに、前述と同様
の方法で記録膜上にSiO2保護膜を積層して情報記録
媒体を形成する。
Next, argon gas is supplied to CH4 from the argon gas line 20.
CH4 gas is supplied from the gas line 21 at a CH4 mixing ratio Q of 5.
96≦Q≦35%, and the inside of the container is maintained at a predetermined pressure, for example, 5×10 −3 Torr. Then, while rotating the substrate 12, power is applied to the sputtering source 24 for a predetermined period of time. A monitor device 25 monitors elemental sputtering W from the sputtering source, and adjusts the power input to the sputtering source so that the monitored amount becomes a predetermined value. This forms a recording layer on the base E12. The film thickness is set to the specified film thickness (5000A
(below), film formation is stopped. Further, a SiO2 protective film is laminated on the recording film in the same manner as described above to form an information recording medium.

(作用) 上述のようにして成膜された記録膜は、Cを含有するた
め、耐環境性に優れ、高温多湿下においても反射率の経
時変化が少ない。
(Function) Since the recording film formed as described above contains C, it has excellent environmental resistance and shows little change in reflectance over time even under high temperature and high humidity conditions.

特に耐酸化性に優れているため、基板としてガラス基板
の他に、P M M A及びPMCといった有機樹脂基
板を用いることができる。
In addition to glass substrates, organic resin substrates such as PMMA and PMC can be used as substrates because of their particularly excellent oxidation resistance.

又、スパッタリングの際に、流入する炭化水素の混合比
Qが5%≦Q≦35%の範囲内にあるため、成膜される
記録膜の組成としてもCの含a率が高くなりすぎること
がない。このため光学的な吸収率が低下することがなく
、情報の記録時及び消去時に必要なレーザパワーが小さ
くて済む。
Furthermore, since the mixing ratio Q of hydrocarbons flowing in during sputtering is within the range of 5%≦Q≦35%, the a content of C becomes too high as a composition of the recording film to be formed. There is no. Therefore, the optical absorption rate does not decrease, and the laser power required for recording and erasing information can be small.

また、Sb、Gc、Te、C,Hからなる記録膜厚は1
00OAとすると、第3図に示すように、多重干渉効果
により、反射率が極小値となるため、この膜厚で非晶質
状態から結晶状態に相変化させると、反射率が増加する
ことが認められ、情報記録が行なわれた。
Also, the thickness of the recording film made of Sb, Gc, Te, C, and H is 1
When 00OA is used, as shown in Figure 3, the reflectance becomes a minimum value due to the multiple interference effect, so if the phase changes from an amorphous state to a crystalline state with this film thickness, the reflectance will increase. It was recognized and information was recorded.

本発明による情報記録媒体は、情報の再生が10変化前
後で反射率差として行なわれるため、記録前後の反射率
差は一般に干渉の極値を与える膜厚近傍が大きくなり好
都合である。した力くって、本発明による記録膜厚の制
限は、干渉効果が膜厚の増加と共に小さくなり、ある一
定の反射率に収束するためと、記録時のレーザパワーが
膜厚の増加と共に増加するためによる2つの条件から5
000A以下であることが望ましい。更に好ましくは3
00A乃至1000A7><適当である。300A以下
だとレーザ照射により記録膜が穴空きする可能性がある
In the information recording medium according to the present invention, since information is reproduced as a reflectance difference around 10 changes, it is advantageous that the reflectance difference before and after recording is generally large in the vicinity of the film thickness that gives an extreme value of interference. This limitation on the recording film thickness according to the present invention is due to the fact that the interference effect decreases as the film thickness increases and converges to a certain reflectance, and the laser power during recording increases as the film thickness increases. 5 from two conditions
000A or less is desirable. More preferably 3
00A to 1000A7><Appropriate. If it is less than 300A, there is a possibility that holes will be formed in the recording film due to laser irradiation.

(実験例) 一実験1− 本実験ではスパッタ法により記録膜を形成した。(Experiment example) 1 Experiment 1- In this experiment, the recording film was formed by sputtering.

まず、ロータリーポンプ18により容器内の空気を0.
2Torrまで排気し、続いてクライオポンプ19によ
りlXl0−’Torrまで排気する。次にアルゴンガ
スライル20より、アルゴンガスを導入して真空容器内
の圧力を5X10−3Torrに保持する。モして基板
を設置し5io2のスパッタ源を設置して、電力を印加
する。モニタ装置25によりスパッタ源からの元素のス
パッタ量を調整して、基板上に5in2保護膜を積層す
る。
First, the rotary pump 18 pumps the air inside the container to zero.
It is evacuated to 2 Torr, and then evacuated to 1X10-'Torr using the cryopump 19. Next, argon gas is introduced from the argon gas rail 20 to maintain the pressure inside the vacuum container at 5×10 −3 Torr. Then, a substrate is installed, a 5io2 sputtering source is installed, and power is applied. The monitoring device 25 adjusts the sputtering amount of elements from the sputtering source, and a 5in2 protective film is laminated on the substrate.

第1図中の真空容器17内に5インチ径の(Sb O,
3Te O,7) o、s Gc O,2なる組成をも
つ合金をスパッタ源として設け、容器内をlX1O−6
To「「マチ排気した。次にA「ガフ、 10 S C
CM及びCH4ガス3SCCMを導入し5X10−3T
orrに全体の圧力を調節した。基板として充分洗浄し
た外径130mm、板厚1.2mmの円板状カポネート
基板を用い、このMlを6 Orpmで回転しつつモニ
タによりスパッタ量をモニタしてスパッタ源に投入する
電力を制御し、全体の膜厚が100OAになるまで各元
素を堆積させて記録層を成膜した。
A 5 inch diameter (SbO,
3TeO,7) o,sGcO,2 was provided as a sputtering source, and the inside of the container was 1X1O-6.
To "I exhausted the gusset. Then A" Gaff, 10 S C
Introducing CM and CH4 gas 3SCCM to 5X10-3T
The total pressure was adjusted to orr. Using a thoroughly cleaned disc-shaped caponate substrate with an outer diameter of 130 mm and a plate thickness of 1.2 mm as a substrate, the amount of sputtering was monitored by a monitor while rotating this Ml at 6 Orpm, and the power input to the sputtering source was controlled. A recording layer was formed by depositing each element until the total film thickness was 100 OA.

さらに、前述と同様の方法で記録膜上に5i02保護膜
を積層して情報記録媒体を形成する。
Further, a 5i02 protective film is laminated on the recording film in the same manner as described above to form an information recording medium.

この情報記録媒体を記録再生装置に用い1800 rp
mて回転駆動させ、記録周波数3.7MHz。
Using this information recording medium in a recording/reproducing device, the speed of 1800 rp
The recording frequency was 3.7 MHz.

記録パルス幅50 m secのレーザ光を照射した場
合、線速度5 、 5 m /secに相当する場所で
記録パワー7mWで30dBのC/Nを得た。
When a laser beam with a recording pulse width of 50 msec was irradiated, a C/N of 30 dB was obtained at a recording power of 7 mW at a location corresponding to a linear velocity of 5.5 m/sec.

−実験2− ここでは記録膜の光ビーム照射による原子配列の変化を
確認した。
-Experiment 2- Here, changes in the atomic arrangement of the recording film due to light beam irradiation were confirmed.

実験1で成膜された記録膜にビーム径1μmに絞った5
mW15μsのパルス光を照射すると、照射部の反射率
は変化した(未記録部)。次に13mW300nsのパ
ルス光を当てるとその照射部の反射率は元に戻ることが
確認された(記録部)。
A beam focused to a beam diameter of 1 μm was applied to the recording film formed in Experiment 1.
When pulsed light of mW 15 μs was irradiated, the reflectance of the irradiated area changed (unrecorded area). Next, when pulsed light of 13 mW and 300 ns was applied, it was confirmed that the reflectance of the irradiated area returned to its original value (recording area).

次いでこの未記録部と記録部の結晶状態を比較するため
、透過型電子顕微鏡を用いて回折パターンを観察した。
Next, in order to compare the crystalline state of the unrecorded area and the recorded area, the diffraction pattern was observed using a transmission electron microscope.

試料から保護層を剥離して記録層の状態を回折パターン
から観察したところ、レーザー光未照射部では非晶質に
特有のハローパターンが認められた。また、レーザー光
照射部のうち未記録部では結晶構造を示す回折リングと
スポットが観察され、記録部では、未照射部に近い非晶
質特有のハローパターンが認められた。
When the protective layer was peeled off from the sample and the state of the recording layer was observed from a diffraction pattern, a halo pattern characteristic of amorphous materials was observed in the areas not irradiated with laser light. Moreover, in the unrecorded part of the laser beam irradiated part, diffraction rings and spots indicating a crystal structure were observed, and in the recorded part, a halo pattern peculiar to an amorphous substance near the unirradiated part was observed.

−実験3− ここでは反射率の経時変化を11!11定し、記録状態
の安定性を評価した。
-Experiment 3- Here, the change in reflectance over time was fixed at 11!11, and the stability of the recording state was evaluated.

炭化水素の混合比Qを096. 596. 35%とし
た3種をつくり、65℃、9096RHの環境に100
0時間暴露し、そのときの初期反射率(R1)と経時反
射率(Rt)との比(Rt/Rl)を暴露時間に対して
プロットした(第4図)。
The mixture ratio Q of hydrocarbons is 096. 596. We made 3 types of 35% and 100% in an environment of 65℃ and 9096RH.
After exposure for 0 hours, the ratio (Rt/Rl) between the initial reflectance (R1) and the reflectance over time (Rt) was plotted against the exposure time (FIG. 4).

第4図かられかるようにSb、Ge、Te組成の試料で
は反射率が次第に低下するが、Sb、Ge、Tel:C
を添加した試料では経時反射率の低下は遅いことがわか
る。
As can be seen from Figure 4, the reflectance gradually decreases in samples with Sb, Ge, and Te compositions, but with Sb, Ge, Tel:C
It can be seen that the decrease in reflectance over time is slow in the sample to which .

[発明の効果コ 以上詳述したように本発明によれば、高温多湿しおいて
も安定した特性を示し、かつ光学的吸収率が比較的高く
情報の記録及び消去に必要なレーザパワーが小さく済む
充分実用に耐え得る情報記録媒体を提供できる。
[Effects of the Invention] As detailed above, the present invention exhibits stable characteristics even under high temperature and humidity, has a relatively high optical absorption rate, and requires low laser power to record and erase information. It is possible to provide an information recording medium that can withstand practical use.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明で用いられる情報記録媒体の層構造を示
す断面図、第2図は成膜装置の側断面図、第3図は記録
膜の膜厚と反射率との相関を示したグラフ、第4図は経
時時間と反射率比(Rt /R1)を示すグラフある。 12・・・基板 13・・・記録層 14・・・誘電体層
Fig. 1 is a cross-sectional view showing the layer structure of the information recording medium used in the present invention, Fig. 2 is a side cross-sectional view of the film forming apparatus, and Fig. 3 shows the correlation between the film thickness and reflectance of the recording film. The graph shown in FIG. 4 is a graph showing the reflectance ratio (Rt/R1) over time. 12...Substrate 13...Recording layer 14...Dielectric layer

Claims (1)

【特許請求の範囲】 光ビームの照射により、記録層に原子配列の変化を生じ
させて情報の記録、消去を行なう情報記録媒体において
、該記録層がスパッタ源として(Sb_xTe_1_−
_x)yGe_1_−_y(0.05≦x≦0.7、0
.4≦y≦0.8)の合金を設置し、希ガスと炭化水素
ガスとの混合雰囲気中で、炭化水素の混合比Q(Q=炭
化水素ガス/〔炭化水素ガス+希ガス〕)が5%≦Q≦
35%としてスパッタ成膜され、かつ該記録膜の両面を
誘電体層で挟んだことを特徴とする情報記録媒体。
[Claims] In an information recording medium in which information is recorded and erased by causing a change in atomic arrangement in a recording layer by irradiation with a light beam, the recording layer serves as a sputtering source (Sb_xTe_1_-
_x)yGe_1_-_y(0.05≦x≦0.7, 0
.. 4≦y≦0.8), and in a mixed atmosphere of rare gas and hydrocarbon gas, the mixture ratio of hydrocarbons Q (Q = hydrocarbon gas / [hydrocarbon gas + rare gas]) is set. 5%≦Q≦
1. An information recording medium characterized in that the recording film is formed by sputtering at a concentration of 35%, and both sides of the recording film are sandwiched between dielectric layers.
JP63325888A 1988-12-26 1988-12-26 Information recording medium Pending JPH02171290A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63325888A JPH02171290A (en) 1988-12-26 1988-12-26 Information recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63325888A JPH02171290A (en) 1988-12-26 1988-12-26 Information recording medium

Publications (1)

Publication Number Publication Date
JPH02171290A true JPH02171290A (en) 1990-07-02

Family

ID=18181719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63325888A Pending JPH02171290A (en) 1988-12-26 1988-12-26 Information recording medium

Country Status (1)

Country Link
JP (1) JPH02171290A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02139283A (en) * 1988-08-01 1990-05-29 Matsushita Electric Ind Co Ltd Optical information recording medium
JPH06262855A (en) * 1993-03-15 1994-09-20 Mitsubishi Kasei Corp Optical data recording medium

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02139283A (en) * 1988-08-01 1990-05-29 Matsushita Electric Ind Co Ltd Optical information recording medium
JPH06262855A (en) * 1993-03-15 1994-09-20 Mitsubishi Kasei Corp Optical data recording medium

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