JPH02167784A - Information recording medium - Google Patents
Information recording mediumInfo
- Publication number
- JPH02167784A JPH02167784A JP63322074A JP32207488A JPH02167784A JP H02167784 A JPH02167784 A JP H02167784A JP 63322074 A JP63322074 A JP 63322074A JP 32207488 A JP32207488 A JP 32207488A JP H02167784 A JPH02167784 A JP H02167784A
- Authority
- JP
- Japan
- Prior art keywords
- recording
- recording layer
- alloy
- amorphous
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000002425 crystallisation Methods 0.000 claims abstract description 22
- 230000008025 crystallization Effects 0.000 claims abstract description 22
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 16
- 239000000956 alloy Substances 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 16
- 239000010410 layer Substances 0.000 abstract description 37
- 239000011241 protective layer Substances 0.000 abstract description 22
- 239000000203 mixture Substances 0.000 abstract description 20
- 239000000463 material Substances 0.000 abstract description 7
- 239000013078 crystal Substances 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 3
- 239000000428 dust Substances 0.000 abstract description 2
- 230000037430 deletion Effects 0.000 abstract 2
- 238000012217 deletion Methods 0.000 abstract 2
- 230000002411 adverse Effects 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 description 17
- 239000007789 gas Substances 0.000 description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 229910001215 Te alloy Inorganic materials 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 4
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 4
- 239000004926 polymethyl methacrylate Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 229910005900 GeTe Inorganic materials 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000004770 chalcogenides Chemical class 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910002058 ternary alloy Inorganic materials 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24302—Metals or metalloids
- G11B2007/2431—Metals or metalloids group 13 elements (B, Al, Ga, In)
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24302—Metals or metalloids
- G11B2007/24314—Metals or metalloids group 15 elements (e.g. Sb, Bi)
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24302—Metals or metalloids
- G11B2007/24316—Metals or metalloids group 16 elements (i.e. chalcogenides, Se, Te)
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
[発明の目的]
(産業上の利用分野)
この発明は、レーザビーム等の光ビームを記録層に照射
し、その照射条件によって照射部分に相変化を誘起させ
て情報を記録・消去し、この相変化に伴う反射率、透過
率等の光学特性の変化を検出することにより情報を再生
する情報記録媒体に関する。このような情報記録媒体と
しては、光ディスク又は光カード等がある。[Detailed Description of the Invention] [Objective of the Invention] (Industrial Field of Application) This invention provides information by irradiating a recording layer with a light beam such as a laser beam and inducing a phase change in the irradiated area depending on the irradiation conditions. The present invention relates to an information recording medium that reproduces information by recording and erasing information and detecting changes in optical properties such as reflectance and transmittance accompanying this phase change. Examples of such information recording media include optical discs and optical cards.
(従来の技術及び発明が解決しようとする課題)
従来、所謂イレーサブル光ディスク等の情報の消去が可
能な情報記録媒体として、相変化型のものが広く知られ
ている。この相変化型情報記録媒体は、例えば、ガラス
又はプラスチック(ポリカーボネート樹脂、ポリメチル
メタクリレート樹脂等)からなる基板と、この基板上に
形成された記録層とを備えている。この記録層を形成す
る材料としては、例えばGeTe等のカルコゲナイド系
合金が知られており、これらは異なる条件の光ビーム(
例えばレーザビーム)を照射することにより、例えば結
晶と非晶質との間で可逆的に相変化するので、この相変
化を利用して情報を記録及び消去し、これらの相変化に
伴う反射率又は透過率等の光学的特性の変化を利用して
情報を読取ることができる。(Prior Art and Problems to be Solved by the Invention) Phase change type media have been widely known as information recording media from which information can be erased, such as so-called erasable optical discs. This phase change type information recording medium includes, for example, a substrate made of glass or plastic (polycarbonate resin, polymethyl methacrylate resin, etc.) and a recording layer formed on the substrate. Chalcogenide alloys such as GeTe are known as materials for forming this recording layer, and these alloys can be used for light beams under different conditions (
By irradiating it with a laser beam (for example, a laser beam), the phase changes reversibly between crystal and amorphous, so this phase change is used to record and erase information, and the reflectance associated with these phase changes is Alternatively, information can be read using changes in optical characteristics such as transmittance.
このような記録層としては、光ビームの照射条件によっ
て相変化が生じ易い共晶組成をを有する材料や金属間化
合物を形成する材料が適している。As such a recording layer, a material having a eutectic composition or a material forming an intermetallic compound that easily undergoes a phase change depending on the irradiation conditions of the light beam is suitable.
しかしながら、従来、相変化型情報記録媒体の記録層と
して用いられているGeTe等の合金は、一応上述の条
件は満足するものの、未だ情報記録媒体として十分な特
性を保持しているとは言えない。特に、初期化、記録及
び消去を高速化することが望まれている。また、結晶−
非晶質間の相変化により情報を記録・消去する場合には
、通常記録部分が非晶質になるが、一般に非晶質は比較
的安定性が低いため、非晶質状態をより安定化すること
も要求されている。However, although alloys such as GeTe that have been conventionally used as the recording layer of phase change information recording media satisfy the above conditions, it cannot be said that they still have sufficient properties as information recording media. . In particular, it is desired to speed up initialization, recording, and erasing. Also, crystal-
When recording or erasing information through a phase change between amorphous states, the recorded portion usually becomes amorphous, but since amorphous states generally have relatively low stability, it is necessary to make the amorphous state more stable. It is also required to do so.
この発明はかかる事情に鑑みてなされたものであって、
安定性に優れ、また、初期化、記録及び消去を高速化す
ることができる情報記録媒体を提供することを目的とす
る。This invention was made in view of such circumstances, and
An object of the present invention is to provide an information recording medium that has excellent stability and can perform initialization, recording, and erasing at high speed.
[発明の構成]
(課題を解決するための手段)
この発明に係る情報記録媒体は、基板と、光ビームの照
1(によって照射部分が結晶相と非晶質相との間で相変
化する記録層とを有する情報記録媒体であって、前記記
録層は、InxSbyTez(ただし、x、y、zは原
子%であり、x、十y+z−100である)で表わされ
る組成の合金で形成され、これらx、y、zはその合金
の結晶化温度が130℃より高くなるように設定されて
いることを特徴とする。[Structure of the Invention] (Means for Solving the Problems) An information recording medium according to the present invention comprises a substrate and a light beam irradiated by the irradiated portion (where the irradiated portion changes phase between a crystalline phase and an amorphous phase). An information recording medium having a recording layer, the recording layer being formed of an alloy having a composition represented by InxSbyTez (where x, y, and z are atomic percent, and x, 10, y + z - 100). , these x, y, and z are set so that the crystallization temperature of the alloy is higher than 130°C.
(作用)
I n x S b y T e z合金は、前述のよ
うな相変化型記録媒体の記録層としての条件を満たす材
料であり、しかも結晶化速度が大きい。この合金組成を
結晶化温度が130℃より高くなるように調整すること
により、非晶質部分が安定に存在する。従って、安定性
に優れ、初期化、記録及び消去を高速化することができ
る。(Function) The In x S by T e z alloy is a material that satisfies the conditions for the recording layer of the phase change recording medium as described above, and has a high crystallization rate. By adjusting the alloy composition so that the crystallization temperature is higher than 130° C., the amorphous portion stably exists. Therefore, it has excellent stability and can speed up initialization, recording, and erasing.
(実施例)
以下、添付図面を参照してこの発明について具体的に説
明する。第1図はこの発明の実施例に係る情報記録媒体
を示す断面図である。基板1はポリオレフィン、エポキ
シ、ポリカーボネート(PC)、ポリメチルメタクリレ
ート(PMMA)等のプラスチック、又はガラス等、こ
の技術分野で通常用いられる材料で形成されている。こ
の基板1の上に、保護層3、記録層2、保護層4及び保
護層5がこの順に形成されている。(Example) Hereinafter, the present invention will be specifically described with reference to the accompanying drawings. FIG. 1 is a sectional view showing an information recording medium according to an embodiment of the invention. The substrate 1 is made of a material commonly used in this technical field, such as a plastic such as polyolefin, epoxy, polycarbonate (PC), polymethyl methacrylate (PMMA), or glass. On this substrate 1, a protective layer 3, a recording layer 2, a protective layer 4, and a protective layer 5 are formed in this order.
保護層3及び保護層4は、記録層2を挟むように配設さ
れており、有機高分子材料、例えばPMMA、ポリスチ
レン等の熱可塑性樹脂若しくは紫外線硬化樹脂(所17
2P樹脂) 又は5i02、A1203、AIN、Zn
S、若しくはZrO2等の誘電体で形成される。これら
保護層3,4は記録WI2が空気中の水分の影響を受け
ることを未然に防止する作用、及び記録・消去の際にレ
ーザビーム等の光ビームにより記録層2の照射部分が飛
散したり穴が形成されてしまうことを防止する作用を有
している。これら保護層3゜4はスピンコード法、蒸着
法、スパッタリング法等によって好適に形成することが
できる。なお、これら保護層3.4の厚みは10人乃至
数十μmであることが好ましい。The protective layer 3 and the protective layer 4 are disposed to sandwich the recording layer 2, and are made of an organic polymer material, such as a thermoplastic resin such as PMMA or polystyrene, or an ultraviolet curing resin (see 17).
2P resin) or 5i02, A1203, AIN, Zn
It is formed of a dielectric material such as S or ZrO2. These protective layers 3 and 4 serve to prevent the recording WI 2 from being affected by moisture in the air, and to prevent the irradiated portion of the recording layer 2 from being scattered by a light beam such as a laser beam during recording or erasing. It has the effect of preventing holes from being formed. These protective layers 3 and 4 can be suitably formed by a spin coating method, a vapor deposition method, a sputtering method, or the like. Note that the thickness of these protective layers 3.4 is preferably 10 to several tens of μm.
保護層5は情報記録媒体取扱う際の表面での傷やほこり
等を防止するために配設されるもので、スピンコード法
等により紫外線硬化樹脂を塗布し、これに紫外線を照射
して硬化させること等により形成される。この保護層5
の層厚は100λ乃至数十μmであることが好ましい。The protective layer 5 is provided to prevent scratches, dust, etc. on the surface when handling the information recording medium, and is coated with an ultraviolet curing resin using a spin code method or the like, and then cured by irradiating it with ultraviolet light. It is formed by such things as This protective layer 5
The layer thickness is preferably 100λ to several tens of μm.
なお、保護層3゜4.5は設けることが好ましいが、必
ずしも設けなくてもよい。Although it is preferable to provide the protective layer 3°4.5, it is not necessary to provide it.
記録層2は、InxSbyTez(ただし、X。The recording layer 2 is made of InxSbyTez (X.
Vr”は原子%であり、x+y+z−100である)で
表わされる合金で形成されており、このX。Vr" is atomic % and is x+y+z-100), and this X.
Vr zは、この合金の結晶化温度が130℃よりも
高くなるように設定されている。なお、この結晶化温度
は、例えば加熱温度を10℃/分に設定して測定される
。このような組成の合金は、照14する光ビームの条件
を変化させることにより結晶と非晶質との間で相変化し
得る材料であり、結晶化速度が大きいという特徴を有し
ている。従って、初期化、記録及び消去を高速化するこ
とができる。Vr z is set such that the crystallization temperature of this alloy is greater than 130°C. Note that this crystallization temperature is measured, for example, by setting the heating temperature to 10° C./min. An alloy having such a composition is a material that can undergo a phase change between crystalline and amorphous by changing the conditions of the irradiated light beam, and is characterized by a high crystallization rate. Therefore, initialization, recording, and erasing can be performed at high speed.
また、結晶化温度が前述のように130℃以上であるこ
とから非晶質の安定性が高い。Furthermore, since the crystallization temperature is 130° C. or higher as described above, the amorphous state is highly stable.
この記録層2は、蒸着法、スパッタリング法等によって
好適に形成することができる。なお、合金ターゲットを
使用して蒸着又はスパッタリングする場合には、ターゲ
ット組成と実際に形成される膜の組成とに差があること
を考慮する必要がある。また、多元同時蒸着又は多元同
時スパッタリング等によって成膜することもできる。記
録層2の層厚は100乃至3000Åであることが好ま
しい。This recording layer 2 can be suitably formed by a vapor deposition method, a sputtering method, or the like. Note that when performing vapor deposition or sputtering using an alloy target, it is necessary to take into account that there is a difference between the target composition and the composition of the film actually formed. Further, the film can also be formed by multi-source simultaneous vapor deposition, multi-source simultaneous sputtering, or the like. The thickness of the recording layer 2 is preferably 100 to 3000 Å.
次に、第2図及び第3図を参照しながらこの実施例に係
る情報記録媒体の記録層の形成方法の一例について説明
する。第2図はこの実施例の記録層を形成するために用
いられるスパッタリング装置の概略構成を示す縦断面図
、第3図はその横断面図である。図中10は真空容器を
示し、この真空容器10はその底面にガス導入ボート1
1及びガス排出ボート12を有している。ガス排出ボー
ト12は排気装置13に接続されており、この排気装置
13により排出ボート12を介して真空容器10内が排
気される。また、ガス導入ボート11はアルゴンガスボ
ンベ14に接続されており、このボンベ14から真空容
器10内にガス導入ボート11を介してスパッタリング
ガスとしてのアルゴンガスが導入される。真空容器10
内の上部には、基板支持用の円板状の回転基台15がそ
の面を水平にして配設されており、その下面に基板1が
支持され、図示しないモータによって回転されるように
なっている。また、真空容器10内の底部近傍には、基
台15に対向するように、夫々In、Sb及びTeで形
成されたスパッタリング源21,22.23が配設され
ており、各スパッタリング源には図示しない高周波電源
が接続されている。これらスパッタリング源21.22
゜23の情報には、夫々モニタ装置24,25゜26が
設けられており、これらモニタ装置により各スパッタリ
ング源からのスパッタリング量をモニタし、記録層が所
定の組成になるように各スパッタリング源に投入する電
力量を調節するようになっている。Next, an example of a method for forming the recording layer of the information recording medium according to this embodiment will be explained with reference to FIGS. 2 and 3. FIG. 2 is a longitudinal cross-sectional view showing a schematic configuration of a sputtering apparatus used to form the recording layer of this embodiment, and FIG. 3 is a cross-sectional view thereof. In the figure, 10 indicates a vacuum vessel, and this vacuum vessel 10 has a gas introduction boat 1 on its bottom surface.
1 and a gas discharge boat 12. The gas exhaust boat 12 is connected to an exhaust device 13, and the inside of the vacuum container 10 is evacuated by the exhaust device 13 via the exhaust boat 12. Further, the gas introduction boat 11 is connected to an argon gas cylinder 14, and argon gas as a sputtering gas is introduced from the cylinder 14 into the vacuum vessel 10 via the gas introduction boat 11. Vacuum container 10
A disk-shaped rotating base 15 for supporting a substrate is placed in the upper part thereof with its surface horizontally, and the substrate 1 is supported on the lower surface thereof and is rotated by a motor (not shown). ing. Furthermore, near the bottom of the vacuum chamber 10, sputtering sources 21, 22, and 23 made of In, Sb, and Te, respectively, are arranged so as to face the base 15. A high frequency power source (not shown) is connected. These sputtering sources 21.22
The information at ゜23 is provided with monitor devices 24, 25゜26, respectively, and these monitor devices monitor the amount of sputtering from each sputtering source, and adjust the amount of sputtering to each sputtering source so that the recording layer has a predetermined composition. The amount of electricity input is adjusted.
このようなスパッタリング装置においては、先ず、排気
装置により真空容器10内を例えば1O−6Torrま
で排気する。次いで、ガス導入ボー111を介して容器
10内にアルゴンガスを導入しつつ、排気装置13の排
気量を調節して真空容器10内を所定圧力のアルゴンガ
ス雰囲気に保持する。この状態で、基板1を回転させつ
つ、スパッタリング源21,22.23に所定時間所定
の電力を印加する。これにより、スパッタリングが実施
され、基板1に所定組成の記録層が形成される。なお、
保護層を形成する場合には、記録層2の形成に先立ち、
保護層の組成に調整されたスパッタリング源を用いて上
述したようにスパッタリングするこにより基板1上に保
護層3を形成し、その後記録層2を形成し、更に保護層
3を形成する場合と同様の条件で記録層2の上に保護層
4を形成することができる。In such a sputtering apparatus, first, the inside of the vacuum container 10 is evacuated to, for example, 10-6 Torr using an exhaust device. Next, while introducing argon gas into the container 10 through the gas introduction bow 111, the exhaust amount of the exhaust device 13 is adjusted to maintain the inside of the vacuum container 10 in an argon gas atmosphere at a predetermined pressure. In this state, while rotating the substrate 1, a predetermined power is applied to the sputtering sources 21, 22, and 23 for a predetermined time. As a result, sputtering is performed, and a recording layer having a predetermined composition is formed on the substrate 1. In addition,
When forming a protective layer, prior to forming the recording layer 2,
Similar to the case of forming the protective layer 3 on the substrate 1 by sputtering as described above using a sputtering source adjusted to the composition of the protective layer, then forming the recording layer 2, and then forming the protective layer 3. The protective layer 4 can be formed on the recording layer 2 under the following conditions.
次に、この発明の情報記録媒体における初期化、並びに
、情報の記録、消去及び再生について説明する。Next, initialization, recording, erasing, and reproduction of information in the information recording medium of the present invention will be explained.
初期化
記録層2は成膜直後に通常非晶質であるが、情報を記録
するためには結晶である必要があるので、レーザビーム
等の光ビームを記録層2に全面照射して加熱徐冷し、記
録層2を結晶化する。The initialization recording layer 2 is normally amorphous immediately after film formation, but it needs to be crystalline in order to record information, so the recording layer 2 is heated and slowed by irradiating the entire surface of the recording layer 2 with a light beam such as a laser beam. Cool and crystallize the recording layer 2.
記録
高出力でパルス幅が短い光ビームを記録層2に照射し、
照射部分を加熱急冷して非晶質に相変化させ、記録マー
クを形成する。A light beam with high recording power and short pulse width is irradiated onto the recording layer 2,
The irradiated area is heated and rapidly cooled to change its phase to an amorphous state, thereby forming a recording mark.
消去
記録層2に形成された記録マーク部に、記録の際よりも
低出力でパルス幅が長い光ビームを照射して記録マーク
部を結晶に相変化させ、情報を消去する。A light beam having a lower output and a longer pulse width than that used during recording is irradiated onto the recording mark portion formed on the erasing recording layer 2 to change the phase of the recording mark portion into a crystal, thereby erasing information.
再生
情報を記録した記録層2に比較的弱い光ビームを照射し
、記録マーク部と非記録部との間の光学的特性、例えば
反射率の差を検出して情報を読取る。A relatively weak light beam is irradiated onto the recording layer 2 on which reproduced information has been recorded, and the information is read by detecting the difference in optical characteristics, such as reflectance, between the recorded mark portion and the non-recorded portion.
なお、この発明に係る情報記録媒体は、結晶化速度が大
きいことからオーバーライドが可能である。オーバルラ
イトとは、単一の光源から放射されるレーザビーム等の
光ビームを、第4図に示すように2段階のパワーレベル
PE (消去)及びPw (記録)の間でパワー変
調して、消去パワーレベルの光ビームに記録パワーレベ
ルのパルスを重畳させ、既に記録された情報を消去しな
がら新しい情報を重ね書することである。In addition, since the information recording medium according to the present invention has a high crystallization speed, overriding is possible. Oval light is a light beam such as a laser beam emitted from a single light source, which is power-modulated between two power levels PE (erase) and Pw (record) as shown in Figure 4. This method involves superimposing pulses at a recording power level on a light beam at an erasing power level to overwrite new information while erasing previously recorded information.
次に、I n x S b y T e zにおいて、
結晶化温度が130℃を超える組成を把握した結果につ
いて説明する。Next, in In x S b y T e z,
The results of understanding compositions with crystallization temperatures exceeding 130°C will be explained.
ガラス基板上に、第2図及び第3図に示す装置により種
々の組成のIn−5b−Te合金を形威し、X線回折に
よりその膜の構造を確認した。その結果、第5図に示す
In−3b−TeB元組戊組成おいて、単斜線で示す領
域の組成において非晶質の薄膜を得ることができ、相変
化型の記録層として利用し得ることが確認された。In-5b-Te alloys of various compositions were formed on glass substrates using the apparatus shown in FIGS. 2 and 3, and the structures of the films were confirmed by X-ray diffraction. As a result, in the In-3b-TeB original composition shown in FIG. 5, an amorphous thin film can be obtained in the region indicated by monoclinic lines, and can be used as a phase-change recording layer. was confirmed.
上記試験において非晶質化したサンプルの結晶化温度を
高感度示差走査熱量計(DSC)で測定した。結晶化温
度は測定の際の昇温速度によって若干変化するので、こ
の昇温速度を10℃/分に固定した。その結果、第5図
の2重斜線領域、すなわち、およそTeが70原子%以
下、sbが80原子%以下、inが60%以下の限られ
た組成範囲において結晶化温度が130℃以上となり、
非晶質状態の安定性が高いことが確認された。The crystallization temperature of the amorphous sample in the above test was measured using a high-sensitivity differential scanning calorimeter (DSC). Since the crystallization temperature varies slightly depending on the temperature increase rate during measurement, this temperature increase rate was fixed at 10° C./min. As a result, the crystallization temperature is 130° C. or higher in the double hatched region in FIG. 5, that is, in a limited composition range of about 70 at % or less Te, 80 at % or less sb, and 60 atomic % or less in,
It was confirmed that the stability of the amorphous state is high.
次に、この発明の試験例について説明する。Next, test examples of the present invention will be explained.
上述の試験と同様にして、ガラス基板上にIn−3b−
Te合金薄膜を形成したA−Hの5つサンプルを作成し
た。これらサンプルの薄膜組成を第1表に示す。In-3b- was deposited on a glass substrate in the same manner as the above test.
Five samples A to H were prepared with Te alloy thin films formed thereon. The thin film compositions of these samples are shown in Table 1.
第1表
これらサンプルについて、基板側から種々のパルス幅の
レーザビームを一定強度で対物レンズを用いて合金薄膜
に集光照射し、パルス幅と照射部分の反射率変化との関
係を把握した。その結果を第6図に示す。第6図は、横
軸に照射するレーザビームのパルス幅をとり、縦軸に反
射率変化量をとって、これらの関係を示すグラフであり
、レーザビームのパワーが3mWの場合について示すも
のである。この図から確認されるように、いずれのサン
プルも反射率の変化が1μsec以下で生じていること
が確認された。反射率変化は非晶質から結晶への相変化
に対応するから、この結果はこれらサンプルの結晶化速
度が極めて大きいことを示すものである。Table 1 For these samples, laser beams of various pulse widths were focused and irradiated onto the alloy thin film from the substrate side at a constant intensity using an objective lens, and the relationship between the pulse width and the change in reflectance of the irradiated area was determined. The results are shown in FIG. Figure 6 is a graph showing the relationship between the pulse width of the irradiated laser beam on the horizontal axis and the change in reflectance on the vertical axis, and is shown for the case where the laser beam power is 3 mW. be. As confirmed from this figure, it was confirmed that the change in reflectance occurred in 1 μsec or less in all samples. Since the change in reflectance corresponds to a phase change from amorphous to crystalline, this result indicates that the rate of crystallization of these samples is extremely high.
このような傾向は、測定時の昇温速度が10℃/分の範
囲内の組成を有する他のIn−8b−Te合金において
も同様に確認された。Such a tendency was similarly confirmed in other In-8b-Te alloys having compositions in which the heating rate during measurement was within the range of 10° C./min.
以上説明したように、結晶化温度が130℃以上の組成
範囲のIn−5b−Te合金は、結晶と非晶質との間の
相変化が可能であり、非晶質状態で安定であり、更に結
晶化速度が大きいことが確認された。As explained above, In-5b-Te alloys with a composition range in which the crystallization temperature is 130°C or higher are capable of phase change between crystalline and amorphous states, and are stable in the amorphous state. Furthermore, it was confirmed that the crystallization rate was high.
[発明の効果]
この発明によれば、記B層を結晶化温度が130℃以上
となるIn−8b−Te合金で形成したので、非晶質の
安定性が高く、また結晶化速度が大きい。従って、非晶
質記録マークの安定性に優れ、しかも初期化、記録及び
消去を高速で実施することができるという極めて特性が
優れた情報記録媒体を得ることができる。[Effects of the Invention] According to the present invention, since the B layer is formed of an In-8b-Te alloy having a crystallization temperature of 130° C. or higher, the amorphous stability is high and the crystallization rate is high. . Therefore, it is possible to obtain an information recording medium with extremely excellent properties such as excellent stability of amorphous recording marks and the ability to perform initialization, recording, and erasing at high speed.
第1図はこの発明の実施例に係る情報記録媒体を示す断
面図、第2図は記録層を形成するための装置の概略構成
を示す縦断面図、第3図はその横断面図、第4図はオー
バーライドの際のレーザビームのパワーを示す図、第5
図はIn−5b−Te3元合金の非晶質化し得る組成範
囲及び結晶化温度が130℃より高くなる組成範囲を示
す組成図、第6図は照射するレーザビームのパルス幅と
反射率変化量との関係を示すグラフ図である。
1;基板、2;記録層、3,4,5.保護層。FIG. 1 is a cross-sectional view showing an information recording medium according to an embodiment of the present invention, FIG. 2 is a vertical cross-sectional view showing a schematic configuration of an apparatus for forming a recording layer, and FIG. Figure 4 shows the power of the laser beam during override, Figure 5
The figure shows the composition range in which the In-5b-Te ternary alloy can become amorphous and the composition range in which the crystallization temperature is higher than 130°C. Figure 6 shows the pulse width of the irradiated laser beam and the amount of change in reflectance. It is a graph diagram showing the relationship between. 1; Substrate, 2; Recording layer, 3, 4, 5. protective layer.
Claims (1)
晶質相との間で相変化する記録層とを有する情報記録媒
体であって、前記記録層は、In_xSb_yTe_z
(ただし、x、y、zは原子%であり、x+y+z=1
00である)で表わされる組成の合金で形成され、これ
らx、y、zはその合金の結晶化温度が130℃より高
くなるように設定されていることを特徴とする情報記録
媒体。An information recording medium comprising a substrate and a recording layer whose irradiated portion changes phase between a crystalline phase and an amorphous phase by irradiation with a light beam, the recording layer comprising In_xSb_yTe_z
(However, x, y, z are atomic %, x+y+z=1
00), and x, y, and z are set such that the crystallization temperature of the alloy is higher than 130°C.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63322074A JPH02167784A (en) | 1988-12-22 | 1988-12-22 | Information recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63322074A JPH02167784A (en) | 1988-12-22 | 1988-12-22 | Information recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02167784A true JPH02167784A (en) | 1990-06-28 |
Family
ID=18139627
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63322074A Pending JPH02167784A (en) | 1988-12-22 | 1988-12-22 | Information recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02167784A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1182654A2 (en) * | 2000-08-25 | 2002-02-27 | Eastman Kodak Company | Erasable phase-change recording elements |
-
1988
- 1988-12-22 JP JP63322074A patent/JPH02167784A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1182654A2 (en) * | 2000-08-25 | 2002-02-27 | Eastman Kodak Company | Erasable phase-change recording elements |
EP1182654A3 (en) * | 2000-08-25 | 2002-05-15 | Eastman Kodak Company | Erasable phase-change recording elements |
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