DE69811419T2 - Antireflex-Schicht, Herstellungsverfahren und elektrolumineszente Vorrichtung - Google Patents

Antireflex-Schicht, Herstellungsverfahren und elektrolumineszente Vorrichtung Download PDF

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Publication number
DE69811419T2
DE69811419T2 DE69811419T DE69811419T DE69811419T2 DE 69811419 T2 DE69811419 T2 DE 69811419T2 DE 69811419 T DE69811419 T DE 69811419T DE 69811419 T DE69811419 T DE 69811419T DE 69811419 T2 DE69811419 T2 DE 69811419T2
Authority
DE
Germany
Prior art keywords
manufacturing process
electroluminescent device
reflective coating
reflective
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69811419T
Other languages
English (en)
Other versions
DE69811419D1 (de
Inventor
Manabu Niboshi
Hiroyuki Shimoyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Application granted granted Critical
Publication of DE69811419D1 publication Critical patent/DE69811419D1/de
Publication of DE69811419T2 publication Critical patent/DE69811419T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/26—Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode
DE69811419T 1997-03-28 1998-03-26 Antireflex-Schicht, Herstellungsverfahren und elektrolumineszente Vorrichtung Expired - Fee Related DE69811419T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP07638497A JP3472432B2 (ja) 1997-03-28 1997-03-28 表示装置用反射防止膜及びその製造方法、並びにｅｌ素子

Publications (2)

Publication Number Publication Date
DE69811419D1 DE69811419D1 (de) 2003-03-27
DE69811419T2 true DE69811419T2 (de) 2004-01-15

Family

ID=13603849

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69811419T Expired - Fee Related DE69811419T2 (de) 1997-03-28 1998-03-26 Antireflex-Schicht, Herstellungsverfahren und elektrolumineszente Vorrichtung

Country Status (4)

Country Link
US (1) US6198215B1 (de)
EP (1) EP0868114B1 (de)
JP (1) JP3472432B2 (de)
DE (1) DE69811419T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100535361B1 (ko) * 1998-12-30 2006-03-16 현대엘씨디주식회사 유기 전계 발광 표시 소자
US6411019B1 (en) * 1999-07-27 2002-06-25 Luxell Technologies Inc. Organic electroluminescent device
KR100563675B1 (ko) * 2002-04-09 2006-03-28 캐논 가부시끼가이샤 유기 발광소자 및 유기 발광소자 패키지
KR100494557B1 (ko) * 2002-09-05 2005-06-13 한국전자통신연구원 고굴절률 덮개층을 가지는 고효율 발광소자
JP2004170554A (ja) * 2002-11-18 2004-06-17 Victor Co Of Japan Ltd 反射型液晶表示装置
US8723415B2 (en) * 2009-12-14 2014-05-13 Sharp Kabushiki Kaisha Moisture-proof film, method for manufacturing the same, and organic electronic device including the same
WO2018090010A1 (en) * 2016-11-14 2018-05-17 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Antirefctive surface structures on optical elements

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61211997A (ja) 1985-03-18 1986-09-20 日産自動車株式会社 薄膜ｅｌ素子
US4900633A (en) * 1987-03-26 1990-02-13 Ppg Industries, Inc. High performance multilayer coatings
JPH0750632B2 (ja) * 1988-06-10 1995-05-31 シャープ株式会社 薄膜ｅｌ素子
US5952128A (en) * 1995-08-15 1999-09-14 Ulvac Coating Corporation Phase-shifting photomask blank and method of manufacturing the same as well as phase-shifting photomask
JP3390561B2 (ja) * 1995-02-10 2003-03-24 旭硝子株式会社 液晶表示装置用遮光膜
JPH09213479A (ja) * 1996-01-31 1997-08-15 Sharp Corp Ｅｌ素子及びその製造方法
US5914202A (en) * 1996-06-10 1999-06-22 Sharp Microeletronics Technology, Inc. Method for forming a multi-level reticle
US5789117A (en) * 1996-12-02 1998-08-04 Taiwan Semiconductor Manufacturing Company, Ltd. Transfer method for non-critical photoresist patterns
US5783337A (en) * 1997-05-15 1998-07-21 Taiwan Semiconductor Manufacturing Company, Ltd. Process to fabricate a double layer attenuated phase shift mask (APSM) with chrome border

Also Published As

Publication number Publication date
EP0868114B1 (de) 2003-02-19
US6198215B1 (en) 2001-03-06
JPH10270165A (ja) 1998-10-09
JP3472432B2 (ja) 2003-12-02
EP0868114A3 (de) 1999-05-12
DE69811419D1 (de) 2003-03-27
EP0868114A2 (de) 1998-09-30

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Legal Events

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8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee