DE69806343D1 - Phasenmaske mit räumlich veränderlichem beugungswirkungsgrad - Google Patents
Phasenmaske mit räumlich veränderlichem beugungswirkungsgradInfo
- Publication number
- DE69806343D1 DE69806343D1 DE69806343T DE69806343T DE69806343D1 DE 69806343 D1 DE69806343 D1 DE 69806343D1 DE 69806343 T DE69806343 T DE 69806343T DE 69806343 T DE69806343 T DE 69806343T DE 69806343 D1 DE69806343 D1 DE 69806343D1
- Authority
- DE
- Germany
- Prior art keywords
- efficiency
- variable
- phase mask
- mask
- phase
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
- G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
- G02B6/02133—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference
- G02B6/02138—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference based on illuminating a phase mask
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/58—Optics for apodization or superresolution; Optical synthetic aperture systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
- G02B5/1871—Transmissive phase gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
- G02B6/0208—Refractive index modulation gratings, e.g. Bragg gratings characterised by their structure, wavelength response
- G02B6/02085—Refractive index modulation gratings, e.g. Bragg gratings characterised by their structure, wavelength response characterised by the grating profile, e.g. chirped, apodised, tilted, helical
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/34—Phase-edge PSM, e.g. chromeless PSM; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1225—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers with a varying coupling constant along the optical axis
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA002197706A CA2197706A1 (en) | 1997-02-14 | 1997-02-14 | Method of fabricating apodized phase mask |
PCT/CA1998/000112 WO1998036297A1 (en) | 1997-02-14 | 1998-02-11 | Phase mask with spatially variable diffraction efficiency |
Publications (1)
Publication Number | Publication Date |
---|---|
DE69806343D1 true DE69806343D1 (de) | 2002-08-08 |
Family
ID=4159949
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69806343T Expired - Lifetime DE69806343D1 (de) | 1997-02-14 | 1998-02-11 | Phasenmaske mit räumlich veränderlichem beugungswirkungsgrad |
Country Status (7)
Country | Link |
---|---|
US (1) | US6545808B1 (de) |
EP (1) | EP0960347B1 (de) |
JP (1) | JP2001511906A (de) |
AU (1) | AU731744B2 (de) |
CA (1) | CA2197706A1 (de) |
DE (1) | DE69806343D1 (de) |
WO (1) | WO1998036297A1 (de) |
Families Citing this family (78)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030107787A1 (en) * | 2001-09-26 | 2003-06-12 | Arkady Bablumyan | Planar and fiber optical apodized diffraction structures fabrication |
US20030107786A1 (en) * | 2001-09-26 | 2003-06-12 | Arkady Bablumyan | Precision optical apparatus utilizing non-optically smooth material |
JP4556143B2 (ja) * | 2001-10-01 | 2010-10-06 | セイコーエプソン株式会社 | 位相格子マスクの製造方法及びフォトマスクの製造方法 |
JP4632103B2 (ja) * | 2001-10-01 | 2011-02-16 | セイコーエプソン株式会社 | フォトマスク |
US7050155B2 (en) | 2001-10-30 | 2006-05-23 | Pixelligent Technologies Llc | Advanced exposure techniques for programmable lithography |
US6654521B2 (en) * | 2002-01-23 | 2003-11-25 | Teraxion Inc. | Diffraction compensation of FBG phase masks for multi-channel sampling applications |
JP2005524989A (ja) | 2002-05-08 | 2005-08-18 | フォーセン テクノロジー インク | 高効率固体光源及びその使用方法及びその製造方法 |
US6830702B2 (en) * | 2002-06-07 | 2004-12-14 | Taiwan Semiconductor Manufacturing Co. Ltd | Single trench alternating phase shift mask fabrication |
US7310463B2 (en) * | 2002-09-09 | 2007-12-18 | Kyocera Corporation | Optical structural body, its manufacturing method and optical element |
US7239594B2 (en) * | 2003-02-07 | 2007-07-03 | Imation Corp. | Self-referenced holography using element formed on a holographic medium |
KR100908234B1 (ko) * | 2003-02-13 | 2009-07-20 | 삼성모바일디스플레이주식회사 | 전계 발광 표시 장치 및 이의 제조방법 |
EP1482494A3 (de) * | 2003-05-28 | 2007-08-29 | Matsushita Electric Industrial Co., Ltd. | Verfahren zur Herstellung eines Masters für optische Informationsaufzeichnungsmedien |
US20040244425A1 (en) * | 2003-06-09 | 2004-12-09 | Xiaolin Tong | Fabrication of photosensitive couplers |
CN100359299C (zh) * | 2003-11-03 | 2008-01-02 | 中国科学院长春光学精密机械与物理研究所 | 一种光路对称分布的光栅衍射效率测试仪 |
US7277604B2 (en) * | 2003-12-12 | 2007-10-02 | Lxsix Photonics Inc. | Method and apparatus for inducing an index of refraction change on a substrate sensitive to electromagnetic radiation |
WO2005091392A1 (en) * | 2004-03-18 | 2005-09-29 | Phoseon Technology, Inc. | Micro-reflectors on a substrate for high-density led array |
US8018508B2 (en) * | 2004-04-13 | 2011-09-13 | Panasonic Corporation | Light-collecting device and solid-state imaging apparatus |
US7289699B1 (en) * | 2004-04-29 | 2007-10-30 | Northrop Grumman Corporation | Grating apodization technique for diffused optical waveguides |
US7280206B2 (en) * | 2004-09-13 | 2007-10-09 | Agilent Technologies, Inc. | Method and apparatus to improve the dynamic range of optical devices using spatial apodization |
US7427466B2 (en) * | 2004-11-29 | 2008-09-23 | Imation Corp. | Anti-reflection optical data storage disk master |
EP1866954B1 (de) * | 2004-12-30 | 2016-04-20 | Phoseon Technology, Inc. | Verfahren und systeme in bezug auf lichtquellen für den einsatz in technischen verfahren |
US20060204185A1 (en) * | 2005-03-09 | 2006-09-14 | Konica Minolta Holdings, Inc. | Diffractive optical element and bidirectional optical communication module using the same |
CN1322340C (zh) * | 2005-06-08 | 2007-06-20 | 中国科学院上海光学精密机械研究所 | 1053纳米波长的高衍射效率石英透射光栅 |
CN1322339C (zh) * | 2005-06-08 | 2007-06-20 | 中国科学院上海光学精密机械研究所 | 532纳米波长的高衍射效率石英透射光栅 |
CN1322341C (zh) * | 2005-06-08 | 2007-06-20 | 中国科学院上海光学精密机械研究所 | 632.8纳米波长的高衍射效率石英透射光栅 |
DE102005044730B4 (de) * | 2005-09-19 | 2008-12-11 | Swet Optics Gmbh | Optisches Element und Verfahren zur Steuerung seiner Übertragungsfunktion |
CN100340875C (zh) * | 2006-03-08 | 2007-10-03 | 中国科学院上海光学精密机械研究所 | 800纳米波段的石英透射偏振分束光栅 |
CN100340877C (zh) * | 2006-03-22 | 2007-10-03 | 中国科学院上海光学精密机械研究所 | 632.8纳米波长背入射式石英反射偏振分束光栅 |
CN100340876C (zh) * | 2006-03-22 | 2007-10-03 | 中国科学院上海光学精密机械研究所 | 532纳米波长的高密度深刻蚀石英透射偏振分束光栅 |
WO2008044686A1 (fr) * | 2006-10-10 | 2008-04-17 | Asahi Glass Co., Ltd. | Élément de diffraction et dispositif à tête optique équipé de celui-ci |
US7773307B2 (en) * | 2006-12-12 | 2010-08-10 | Northrop Grumman Space & Mission Systems Corporation | Phase mask with continuous azimuthal variation for a coronagraph imaging system |
CN101765793B (zh) * | 2007-02-23 | 2011-11-30 | 纳诺科普有限公司 | 一种用于设计衍射光栅结构的方法和衍射光栅结构 |
US8358889B2 (en) * | 2009-05-27 | 2013-01-22 | Redfern Integrated Optics | Device fabrication with planar bragg gratings suppressing parasitic effects |
US8532450B1 (en) * | 2009-12-23 | 2013-09-10 | Western Digital (Fremont), Llc | Optical grating and method of manufacture |
CN103620356B (zh) * | 2011-04-20 | 2016-04-13 | 惠普发展公司,有限责任合伙企业 | 光探测系统 |
CN103547956B (zh) | 2011-04-20 | 2016-06-15 | 惠普发展公司,有限责任合伙企业 | 基于亚波长光栅的光学元件 |
WO2016020630A2 (en) | 2014-08-08 | 2016-02-11 | Milan Momcilo Popovich | Waveguide laser illuminator incorporating a despeckler |
DE102012108170B4 (de) * | 2012-09-03 | 2015-01-22 | Bundesdruckerei Gmbh | Sicherheitselement und Verfahren zur Herstellung eines Sicherheitselements |
CN104937463A (zh) | 2013-01-30 | 2015-09-23 | 惠普发展公司,有限责任合伙企业 | 具有清洁元件的光学连接器 |
US9240255B2 (en) * | 2013-03-06 | 2016-01-19 | University Of Oregon | Device and method for creating Gaussian aberration-corrected electron beams |
CN103197366B (zh) * | 2013-03-13 | 2015-06-17 | 北京工业大学 | 基于异质结光栅的偏振滤波器及制备方法 |
JP6654578B2 (ja) * | 2014-05-22 | 2020-02-26 | オーストラリアン ニュークリア サイエンス アンド テクノロジー オーガニゼーション | ガンマ線イメージング |
US9632226B2 (en) | 2015-02-12 | 2017-04-25 | Digilens Inc. | Waveguide grating device |
US10459145B2 (en) * | 2015-03-16 | 2019-10-29 | Digilens Inc. | Waveguide device incorporating a light pipe |
US9618664B2 (en) * | 2015-04-15 | 2017-04-11 | Finisar Corporation | Partially etched phase-transforming optical element |
US10983389B2 (en) * | 2016-03-04 | 2021-04-20 | Applied Materials, Inc. | Wire grid polarizer manufacturing method |
US10539723B2 (en) | 2016-10-19 | 2020-01-21 | Finisar Corporation | Phase-transforming optical reflector formed by partial etching or by partial etching with reflow |
KR101919067B1 (ko) | 2017-04-27 | 2018-11-19 | 세종공업 주식회사 | 저수차 렌즈 제조방법 |
FI128574B (en) * | 2017-06-02 | 2020-08-14 | Dispelix Oy | Height-modulated diffractive master plate and process for its manufacture |
FI128376B (en) * | 2017-06-02 | 2020-04-15 | Dispelix Oy | Process for the preparation of a diffractive grating with varying efficiency and a diffraction grating |
WO2019027931A1 (en) * | 2017-07-31 | 2019-02-07 | Rutgers, The State University Of New Jersey | APPARATUS AND METHOD FOR SPATIAL LIGHT MODULATION BASED ON HIGH-POWER LASER DISPLAY |
CN108110600B (zh) * | 2018-02-05 | 2023-08-15 | 长春新产业光电技术有限公司 | 一种多光束相位扰动装置及方法 |
US10818499B2 (en) | 2018-02-21 | 2020-10-27 | Varian Semiconductor Equipment Associates, Inc. | Optical component having variable depth gratings and method of formation |
US11067726B2 (en) | 2018-04-23 | 2021-07-20 | Facebook Technologies, Llc | Gratings with variable depths for waveguide displays |
US10732351B2 (en) | 2018-04-23 | 2020-08-04 | Facebook Technologies, Llc | Gratings with variable depths formed using planarization for waveguide displays |
US10649141B1 (en) | 2018-04-23 | 2020-05-12 | Facebook Technologies, Llc | Gratings with variable etch heights for waveguide displays |
WO2020018270A1 (en) * | 2018-07-19 | 2020-01-23 | Applied Materials, Inc. | Variable height slanted grating method |
US11675114B2 (en) * | 2018-07-23 | 2023-06-13 | Ii-Vi Delaware, Inc. | Monolithic structured light projector |
US10935799B2 (en) * | 2018-10-23 | 2021-03-02 | Applied Materials, Inc. | Optical component having depth modulated angled gratings and method of formation |
TW202204951A (zh) * | 2018-11-07 | 2022-02-01 | 美商應用材料股份有限公司 | 使用灰調微影術及傾斜蝕刻的深度調節傾斜光柵 |
US10690821B1 (en) * | 2018-12-14 | 2020-06-23 | Applied Materials, Inc. | Methods of producing slanted gratings |
JPWO2020145218A1 (ja) | 2019-01-10 | 2021-11-04 | 富士フイルム株式会社 | 構造体、固体撮像素子および画像表示装置 |
US11150394B2 (en) * | 2019-01-31 | 2021-10-19 | Facebook Technologies, Llc | Duty cycle range increase for waveguide combiners |
US20200264378A1 (en) | 2019-02-15 | 2020-08-20 | Digilens Inc. | Methods and Apparatuses for Providing a Holographic Waveguide Display Using Integrated Gratings |
US10976483B2 (en) * | 2019-02-26 | 2021-04-13 | Facebook Technologies, Llc | Variable-etch-depth gratings |
US10809448B1 (en) * | 2019-04-18 | 2020-10-20 | Facebook Technologies, Llc | Reducing demolding stress at edges of gratings in nanoimprint lithography |
JP2022535460A (ja) | 2019-06-07 | 2022-08-08 | ディジレンズ インコーポレイテッド | 透過格子および反射格子を組み込んだ導波路、ならびに関連する製造方法 |
WO2021041949A1 (en) | 2019-08-29 | 2021-03-04 | Digilens Inc. | Evacuating bragg gratings and methods of manufacturing |
CN110543029B (zh) * | 2019-09-06 | 2023-05-02 | Ii-Vi特拉华有限公司 | 单片结构光投影仪 |
WO2021063910A1 (de) * | 2019-09-30 | 2021-04-08 | Carl Zeiss Jena Gmbh | Getarnte gitterstrukturen |
US10823888B1 (en) * | 2019-11-12 | 2020-11-03 | Applied Materials, Inc. | Methods of producing slanted gratings with variable etch depths |
US11662524B2 (en) * | 2020-03-13 | 2023-05-30 | Applied Materials, Inc. | Forming variable depth structures with laser ablation |
FI20205642A1 (en) * | 2020-06-17 | 2021-12-18 | Dispelix Oy | A method of manufacturing an optical element, an optical element, and an apparatus for manufacturing an optical element |
US20220082739A1 (en) * | 2020-09-17 | 2022-03-17 | Facebook Technologies, Llc | Techniques for manufacturing variable etch depth gratings using gray-tone lithography |
US11709422B2 (en) | 2020-09-17 | 2023-07-25 | Meta Platforms Technologies, Llc | Gray-tone lithography for precise control of grating etch depth |
WO2022150841A1 (en) * | 2021-01-07 | 2022-07-14 | Digilens Inc. | Grating structures for color waveguides |
WO2022187728A1 (en) * | 2021-03-05 | 2022-09-09 | Ipg Photonics Corporation | Intracavity holographic laser mode converter |
CN114594612B (zh) * | 2022-03-04 | 2024-04-26 | 南京邮电大学 | 基于变迹光栅组的捕获原子、操纵和读取原子态的方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4936665A (en) * | 1987-10-25 | 1990-06-26 | Whitney Theodore R | High resolution imagery systems and methods |
US5367588A (en) * | 1992-10-29 | 1994-11-22 | Her Majesty The Queen In Right Of Canada, As Represented By The Minister Of Communications | Method of fabricating Bragg gratings using a silica glass phase grating mask and mask used by same |
JP2690430B2 (ja) | 1992-07-06 | 1997-12-10 | ワイケイケイ株式会社 | スライドファスナー用務歯の成形方法及び装置 |
JP3333886B2 (ja) | 1992-09-17 | 2002-10-15 | ミノルタ株式会社 | ホログラフィ素子 |
US5413884A (en) | 1992-12-14 | 1995-05-09 | American Telephone And Telegraph Company | Grating fabrication using electron beam lithography |
US5327515A (en) | 1993-01-14 | 1994-07-05 | At&T Laboratories | Method for forming a Bragg grating in an optical medium |
EP0632295A1 (de) | 1993-07-02 | 1995-01-04 | Xerox Corporation | Binäres optisches Element zur Phasen-Apodisation |
US6313473B1 (en) * | 1999-05-14 | 2001-11-06 | :Uconn Technology Inc. | Device for producing apodized gratings |
-
1997
- 1997-02-14 CA CA002197706A patent/CA2197706A1/en not_active Abandoned
-
1998
- 1998-02-11 WO PCT/CA1998/000112 patent/WO1998036297A1/en active IP Right Grant
- 1998-02-11 EP EP98902911A patent/EP0960347B1/de not_active Expired - Lifetime
- 1998-02-11 AU AU59789/98A patent/AU731744B2/en not_active Ceased
- 1998-02-11 US US09/403,678 patent/US6545808B1/en not_active Expired - Fee Related
- 1998-02-11 JP JP53519098A patent/JP2001511906A/ja active Pending
- 1998-02-11 DE DE69806343T patent/DE69806343D1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
AU5978998A (en) | 1998-09-08 |
US6545808B1 (en) | 2003-04-08 |
EP0960347A1 (de) | 1999-12-01 |
EP0960347B1 (de) | 2002-07-03 |
WO1998036297A1 (en) | 1998-08-20 |
CA2197706A1 (en) | 1998-08-14 |
JP2001511906A (ja) | 2001-08-14 |
AU731744B2 (en) | 2001-04-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69806343D1 (de) | Phasenmaske mit räumlich veränderlichem beugungswirkungsgrad | |
DE69833362D1 (de) | Variable Drosselspulenanordnung | |
ATE278686T1 (de) | Phthalazines mit angiogenesis-hemmender wirkung | |
DE69827870D1 (de) | Drebohrmeissel mit beweglichen Formation-eingreifenden Elementen | |
DE59804362D1 (de) | Rotor mit integraler beschaufelung | |
ID24084A (id) | Turunan-turunan resorsinol | |
DE59810205D1 (de) | Bedienelement | |
DE69737411D1 (de) | Induktor mit verbesserten Q-Wert | |
DE69801694T2 (de) | Einrichtung mit Kurvenscheibe | |
ATE355264T1 (de) | Neue aryloxy-alkyl-dialkylamine | |
DE59806593D1 (de) | Wendeturmanordnung | |
DE69821168D1 (de) | Kochmulde | |
ID21287A (id) | Turunan-turunan karbohidrat | |
DE69822686D1 (de) | Kompressor mit variabler Fördermenge | |
DE69808366D1 (de) | Dimmer | |
FR2770230B1 (fr) | Reflecteurs solaires | |
DE69521542T2 (de) | Brotaufstrich mit kontinuierlicher Wasserphase | |
DE69836069D1 (de) | Zweirichtungsthyristor | |
DE69617275D1 (de) | Oszillator mit niedriger Leistung | |
DE69836751D1 (de) | Dienste mit rufunabhängigen modulen | |
DE69815176D1 (de) | Brotaufstrich mit kontinuierlicher Wasserphase | |
DE69802923T2 (de) | neue tetrahydroiosoquinolin thiophenecarboximidamiden | |
DE69835157D1 (de) | Reihenelektroden-anodisierung | |
FR2769993B1 (fr) | Reflecteur concentrant | |
DE59812160D1 (de) | Bedienelement |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8332 | No legal effect for de |