DE69727782D1 - Schutzvorrichtung für maske - Google Patents

Schutzvorrichtung für maske

Info

Publication number
DE69727782D1
DE69727782D1 DE69727782T DE69727782T DE69727782D1 DE 69727782 D1 DE69727782 D1 DE 69727782D1 DE 69727782 T DE69727782 T DE 69727782T DE 69727782 T DE69727782 T DE 69727782T DE 69727782 D1 DE69727782 D1 DE 69727782D1
Authority
DE
Germany
Prior art keywords
mask
protective device
protective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69727782T
Other languages
English (en)
Other versions
DE69727782T2 (de
Inventor
Hiroaki Nakagawa
Masahiro Kondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
Original Assignee
Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Application granted granted Critical
Publication of DE69727782D1 publication Critical patent/DE69727782D1/de
Publication of DE69727782T2 publication Critical patent/DE69727782T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24777—Edge feature
    • Y10T428/24793—Comprising discontinuous or differential impregnation or bond
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24851—Intermediate layer is discontinuous or differential
    • Y10T428/24868—Translucent outer layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Adhesive Tapes (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
DE69727782T 1996-07-17 1997-07-08 Maskenschutzvorrichtung Expired - Fee Related DE69727782T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP18714596 1996-07-17
JP18714596 1996-07-17
PCT/JP1997/002368 WO1998002783A1 (fr) 1996-07-17 1997-07-08 Dispositif de protection de masque

Publications (2)

Publication Number Publication Date
DE69727782D1 true DE69727782D1 (de) 2004-04-01
DE69727782T2 DE69727782T2 (de) 2004-12-09

Family

ID=16200918

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69727782T Expired - Fee Related DE69727782T2 (de) 1996-07-17 1997-07-08 Maskenschutzvorrichtung

Country Status (9)

Country Link
US (1) US6083577A (de)
EP (1) EP0851294B1 (de)
JP (1) JP3606880B2 (de)
KR (1) KR19990045743A (de)
CA (1) CA2231175A1 (de)
DE (1) DE69727782T2 (de)
MY (1) MY120124A (de)
TW (1) TW369621B (de)
WO (1) WO1998002783A1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002182373A (ja) * 2000-12-18 2002-06-26 Shin Etsu Chem Co Ltd ペリクル及びその製造方法及びフォトマスク
US7008487B1 (en) 2002-03-04 2006-03-07 Micron Technology, Inc. Method and system for removal of contaminates from phaseshift photomasks
DE10246788B4 (de) * 2002-10-08 2007-08-30 Infineon Technologies Ag Schutzvorrichtung für Reflexionsmasken und Verfahren zur Verwendung einer geschützten Reflexionsmaske
JP2006504996A (ja) * 2002-10-29 2006-02-09 トッパン、フォウタマスクス、インク フォトマスク・アセンブリ、およびリソグラフィ工程中に生成される汚染物からそれを保護する方法
US7316869B2 (en) 2003-08-26 2008-01-08 Intel Corporation Mounting a pellicle to a frame
US7264853B2 (en) * 2003-08-26 2007-09-04 Intel Corporation Attaching a pellicle frame to a reticle
US20050202252A1 (en) * 2004-03-12 2005-09-15 Alexander Tregub Use of alternative polymer materials for "soft" polymer pellicles
US7314667B2 (en) * 2004-03-12 2008-01-01 Intel Corporation Process to optimize properties of polymer pellicles and resist for lithography applications
CN103196437B (zh) * 2006-03-15 2016-04-06 松下知识产权经营株式会社 角速度传感器及其制造方法
JP2016139103A (ja) * 2015-01-29 2016-08-04 日本軽金属株式会社 ペリクル用支持枠
TWI669565B (zh) * 2018-09-26 2019-08-21 美商微相科技股份有限公司 Photomask protection component structure
CN109814333A (zh) * 2019-01-25 2019-05-28 上海微择科技有限公司 一种高性能的防污染颗粒的光罩膜
TWI687760B (zh) * 2019-04-16 2020-03-11 家登精密工業股份有限公司 具有擾流結構的光罩盒

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2036367A (en) * 1978-10-17 1980-06-25 Censor Patent Versuch Masks for the Projection Exposure of Semiconductor Substrates
JPH0123137Y2 (de) * 1985-04-05 1989-07-17
JPH0772793B2 (ja) * 1986-09-05 1995-08-02 三井石油化学工業株式会社 ペリクル
JPH02250055A (ja) * 1988-12-09 1990-10-05 Seiko Epson Corp フォトマスク及び半導体装置の製造方法
JPH02302757A (ja) * 1989-05-17 1990-12-14 Fujitsu Ltd 冷却機能付ペリクル
DE69227092T2 (de) * 1991-05-17 1999-05-20 Du Pont Photomasks Inc Druckentlastende membranabdeckung
US5529819A (en) * 1995-04-17 1996-06-25 Inko Industrial Corporation Pellicle assembly with vent structure

Also Published As

Publication number Publication date
WO1998002783A1 (fr) 1998-01-22
EP0851294A1 (de) 1998-07-01
JP3606880B2 (ja) 2005-01-05
EP0851294B1 (de) 2004-02-25
CA2231175A1 (en) 1998-01-22
TW369621B (en) 1999-09-11
DE69727782T2 (de) 2004-12-09
EP0851294A4 (de) 2000-04-05
KR19990045743A (ko) 1999-06-25
MY120124A (en) 2005-09-30
US6083577A (en) 2000-07-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee