DE69711650D1 - Flüssige, härtbare harzzusammensetzung - Google Patents

Flüssige, härtbare harzzusammensetzung

Info

Publication number
DE69711650D1
DE69711650D1 DE69711650T DE69711650T DE69711650D1 DE 69711650 D1 DE69711650 D1 DE 69711650D1 DE 69711650 T DE69711650 T DE 69711650T DE 69711650 T DE69711650 T DE 69711650T DE 69711650 D1 DE69711650 D1 DE 69711650D1
Authority
DE
Germany
Prior art keywords
liquid
resin composition
hardenable resin
hardenable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69711650T
Other languages
English (en)
Other versions
DE69711650T2 (de
Inventor
Zen Komiya
Yoshikazu Yamaguchi
Tsuyoshi Watanabe
Takashi Ukachi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Japan Fine Coatings Co Ltd
DSM IP Assets BV
Original Assignee
JSR Corp
Japan Fine Coatings Co Ltd
DSM NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp, Japan Fine Coatings Co Ltd, DSM NV filed Critical JSR Corp
Application granted granted Critical
Publication of DE69711650D1 publication Critical patent/DE69711650D1/de
Publication of DE69711650T2 publication Critical patent/DE69711650T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
    • C03C25/10—Coating
    • C03C25/104—Coating to obtain optical fibres
    • C03C25/106—Single coatings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C08F265/06—Polymerisation of acrylate or methacrylate esters on to polymers thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D151/00—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C09D151/003—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2913—Rod, strand, filament or fiber
    • Y10T428/2933—Coated or with bond, impregnation or core
    • Y10T428/2938—Coating on discrete and individual rods, strands or filaments
DE69711650T 1996-09-02 1997-09-01 Flüssige, härtbare harzzusammensetzung Expired - Lifetime DE69711650T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP23196796A JP3825506B2 (ja) 1996-09-02 1996-09-02 液状硬化性樹脂組成物
PCT/NL1997/000498 WO1998010002A1 (en) 1996-09-02 1997-09-01 Liquid curable resin composition

Publications (2)

Publication Number Publication Date
DE69711650D1 true DE69711650D1 (de) 2002-05-08
DE69711650T2 DE69711650T2 (de) 2002-11-28

Family

ID=16931865

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69711650T Expired - Lifetime DE69711650T2 (de) 1996-09-02 1997-09-01 Flüssige, härtbare harzzusammensetzung

Country Status (7)

Country Link
US (1) US6319603B1 (de)
EP (1) EP0927209B1 (de)
JP (1) JP3825506B2 (de)
CN (1) CN1221582C (de)
AU (1) AU4138697A (de)
DE (1) DE69711650T2 (de)
WO (1) WO1998010002A1 (de)

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US6162842A (en) * 1999-05-18 2000-12-19 The Goodyear Tire & Rubber Company Radiation curable coating composition
US6334016B1 (en) * 1999-06-30 2001-12-25 Alcatel Optical fiber ribbon matrix material having optimal handling characteristics
US20020099110A1 (en) * 1999-12-30 2002-07-25 Tyson Norlin Radiation-curable coating composition
AU7466201A (en) * 2000-06-09 2001-12-17 Dsm N.V. Resin composition and three-dimensional object
AU2001296428A1 (en) * 2000-09-27 2002-04-08 The Regents Of The University Of California Dynamic mask projection stereo micro lithography
US6584257B1 (en) * 2000-12-27 2003-06-24 Corning Cable Systems, Llc Fiber optic assembly and method of making same
US6949297B2 (en) * 2001-11-02 2005-09-27 3M Innovative Properties Company Hybrid adhesives, articles, and methods
US6689463B2 (en) * 2001-12-18 2004-02-10 Corning Incorporated Secondary coating composition for optical fibers
US7105583B2 (en) * 2001-12-20 2006-09-12 Ppg Industries Ohio, Inc. Radiation-curable compositions for optical fiber coating materials
US7362407B2 (en) * 2002-02-01 2008-04-22 Lg.Philips Lcd Co., Ltd. Method of fabricating liquid crystal display device
KR100954044B1 (ko) * 2002-05-14 2010-04-20 제이에스알 가부시끼가이샤 수지 조성물 및 보호막
US6850681B2 (en) * 2002-08-22 2005-02-01 Addison Clear Wave, Llc Radiation-curable flame retardant optical fiber coatings
GB0304011D0 (en) * 2003-02-21 2003-03-26 Microsharp Corp Ltd High refractive index material
US7927703B2 (en) 2003-04-11 2011-04-19 3M Innovative Properties Company Adhesive blends, articles, and methods
JP3873931B2 (ja) * 2003-05-30 2007-01-31 ソニーケミカル＆インフォメーションデバイス株式会社 吸液性シート及び非水電解液電池パック
JP2005053936A (ja) * 2003-06-13 2005-03-03 Jsr Corp 光硬化性液状樹脂組成物
JP4620380B2 (ja) * 2004-05-26 2011-01-26 Ｊｓｒ株式会社 光学的立体造形用放射線硬化性液状樹脂組成物及びそれを光硬化させて得られる光造形物
KR100642446B1 (ko) * 2004-10-15 2006-11-02 제일모직주식회사 열경화성 일액형 컬러필터용 보호막 조성물 및 이를이용한 컬러필터
JP4243296B2 (ja) * 2004-10-25 2009-03-25 ナガセケムテックス株式会社 充填剤組成物及びそれを使用した内部に空孔を有する光ファイバーの製造方法
KR100544824B1 (ko) * 2005-01-27 2006-01-24 주식회사 코오롱 프리즘층 형성용 조성물 및 이로부터 제조된 프리즘 필름
JP2006257190A (ja) * 2005-03-16 2006-09-28 Nippon Kayaku Co Ltd 光硬化性樹脂組成物
WO2008144703A2 (en) * 2007-05-21 2008-11-27 Avery Dennison Corporation Pressure sensitive adhesives made from renewable resources and related methods
DE102009003225A1 (de) * 2009-05-19 2010-11-25 Evonik Degussa Gmbh Transparente, witterungsbeständige Barrierefolie, Herstellung durch Lamination, Extrusionslamination oder Extrusionsbeschichtung
JP4561936B1 (ja) * 2009-09-04 2010-10-13 東洋インキ製造株式会社 偏光板及び偏光板形成用光硬化性接着剤
JP2011100718A (ja) * 2009-10-05 2011-05-19 Yazaki Corp コネクタ
WO2012073633A1 (ja) * 2010-11-30 2012-06-07 Dic株式会社 カチオン重合性樹脂組成物、それを用いて得られる光学用材料、積層体
JP6061449B2 (ja) * 2011-03-31 2017-01-18 太陽インキ製造株式会社 光硬化性熱硬化性樹脂組成物、そのドライフィルム及び硬化物並びにそれらを用いたプリント配線板
CN104039913B (zh) * 2011-11-02 2017-08-22 汉高知识产权控股有限责任公司 用于电子部件的粘合剂
US9453151B2 (en) 2012-04-09 2016-09-27 Avery Dennison Corporation Pressure sensitive adhesives based on renewable resources, UV curing and related methods
US9505655B2 (en) * 2013-05-17 2016-11-29 Corning Incorporated Optical fiber coating compositions with non-curable reinforcing agents
CN103588926B (zh) * 2013-11-13 2016-06-22 烟台德邦科技有限公司 一种可阳离子光固化的丙烯酸树脂及其制备方法
KR101719883B1 (ko) * 2013-12-25 2017-03-24 도아고세이가부시키가이샤 광 경화성 접착제 조성물, 편광판과 그 제조법, 광학 부재 및 액정 표시 장치
US9891379B2 (en) 2014-11-14 2018-02-13 Corning Incorporated Optical fiber coating compositions with acrylic polymers
JP2017061597A (ja) * 2015-09-24 2017-03-30 横浜ゴム株式会社 光通信用接着剤組成物
JP6699145B2 (ja) * 2015-11-30 2020-05-27 味の素株式会社 光および熱硬化性樹脂組成物
DE102016207550A1 (de) * 2016-05-02 2017-11-02 Tesa Se Funktionalisierte (Co)Polymere für Klebesysteme und Klebebänder
DE102016207540A1 (de) 2016-05-02 2017-11-02 Tesa Se Wasserdampfsperrende Klebemasse mit hochfunktionalisiertem Poly(meth)acrylat
DE102016207548A1 (de) 2016-05-02 2017-11-02 Tesa Se Härtbare Klebemasse und darauf basierende Reaktivklebebänder
EP3252088B1 (de) * 2016-05-31 2018-07-04 Henkel AG & Co. KGaA Durch mitteldruck-quecksilberglühlampen uv-gehärteter, kationischer druckempfindlicher haftkleber

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US4090936A (en) * 1976-10-28 1978-05-23 Minnesota Mining And Manufacturing Company Photohardenable compositions
US4156035A (en) * 1978-05-09 1979-05-22 W. R. Grace & Co. Photocurable epoxy-acrylate compositions
US4717605A (en) * 1984-05-16 1988-01-05 Merck Patent Gesellschaft Mit Beschrankter Haftung Radiation curable adhesives
DE3621477A1 (de) * 1985-06-26 1987-01-08 Canon Kk Durch strahlen mit wirksamer energie haertbare harzmischung
US5026794A (en) * 1989-05-23 1991-06-25 Polysar Limited Adducts of an hydroxy-free acrylate resin and an epoxy resin
WO1991003499A1 (en) * 1989-09-06 1991-03-21 Desoto, Inc. Primary coatings for optical glass fibers including polyether acrylates
US5336563A (en) 1989-09-06 1994-08-09 Dsm Desotech, Inc. Primary coatings for optical glass fibers including polyether acrylates
US5399604A (en) * 1992-07-24 1995-03-21 Japan Synthetic Rubber Co., Ltd. Epoxy group-containing resin compositions
TW269017B (de) 1992-12-21 1996-01-21 Ciba Geigy Ag
US5891930A (en) * 1995-08-17 1999-04-06 Dsm N.V. High temperature coating composition for glass optical fibers, a method of making a coating composition and a coated optical glass fiber

Also Published As

Publication number Publication date
EP0927209A1 (de) 1999-07-07
WO1998010002A1 (en) 1998-03-12
CN1235615A (zh) 1999-11-17
JPH1077331A (ja) 1998-03-24
EP0927209B1 (de) 2002-04-03
DE69711650T2 (de) 2002-11-28
AU4138697A (en) 1998-03-26
CN1221582C (zh) 2005-10-05
US6319603B1 (en) 2001-11-20
JP3825506B2 (ja) 2006-09-27

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: DSM IP ASSETS B.V., HEERLEN, NL

Owner name: JSR CORP., TOKIO/TOKYO, JP

Owner name: JAPAN FINE COATINGS CO., LTD., TOKIO/TOKYO, JP