DE69702570T2 - Vorrichtung zur Dotierung eines Kieselsäurepulvers - Google Patents

Vorrichtung zur Dotierung eines Kieselsäurepulvers

Info

Publication number
DE69702570T2
DE69702570T2 DE69702570T DE69702570T DE69702570T2 DE 69702570 T2 DE69702570 T2 DE 69702570T2 DE 69702570 T DE69702570 T DE 69702570T DE 69702570 T DE69702570 T DE 69702570T DE 69702570 T2 DE69702570 T2 DE 69702570T2
Authority
DE
Germany
Prior art keywords
doping
silica powder
silica
powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69702570T
Other languages
English (en)
Other versions
DE69702570D1 (de
Inventor
Jean-Florent Campion
Bernard Jouvenel
Laurent Gasca
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel Lucent SAS
Original Assignee
Alcatel SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcatel SA filed Critical Alcatel SA
Publication of DE69702570D1 publication Critical patent/DE69702570D1/de
Application granted granted Critical
Publication of DE69702570T2 publication Critical patent/DE69702570T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/50Solid solutions
    • C01P2002/52Solid solutions containing elements as dopants
    • C01P2002/54Solid solutions containing elements as dopants one element only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Silicon Compounds (AREA)
DE69702570T 1996-05-21 1997-05-15 Vorrichtung zur Dotierung eines Kieselsäurepulvers Expired - Lifetime DE69702570T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9606272A FR2749005B1 (fr) 1996-05-21 1996-05-21 Dispositif de dopage d'une poudre de silice

Publications (2)

Publication Number Publication Date
DE69702570D1 DE69702570D1 (de) 2000-08-24
DE69702570T2 true DE69702570T2 (de) 2001-04-19

Family

ID=9492303

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69702570T Expired - Lifetime DE69702570T2 (de) 1996-05-21 1997-05-15 Vorrichtung zur Dotierung eines Kieselsäurepulvers

Country Status (6)

Country Link
US (1) US6007786A (de)
EP (1) EP0808799B1 (de)
JP (1) JP4101324B2 (de)
CA (1) CA2207122A1 (de)
DE (1) DE69702570T2 (de)
FR (1) FR2749005B1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7797966B2 (en) * 2000-12-29 2010-09-21 Single Crystal Technologies, Inc. Hot substrate deposition of fused silica
US20020083740A1 (en) * 2000-12-29 2002-07-04 Pandelisev Kiril A. Process and apparatus for production of silica grain having desired properties and their fiber optic and semiconductor application
US20020083739A1 (en) * 2000-12-29 2002-07-04 Pandelisev Kiril A. Hot substrate deposition fiber optic preforms and preform components process and apparatus
US20020173416A1 (en) * 2001-04-06 2002-11-21 Ellison Adam J. Dispersal of optically active ions in glass
FR2825357B1 (fr) * 2001-05-31 2004-04-30 Cit Alcatel Procede de dopage de la silice par du fluor
US20030027055A1 (en) * 2001-08-01 2003-02-06 Ball Laura J. Method and feedstock for making photomask material
US20030027054A1 (en) * 2001-08-01 2003-02-06 Ball Laura J. Method for making photomask material by plasma induction
US7052541B2 (en) 2002-06-19 2006-05-30 Board Of Regents, The University Of Texas System Color compositions
US20040187525A1 (en) * 2003-03-31 2004-09-30 Coffey Calvin T. Method and apparatus for making soot
US7793612B2 (en) * 2003-08-01 2010-09-14 Silica Tech, Llc Ring plasma jet method and apparatus for making an optical fiber preform
US7425235B2 (en) 2005-02-11 2008-09-16 The Board Of Regents Of The University Of Texas System Color compositions and methods of manufacture

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62182127A (ja) * 1986-02-05 1987-08-10 Nippon Telegr & Teleph Corp <Ntt> 石英系光フアイバ用母材の製造方法
IT1219404B (it) * 1988-06-27 1990-05-11 Sip Procedimento e apparecchiatura per la fabbricazione di fibre ottiche in silice
FR2693451B1 (fr) * 1992-07-07 1994-08-19 Alcatel Nv Procédé de fabrication d'une poudre de silice et application d'une telle poudre à la réalisation d'une préforme pour fibre optique.

Also Published As

Publication number Publication date
JPH1087313A (ja) 1998-04-07
DE69702570D1 (de) 2000-08-24
CA2207122A1 (fr) 1997-11-21
US6007786A (en) 1999-12-28
FR2749005A1 (fr) 1997-11-28
EP0808799B1 (de) 2000-07-19
JP4101324B2 (ja) 2008-06-18
FR2749005B1 (fr) 1998-07-10
EP0808799A1 (de) 1997-11-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: ALCATEL LUCENT, PARIS, FR