DE69637690D1 - Verfahren zum Herstellen abgeschiedener Filme und Vorrichtung zum Herstellen abgeschiedener Filme - Google Patents

Verfahren zum Herstellen abgeschiedener Filme und Vorrichtung zum Herstellen abgeschiedener Filme

Info

Publication number
DE69637690D1
DE69637690D1 DE69637690T DE69637690T DE69637690D1 DE 69637690 D1 DE69637690 D1 DE 69637690D1 DE 69637690 T DE69637690 T DE 69637690T DE 69637690 T DE69637690 T DE 69637690T DE 69637690 D1 DE69637690 D1 DE 69637690D1
Authority
DE
Germany
Prior art keywords
deposited films
producing deposited
producing
films
deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69637690T
Other languages
English (en)
Inventor
Koichiro Moriyama
Hiroshi Echizen
Masahiro Kanai
Hirokazu Ohtoshi
Takehito Yoshino
Atsushi Yasuno
Kohei Yoshida
Yusuke Miyamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69637690D1 publication Critical patent/DE69637690D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)
DE69637690T 1995-12-22 1996-12-20 Verfahren zum Herstellen abgeschiedener Filme und Vorrichtung zum Herstellen abgeschiedener Filme Expired - Lifetime DE69637690D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35035995A JP3332700B2 (ja) 1995-12-22 1995-12-22 堆積膜形成方法及び堆積膜形成装置

Publications (1)

Publication Number Publication Date
DE69637690D1 true DE69637690D1 (de) 2008-11-06

Family

ID=18409961

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69637690T Expired - Lifetime DE69637690D1 (de) 1995-12-22 1996-12-20 Verfahren zum Herstellen abgeschiedener Filme und Vorrichtung zum Herstellen abgeschiedener Filme

Country Status (6)

Country Link
US (1) US6350489B1 (de)
EP (1) EP0782176B1 (de)
JP (1) JP3332700B2 (de)
KR (1) KR100269936B1 (de)
CN (1) CN1124365C (de)
DE (1) DE69637690D1 (de)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3870014B2 (ja) 1999-07-26 2007-01-17 キヤノン株式会社 真空処理装置および真空処理方法
JP2001288572A (ja) * 2000-01-31 2001-10-19 Canon Inc 堆積膜形成装置および堆積膜形成方法
JP4841023B2 (ja) * 2000-02-10 2011-12-21 株式会社半導体エネルギー研究所 成膜装置及び太陽電池の作製方法
US6667240B2 (en) 2000-03-09 2003-12-23 Canon Kabushiki Kaisha Method and apparatus for forming deposited film
JP2002020863A (ja) 2000-05-01 2002-01-23 Canon Inc 堆積膜の形成方法及び形成装置、及び基板処理方法
US6434514B1 (en) * 2000-10-13 2002-08-13 Sbc Technology Resources, Inc. Rule based capacity management system for an inter office facility
JP4651072B2 (ja) 2001-05-31 2011-03-16 キヤノン株式会社 堆積膜形成方法、および堆積膜形成装置
JP4560245B2 (ja) * 2001-06-29 2010-10-13 キヤノン株式会社 光起電力素子
JP2004043910A (ja) * 2002-07-12 2004-02-12 Canon Inc 堆積膜形成方法および形成装置
US7169323B2 (en) 2002-11-08 2007-01-30 3M Innovative Properties Company Fluorinated surfactants for buffered acid etch solutions
JP2006045593A (ja) * 2004-08-02 2006-02-16 Fuji Electric Holdings Co Ltd 基板処理装置および基板処理方法
US7666766B2 (en) * 2005-09-27 2010-02-23 Semiconductor Energy Laboratory Co., Ltd. Film formation apparatus, method for forming film, and method for manufacturing photoelectric conversion device
US8323735B2 (en) 2006-10-13 2012-12-04 Solopower, Inc. Method and apparatus to form solar cell absorber layers with planar surface
US9103033B2 (en) * 2006-10-13 2015-08-11 Solopower Systems, Inc. Reel-to-reel reaction of precursor film to form solar cell absorber
WO2008085604A2 (en) * 2006-11-10 2008-07-17 Solopower, Inc. Reel-to-reel reaction of precursor film to form solar cell absorber
US20100300352A1 (en) * 2007-10-17 2010-12-02 Yann Roussillon Solution deposition assembly
US8409418B2 (en) 2009-02-06 2013-04-02 Solopower, Inc. Enhanced plating chemistries and methods for preparation of group IBIIIAVIA thin film solar cell absorbers
WO2009111054A1 (en) * 2008-03-05 2009-09-11 Global Solar Energy, Inc. Solution containment during buffer layer deposition
WO2009111055A1 (en) * 2008-03-05 2009-09-11 Global Solar Energy, Inc. Feedback for buffer layer deposition
WO2009111052A1 (en) * 2008-03-05 2009-09-11 Global Solar Energy, Inc. Heating for buffer layer deposition
US8062922B2 (en) * 2008-03-05 2011-11-22 Global Solar Energy, Inc. Buffer layer deposition for thin-film solar cells
US9252318B2 (en) 2008-03-05 2016-02-02 Hanergy Hi-Tech Power (Hk) Limited Solution containment during buffer layer deposition
DE102008017492B4 (de) * 2008-04-04 2013-07-25 Von Ardenne Anlagentechnik Gmbh Verfahren zum Transport eines bandförmigen Substrats und Vakuumbeschichtungsanlage
DE102008029379A1 (de) * 2008-06-23 2009-08-13 Von Ardenne Anlagentechnik Gmbh Anordnung zum Beschichten bandförmiger Foliensubstrate
CN101614620A (zh) * 2008-06-27 2009-12-30 深圳富泰宏精密工业有限公司 电子装置及其周期性测试方法
JP5532506B2 (ja) * 2008-10-01 2014-06-25 日本電気硝子株式会社 ガラスロール
JP5532507B2 (ja) * 2008-10-01 2014-06-25 日本電気硝子株式会社 ガラスロール及びガラスロールの処理方法
JP5435267B2 (ja) * 2008-10-01 2014-03-05 日本電気硝子株式会社 ガラスロール、ガラスロールの製造装置、及びガラスロールの製造方法
JP5691148B2 (ja) 2008-10-01 2015-04-01 日本電気硝子株式会社 ガラスロール、ガラスロールの製造装置、及びガラスロールの製造方法
JP5238530B2 (ja) * 2009-01-28 2013-07-17 富士電機株式会社 薄膜製造装置
US20100291308A1 (en) * 2009-05-14 2010-11-18 Veeco Instruments Inc. Web Substrate Deposition System
US20100310766A1 (en) * 2009-06-07 2010-12-09 Veeco Compound Semiconductor, Inc. Roll-to-Roll Chemical Vapor Deposition System
US20100310769A1 (en) * 2009-06-07 2010-12-09 Veeco Compound Semiconductor, Inc. Continuous Feed Chemical Vapor Deposition System
JP5315228B2 (ja) * 2009-12-25 2013-10-16 株式会社半導体エネルギー研究所 成膜装置及び太陽電池の作製方法
DE102012111484A1 (de) * 2012-11-27 2014-05-28 Aixtron Se Vorrichtung und Verfahren zum Bearbeiten streifenförmiger Substrate
CN103469163A (zh) * 2013-09-22 2013-12-25 无锡启晖光电科技有限公司 一种真空镀膜机
CN106164330B (zh) * 2014-04-02 2021-01-26 应用材料公司 真空处理系统以及用于装配处理系统的方法
JP6717191B2 (ja) * 2014-04-18 2020-07-01 株式会社ニコン 成膜装置、基板処理装置、および、デバイス製造方法
KR20180083926A (ko) * 2015-11-20 2018-07-23 어플라이드 머티어리얼스, 인코포레이티드 진공 프로세싱 챔버 내에서 가요성 기판을 지지하기 위한 장치, 가요성 기판 상의 층 증착을 위해 구성된 프로세싱 장치, 및 코팅 드럼 상에 가요성 기판을 지지하기 위한 방법
JP6544249B2 (ja) * 2016-01-19 2019-07-17 住友金属鉱山株式会社 キャンロールと真空成膜装置および長尺体の成膜方法
JP6508080B2 (ja) * 2016-02-05 2019-05-08 住友金属鉱山株式会社 キャンロールと長尺体の処理装置および処理方法
KR102622868B1 (ko) 2016-11-28 2024-01-08 엘지디스플레이 주식회사 열충격이 방지된 롤투롤 제조장치

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1542299A (en) * 1976-03-23 1979-03-14 Warner Lambert Co Blade shields
US4485125A (en) 1982-03-19 1984-11-27 Energy Conversion Devices, Inc. Method for continuously producing tandem amorphous photovoltaic cells
US4440107A (en) 1982-07-12 1984-04-03 Energy Conversion Devices, Inc. Magnetic apparatus for reducing substrate warpage
US4724169A (en) * 1984-10-09 1988-02-09 Ovonic Synthetic Materials Company, Inc. Method of producing multilayer coatings on a substrate
JPS61159573A (ja) * 1985-01-07 1986-07-19 Hitachi Ltd 真空蒸着装置
US4968918A (en) 1987-07-06 1990-11-06 Kanebo, Ltd. Apparatus for plasma treatment
US4763601A (en) 1987-09-02 1988-08-16 Nippon Steel Corporation Continuous composite coating apparatus for coating strip
JPH0621358B2 (ja) 1988-07-15 1994-03-23 川崎製鉄株式会社 長尺基板均一加熱装置
DE69030140T2 (de) 1989-06-28 1997-09-04 Canon Kk Verfahren und Anordnung zur kontinuierlichen Bildung einer durch Mikrowellen-Plasma-CVD niedergeschlagenen grossflächigen Dünnschicht
JPH0444335A (ja) 1990-06-12 1992-02-14 Seiko Epson Corp 半導体装置の製造方法
JP2714247B2 (ja) * 1990-10-29 1998-02-16 キヤノン株式会社 マイクロ波プラズマｃｖｄ法による大面積の機能性堆積膜を連続的に形成する方法及び装置
JPH06280026A (ja) 1993-03-24 1994-10-04 Semiconductor Energy Lab Co Ltd 成膜装置及び成膜方法
JP3659512B2 (ja) 1993-12-20 2005-06-15 キヤノン株式会社 光起電力素子及びその形成方法及びその形成装置
JP3571785B2 (ja) 1993-12-28 2004-09-29 キヤノン株式会社 堆積膜形成方法及び堆積膜形成装置

Also Published As

Publication number Publication date
JP3332700B2 (ja) 2002-10-07
KR100269936B1 (ko) 2000-10-16
JPH09181005A (ja) 1997-07-11
EP0782176A3 (de) 2000-01-12
KR970052053A (ko) 1997-07-29
US6350489B1 (en) 2002-02-26
CN1158912A (zh) 1997-09-10
EP0782176B1 (de) 2008-09-24
CN1124365C (zh) 2003-10-15
EP0782176A2 (de) 1997-07-02

Similar Documents

Publication Publication Date Title
DE69637690D1 (de) Verfahren zum Herstellen abgeschiedener Filme und Vorrichtung zum Herstellen abgeschiedener Filme
DE69434949D1 (de) Verfahren und Vorrichtung zur Bildung eines abgeschiedenen Films
DE69623424D1 (de) Verfahren und Vorrichtung zum Stranggiessen mittels Doppelwalzen
DE59602684D1 (de) Vorrichtung und Verfahren zum Herstellen eines dreidimensionalen Objektes
DE59600002D1 (de) Vorrichtung und Verfahren zum Herstellen eines dreidimensionalen Objektes
ATE248052T1 (de) Extrusionsbeschichtungsverfahren zum herstellen von schützenden und dekorativen folien
DE69728835D1 (de) Verfahren und Vorrichtung zum Herstellen eines Farbfilters
DE69630589D1 (de) Verfahren und vorrichtung zur plasmaerzeugung
DE59501852D1 (de) Verfahren und vorrichtung zum herstellen dreidimensionaler objekte
ATE185513T1 (de) Vorgestreckte folie, vorrichtung und verfahren zur umverpackung
DE69531000D1 (de) Verfahren und vorrichtung zum herstellen einer kontinuierlichen stoffbahn
DE69939995D1 (de) Verfahren zum Bilden von Mustern und Vorrichtung zum Herstellen von Substraten
DE69415715D1 (de) Verfahren und Vorrichtung zum Herstellen von Isolatoren
DE69519179D1 (de) Apparat und verfahren zum kühlen eines produktes
DE19681378T1 (de) Verfahren und Vorrichtung zum Gravieren
DE69410572D1 (de) Verfahren und Apparat zum Vakuumkneten und Extrudieren
DE69119989D1 (de) CVD-Anlage und Verfahren zum Herstellen geglühter Filme
DE69613039D1 (de) Verfahren zum Formen mehrschichtiger Gegenstände und Vorrichtung dafür
DE69605465D1 (de) Verfahren und Vorrichtung zum Etikettieren
DE69829326D1 (de) Vorrichtung und Verfahren zum Kalibrieren eines Fotobehandlungssystems
DE69323635D1 (de) Verfahren und vorrichtung zum herstellen einer streckfolie
ATE204529T1 (de) Verfahren und vorrichtung zum herstellen von kunststoffschaum
DE69418177D1 (de) Verfahren und Vorrichtung zum Herstellen von Dünnfilmen
DE59506572D1 (de) Vorrichtung und Verfahren zum Herstellen von Rohren
DE69606966D1 (de) Verfahren und Vorrichtung zur Herstellung eines Einkristalles

Legal Events

Date Code Title Description
8364 No opposition during term of opposition