DE69623007D1 - Wässrige, fotoempfindliche harzzusammensetzung - Google Patents

Wässrige, fotoempfindliche harzzusammensetzung

Info

Publication number
DE69623007D1
DE69623007D1 DE69623007T DE69623007T DE69623007D1 DE 69623007 D1 DE69623007 D1 DE 69623007D1 DE 69623007 T DE69623007 T DE 69623007T DE 69623007 T DE69623007 T DE 69623007T DE 69623007 D1 DE69623007 D1 DE 69623007D1
Authority
DE
Germany
Prior art keywords
photo
aqueous
resin composition
sensitive resin
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69623007T
Other languages
English (en)
Other versions
DE69623007T2 (de
Inventor
Hiroshi Samukawa
Yoshichi Hagiwara
Tsuyoshi Saigou
Scott Hallock
Frederick Becknell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Inc
Original Assignee
MacDermid Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MacDermid Inc filed Critical MacDermid Inc
Application granted granted Critical
Publication of DE69623007D1 publication Critical patent/DE69623007D1/de
Publication of DE69623007T2 publication Critical patent/DE69623007T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Manufacturing Of Printed Wiring (AREA)
DE69623007T 1995-03-31 1996-03-28 Wässrige, fotoempfindliche harzzusammensetzung Expired - Lifetime DE69623007T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP7586995 1995-03-31
JP19352895A JPH08328251A (ja) 1995-03-31 1995-07-28 水性感光性樹脂組成物
PCT/JP1996/000818 WO1996030451A1 (fr) 1995-03-31 1996-03-28 Composition de resine photosensible a base d'eau

Publications (2)

Publication Number Publication Date
DE69623007D1 true DE69623007D1 (de) 2002-09-19
DE69623007T2 DE69623007T2 (de) 2003-05-08

Family

ID=26417034

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69623007T Expired - Lifetime DE69623007T2 (de) 1995-03-31 1996-03-28 Wässrige, fotoempfindliche harzzusammensetzung

Country Status (5)

Country Link
EP (1) EP0823460B1 (de)
JP (1) JPH08328251A (de)
AU (1) AU5120996A (de)
DE (1) DE69623007T2 (de)
WO (1) WO1996030451A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3771705B2 (ja) 1998-03-12 2006-04-26 互応化学工業株式会社 感光性樹脂組成物及びプリント配線板製造用フォトレジストインク
JP5452942B2 (ja) * 2009-01-29 2014-03-26 東海染工株式会社 マーキング用インク
KR20140047662A (ko) * 2011-07-20 2014-04-22 가부시키가이샤 닛폰 쇼쿠바이 성형 재료
JP5990400B2 (ja) * 2012-04-09 2016-09-14 株式会社日本触媒 被膜形成用材料
CN109901361B (zh) * 2017-12-11 2022-12-16 固安鼎材科技有限公司 感光树脂组合物
WO2021182021A1 (ja) * 2020-03-10 2021-09-16 三菱ケミカル株式会社 活性エネルギー線硬化性樹脂組成物及びその硬化物

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3622334A (en) * 1969-12-31 1971-11-23 Du Pont Photopolymerizable compositions and elements containing heterocyclic nitrogen-containing compounds
JPH0642073B2 (ja) * 1984-04-10 1994-06-01 三菱レイヨン株式会社 光重合性樹脂組成物
US5236809A (en) * 1988-10-24 1993-08-17 Tokyo Ohka Kogyo Co., Ltd. Photopolymerizable resin composition employing (meth)acrylonitrile in the linear copolymer to impart additional flexibility of the composition
JP2527271B2 (ja) * 1990-10-16 1996-08-21 日立化成工業株式会社 ネガ型感光性電着塗料樹脂組成物及びこれを用いた電着塗装浴
AT397508B (de) * 1990-12-27 1994-04-25 Vianova Kunstharz Ag Wasserverdünnbare lackbindemittel auf der basis von acrylatcopolymerisaten und deren verwendung
JP3301156B2 (ja) * 1993-04-21 2002-07-15 住友化学工業株式会社 メタクリル系樹脂の製造方法
US5364737A (en) * 1994-01-25 1994-11-15 Morton International, Inc. Waterbone photoresists having associate thickeners

Also Published As

Publication number Publication date
JPH08328251A (ja) 1996-12-13
DE69623007T2 (de) 2003-05-08
WO1996030451A1 (fr) 1996-10-03
EP0823460A4 (de) 1999-06-16
AU5120996A (en) 1996-10-16
EP0823460A1 (de) 1998-02-11
EP0823460B1 (de) 2002-08-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: MEISSNER, BOLTE & PARTNER GBR, 80538 MUENCHEN