DE69621701D1 - Säurekatalysierte Positiv-Photoresists - Google Patents

Säurekatalysierte Positiv-Photoresists

Info

Publication number
DE69621701D1
DE69621701D1 DE69621701T DE69621701T DE69621701D1 DE 69621701 D1 DE69621701 D1 DE 69621701D1 DE 69621701 T DE69621701 T DE 69621701T DE 69621701 T DE69621701 T DE 69621701T DE 69621701 D1 DE69621701 D1 DE 69621701D1
Authority
DE
Germany
Prior art keywords
acid
positive photoresists
catalyzed positive
catalyzed
photoresists
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69621701T
Other languages
English (en)
Other versions
DE69621701T2 (de
Inventor
James W Thackeray
Roger F Sinta
Mark D Denison
Sheri L Ablaza
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Rohm and Haas Electronic Materials LLC
Original Assignee
Shipley Co Inc
Shipley Co LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Inc, Shipley Co LLC filed Critical Shipley Co Inc
Publication of DE69621701D1 publication Critical patent/DE69621701D1/de
Application granted granted Critical
Publication of DE69621701T2 publication Critical patent/DE69621701T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE1996621701 1995-05-09 1996-03-15 Säurekatalysierte Positiv-Photoresists Expired - Fee Related DE69621701T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US43817395A 1995-05-09 1995-05-09

Publications (2)

Publication Number Publication Date
DE69621701D1 true DE69621701D1 (de) 2002-07-18
DE69621701T2 DE69621701T2 (de) 2003-02-13

Family

ID=23739551

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1996621701 Expired - Fee Related DE69621701T2 (de) 1995-05-09 1996-03-15 Säurekatalysierte Positiv-Photoresists

Country Status (3)

Country Link
EP (1) EP0742490B1 (de)
JP (1) JP3759994B2 (de)
DE (1) DE69621701T2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9622657D0 (en) 1996-10-31 1997-01-08 Horsell Graphic Ind Ltd Direct positive lithographic plate
GB9722862D0 (en) 1997-10-29 1997-12-24 Horsell Graphic Ind Ltd Pattern formation
DE112004002240T5 (de) * 2003-11-21 2006-11-02 Sekisui Chemical Co., Ltd. Positiv arbeitender Photolack und Verfahren zur Erzeugung einer Struktur

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4985332A (en) * 1990-04-10 1991-01-15 E. I. Du Pont De Nemours And Company Resist material with carbazole diazonium salt acid generator and process for use
US5258257A (en) * 1991-09-23 1993-11-02 Shipley Company Inc. Radiation sensitive compositions comprising polymer having acid labile groups
KR0159808B1 (ko) * 1993-01-19 1999-02-18 가나가와 지히로 레지스트 조성물
EP0608983B1 (de) * 1993-01-25 1997-11-12 AT&T Corp. Ein Verfahren zum gesteuerten Entschützen von Polymeren und Verfahren zur Herstellung einer Vorrichtung welches diese zum Teil entschützten Polymere für Photoresiste benutzt
TW288112B (de) * 1993-06-02 1996-10-11 Sumitomo Chemical Co
DE69631709T2 (de) * 1995-03-16 2005-02-10 Shipley Co., L.L.C., Marlborough Strahlungsempfindliche Zusammensetzung, die ein Polymer mit Schutzgruppen enthält

Also Published As

Publication number Publication date
JP3759994B2 (ja) 2006-03-29
EP0742490B1 (de) 2002-06-12
DE69621701T2 (de) 2003-02-13
EP0742490A1 (de) 1996-11-13
JPH08314142A (ja) 1996-11-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee