DE69615753D1 - Lagerraum zum Lagern von reinen Gegenständen - Google Patents

Lagerraum zum Lagern von reinen Gegenständen

Info

Publication number
DE69615753D1
DE69615753D1 DE69615753T DE69615753T DE69615753D1 DE 69615753 D1 DE69615753 D1 DE 69615753D1 DE 69615753 T DE69615753 T DE 69615753T DE 69615753 T DE69615753 T DE 69615753T DE 69615753 D1 DE69615753 D1 DE 69615753D1
Authority
DE
Germany
Prior art keywords
storage room
storing pure
objects
pure objects
storing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69615753T
Other languages
English (en)
Other versions
DE69615753T2 (de
Inventor
Soichiro Sakata
Hideto Takahashi
Katsumi Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Takasago Thermal Engineering Co Ltd
Original Assignee
Takasago Thermal Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Takasago Thermal Engineering Co Ltd filed Critical Takasago Thermal Engineering Co Ltd
Application granted granted Critical
Publication of DE69615753D1 publication Critical patent/DE69615753D1/de
Publication of DE69615753T2 publication Critical patent/DE69615753T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24FAIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F3/00Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
    • F24F3/12Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
    • F24F3/16Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
    • F24F3/167Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24FAIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F8/00Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying
    • F24F8/10Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying by separation, e.g. by filtering
    • F24F8/15Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying by separation, e.g. by filtering by chemical means
    • F24F8/158Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying by separation, e.g. by filtering by chemical means using active carbon
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24FAIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F8/00Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying
    • F24F8/10Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying by separation, e.g. by filtering
    • F24F8/15Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying by separation, e.g. by filtering by chemical means
    • F24F8/167Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying by separation, e.g. by filtering by chemical means using catalytic reactions

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Combustion & Propulsion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Ventilation (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Storage Of Harvested Produce (AREA)
DE69615753T 1995-06-13 1996-06-13 Lagerraum zum Lagern von reinen Gegenständen Expired - Fee Related DE69615753T2 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP17137495 1995-06-13
JP17137495 1995-06-13
JP8757696 1996-03-14
JP8757696 1996-03-14
JP14076796 1996-05-10
JP14076796A JP3519212B2 (ja) 1995-06-13 1996-05-10 清浄な資材用保管庫

Publications (2)

Publication Number Publication Date
DE69615753D1 true DE69615753D1 (de) 2001-11-15
DE69615753T2 DE69615753T2 (de) 2004-06-17

Family

ID=27305546

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69615753T Expired - Fee Related DE69615753T2 (de) 1995-06-13 1996-06-13 Lagerraum zum Lagern von reinen Gegenständen

Country Status (6)

Country Link
US (1) US5798455A (de)
EP (1) EP0748990B1 (de)
JP (1) JP3519212B2 (de)
KR (1) KR100425006B1 (de)
DE (1) DE69615753T2 (de)
TW (1) TW325520B (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1140770A (ja) * 1997-07-18 1999-02-12 Nec Corp 半導体装置の製造方法および半導体製造装置
KR19990027844A (ko) * 1997-09-30 1999-04-15 윤종용 반도체장비의 공기유입장치 및 이를 이용한 화학물 오염 제거방법
US6345510B1 (en) * 2000-11-22 2002-02-12 Joackim Shiuan Air-conditioning system
US6503462B1 (en) * 2001-06-19 2003-01-07 Honeywell International Inc. Smart air cleaning system and method thereof
JP2004210421A (ja) * 2002-12-26 2004-07-29 Semiconductor Energy Lab Co Ltd 製造システム、並びに処理装置の操作方法
US20060130896A1 (en) * 2004-01-07 2006-06-22 Skibinski Gregory J High reliability gas mixture back-up system
US7722951B2 (en) * 2004-10-15 2010-05-25 Georgia Tech Research Corporation Insulator coating and method for forming same
US20090011222A1 (en) * 2006-03-27 2009-01-08 Georgia Tech Research Corporation Superhydrophobic surface and method for forming same
FR2932886B1 (fr) * 2008-06-18 2014-09-19 Electricite De France Procede et dispositif pour la detection et/ou la mesure d'encrassement dans des echangeurs
WO2016065366A1 (en) * 2014-10-24 2016-04-28 Brighton Technologies Llc Method and device for detecting substances on surfaces
CN104858193B (zh) * 2015-06-12 2017-05-03 深圳市华星光电技术有限公司 玻璃基板的紫外光清洗装置
CN106644833B (zh) * 2016-11-01 2019-03-29 东南大学 一种流化床多组分颗粒扩散特性的测量装置及测量方法
CN112714674B (zh) 2018-07-20 2022-12-09 布赖顿技术有限责任公司 用于从液体微滴分配系统收集的样本数据确定微滴的质量的方法和装置
CN113937036B (zh) * 2021-10-15 2022-05-31 安徽耐科装备科技股份有限公司 一种上料检测装置以及自动封装系统

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0756879B2 (ja) * 1988-03-31 1995-06-14 日鉄セミコンダクター株式会社 半導体の無塵化製造装置
JPH03291436A (ja) * 1990-04-05 1991-12-20 N M B Semiconductor:Kk 半導体製造工場のクリーンルーム
JPH0431740A (ja) * 1990-05-28 1992-02-03 Fujitsu Ltd 大気汚染物質有無検査方法
JP2982461B2 (ja) * 1992-01-21 1999-11-22 神鋼電機株式会社 クリーンルーム用保管庫
EP0552756A1 (de) * 1992-01-21 1993-07-28 Shinko Electric Co. Ltd. Artikel-Lager in Reinraum
JP3191392B2 (ja) * 1992-04-07 2001-07-23 神鋼電機株式会社 クリーンルーム用密閉式コンテナ
US6733570B2 (en) * 1992-12-02 2004-05-11 Ebara Research Co., Ltd. Method and apparatus for the preparation of clean gases
JP3078697B2 (ja) * 1994-02-07 2000-08-21 高砂熱学工業株式会社 クリーンルーム,クリーンルームの空気浄化方法および基板搬送システム

Also Published As

Publication number Publication date
EP0748990A1 (de) 1996-12-18
DE69615753T2 (de) 2004-06-17
KR100425006B1 (ko) 2004-06-30
TW325520B (en) 1998-01-21
US5798455A (en) 1998-08-25
JPH09303838A (ja) 1997-11-28
KR970003446A (ko) 1997-01-28
JP3519212B2 (ja) 2004-04-12
EP0748990B1 (de) 2001-10-10

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Legal Events

Date Code Title Description
8332 No legal effect for de
8370 Indication of lapse of patent is to be deleted
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee