DE69615360T2 - Stabilisatoren für lichtempfindliche säurespenderzusammensetzungen - Google Patents

Stabilisatoren für lichtempfindliche säurespenderzusammensetzungen

Info

Publication number
DE69615360T2
DE69615360T2 DE69615360T DE69615360T DE69615360T2 DE 69615360 T2 DE69615360 T2 DE 69615360T2 DE 69615360 T DE69615360 T DE 69615360T DE 69615360 T DE69615360 T DE 69615360T DE 69615360 T2 DE69615360 T2 DE 69615360T2
Authority
DE
Germany
Prior art keywords
stabilizers
light sensitive
sensitive acid
acid dispenser
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69615360T
Other languages
English (en)
Other versions
DE69615360D1 (de
Inventor
Alan Lawton
John Nebe
Anthony Thommes
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DSM IP Assets BV
Original Assignee
DSM NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DSM NV filed Critical DSM NV
Publication of DE69615360D1 publication Critical patent/DE69615360D1/de
Application granted granted Critical
Publication of DE69615360T2 publication Critical patent/DE69615360T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE69615360T 1995-06-07 1996-06-04 Stabilisatoren für lichtempfindliche säurespenderzusammensetzungen Expired - Lifetime DE69615360T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/488,468 US5665792A (en) 1995-06-07 1995-06-07 Stabilizers for use with photoacid precursor formulations
PCT/US1996/008486 WO1996041238A1 (en) 1995-06-07 1996-06-04 Stabilizers for use with photoacid precursor formulations

Publications (2)

Publication Number Publication Date
DE69615360D1 DE69615360D1 (de) 2001-10-25
DE69615360T2 true DE69615360T2 (de) 2002-07-04

Family

ID=23939787

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69615360T Expired - Lifetime DE69615360T2 (de) 1995-06-07 1996-06-04 Stabilisatoren für lichtempfindliche säurespenderzusammensetzungen

Country Status (5)

Country Link
US (1) US5665792A (de)
EP (1) EP0830640B1 (de)
JP (1) JP3844360B2 (de)
DE (1) DE69615360T2 (de)
WO (1) WO1996041238A1 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100491736B1 (ko) * 1996-07-29 2005-09-09 반티코 아게 입체리토그래피용방사선-경화성액체조성물
EP0998696A2 (de) 1997-07-21 2000-05-10 Ciba SC Holding AG Viskositätsstabilisierung von strahlungshärtbaren zusammensetzungen
US20030149124A1 (en) * 2001-11-27 2003-08-07 Thommes Glen A. Radiation curable resin composition for making colored three dimensional objects
US6858378B1 (en) * 2002-04-17 2005-02-22 Sandia National Laboratories Photoimageable composition
AU2003224516A1 (en) 2002-05-03 2003-11-17 Dsm Ip Assets B.V. Radiation curable resin composition and rapid prototyping process using the same
GB0212977D0 (en) * 2002-06-06 2002-07-17 Vantico Ag Actinic radiation curable compositions and their use
US20040077745A1 (en) * 2002-10-18 2004-04-22 Jigeng Xu Curable compositions and rapid prototyping process using the same
JP4757574B2 (ja) * 2005-09-07 2011-08-24 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版
JP5300190B2 (ja) * 2005-10-13 2013-09-25 株式会社トクヤマ 光カチオン硬化性組成物
EP1979088A2 (de) * 2005-12-29 2008-10-15 Affymetrix, Inc. Verwendung von säurefängern für die synthese von arrays von standardlänge aufweisenden und langmerigen nucleinsäuren
WO2010104603A2 (en) 2009-03-13 2010-09-16 Dsm Ip Assets B.V Radiation curable resin composition and rapid three-dimensional imaging process using the same
US20120259031A1 (en) 2009-12-17 2012-10-11 Dsm Ip Assets, B.V. Led curable liquid resin compositions for additive fabrication
JP5866686B2 (ja) 2010-01-22 2016-02-17 ディーエスエム アイピー アセッツ ビー．ブイ． 選択的視覚効果を有して層状に硬化可能な液状放射線硬化性樹脂およびその使用方法
EP2502728B1 (de) 2011-03-23 2017-01-04 DSM IP Assets B.V. Leichte und hochfeste, mittels Additivherstellungsverfahren erzeugbare dreidimensionale Artikel
EP2842980B1 (de) 2013-08-09 2021-05-05 DSM IP Assets B.V. Niedrigviskose flüssige strahlungshärtbare harzzusammensetzungen für zahnregulierungsform zur herstellung von zusatzstoffen
EP3266815B1 (de) 2013-11-05 2021-11-03 Covestro (Netherlands) B.V. Stabilisierte matrixgefüllte flüssige strahlungshärtbare harzzusammensetzungen zur generativen fertigung
KR20180016505A (ko) 2015-06-08 2018-02-14 디에스엠 아이피 어셋츠 비.브이. 부가적 제조용 액체 하이브리드 자외선/가시광선 복사선-경화성 수지 조성물
JP6880416B2 (ja) 2015-10-01 2021-06-02 ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． 付加造形用液状ハイブリッドＵＶ／ｖｉｓ線硬化性樹脂組成物
CN108472834B (zh) 2015-11-17 2021-05-25 帝斯曼知识产权资产管理有限公司 用于加成法制造的经改进的不含锑的可辐射固化组合物及其在熔模铸造工艺中的应用
US10737984B2 (en) * 2016-11-30 2020-08-11 Hrl Laboratories, Llc Formulations and methods for 3D printing of ceramic matrix composites
WO2018119049A1 (en) 2016-12-20 2018-06-28 Basf Se Photopolymer ceramic dispersion for additive fabrication
WO2018119067A1 (en) 2016-12-20 2018-06-28 Basf Se Photopolymer ceramic dispersion
TW201840964A (zh) 2016-12-20 2018-11-16 德商巴地斯顏料化工廠 測定陶瓷分散液中沉積物含量之方法
WO2019117723A1 (en) 2017-12-15 2019-06-20 Dsm Ip Assets B.V. Compositions and methods for high-temperature jetting of viscous thermosets to create solid articles via additive fabrication
JP7251715B2 (ja) 2017-12-29 2023-04-04 コベストロ （ネザーランズ） ビー．ブイ． 付加造形用組成物及び物品並びにそれらの使用方法
EP4095603A1 (de) 2018-04-20 2022-11-30 Covestro (Netherlands) B.V. Methode zur herstellung eines drei-dimensionalen teils durch ein additive-herstellungsverfahren
US11590706B2 (en) 2018-05-03 2023-02-28 Covestro (Netherlands) B.V. Methods of post-processing photofabricated articles created via additive fabrication
CN114341732A (zh) 2019-08-30 2022-04-12 科思创(荷兰)有限公司 用于增材制造的液体混合紫外/可见光辐射可固化树脂组合物

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3721616A (en) * 1971-05-18 1973-03-20 American Can Co Photopolymerizable epoxy systems containing nitrile gelation inhibitors
US3721617A (en) * 1971-05-18 1973-03-20 American Can Co Photopolymerizable epoxy systems containing cyclic amide gelation inhibitors
US5019488A (en) * 1988-09-29 1991-05-28 Hoechst Celanese Corporation Method of producing an image reversal negative photoresist having a photo-labile blocked imide
JPH0539444A (ja) * 1990-11-30 1993-02-19 Hitachi Chem Co Ltd ポジ型感光性アニオン電着塗料樹脂組成物、これを用いた電着塗装浴、電着塗装法及びプリント回路板の製造方法
DE69226686T2 (de) * 1991-10-02 1999-04-15 Spectra Group Ltd Inc Herstellung dreidimensionaler Objekte
US5384229A (en) * 1992-05-07 1995-01-24 Shipley Company Inc. Photoimageable compositions for electrodeposition
CA2115333A1 (en) * 1993-02-16 1994-08-17 Shigeo Hozumi Polyfunctional vinyl ether compounds and photoresist resin composition containing the same

Also Published As

Publication number Publication date
JPH11506842A (ja) 1999-06-15
DE69615360D1 (de) 2001-10-25
JP3844360B2 (ja) 2006-11-08
EP0830640A1 (de) 1998-03-25
WO1996041238A1 (en) 1996-12-19
US5665792A (en) 1997-09-09
EP0830640B1 (de) 2001-09-19

Similar Documents

Publication Publication Date Title
DE69615360D1 (de) Stabilisatoren für lichtempfindliche säurespenderzusammensetzungen
ATE257705T1 (de) Stabiler antihistaminsirup enthaltend aminopolycarbonsäuren als stabilisatoren
IT1276979B1 (it) Composizioni fluoroelastomeriche
ATE211131T1 (de) Arylsulfonylaminohydroxamsäurederivate
BR9607635A (pt) Composição detergente
BR9609779A (pt) Composições detergentes
BR9608126A (pt) Composição detergente
DE69609242D1 (de) Fotopolymerisierbare Zusammensetzungen
ATE387188T1 (de) Trockene zusamensetzungen mit hydrophoben stabilisatoren
DE69606053T2 (de) Modifizierte fluorsulfonsäure
DE69625730D1 (de) Endermatische Salbe
BR9609585A (pt) Composições detergentes
DE69626898D1 (de) Strahlungsempfindliche Zusammensetzung
FI951011A0 (fi) Anordning i ett luftkonditioneringsaggregat
BR9609584A (pt) Composições detergentes
DE69608572D1 (de) Waschmittelzusammensetzung
DE69626081D1 (de) Antistatisches Hilfsmittel für Polymerzusammensetzungen
FI950897A0 (fi) Maetanordning foer maetning av reologiska egenskaper i ett aemne
BR9608972A (pt) Composições detergentes
DE69401198T2 (de) Zusammensetzungen für halogenidglas
DE69637853D1 (de) Fettalkyldiethanolamine als stabilisatoren für die optische klarheit
DE69609346T2 (de) Waschmittelzusammensetzung
DE69617170T2 (de) Waschmittelzusammensetzungen
BR9609630A (pt) Composições detergentes
FI2201U1 (fi) Anordning foer reglering av vaetskeytan i ett vattenlaos

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: DSM IP ASSETS B.V., HEERLEN, NL