DE69613462D1 - Einkapselungsharz, verfahren und apparat - Google Patents

Einkapselungsharz, verfahren und apparat

Info

Publication number
DE69613462D1
DE69613462D1 DE69613462T DE69613462T DE69613462D1 DE 69613462 D1 DE69613462 D1 DE 69613462D1 DE 69613462 T DE69613462 T DE 69613462T DE 69613462 T DE69613462 T DE 69613462T DE 69613462 D1 DE69613462 D1 DE 69613462D1
Authority
DE
Germany
Prior art keywords
radiation
formulation
initialing
photopolymerization
ultraviolet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69613462T
Other languages
English (en)
Inventor
G Bachmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dymax Corp
Original Assignee
Dymax Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dymax Corp filed Critical Dymax Corp
Application granted granted Critical
Publication of DE69613462D1 publication Critical patent/DE69613462D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122Incoherent waves
    • B01J19/123Ultra-violet light
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122Incoherent waves
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/913Numerically specified distinct wavelength
DE69613462T 1995-03-20 1996-02-07 Einkapselungsharz, verfahren und apparat Expired - Lifetime DE69613462D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US40650695A 1995-03-20 1995-03-20
PCT/US1996/001678 WO1996029352A1 (en) 1995-03-20 1996-02-07 Encapsulation formulation, method, and apparatus

Publications (1)

Publication Number Publication Date
DE69613462D1 true DE69613462D1 (de) 2001-07-26

Family

ID=23608275

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69613462T Expired - Lifetime DE69613462D1 (de) 1995-03-20 1996-02-07 Einkapselungsharz, verfahren und apparat

Country Status (10)

Country Link
US (2) US5677362A (de)
EP (1) EP0815146B1 (de)
JP (1) JPH10510578A (de)
KR (1) KR19980703112A (de)
AT (1) ATE202364T1 (de)
AU (1) AU4974196A (de)
BR (1) BR9607693A (de)
CA (1) CA2215597C (de)
DE (1) DE69613462D1 (de)
WO (1) WO1996029352A1 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6099783A (en) * 1995-06-06 2000-08-08 Board Of Trustees Operating Michigan State University Photopolymerizable compositions for encapsulating microelectronic devices
JPH09171953A (ja) * 1995-12-20 1997-06-30 Sony Corp 基板加熱装置、基板加熱方法および半導体集積回路装置、フォトマスクならびに液晶表示装置
US5980637A (en) * 1996-12-20 1999-11-09 Steag Rtp Systems, Inc. System for depositing a material on a substrate using light energy
US6075065A (en) * 1996-12-20 2000-06-13 Takeda Chemical Industries, Ltd. Photocurable resin composition and a method for producing the same
US6218446B1 (en) 1999-01-11 2001-04-17 Dymax Corporation Radiation curable formulation for producing electrically conductive resinous material, method of use, and article produced
US6174651B1 (en) 1999-01-14 2001-01-16 Steag Rtp Systems, Inc. Method for depositing atomized materials onto a substrate utilizing light exposure for heating
FR2793069B1 (fr) * 1999-04-28 2003-02-14 Gemplus Card Int Procede de fabrication de dispositif electronique portable a circuit integre protege par resine photosensible
US6461689B1 (en) 2000-08-31 2002-10-08 Domco Tarkett Inc. Method of controlling specular gloss characteristics
US6551863B2 (en) 2001-08-30 2003-04-22 Micron Technology, Inc. Flip chip dip coating encapsulant
US6632147B2 (en) 2001-10-09 2003-10-14 Acushnet Company Golf ball with vapor barrier layer and method of making same
US20060128505A1 (en) * 2001-10-09 2006-06-15 Sullivan Michael J Golf ball layers having improved barrier properties
US7004854B2 (en) 2001-10-09 2006-02-28 Acushnet Company Golf ball with vapor barrier layer and method of making same
US7951015B2 (en) 2001-10-09 2011-05-31 Acushnet Company Multilayer golf ball containing at least three core layers, at least one intermediate barrier layer, and at least one cover layer
US20030069085A1 (en) * 2001-10-09 2003-04-10 Hogge Matthew F. Golf ball with vapor barrier layer and method of making same
US20030069082A1 (en) * 2001-10-09 2003-04-10 Sullivan Michael J. Golf ball with polysulfide rubber layer
US7670542B2 (en) * 2002-05-08 2010-03-02 Acushnet Company Infrared heating method for creating cure gradients in golf balls and golf ball cores
US20070155542A1 (en) * 2002-05-08 2007-07-05 Sullivan Michael J Gold ball having a foamed layer created by infrared radiation
US6855070B2 (en) 2002-05-08 2005-02-15 Acushnet Company Infrared heating method for creating cure gradients in golf balls and golf balls cores
EP1502922A1 (de) * 2003-07-30 2005-02-02 Loctite (R & D) Limited Vernetzbare Zusammensetzungen für Verkapselungen
EP2586804B1 (de) * 2005-12-28 2014-04-02 Kaneka Corporation Photoradikal und Wärmeradikal härtbare Zusammensetzung
TWI370525B (en) * 2008-04-25 2012-08-11 Ind Tech Res Inst Encapsulant composition and method for fabricating encapsulant material
JP5402225B2 (ja) * 2008-11-26 2014-01-29 Jsr株式会社 電線止水材用キット、電線止水材、止水部材、止水処理された電線および止水処理方法
GB2466251B (en) * 2008-12-16 2011-03-09 Ind Tech Res Inst Encapsulant compositions and method for fabricating encapsulant materials
US20100183820A1 (en) * 2009-01-16 2010-07-22 Ford Global Technologies, Llc Methods for curing uv-curable coatings
US8513321B2 (en) 2010-11-05 2013-08-20 Ppg Industries Ohio, Inc. Dual cure coating compositions, methods of coating a substrate, and related coated substrates
US8901198B2 (en) 2010-11-05 2014-12-02 Ppg Industries Ohio, Inc. UV-curable coating compositions, multi-component composite coatings, and related coated substrates

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4203792A (en) * 1977-11-17 1980-05-20 Bell Telephone Laboratories, Incorporated Method for the fabrication of devices including polymeric materials
US4223115A (en) * 1978-04-24 1980-09-16 Lord Corporation Structural adhesive formulations
US4222835A (en) * 1978-05-25 1980-09-16 Westinghouse Electric Corp. In depth curing of resins induced by UV radiation
US4348503A (en) * 1980-06-04 1982-09-07 Bachmann Andrew G Adhesive composition
US4605465A (en) * 1982-04-26 1986-08-12 W. R. Grace & Co. UV and thermally curable, thermoplastic-containing compositions
IT1177945B (it) * 1984-07-31 1987-08-26 Siv Soc Italiana Vetro Procedimento per la produzione di un nastro continuo composito comprendente una pellicola a base acrilica,adatta per l'uso in lastre di vetro laminato di sicurezza e procedotto cosi' ottenuto
US5151453A (en) * 1989-04-06 1992-09-29 Den-Mat Corporation Light-curable ionomer dental cement
JPH0698628B2 (ja) * 1989-09-01 1994-12-07 株式会社総合歯科医療研究所 可視光重合型レジンの連続硬化方法及び装置
JPH04234422A (ja) * 1990-10-31 1992-08-24 Internatl Business Mach Corp <Ibm> 二重硬化エポキシバックシール処方物

Also Published As

Publication number Publication date
US5677362A (en) 1997-10-14
EP0815146B1 (de) 2001-06-20
WO1996029352A1 (en) 1996-09-26
EP0815146A1 (de) 1998-01-07
JPH10510578A (ja) 1998-10-13
CA2215597A1 (en) 1996-09-26
BR9607693A (pt) 1999-11-30
US5672393A (en) 1997-09-30
KR19980703112A (ko) 1998-10-15
CA2215597C (en) 2000-05-02
EP0815146A4 (de) 1998-02-11
ATE202364T1 (de) 2001-07-15
AU4974196A (en) 1996-10-08

Similar Documents

Publication Publication Date Title
DE69613462D1 (de) Einkapselungsharz, verfahren und apparat
KR970003593B1 (en) Projection exposure method and device using mask
TW363146B (en) An anti-reflective layer and a method of forming a photoresist pattern
EP0151686A3 (en) Method of preparing maxillar orthopaedic devices and apparatuses
MY136915A (en) Photoinitiated reactions
KR970702756A (ko) 중합가능한 필름을 제조하기 위한 정밀한 피복방법(precision coating process for preparing polymerizable films)
JPS5744143A (en) Composition and method for forming micropattern
EP0917000A3 (de) Positivphotoresistzusammensetzung und Verfahren zur Herstellung eines Resistmusters
TW332372B (en) Method for forming pattern
DE69724308D1 (de) Verfahren zur Leistungsverbesserung von Hochtemperatur-supraleitenden Dünnschichten
DE69613731D1 (de) Wickel-, Temper- und Abwickelverfahren eines Polymerfilms, eine Tempervorrichtung und ein photographischer Filmträger hergestellt mit diesem Verfahren oder Vorrichtung
JPS56100674A (en) Hardening method of primer
JPS5434338A (en) Protective coating method
Guckel et al. Plasma polymerization of methyl methacrylate: a photoresist for 3D applications
JPS56114942A (en) High energy beam sensitive resist material and its using method
GB2012117B (en) Coil assembly for electro-mechanical transducer
JPS52111935A (en) Method of forming paint film on metal by ultraviolet curing.
JPS557711A (en) Fiber with fine lense and forming method thereof
JPS55123419A (en) Preparation of decorative board
ATE408234T1 (de) Verfahren und vorrichtung zur ausbildung eines gekrümmten linienzuges auf einem strahlungsempfindlichen resist
JPS57192420A (en) Photopolymer composition
JPS53112932A (en) Coating of electron radiation curing thick coating paint
KR970063360A (ko) 섀도우마스크용 네거패턴의 제조방법
JPS6459914A (en) Exposure of charged particle beam
JPS5396678A (en) Method and apparatus for mask pattern exposure

Legal Events

Date Code Title Description
8332 No legal effect for de