DE69613426T2 - Initiator für sichtbare Strahlung und mit sichtbarem Licht polymerisierbare Zusammensetzung - Google Patents

Initiator für sichtbare Strahlung und mit sichtbarem Licht polymerisierbare Zusammensetzung

Info

Publication number
DE69613426T2
DE69613426T2 DE69613426T DE69613426T DE69613426T2 DE 69613426 T2 DE69613426 T2 DE 69613426T2 DE 69613426 T DE69613426 T DE 69613426T DE 69613426 T DE69613426 T DE 69613426T DE 69613426 T2 DE69613426 T2 DE 69613426T2
Authority
DE
Germany
Prior art keywords
visible
initiator
visible light
composition polymerizable
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69613426T
Other languages
English (en)
Other versions
DE69613426D1 (de
Inventor
Hideki Kazama
Takeshi Satoh
Makoto Oguri
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuyama Corp
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Publication of DE69613426D1 publication Critical patent/DE69613426D1/de
Application granted granted Critical
Publication of DE69613426T2 publication Critical patent/DE69613426T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/908—Dental utility

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Dental Preparations (AREA)
DE69613426T 1995-04-19 1996-04-19 Initiator für sichtbare Strahlung und mit sichtbarem Licht polymerisierbare Zusammensetzung Expired - Lifetime DE69613426T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9392495 1995-04-19

Publications (2)

Publication Number Publication Date
DE69613426D1 DE69613426D1 (de) 2001-07-26
DE69613426T2 true DE69613426T2 (de) 2001-10-04

Family

ID=14096000

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69613426T Expired - Lifetime DE69613426T2 (de) 1995-04-19 1996-04-19 Initiator für sichtbare Strahlung und mit sichtbarem Licht polymerisierbare Zusammensetzung

Country Status (3)

Country Link
US (1) US5744511A (de)
EP (1) EP0738928B1 (de)
DE (1) DE69613426T2 (de)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2762001B1 (fr) * 1997-04-11 1999-07-02 Rhodia Chimie Sa Amorceurs non toxiques, resines a groupements organofonctionnels reticulables comprenant les amorceurs, et leur utilisation pour la preparation de polymeres stables et non toxiques
ATE212734T1 (de) * 1997-06-30 2002-02-15 Siemens Ag Reaktionsharzmischungen und deren verwendung
SG78412A1 (en) 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
US6114350A (en) * 1999-04-19 2000-09-05 Nen Life Science Products, Inc. Cyanine dyes and synthesis methods thereof
DE19961347A1 (de) * 1999-12-17 2001-06-21 S & C Polymer Silicon & Compos Photoinitiatorsystem mit Acylphosphinoxid-Initiatoren
GB2365430B (en) 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates
US6660784B2 (en) * 2000-09-26 2003-12-09 Tokuyama Corporation Dental catalyst for chemical polymerization and use thereof
DE10124028B4 (de) * 2001-05-16 2010-02-18 3M Espe Ag Selbstadhäsive Dentalmaterialien
US20050009946A1 (en) * 2001-09-21 2005-01-13 Makoto Oguri Radical polymerization catalyst and adhesive kit for dental use
DE10255663B4 (de) * 2002-11-28 2006-05-04 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Elemente
ATE533462T1 (de) * 2004-09-07 2011-12-15 S & C Polymer Silicon & Compos Polyalkenoat-zahnzementzusammensetzung
JP4693434B2 (ja) * 2005-02-15 2011-06-01 株式会社トクヤマ 歯科用粘膜調整材
EP1702605B1 (de) * 2005-03-18 2009-11-04 Tokuyama Corporation Härtbare Zusammensetzung
US20100016465A1 (en) * 2006-03-13 2010-01-21 Alexander Van Lelieveld Composite Material Comprising A Water-Or Acid-Releasing Agent
JP2008201913A (ja) * 2007-02-20 2008-09-04 Fujifilm Corp 光重合性組成物
CN102275672A (zh) * 2007-03-08 2011-12-14 株式会社德山齿科 容器
JP5282980B2 (ja) * 2007-05-31 2013-09-04 学校法人日本大学 歯列矯正部材用接着材
EP2206488B1 (de) 2007-10-16 2016-04-13 Tokuyama Dental Corporation Einkomponenten-beschichtungsmaterial für zahnoberfläche
EP2223948B1 (de) * 2007-11-01 2013-01-23 Adeka Corporation Salzverbindung, initiator für die kationische polymerisation und kationisch polymerisierbare zusammensetzung
US8765837B2 (en) * 2007-11-15 2014-07-01 Tokuyama Dental Corporation Dental curable composition
CN101320208B (zh) * 2008-07-21 2011-06-01 上海复旦天臣新技术有限公司 反射全息薄膜及其制备方法
CN102781911B (zh) 2010-02-24 2015-07-22 巴斯夫欧洲公司 潜酸及其用途
US9089482B2 (en) 2010-09-30 2015-07-28 Kuraray Noritake Dental Inc. Dental mill blank
WO2013142956A1 (en) * 2012-03-28 2013-10-03 Uti Limited Partnership Methods and compounds for photo lewis acid generation and uses thereof
JP6417319B2 (ja) 2013-03-26 2018-11-07 クラレノリタケデンタル株式会社 歯科用硬化性組成物
WO2015190099A1 (ja) 2014-06-10 2015-12-17 クラレノリタケデンタル株式会社 歯科用接着材
US9844495B2 (en) 2014-06-10 2017-12-19 Kuraray Noritake Dental Inc. Self-adhesive dental composite resin
KR102537349B1 (ko) 2015-02-02 2023-05-26 바스프 에스이 잠재성 산 및 그의 용도
ES2864127T3 (es) * 2016-06-17 2021-10-13 Igm Group B V Nuevas 3-cetocumarinas, un proceso para su preparación y su uso como fotoiniciadores en reacciones de fotopolimerización
WO2018074594A1 (ja) 2016-10-21 2018-04-26 クラレノリタケデンタル株式会社 自己接着性歯科用コンポジットレジン
WO2018110705A1 (ja) * 2016-12-16 2018-06-21 デンカ株式会社 組成物
KR102034454B1 (ko) * 2017-01-04 2019-10-21 주식회사 엘지화학 중합개시제 조성물, 이의 제조방법 및 이를 이용한 중합체의 제조방법
EP3470048B1 (de) * 2017-10-13 2021-11-10 Dentsply DeTrey GmbH Lichthärtbare dentale zusammensetzung
CN110964458B (zh) * 2019-12-23 2020-12-15 苏州世华新材料科技股份有限公司 一种生物基丙烯酸酯抗翘曲胶带的制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4950581A (en) * 1987-07-06 1990-08-21 Fuji Photo Film Co., Ltd. Photopolymerizable composition
JPH02157760A (ja) * 1988-12-10 1990-06-18 Toyobo Co Ltd 光重合性組成物
US5500453A (en) * 1992-02-07 1996-03-19 Toyo Ink Manufacturing Co., Ltd. (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing the composition
FR2688783A1 (fr) * 1992-03-23 1993-09-24 Rhone Poulenc Chimie Nouveaux borates d'onium ou de complexe organometallique amorceurs cationiques de polymerisation.
AU684891B2 (en) * 1994-03-17 1998-01-08 Toppan Printing Co. Ltd. Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium

Also Published As

Publication number Publication date
EP0738928A2 (de) 1996-10-23
US5744511A (en) 1998-04-28
EP0738928A3 (de) 1997-06-25
DE69613426D1 (de) 2001-07-26
EP0738928B1 (de) 2001-06-20

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