DE69606141D1 - Gasrückgewinnungsvorrichtung - Google Patents

Gasrückgewinnungsvorrichtung

Info

Publication number
DE69606141D1
DE69606141D1 DE69606141T DE69606141T DE69606141D1 DE 69606141 D1 DE69606141 D1 DE 69606141D1 DE 69606141 T DE69606141 T DE 69606141T DE 69606141 T DE69606141 T DE 69606141T DE 69606141 D1 DE69606141 D1 DE 69606141D1
Authority
DE
Germany
Prior art keywords
recovery device
gas recovery
gas
recovery
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69606141T
Other languages
English (en)
Other versions
DE69606141T2 (de
Inventor
Shinji Tomita
Shigeyoshi Nozawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Liquide Japan GK
Original Assignee
Air Liquide Japan GK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide Japan GK filed Critical Air Liquide Japan GK
Publication of DE69606141D1 publication Critical patent/DE69606141D1/de
Application granted granted Critical
Publication of DE69606141T2 publication Critical patent/DE69606141T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/002—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by condensation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D8/00—Cold traps; Cold baffles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Treating Waste Gases (AREA)
  • Chemical Vapour Deposition (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
DE69606141T 1995-11-06 1996-11-05 Gasrückgewinnungsvorrichtung Expired - Fee Related DE69606141T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7287143A JPH09129561A (ja) 1995-11-06 1995-11-06 ガス回収装置

Publications (2)

Publication Number Publication Date
DE69606141D1 true DE69606141D1 (de) 2000-02-17
DE69606141T2 DE69606141T2 (de) 2000-08-24

Family

ID=17713634

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69606141T Expired - Fee Related DE69606141T2 (de) 1995-11-06 1996-11-05 Gasrückgewinnungsvorrichtung

Country Status (4)

Country Link
US (1) US5958138A (de)
EP (1) EP0771887B1 (de)
JP (1) JPH09129561A (de)
DE (1) DE69606141T2 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5766683A (en) * 1996-11-12 1998-06-16 New American Tec Nickel deposition system with a vapor recovery system
US6436353B1 (en) * 1997-06-13 2002-08-20 Tadahiro Ohmi Gas recovering apparatus
US6257018B1 (en) * 1999-06-28 2001-07-10 Praxair Technology, Inc. PFC recovery using condensation
JP4246343B2 (ja) * 2000-01-06 2009-04-02 株式会社荏原製作所 ガス雰囲気形成装置及びガス雰囲気形成方法
US6383257B1 (en) * 2000-04-04 2002-05-07 Air Products And Chemicals, Inc. Reclamation and separation of perfluorocarbons using condensation
GB2363129A (en) * 2000-05-04 2001-12-12 Boc Group Plc Gas supply method and apparatus
US6737361B2 (en) 2001-04-06 2004-05-18 Wafermaster, Inc Method for H2 Recycling in semiconductor processing system
US8475966B2 (en) 2003-09-25 2013-07-02 IES Consulting, Inc. Apparatus and method of recovering vapors
US7762082B1 (en) * 2003-09-25 2010-07-27 IES Consulting Inc. Apparatus and method of recovering vapors
US20050250347A1 (en) * 2003-12-31 2005-11-10 Bailey Christopher M Method and apparatus for maintaining by-product volatility in deposition process
US20080164144A1 (en) * 2005-03-07 2008-07-10 Katsushi Kishimoto Plasma Processing Apparatus And Method Of Producing Semiconductor Thin Film Using The Same
GB0505674D0 (en) * 2005-03-22 2005-04-27 Boc Group Plc Trap device
GB0618016D0 (en) * 2006-09-13 2006-10-18 Boc Group Plc Method of recycling hydrogen
KR20080029497A (ko) * 2006-09-29 2008-04-03 삼성전자주식회사 플라즈마 공정 장비와 이를 이용한 기판 가공 방법
FR2933714B1 (fr) * 2008-07-11 2011-05-06 Air Liquide Procede de recyclage de silane (sih4)
US20100078064A1 (en) * 2008-09-29 2010-04-01 Thinsilicion Corporation Monolithically-integrated solar module
WO2010068798A2 (en) * 2008-12-10 2010-06-17 Thinsilicon Corporation System and method for recycling a gas used to deposit a semiconductor layer
US8241379B2 (en) * 2009-04-16 2012-08-14 PTG Industries, LLC Natural gas reclaimer device
US8728240B2 (en) * 2012-05-02 2014-05-20 Msp Corporation Apparatus for vapor condensation and recovery
NL2010809C2 (nl) 2013-05-16 2014-11-24 Smit Ovens Bv Inrichting en werkwijze voor het aanbrengen van een materiaal op een substraat.
JP6201496B2 (ja) 2013-08-02 2017-09-27 セントラル硝子株式会社 Ｉｆ７由来フッ化ヨウ素化合物の回収方法及び回収装置
US10443127B2 (en) * 2013-11-05 2019-10-15 Taiwan Semiconductor Manufacturing Company Limited System and method for supplying a precursor for an atomic layer deposition (ALD) process
CN103611386B (zh) * 2013-11-07 2015-10-21 同济大学 一种控制生产过程物料损失和减少污染气体排放的方法
CN105169878A (zh) * 2015-09-15 2015-12-23 蚌埠高科能源装备有限公司 一种新型的冷却分离装置
CN113800484A (zh) * 2021-09-24 2021-12-17 中船重工（邯郸）派瑞特种气体有限公司 一种放空尾气中三氟化氮气体的回收设备和回收方法
KR102588509B1 (ko) * 2022-12-09 2023-10-13 크라이오에이치앤아이(주) 초저온 냉동기를 이용하여 반도체 장비에서 이용되는 공정 가스를 처리하는 공정 가스 처리 장치

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3207065C2 (de) * 1982-02-26 1985-08-22 Gosudarstvennyj naučno-issledovatel'skij i proektnyj institut redkometalličeskoj promyšlennosti GIREDMET, Moskva Verfahren zur Regenerierung von nichtumgesetzten Chlorsilanen und nichtumgesetztem Wasserstoff bei der Herstellung von polykristallinem Halbleitersilizium
JPS58209113A (ja) * 1982-05-31 1983-12-06 Semiconductor Energy Lab Co Ltd 半導体用反応性気体精製方法
NL8402636A (nl) * 1984-08-30 1986-03-17 Philips Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij een halfgeleidersubstraat wordt onderworpen aan een behandeling in een reaktiegas.
US5118485A (en) * 1988-03-25 1992-06-02 Hemlock Semiconductor Corporation Recovery of lower-boiling silanes in a cvd process
US5250323A (en) * 1989-10-30 1993-10-05 Kabushiki Kaisha Toshiba Chemical vapor growth apparatus having an exhaust device including trap
AU7667994A (en) * 1993-08-17 1995-03-14 Aktsionernoe Obschestvo "Russkoe Obschestvo Prikladnoi Elektroniki" Method of producing layers of silicon carbide and an associated product
US5426945A (en) * 1994-02-04 1995-06-27 Jordan Holding Company Process and apparatus for recovering vapor

Also Published As

Publication number Publication date
EP0771887B1 (de) 2000-01-12
US5958138A (en) 1999-09-28
JPH09129561A (ja) 1997-05-16
EP0771887A1 (de) 1997-05-07
DE69606141T2 (de) 2000-08-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee