DE69604699D1 - Röntgenstrahl-abtaster - Google Patents

Röntgenstrahl-abtaster

Info

Publication number
DE69604699D1
DE69604699D1 DE69604699T DE69604699T DE69604699D1 DE 69604699 D1 DE69604699 D1 DE 69604699D1 DE 69604699 T DE69604699 T DE 69604699T DE 69604699 T DE69604699 T DE 69604699T DE 69604699 D1 DE69604699 D1 DE 69604699D1
Authority
DE
Germany
Prior art keywords
ray scanner
scanner
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69604699T
Other languages
English (en)
Other versions
DE69604699T2 (de
Inventor
George Gutman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osmic Inc
Original Assignee
Osmic Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osmic Inc filed Critical Osmic Inc
Publication of DE69604699D1 publication Critical patent/DE69604699D1/de
Application granted granted Critical
Publication of DE69604699T2 publication Critical patent/DE69604699T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/068—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements specially adapted for particle beams

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE69604699T 1995-12-18 1996-12-12 Röntgenstrahl-abtaster Expired - Lifetime DE69604699T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/574,249 US5757882A (en) 1995-12-18 1995-12-18 Steerable x-ray optical system
PCT/US1996/019565 WO1997022976A1 (en) 1995-12-18 1996-12-12 Steerable x-ray optical system

Publications (2)

Publication Number Publication Date
DE69604699D1 true DE69604699D1 (de) 1999-11-18
DE69604699T2 DE69604699T2 (de) 2000-03-02

Family

ID=24295305

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69604699T Expired - Lifetime DE69604699T2 (de) 1995-12-18 1996-12-12 Röntgenstrahl-abtaster

Country Status (5)

Country Link
US (1) US5757882A (de)
EP (1) EP0868729B1 (de)
JP (1) JP3733142B2 (de)
DE (1) DE69604699T2 (de)
WO (1) WO1997022976A1 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3734366B2 (ja) 1998-03-20 2006-01-11 株式会社リガク Ｘ線分析装置
EP1149282A2 (de) 1998-12-18 2001-10-31 Symyx Technologies, Inc. Verfahren zur charakterisierung von bibliotheken verschiedener materialien mittels röntgenstrahlen
JP3048569B1 (ja) * 1999-03-08 2000-06-05 理化学研究所 中性子ビ―ム制御装置及び中性子エネルギ―測定装置
US6389100B1 (en) 1999-04-09 2002-05-14 Osmic, Inc. X-ray lens system
EP1200879B1 (de) 1999-07-30 2007-06-20 Carl Zeiss SMT AG Steuerung der Beleuchtungsverteilung in der Austrittspupille eines EUV-Beleuchtungssystems
US6421417B1 (en) 1999-08-02 2002-07-16 Osmic, Inc. Multilayer optics with adjustable working wavelength
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes
US6389099B1 (en) * 2000-11-13 2002-05-14 Rad Source Technologies Inc. Irradiation system and method using X-ray and gamma-ray reflector
US6870896B2 (en) 2000-12-28 2005-03-22 Osmic, Inc. Dark-field phase contrast imaging
US6804324B2 (en) * 2001-03-01 2004-10-12 Osmo, Inc. X-ray phase contrast imaging using a fabry-perot interferometer concept
US6510200B1 (en) 2001-06-29 2003-01-21 Osmic, Inc. Multi-layer structure with variable bandpass for monochromatization and spectroscopy
US6678082B2 (en) 2001-09-12 2004-01-13 Harris Corporation Electro-optical component including a fluorinated poly(phenylene ether ketone) protective coating and related methods
US6643353B2 (en) 2002-01-10 2003-11-04 Osmic, Inc. Protective layer for multilayers exposed to x-rays
DE10236640B4 (de) * 2002-08-09 2004-09-16 Siemens Ag Vorrichtung und Verfahren zur Erzeugung monochromatischer Röntgenstrahlung
US7651270B2 (en) * 2007-08-31 2010-01-26 Rigaku Innovative Technologies, Inc. Automated x-ray optic alignment with four-sector sensor
US7848483B2 (en) * 2008-03-07 2010-12-07 Rigaku Innovative Technologies Magnesium silicide-based multilayer x-ray fluorescence analyzers
CN101599307B (zh) * 2009-03-12 2012-02-29 中国原子能科学研究院 中子单色器屏蔽装置
DE102010022851B4 (de) * 2010-06-07 2014-11-13 Siemens Aktiengesellschaft Röntgenstrahlungsvorrichtung zur Erzeugung von quasimonochromatischer Röntgenstrahlung und Radiographie-Röntgenaufnahmesystem
JP6202684B2 (ja) 2014-06-05 2017-09-27 株式会社リガク Ｘ線回折装置
DE102014219601B4 (de) * 2014-08-13 2023-06-29 Bruker Nano Gmbh Verfahren zum Scannen einer Probe mittels einer Röntgenoptik und eine Apparatur zum Scannen einer Probe
EP3322341B1 (de) * 2015-07-14 2019-03-27 Koninklijke Philips N.V. Bildgebung mit modulierter röntgenstrahlung
CN107847200B (zh) * 2015-07-14 2022-04-01 皇家飞利浦有限公司 利用增强的x射线辐射的成像装置和系统
DE102017208736A1 (de) * 2017-05-23 2018-11-29 Robert Bosch Gmbh LIDAR-Vorrichtung mit erhöhter Abtastfrequenz und Verfahren zum Abtasten eines Abtastbereiches
US11333621B2 (en) * 2017-07-11 2022-05-17 Kla-Tencor Corporation Methods and systems for semiconductor metrology based on polychromatic soft X-Ray diffraction
DE102019128198B3 (de) 2019-10-18 2021-02-25 Laser Imaging Systems Gmbh Vorrichtung zur Mustereinbringung mittels Strahlung an einem aufgewickelten Endlossubstrat

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4525853A (en) * 1983-10-17 1985-06-25 Energy Conversion Devices, Inc. Point source X-ray focusing device
US4698833A (en) * 1985-05-14 1987-10-06 Energy Conversion Devices, Inc. Subassembly, method and system for monochromatizing X-rays
US4675889A (en) * 1985-07-08 1987-06-23 Ovonic Synthetic Materials Company, Inc. Multiple wavelength X-ray dispersive devices and method of making the devices
US4958363A (en) * 1986-08-15 1990-09-18 Nelson Robert S Apparatus for narrow bandwidth and multiple energy x-ray imaging
JPH04169898A (ja) * 1990-11-02 1992-06-17 Seiko Instr Inc Ｘ線多層膜鏡構造体
JPH0534500A (ja) * 1991-08-02 1993-02-09 Olympus Optical Co Ltd Ｘ線多層膜反射鏡
GB2266040B (en) * 1992-04-09 1996-03-13 Rigaku Ind Corp X-ray analysis apparatus
US5384817A (en) * 1993-07-12 1995-01-24 Ovonic Synthetic Materials Company X-ray optical element and method for its manufacture
US5646976A (en) * 1994-08-01 1997-07-08 Osmic, Inc. Optical element of multilayered thin film for X-rays and neutrons

Also Published As

Publication number Publication date
EP0868729B1 (de) 1999-10-13
US5757882A (en) 1998-05-26
JP2000502188A (ja) 2000-02-22
EP0868729A1 (de) 1998-10-07
WO1997022976A1 (en) 1997-06-26
JP3733142B2 (ja) 2006-01-11
DE69604699T2 (de) 2000-03-02

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Legal Events

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