DE69517869D1 - Optisches Gehäuse für rotierende Abtastvorrichtung mit hoher Geschwindigkeit - Google Patents

Optisches Gehäuse für rotierende Abtastvorrichtung mit hoher Geschwindigkeit

Info

Publication number
DE69517869D1
DE69517869D1 DE69517869T DE69517869T DE69517869D1 DE 69517869 D1 DE69517869 D1 DE 69517869D1 DE 69517869 T DE69517869 T DE 69517869T DE 69517869 T DE69517869 T DE 69517869T DE 69517869 D1 DE69517869 D1 DE 69517869D1
Authority
DE
Germany
Prior art keywords
high speed
scanning device
optical housing
rotating scanning
rotating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69517869T
Other languages
English (en)
Other versions
DE69517869T2 (de
Inventor
Gregg R King
John A Morrell
Lawrence S Blake
Philip A Rombult
Thomas K Hebert
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Corp
Original Assignee
Agfa Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Corp filed Critical Agfa Corp
Application granted granted Critical
Publication of DE69517869D1 publication Critical patent/DE69517869D1/de
Publication of DE69517869T2 publication Critical patent/DE69517869T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Laser Beam Printer (AREA)
  • Facsimile Scanning Arrangements (AREA)
DE69517869T 1994-05-16 1995-03-21 Optisches Gehäuse für rotierende Abtastvorrichtung mit hoher Geschwindigkeit Expired - Fee Related DE69517869T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/243,677 US5589973A (en) 1994-05-16 1994-05-16 Optical enclosure for high speed rotating beam deflector

Publications (2)

Publication Number Publication Date
DE69517869D1 true DE69517869D1 (de) 2000-08-17
DE69517869T2 DE69517869T2 (de) 2001-01-18

Family

ID=22919675

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69517869T Expired - Fee Related DE69517869T2 (de) 1994-05-16 1995-03-21 Optisches Gehäuse für rotierende Abtastvorrichtung mit hoher Geschwindigkeit

Country Status (4)

Country Link
US (1) US5589973A (de)
EP (1) EP0683415B1 (de)
JP (1) JP2945608B2 (de)
DE (1) DE69517869T2 (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5600477A (en) * 1995-05-04 1997-02-04 Bayer Corporation Beam scanner
DE19517629A1 (de) * 1995-05-13 1996-11-14 Hell Ag Linotype Lichtstrahl-Ablenkvorrichtung
US5610751A (en) * 1995-11-14 1997-03-11 Speedring Systems, Inc. Optical scanning device having a spherical exit window
DE19624203A1 (de) * 1996-06-18 1998-01-02 Hell Ag Linotype Drehspiegeleinheit zum Abtasten oder Aufzeichnen von Bildinformationen mit einer, den Drehspiegel umgebenden Abdeckung
GB9710021D0 (en) * 1997-05-16 1997-07-09 Fujifilm Electronic Imaging Li A method of reducing the effect of a contaminated environment
DE19820784C2 (de) * 1998-03-21 2003-05-08 Heidelberger Druckmasch Ag Lichtstrahl-Ablenkvorrichtung
US5901000A (en) * 1998-04-22 1999-05-04 Lexmark International, Inc. Sound reduced rotatable polygon assembly
US6243184B1 (en) * 1998-10-09 2001-06-05 Ecrm, Inc. Method and apparatus for light scanning
US6735003B1 (en) 1998-10-29 2004-05-11 Agfa Corporation Method and apparatus for reducing artifacts in an imaging system
US6501584B1 (en) 2001-08-14 2002-12-31 Lexmark International, Inc. Sound reduced rotatable polygon assembly
US7381980B2 (en) 2003-01-09 2008-06-03 Idexx Laboratories, Inc. Method and apparatus for improving a computed radiography image
TWI448830B (zh) 2010-02-09 2014-08-11 Asml Netherlands Bv 微影裝置及元件製造方法
KR101419330B1 (ko) 2010-02-23 2014-07-15 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조 방법
CN102770811B (zh) 2010-02-25 2015-05-20 Asml荷兰有限公司 光刻设备和器件制造方法
US9696633B2 (en) 2010-04-12 2017-07-04 Asml Netherlands B.V. Substrate handling apparatus and lithographic apparatus
WO2012076300A1 (en) 2010-12-08 2012-06-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG193240A1 (en) 2011-03-29 2013-10-30 Asml Netherlands Bv Measurement of the position of a radiation beam spot in lithography
JP5731063B2 (ja) 2011-04-08 2015-06-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、プログラマブル・パターニングデバイス、及びリソグラフィ方法
WO2012143188A1 (en) 2011-04-21 2012-10-26 Asml Netherlands B.V. Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method
JP5837693B2 (ja) 2011-08-18 2015-12-24 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びデバイス製造方法
NL2009342A (en) 2011-10-31 2013-05-07 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
NL2009797A (en) 2011-11-29 2013-05-30 Asml Netherlands Bv Apparatus and method for converting a vector-based representation of a desired device pattern for a lithography apparatus, apparatus and method for providing data to a programmable patterning device, a lithography apparatus and a device manufacturing method.
WO2013079285A1 (en) 2011-11-29 2013-06-06 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program
NL2009806A (en) 2011-12-05 2013-06-10 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
KR101607176B1 (ko) 2011-12-06 2016-03-29 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치, 세트포인트 데이터를 제공하는 장치, 디바이스 제조 방법, 세트포인트 데이터를 계산하는 방법, 및 컴퓨터 프로그램
NL2009902A (en) 2011-12-27 2013-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP5916895B2 (ja) 2012-01-12 2016-05-11 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、セットポイントデータを提供する装置、デバイス製造方法、セットポイントデータを提供する方法、およびコンピュータプログラム
US9568831B2 (en) 2012-01-17 2017-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2010176A (en) 2012-02-23 2013-08-26 Asml Netherlands Bv Device, lithographic apparatus, method for guiding radiation and device manufacturing method.
NL2012052A (en) 2013-01-29 2014-08-04 Asml Netherlands Bv A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method.

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS554019A (en) * 1978-06-22 1980-01-12 Canon Inc Light deflector
JPS55129313A (en) * 1979-03-29 1980-10-07 Canon Inc Light deflector
DE3303499A1 (de) * 1982-02-05 1983-08-25 Nippon Seiko K.K., Tokyo Dynamische druckgaslagerung
EP0096089A1 (de) * 1982-06-04 1983-12-21 DR.-ING. RUDOLF HELL GmbH Optische Ablenkeinrichtung
JPS60244913A (ja) * 1984-05-21 1985-12-04 Toshiba Corp 回転体支持装置
US4560244A (en) * 1984-06-25 1985-12-24 Solavolt International Apparatus and method for redirecting an incident beam
US4943128A (en) * 1986-10-28 1990-07-24 Ricoh Company, Ltd. Light scanning device
JPH01131516A (ja) * 1987-08-07 1989-05-24 Fuji Photo Film Co Ltd 光ビーム走査装置
US5080456A (en) * 1990-02-26 1992-01-14 Symbol Technologies, Inc. Laser scanners with extended working range
IT1266063B1 (it) * 1992-01-30 1996-12-20 Miriam Lunelli Scanner laser a visione polare per lunghe distanze
JP3239188B2 (ja) * 1992-02-28 2001-12-17 コニカ株式会社 光ビーム走査装置

Also Published As

Publication number Publication date
DE69517869T2 (de) 2001-01-18
US5589973A (en) 1996-12-31
EP0683415B1 (de) 2000-07-12
JPH0843755A (ja) 1996-02-16
JP2945608B2 (ja) 1999-09-06
EP0683415A1 (de) 1995-11-22

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee