DE69510284T2 - Flüssigkeitsstrahlkopf - Google Patents

Flüssigkeitsstrahlkopf

Info

Publication number
DE69510284T2
DE69510284T2 DE69510284T DE69510284T DE69510284T2 DE 69510284 T2 DE69510284 T2 DE 69510284T2 DE 69510284 T DE69510284 T DE 69510284T DE 69510284 T DE69510284 T DE 69510284T DE 69510284 T2 DE69510284 T2 DE 69510284T2
Authority
DE
Germany
Prior art keywords
jet head
liquid jet
liquid
head
jet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69510284T
Other languages
English (en)
Other versions
DE69510284D1 (de
Inventor
Kazumasa Hasegawa
Masato Shimada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Publication of DE69510284D1 publication Critical patent/DE69510284D1/de
Application granted granted Critical
Publication of DE69510284T2 publication Critical patent/DE69510284T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1623—Manufacturing processes bonding and adhesion
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1607—Production of print heads with piezoelectric elements
    • B41J2/161—Production of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1626—Manufacturing processes etching
    • B41J2/1629—Manufacturing processes etching wet etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1631—Manufacturing processes photolithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/164—Manufacturing processes thin film formation
    • B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/164—Manufacturing processes thin film formation
    • B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
DE69510284T 1994-08-25 1995-08-24 Flüssigkeitsstrahlkopf Expired - Lifetime DE69510284T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20108694 1994-08-25

Publications (2)

Publication Number Publication Date
DE69510284D1 DE69510284D1 (de) 1999-07-22
DE69510284T2 true DE69510284T2 (de) 1999-10-14

Family

ID=16435165

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69510284T Expired - Lifetime DE69510284T2 (de) 1994-08-25 1995-08-24 Flüssigkeitsstrahlkopf

Country Status (3)

Country Link
US (1) US5719607A (de)
EP (1) EP0698490B1 (de)
DE (1) DE69510284T2 (de)

Families Citing this family (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993022140A1 (en) * 1992-04-23 1993-11-11 Seiko Epson Corporation Liquid jet head and production thereof
JP3327149B2 (ja) * 1995-12-20 2002-09-24 セイコーエプソン株式会社 圧電体薄膜素子及びこれを用いたインクジェット式記録ヘッド
JP3503386B2 (ja) * 1996-01-26 2004-03-02 セイコーエプソン株式会社 インクジェット式記録ヘッド及びその製造方法
EP0791459B1 (de) * 1996-02-22 2002-05-22 Seiko Epson Corporation Tintenstrahlaufzeichnungskopf, Tintenstrahlaufzeichnungsgerät damit versehen und Herstellungsverfahren eines Tintenstrahlaufzeichnungskopfes
EP0800920B1 (de) * 1996-04-10 2002-02-06 Seiko Epson Corporation Tintenstrahlaufzeichnungskopf
JPH1095112A (ja) * 1996-09-25 1998-04-14 Seiko Epson Corp インクジェットプリンタ用アクチュエータ
JP3713921B2 (ja) * 1996-10-24 2005-11-09 セイコーエプソン株式会社 インクジェット式記録ヘッドの製造方法
JPH10211701A (ja) * 1996-11-06 1998-08-11 Seiko Epson Corp 圧電体素子を備えたアクチュエータ及びインクジェット式記録ヘッド、並びにこれらの製造方法
JP3666177B2 (ja) * 1997-04-14 2005-06-29 松下電器産業株式会社 インクジェット記録装置
JP3019845B1 (ja) * 1997-11-25 2000-03-13 セイコーエプソン株式会社 インクジェット式記録ヘッド及びインクジェット式記録装置
JP3379479B2 (ja) * 1998-07-01 2003-02-24 セイコーエプソン株式会社 機能性薄膜、圧電体素子、インクジェット式記録ヘッド、プリンタ、圧電体素子の製造方法およびインクジェット式記録ヘッドの製造方法、
DE69934175T2 (de) * 1998-08-12 2007-03-08 Seiko Epson Corp. Piezoelektrischer Aktuator, Tintenstrahlkopf, Drucker, Herstellungsverfahren für den piezoelektrischen Aktuator, Herstellungsverfahren für den Tintenstrahlkopf
US6154239A (en) * 1998-08-31 2000-11-28 Eastman Kodak Company Ceramic ink jet printing element
JP3267937B2 (ja) * 1998-09-04 2002-03-25 松下電器産業株式会社 インクジェットヘッド
US6594875B2 (en) * 1998-10-14 2003-07-22 Samsung Electro-Mechanics Co. Method for producing a piezoelectric/electrostrictive actuator
JP3517876B2 (ja) 1998-10-14 2004-04-12 セイコーエプソン株式会社 強誘電体薄膜素子の製造方法、インクジェット式記録ヘッド及びインクジェットプリンタ
TW386286B (en) * 1998-10-26 2000-04-01 Ind Tech Res Inst An ohmic contact of semiconductor and the manufacturing method
JP3868143B2 (ja) 1999-04-06 2007-01-17 松下電器産業株式会社 圧電体薄膜素子及びこれを用いたインクジェット式記録ヘッド並びにこれらの製造方法
JP2000357826A (ja) † 1999-04-13 2000-12-26 Seiko Epson Corp 圧電体素子の製造方法、圧電体素子、インクジェット式記録ヘッドおよびプリンタ
US6523943B1 (en) * 1999-11-01 2003-02-25 Kansai Research Institute, Inc. Piezoelectric element, process for producing the piezoelectric element, and head for ink-jet printer using the piezoelectric element
DE69935462T2 (de) * 1999-12-24 2007-11-08 Fujifilm Corp. Verfahren zur Herstellung eines Tintenstrahl-Aufzeichnungskopfs
CN100339217C (zh) * 2000-02-25 2007-09-26 松下电器产业株式会社 喷墨头及喷墨式记录装置
JP3796394B2 (ja) 2000-06-21 2006-07-12 キヤノン株式会社 圧電素子の製造方法および液体噴射記録ヘッドの製造方法
US6451646B1 (en) * 2000-08-30 2002-09-17 Micron Technology, Inc. High-k dielectric materials and processes for manufacturing them
US7378719B2 (en) * 2000-12-20 2008-05-27 Micron Technology, Inc. Low leakage MIM capacitor
JP3833070B2 (ja) * 2001-02-09 2006-10-11 キヤノン株式会社 液体噴射ヘッドおよび製造方法
US6888636B2 (en) * 2001-03-19 2005-05-03 E. I. Du Pont De Nemours And Company Method and apparatus for measuring the color properties of fluids
US6686248B1 (en) * 2001-04-03 2004-02-03 Advanced Micro Devices, Inc. Method of fabricating a semiconductor device having a MOS transistor with a high dielectric constant material
JP3861673B2 (ja) 2001-11-30 2006-12-20 ブラザー工業株式会社 インクジェット記録ヘッド
WO2004018214A1 (en) 2002-08-22 2004-03-04 Mvm Products, Llc Universal inkjet printer device and methods
CN100363179C (zh) * 2002-10-17 2008-01-23 京瓷株式会社 促动器以及打印头
DE10348346A1 (de) * 2002-10-17 2004-05-27 Kyocera Corp. Aktuator, Herstellungsverfahren und Druckkopf
JP5044902B2 (ja) * 2005-08-01 2012-10-10 日立電線株式会社 圧電薄膜素子
US7464466B2 (en) * 2005-10-11 2008-12-16 Silverbrook Research Pty Ltd Method of fabricating inkjet nozzle chambers having filter structures
JP4911669B2 (ja) * 2005-12-13 2012-04-04 富士フイルム株式会社 圧電アクチュエータ、液体吐出ヘッドの製造方法及び液体吐出ヘッド並びに画像形成装置
JP5063892B2 (ja) * 2005-12-20 2012-10-31 富士フイルム株式会社 液体吐出ヘッドの製造方法
JP4258530B2 (ja) * 2006-06-05 2009-04-30 日立電線株式会社 圧電薄膜素子
JP2008266770A (ja) * 2007-03-22 2008-11-06 Fujifilm Corp 強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置
EP1973177B8 (de) * 2007-03-22 2015-01-21 FUJIFILM Corporation Ferroelektrischer Film, Herstellungsverfahren dafür, ferroelektrische Vorrichtung und Flüssigkeitsausstossvorrichtung
US7732991B2 (en) * 2007-09-28 2010-06-08 Freescale Semiconductor, Inc. Self-poling piezoelectric MEMs device
JP5382905B2 (ja) * 2008-03-10 2014-01-08 富士フイルム株式会社 圧電素子の製造方法及び液体吐出ヘッドの製造方法
JP2011061118A (ja) * 2009-09-14 2011-03-24 Seiko Epson Corp 圧電素子、液体噴射ヘッドおよび液体噴射装置
WO2011065317A1 (ja) * 2009-11-26 2011-06-03 株式会社村田製作所 圧電デバイス及び圧電デバイスの製造方法
JP5555072B2 (ja) * 2010-06-25 2014-07-23 富士フイルム株式会社 圧電体膜、圧電素子および液体吐出装置
JP5592192B2 (ja) * 2010-08-11 2014-09-17 富士フイルム株式会社 圧電体膜とその製造方法、圧電素子および液体吐出装置
JP6948763B2 (ja) 2015-12-21 2021-10-13 セイコーエプソン株式会社 圧電素子応用デバイス

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4312008A (en) * 1979-11-02 1982-01-19 Dataproducts Corporation Impulse jet head using etched silicon
JP3039971B2 (ja) * 1989-09-19 2000-05-08 株式会社日立製作所 接合型圧電装置及び製造方法並びに接合型圧電素子
JPH07108102B2 (ja) 1990-05-01 1995-11-15 日本碍子株式会社 圧電／電歪膜型アクチュエータの製造方法
EP0490668B1 (de) * 1990-12-12 1996-10-16 Canon Kabushiki Kaisha Tintenstrahlaufzeichnung
US5198834A (en) * 1991-04-02 1993-03-30 Hewlett-Packard Company Ink jet print head having two cured photoimaged barrier layers
US5479197A (en) * 1991-07-11 1995-12-26 Canon Kabushiki Kaisha Head for recording apparatus
JP3272004B2 (ja) 1991-10-03 2002-04-08 日本碍子株式会社 圧電／電歪膜型素子
JPH0748448B2 (ja) 1991-08-09 1995-05-24 日本電気株式会社 薄膜キャパシタとその製造方法
JPH05177831A (ja) * 1991-12-27 1993-07-20 Rohm Co Ltd インクジェットプリントヘッド及びそれを備える電子機器
WO1993022140A1 (en) * 1992-04-23 1993-11-11 Seiko Epson Corporation Liquid jet head and production thereof

Also Published As

Publication number Publication date
US5719607A (en) 1998-02-17
EP0698490B1 (de) 1999-06-16
DE69510284D1 (de) 1999-07-22
EP0698490A3 (de) 1997-03-05
EP0698490A2 (de) 1996-02-28

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Legal Events

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8364 No opposition during term of opposition