DE69508520T2 - Verfahren zur Reinigung von feinteiliger Kieselsäure - Google Patents
Verfahren zur Reinigung von feinteiliger KieselsäureInfo
- Publication number
- DE69508520T2 DE69508520T2 DE1995608520 DE69508520T DE69508520T2 DE 69508520 T2 DE69508520 T2 DE 69508520T2 DE 1995608520 DE1995608520 DE 1995608520 DE 69508520 T DE69508520 T DE 69508520T DE 69508520 T2 DE69508520 T2 DE 69508520T2
- Authority
- DE
- Germany
- Prior art keywords
- finely divided
- divided silica
- cleaning
- cleaning finely
- silica
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP288998/94 | 1994-10-27 | ||
| JP28899894A JP3546494B2 (ja) | 1994-10-27 | 1994-10-27 | 微細シリカの精製法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE69508520D1 DE69508520D1 (de) | 1999-04-29 |
| DE69508520T2 true DE69508520T2 (de) | 1999-08-26 |
| DE69508520T3 DE69508520T3 (de) | 2008-07-10 |
Family
ID=17737526
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE1995608520 Expired - Lifetime DE69508520T3 (de) | 1994-10-27 | 1995-10-27 | Verfahren zur Reinigung von feinteiliger Kieselsäure |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0709340B2 (de) |
| JP (1) | JP3546494B2 (de) |
| DE (1) | DE69508520T3 (de) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5855860A (en) * | 1994-10-27 | 1999-01-05 | Shin-Etsu Chemical Co., Ltd. | Method for porifying fine particulate silica |
| DE19921059A1 (de) * | 1999-05-07 | 2000-11-16 | Heraeus Quarzglas | Verfahren zum Reinigen von Si0¶2¶-Partikeln, Vorrichtung zur Durchführung des Verfahrens, und nach dem Verfahren hergestellte Körnung |
| SE9904046D0 (sv) * | 1999-11-09 | 1999-11-09 | Goesta Lennart Flemmert | Process for the continuous treatment of fluorinecontaining fumed silica and reactor for the implementation of this process |
| JP4202195B2 (ja) * | 2003-06-10 | 2008-12-24 | 三井金属鉱業株式会社 | 水酸化タンタル、水酸化ニオブ、酸化タンタル、酸化ニオブ、およびこれらの製造方法 |
| US7785560B2 (en) | 2003-08-20 | 2010-08-31 | Evonik Degussa Gmbh | Purification of finely divided, pyrogenically prepared metal oxide particles |
| DE10342827A1 (de) * | 2003-08-20 | 2005-03-17 | Degussa Ag | Reinigung feinverteilter, pyrogen hergestellter Metalloxidpartikel |
| CN102513031B (zh) | 2011-11-30 | 2014-04-16 | 广州吉必盛科技实业有限公司 | 一种脱酸工艺及其设备 |
| KR102329003B1 (ko) * | 2015-05-18 | 2021-11-22 | 나노리소스 주식회사 | 매체유동층을 이용한 나노다이아몬드 정제 방법 및 장치 |
| TWI808933B (zh) | 2015-12-18 | 2023-07-21 | 德商何瑞斯廓格拉斯公司 | 石英玻璃體、二氧化矽顆粒、光導、施照體、及成型體及其製備方法 |
| US11299417B2 (en) | 2015-12-18 | 2022-04-12 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a melting crucible of refractory metal |
| WO2017103160A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern aus siliziumdioxidgranulat |
| TW201733932A (zh) * | 2015-12-18 | 2017-10-01 | 德商何瑞斯廓格拉斯公司 | 石英玻璃製備中之二氧化矽粉末的蒸氣處理 |
| WO2017103123A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| TWI788278B (zh) | 2015-12-18 | 2023-01-01 | 德商何瑞斯廓格拉斯公司 | 由均質石英玻璃製得之玻璃纖維及預成型品 |
| JP6881777B2 (ja) | 2015-12-18 | 2021-06-02 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 合成石英ガラス粒の調製 |
| TWI733723B (zh) | 2015-12-18 | 2021-07-21 | 德商何瑞斯廓格拉斯公司 | 不透明石英玻璃體的製備 |
| CN108698888A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在石英玻璃制备中作为中间物的经碳掺杂的二氧化硅颗粒的制备 |
| WO2017103124A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Erhöhen des siliziumgehalts bei der herstellung von quarzglas |
| US10730780B2 (en) | 2015-12-18 | 2020-08-04 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a multi-chamber oven |
| CN108675309B (zh) * | 2018-05-15 | 2020-02-14 | 湖北兴瑞硅材料有限公司 | 一种气相白炭黑生产原料供给的方法 |
| EP3763682A1 (de) * | 2019-07-12 | 2021-01-13 | Heraeus Quarzglas GmbH & Co. KG | Reinigung von quarzpulvern durch entfernung von mikropartikeln aus feuerfesten materialien |
| WO2021121557A1 (de) | 2019-12-17 | 2021-06-24 | Wacker Chemie Ag | Wirbelschichtreaktor zur steuerung der verweilzeitverteilung in kontinuierlich betriebenen wirbelschichten |
| KR102601416B1 (ko) * | 2021-02-23 | 2023-11-13 | 충남대학교산학협력단 | 식물원료로부터 실리카를 추출 및 분리하는 방법 |
| CN116081631B (zh) * | 2022-12-30 | 2024-05-31 | 浙江工程设计有限公司 | 一种气相白炭黑脱酸方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB796735A (en) * | 1955-07-25 | 1958-06-18 | British Titan Products | Production of silicon dioxide |
| DE1150955B (de) * | 1961-04-20 | 1963-07-04 | Degussa | Verfahren und Vorrichtung zum Reinigen von hochdispersen Oxyden |
| DE1642994A1 (de) | 1967-01-21 | 1971-06-03 | Degussa | Verfahren zum Reinigen von hochdispersen Oxiden |
| DE3028364C2 (de) * | 1980-07-26 | 1983-07-21 | Degussa Ag, 6000 Frankfurt | Verfahren und Vorrichtung zur pyrogenen Herstellung von Siliciumdioxid |
-
1994
- 1994-10-27 JP JP28899894A patent/JP3546494B2/ja not_active Expired - Fee Related
-
1995
- 1995-10-27 DE DE1995608520 patent/DE69508520T3/de not_active Expired - Lifetime
- 1995-10-27 EP EP19950307683 patent/EP0709340B2/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0709340B1 (de) | 1999-03-24 |
| JPH08119620A (ja) | 1996-05-14 |
| EP0709340A1 (de) | 1996-05-01 |
| EP0709340B2 (de) | 2007-12-19 |
| JP3546494B2 (ja) | 2004-07-28 |
| DE69508520T3 (de) | 2008-07-10 |
| DE69508520D1 (de) | 1999-04-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8363 | Opposition against the patent | ||
| 8366 | Restricted maintained after opposition proceedings |