DE69508520D1 - Verfahren zur Reinigung von feinteiliger Kieselsäure - Google Patents

Verfahren zur Reinigung von feinteiliger Kieselsäure

Info

Publication number
DE69508520D1
DE69508520D1 DE69508520T DE69508520T DE69508520D1 DE 69508520 D1 DE69508520 D1 DE 69508520D1 DE 69508520 T DE69508520 T DE 69508520T DE 69508520 T DE69508520 T DE 69508520T DE 69508520 D1 DE69508520 D1 DE 69508520D1
Authority
DE
Germany
Prior art keywords
finely divided
divided silica
cleaning
cleaning finely
silica
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69508520T
Other languages
English (en)
Other versions
DE69508520T2 (de
DE69508520T3 (de
Inventor
Masanobu Nishimine
Yoshio Tomizawa
Hidekazu Uehara
Kiyoshi Shirasuna
Susumu Ueno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=17737526&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69508520(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Publication of DE69508520D1 publication Critical patent/DE69508520D1/de
Publication of DE69508520T2 publication Critical patent/DE69508520T2/de
Application granted granted Critical
Publication of DE69508520T3 publication Critical patent/DE69508520T3/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/12Surface area
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
DE1995608520 1994-10-27 1995-10-27 Verfahren zur Reinigung von feinteiliger Kieselsäure Expired - Lifetime DE69508520T3 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP288998/94 1994-10-27
JP28899894A JP3546494B2 (ja) 1994-10-27 1994-10-27 微細シリカの精製法

Publications (3)

Publication Number Publication Date
DE69508520D1 true DE69508520D1 (de) 1999-04-29
DE69508520T2 DE69508520T2 (de) 1999-08-26
DE69508520T3 DE69508520T3 (de) 2008-07-10

Family

ID=17737526

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1995608520 Expired - Lifetime DE69508520T3 (de) 1994-10-27 1995-10-27 Verfahren zur Reinigung von feinteiliger Kieselsäure

Country Status (3)

Country Link
EP (1) EP0709340B2 (de)
JP (1) JP3546494B2 (de)
DE (1) DE69508520T3 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5855860A (en) * 1994-10-27 1999-01-05 Shin-Etsu Chemical Co., Ltd. Method for porifying fine particulate silica
DE19921059A1 (de) * 1999-05-07 2000-11-16 Heraeus Quarzglas Verfahren zum Reinigen von Si0¶2¶-Partikeln, Vorrichtung zur Durchführung des Verfahrens, und nach dem Verfahren hergestellte Körnung
SE9904046D0 (sv) * 1999-11-09 1999-11-09 Goesta Lennart Flemmert Process for the continuous treatment of fluorinecontaining fumed silica and reactor for the implementation of this process
JP4202195B2 (ja) * 2003-06-10 2008-12-24 三井金属鉱業株式会社 水酸化タンタル、水酸化ニオブ、酸化タンタル、酸化ニオブ、およびこれらの製造方法
US7785560B2 (en) 2003-08-20 2010-08-31 Evonik Degussa Gmbh Purification of finely divided, pyrogenically prepared metal oxide particles
DE10342827A1 (de) * 2003-08-20 2005-03-17 Degussa Ag Reinigung feinverteilter, pyrogen hergestellter Metalloxidpartikel
CN102513031B (zh) * 2011-11-30 2014-04-16 广州吉必盛科技实业有限公司 一种脱酸工艺及其设备
KR102329003B1 (ko) * 2015-05-18 2021-11-22 나노리소스 주식회사 매체유동층을 이용한 나노다이아몬드 정제 방법 및 장치
CN108698884A (zh) * 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 石英玻璃制备中的二氧化硅粉末的蒸汽处理
TWI794150B (zh) 2015-12-18 2023-03-01 德商何瑞斯廓格拉斯公司 自二氧化矽顆粒製備石英玻璃體
EP3390304B1 (de) 2015-12-18 2023-09-13 Heraeus Quarzglas GmbH & Co. KG Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas
WO2017103131A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur
JP6940236B2 (ja) 2015-12-18 2021-09-22 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 溶融炉内での露点監視による石英ガラス体の調製
KR20180095618A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지 다중-챔버 가열로에서 실리카 유리체의 제조
WO2017103124A2 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Erhöhen des siliziumgehalts bei der herstellung von quarzglas
WO2017103120A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung einer synthetischen quarzglaskörnung
US11299417B2 (en) 2015-12-18 2022-04-12 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a melting crucible of refractory metal
US11236002B2 (en) 2015-12-18 2022-02-01 Heraeus Quarzglas Gmbh & Co. Kg Preparation of an opaque quartz glass body
EP3390308A1 (de) 2015-12-18 2018-10-24 Heraeus Quarzglas GmbH & Co. KG Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt
CN108675309B (zh) * 2018-05-15 2020-02-14 湖北兴瑞硅材料有限公司 一种气相白炭黑生产原料供给的方法
EP3763682A1 (de) * 2019-07-12 2021-01-13 Heraeus Quarzglas GmbH & Co. KG Reinigung von quarzpulvern durch entfernung von mikropartikeln aus feuerfesten materialien
WO2021121557A1 (de) 2019-12-17 2021-06-24 Wacker Chemie Ag Wirbelschichtreaktor zur steuerung der verweilzeitverteilung in kontinuierlich betriebenen wirbelschichten
KR102601416B1 (ko) * 2021-02-23 2023-11-13 충남대학교산학협력단 식물원료로부터 실리카를 추출 및 분리하는 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB796735A (en) * 1955-07-25 1958-06-18 British Titan Products Production of silicon dioxide
DE1150955B (de) * 1961-04-20 1963-07-04 Degussa Verfahren und Vorrichtung zum Reinigen von hochdispersen Oxyden
DE1642994A1 (de) * 1967-01-21 1971-06-03 Degussa Verfahren zum Reinigen von hochdispersen Oxiden
DE3028364C2 (de) * 1980-07-26 1983-07-21 Degussa Ag, 6000 Frankfurt Verfahren und Vorrichtung zur pyrogenen Herstellung von Siliciumdioxid

Also Published As

Publication number Publication date
DE69508520T2 (de) 1999-08-26
EP0709340A1 (de) 1996-05-01
EP0709340B2 (de) 2007-12-19
JP3546494B2 (ja) 2004-07-28
DE69508520T3 (de) 2008-07-10
JPH08119620A (ja) 1996-05-14
EP0709340B1 (de) 1999-03-24

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8366 Restricted maintained after opposition proceedings