DE69504759D1 - Sperrschicht für ein Bilderzeugungsverfahren durch Laserablation - Google Patents

Sperrschicht für ein Bilderzeugungsverfahren durch Laserablation

Info

Publication number
DE69504759D1
DE69504759D1 DE69504759T DE69504759T DE69504759D1 DE 69504759 D1 DE69504759 D1 DE 69504759D1 DE 69504759 T DE69504759 T DE 69504759T DE 69504759 T DE69504759 T DE 69504759T DE 69504759 D1 DE69504759 D1 DE 69504759D1
Authority
DE
Germany
Prior art keywords
barrier layer
laser ablation
imaging process
imaging
ablation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69504759T
Other languages
English (en)
Other versions
DE69504759T2 (de
Inventor
Glenn Thomas Pearce
Richard Paul Henzel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of DE69504759D1 publication Critical patent/DE69504759D1/de
Application granted granted Critical
Publication of DE69504759T2 publication Critical patent/DE69504759T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/92—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared from printing surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/24—Ablative recording, e.g. by burning marks; Spark recording
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
    • B41M5/42—Intermediate, backcoat, or covering layers
    • B41M5/44—Intermediate, backcoat, or covering layers characterised by the macromolecular compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/913—Material designed to be responsive to temperature, light, moisture
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/914—Transfer or decalcomania
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145—Infrared
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/165—Thermal imaging composition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE69504759T 1994-06-14 1995-06-06 Sperrschicht für ein Bilderzeugungsverfahren durch Laserablation Expired - Fee Related DE69504759T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/259,586 US5468591A (en) 1994-06-14 1994-06-14 Barrier layer for laser ablative imaging

Publications (2)

Publication Number Publication Date
DE69504759D1 true DE69504759D1 (de) 1998-10-22
DE69504759T2 DE69504759T2 (de) 1999-02-04

Family

ID=22985531

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69504759T Expired - Fee Related DE69504759T2 (de) 1994-06-14 1995-06-06 Sperrschicht für ein Bilderzeugungsverfahren durch Laserablation

Country Status (4)

Country Link
US (2) US5468591A (de)
EP (1) EP0687567B1 (de)
JP (1) JP3699158B2 (de)
DE (1) DE69504759T2 (de)

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US5674661A (en) * 1995-10-31 1997-10-07 Eastman Kodak Company Image dye for laser dye removal recording element
US5691114A (en) * 1996-03-12 1997-11-25 Eastman Kodak Company Method of imaging of lithographic printing plates using laser ablation
US5605780A (en) * 1996-03-12 1997-02-25 Eastman Kodak Company Lithographic printing plate adapted to be imaged by ablation
US5756010A (en) * 1996-06-20 1998-05-26 Eastman Kodak Company Protective eyeshield
US5858607A (en) * 1996-11-21 1999-01-12 Kodak Polychrome Graphics Laser-induced material transfer digital lithographic printing plates
US5712079A (en) * 1996-12-11 1998-01-27 Eastman Kodak Company Barrier layer for laser ablative imaging
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US5759741A (en) * 1997-02-11 1998-06-02 Eastman Kodak Company Barrier layer for laser ablative imaging
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JP3654739B2 (ja) * 1997-05-13 2005-06-02 富士写真フイルム株式会社 レーザーアブレーション記録材料
US5856061A (en) * 1997-08-14 1999-01-05 Minnesota Mining And Manufacturing Company Production of color proofs and printing plates
US6063834A (en) * 1997-12-08 2000-05-16 Lexmark International, Inc. Wet-rub resistant ink compositions
US6007962A (en) * 1998-06-15 1999-12-28 Eastman Kodak Company Spacer beads for laser ablative imaging
US5998088A (en) * 1998-08-03 1999-12-07 Eastman Kodak Company Heterogeneous image layer for laser ablative imaging
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US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
US6361923B1 (en) 1999-08-17 2002-03-26 International Business Machines Corporation Laser ablatable material and its use
US6284184B1 (en) 1999-08-27 2001-09-04 Avaya Technology Corp Method of laser marking one or more colors on plastic substrates
CN1402840A (zh) * 1999-11-30 2003-03-12 部鲁尔科学公司 用于聚合物防反射涂料的非芳族发色团
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GB0127896D0 (en) 2001-11-21 2002-01-16 Eastman Kodak Co Solid particle dispersions and their use in the preparation of laser thermal media
US7375858B2 (en) * 2002-03-19 2008-05-20 Fujifilm Corporation Image data control apparatus and method for image-recording device
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US8142987B2 (en) 2004-04-10 2012-03-27 Eastman Kodak Company Method of producing a relief image for printing
US7317577B2 (en) * 2004-05-14 2008-01-08 Eastman Kodak Company Methods for producing a black matrix on a lenticular lens
US7867688B2 (en) * 2006-05-30 2011-01-11 Eastman Kodak Company Laser ablation resist
US7745101B2 (en) * 2006-06-02 2010-06-29 Eastman Kodak Company Nanoparticle patterning process
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
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Also Published As

Publication number Publication date
JP3699158B2 (ja) 2005-09-28
JPH0852948A (ja) 1996-02-27
EP0687567A2 (de) 1995-12-20
EP0687567B1 (de) 1998-09-16
DE69504759T2 (de) 1999-02-04
US5468591A (en) 1995-11-21
US5576144A (en) 1996-11-19
EP0687567A3 (de) 1996-08-07

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8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee