DE69503934T2 - Reaktives Mehrfachquelle-Abscheideverfahren zur Herstellung blaulichtemittierende Phosphorschichten für AC-TFEL-Vorrichtungen - Google Patents
Reaktives Mehrfachquelle-Abscheideverfahren zur Herstellung blaulichtemittierende Phosphorschichten für AC-TFEL-VorrichtungenInfo
- Publication number
- DE69503934T2 DE69503934T2 DE69503934T DE69503934T DE69503934T2 DE 69503934 T2 DE69503934 T2 DE 69503934T2 DE 69503934 T DE69503934 T DE 69503934T DE 69503934 T DE69503934 T DE 69503934T DE 69503934 T2 DE69503934 T2 DE 69503934T2
- Authority
- DE
- Germany
- Prior art keywords
- production
- blue light
- deposition process
- emitting phosphor
- phosphor layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/77—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
- C09K11/7715—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing cerium
- C09K11/7716—Chalcogenides
- C09K11/7718—Chalcogenides with alkaline earth metals
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/77—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
- C09K11/7728—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing europium
- C09K11/7729—Chalcogenides
- C09K11/7731—Chalcogenides with alkaline earth metals
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/88—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing selenium, tellurium or unspecified chalcogen elements
- C09K11/881—Chalcogenides
- C09K11/886—Chalcogenides with rare earth metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0623—Sulfides, selenides or tellurides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
- Luminescent Compositions (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/195,999 US5505986A (en) | 1994-02-14 | 1994-02-14 | Multi-source reactive deposition process for the preparation of blue light emitting phosphor layers for AC TFEL devices |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69503934D1 DE69503934D1 (de) | 1998-09-17 |
DE69503934T2 true DE69503934T2 (de) | 1998-12-10 |
Family
ID=22723708
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69503934T Expired - Fee Related DE69503934T2 (de) | 1994-02-14 | 1995-02-13 | Reaktives Mehrfachquelle-Abscheideverfahren zur Herstellung blaulichtemittierende Phosphorschichten für AC-TFEL-Vorrichtungen |
Country Status (4)
Country | Link |
---|---|
US (1) | US5505986A (de) |
EP (1) | EP0667383B1 (de) |
JP (1) | JPH088188A (de) |
DE (1) | DE69503934T2 (de) |
Families Citing this family (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1993021744A1 (en) * | 1992-04-16 | 1993-10-28 | Kabushiki Kaisha Komatsu Seisakusho | Thin-film el element |
JP3564737B2 (ja) * | 1994-06-24 | 2004-09-15 | 株式会社デンソー | エレクトロルミネッセンス素子の製造方法および製造装置 |
CA2171020C (en) * | 1994-07-04 | 1999-11-02 | Yoji Inoue | Ternary compound film and manufacturing method therefor |
JP2795194B2 (ja) * | 1994-09-22 | 1998-09-10 | 株式会社デンソー | エレクトロルミネッセンス素子とその製造方法 |
US6074575A (en) * | 1994-11-14 | 2000-06-13 | Mitsui Mining & Smelting Co., Ltd. | Thin film electro-luminescence device |
JPH08134440A (ja) * | 1994-11-14 | 1996-05-28 | Mitsui Mining & Smelting Co Ltd | 薄膜エレクトロルミネッセンス素子 |
US5834053A (en) * | 1994-11-30 | 1998-11-10 | The Regents Of The University Of California | Blue light emitting thiogallate phosphor |
JP3735949B2 (ja) * | 1996-06-28 | 2006-01-18 | 株式会社デンソー | 青色発光材料、それを用いたel素子、及びその製造方法 |
SG151084A1 (en) * | 1996-07-29 | 2009-04-30 | Nichia Corp | Light emitting device and display |
TW383508B (en) | 1996-07-29 | 2000-03-01 | Nichia Kagaku Kogyo Kk | Light emitting device and display |
DE19855476A1 (de) * | 1997-12-02 | 1999-06-17 | Murata Manufacturing Co | Lichtemittierendes Halbleiterelement mit einer Halbleiterschicht auf GaN-Basis, Verfahren zur Herstellung desselben und Verfahren zur Ausbildung einer Halbleiterschicht auf GaN-Basis |
JP3472236B2 (ja) | 2000-04-17 | 2003-12-02 | Tdk株式会社 | 蛍光体薄膜とその製造方法およびelパネル |
JP3704057B2 (ja) * | 2000-07-07 | 2005-10-05 | ザ ウエステイム コーポレイション | 蛍光体薄膜その製造方法、およびelパネル |
US6451460B1 (en) | 2000-09-08 | 2002-09-17 | Planner Systems, Inc. | Thin film electroluminescent device |
US20020122895A1 (en) * | 2000-09-14 | 2002-09-05 | Cheong Dan Daeweon | Magnesium barium thioaluminate and related phosphor materials |
US6610352B2 (en) * | 2000-12-22 | 2003-08-26 | Ifire Technology, Inc. | Multiple source deposition process |
US6656610B2 (en) * | 2001-04-19 | 2003-12-02 | Tdk Corporation | Phosphor thin film, preparation method, and EL panel |
US7005198B2 (en) * | 2001-04-19 | 2006-02-28 | The Westaim Corporation | Phosphor thin film, preparation method, and EL panel |
US6627251B2 (en) * | 2001-04-19 | 2003-09-30 | Tdk Corporation | Phosphor thin film, preparation method, and EL panel |
FR2826016B1 (fr) * | 2001-06-13 | 2004-07-23 | Rhodia Elect & Catalysis | Compose a base d'un alcalino-terreux, de soufre et d'aluminium, de gallium ou d'indium, son procede de preparation et son utilisation comme luminophore |
US6686062B2 (en) * | 2001-06-13 | 2004-02-03 | Ifire Technology Inc. | Magnesium calcium thioaluminate phosphor |
US9261460B2 (en) | 2002-03-12 | 2016-02-16 | Enzo Life Sciences, Inc. | Real-time nucleic acid detection processes and compositions |
US6793782B2 (en) | 2001-12-21 | 2004-09-21 | Ifire Technology Inc. | Sputter deposition process for electroluminescent phosphors |
TWI262034B (en) * | 2002-02-05 | 2006-09-11 | Semiconductor Energy Lab | Manufacturing system, manufacturing method, method of operating a manufacturing apparatus, and light emitting device |
TWI285515B (en) * | 2002-02-22 | 2007-08-11 | Semiconductor Energy Lab | Light-emitting device and method of manufacturing the same, and method of operating manufacturing apparatus |
US6838114B2 (en) | 2002-05-24 | 2005-01-04 | Micron Technology, Inc. | Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces |
US6955725B2 (en) | 2002-08-15 | 2005-10-18 | Micron Technology, Inc. | Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces |
US7118928B2 (en) * | 2002-12-02 | 2006-10-10 | University Of Cincinnati | Method of forming a semiconductor phosphor layer by metalorganic chemical vapor deposition for use in light-emitting devices |
CN1820551B (zh) * | 2002-12-20 | 2010-10-06 | 伊菲雷知识产权公司 | 用于电致发光显示器的氮化铝钝化的荧光体 |
JP2007527950A (ja) * | 2003-07-03 | 2007-10-04 | アイファイアー・テクノロジー・コープ | 発光体堆積のための硫化水素注入方法 |
US7109648B2 (en) * | 2003-08-02 | 2006-09-19 | Phosphortech Inc. | Light emitting device having thio-selenide fluorescent phosphor |
US7581511B2 (en) | 2003-10-10 | 2009-09-01 | Micron Technology, Inc. | Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes |
CA2554756A1 (en) * | 2004-03-04 | 2005-09-15 | Ifire Technology Corp. | Reactive metal sources and deposition method for thioaluminate phosphors |
US8133554B2 (en) | 2004-05-06 | 2012-03-13 | Micron Technology, Inc. | Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces |
US7699932B2 (en) | 2004-06-02 | 2010-04-20 | Micron Technology, Inc. | Reactors, systems and methods for depositing thin films onto microfeature workpieces |
JP4849829B2 (ja) * | 2005-05-15 | 2012-01-11 | 株式会社ソニー・コンピュータエンタテインメント | センタ装置 |
JP6010026B2 (ja) | 2010-07-19 | 2016-10-19 | レンセレイアー ポリテクニック インスティテュート | フルスペクトル半導体白色光源、製造方法および応用 |
US10304979B2 (en) * | 2015-01-30 | 2019-05-28 | International Business Machines Corporation | In situ nitrogen doping of co-evaporated copper-zinc-tin-sulfo-selenide by nitrogen plasma |
CN106756782A (zh) * | 2017-01-22 | 2017-05-31 | 燕园众欣纳米科技(北京)有限公司 | 一种pvd法制备二硫化钨纳米薄膜的方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4720436A (en) * | 1985-09-11 | 1988-01-19 | Ricoh Company, Ltd. | Electroluminescence devices and method of fabricating the same |
JPS6279285A (ja) * | 1985-10-01 | 1987-04-11 | Ricoh Co Ltd | 薄膜エレクトロルミネツセンス素子 |
US5309070A (en) * | 1991-03-12 | 1994-05-03 | Sun Sey Shing | AC TFEL device having blue light emitting thiogallate phosphor |
-
1994
- 1994-02-14 US US08/195,999 patent/US5505986A/en not_active Expired - Lifetime
-
1995
- 1995-02-13 DE DE69503934T patent/DE69503934T2/de not_active Expired - Fee Related
- 1995-02-13 EP EP95300880A patent/EP0667383B1/de not_active Expired - Lifetime
- 1995-02-14 JP JP7025408A patent/JPH088188A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE69503934D1 (de) | 1998-09-17 |
JPH088188A (ja) | 1996-01-12 |
EP0667383A2 (de) | 1995-08-16 |
EP0667383A3 (de) | 1995-11-22 |
EP0667383B1 (de) | 1998-08-12 |
US5505986A (en) | 1996-04-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |