DE69503934T2 - Reaktives Mehrfachquelle-Abscheideverfahren zur Herstellung blaulichtemittierende Phosphorschichten für AC-TFEL-Vorrichtungen - Google Patents

Reaktives Mehrfachquelle-Abscheideverfahren zur Herstellung blaulichtemittierende Phosphorschichten für AC-TFEL-Vorrichtungen

Info

Publication number
DE69503934T2
DE69503934T2 DE69503934T DE69503934T DE69503934T2 DE 69503934 T2 DE69503934 T2 DE 69503934T2 DE 69503934 T DE69503934 T DE 69503934T DE 69503934 T DE69503934 T DE 69503934T DE 69503934 T2 DE69503934 T2 DE 69503934T2
Authority
DE
Germany
Prior art keywords
production
blue light
deposition process
emitting phosphor
phosphor layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69503934T
Other languages
English (en)
Other versions
DE69503934D1 (de
Inventor
Karl-Otto Velthaus
Reiner H Mauch
Achim T Oberacker
Hans-Werner Schock
Sey-Shing Sun
Randall C Wentross
Richard T Tuenge
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Planar Systems Inc
Original Assignee
Planar Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Planar Systems Inc filed Critical Planar Systems Inc
Publication of DE69503934D1 publication Critical patent/DE69503934D1/de
Application granted granted Critical
Publication of DE69503934T2 publication Critical patent/DE69503934T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/77Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
    • C09K11/7715Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing cerium
    • C09K11/7716Chalcogenides
    • C09K11/7718Chalcogenides with alkaline earth metals
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/77Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
    • C09K11/7728Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing europium
    • C09K11/7729Chalcogenides
    • C09K11/7731Chalcogenides with alkaline earth metals
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/88Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing selenium, tellurium or unspecified chalcogen elements
    • C09K11/881Chalcogenides
    • C09K11/886Chalcogenides with rare earth metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623Sulfides, selenides or tellurides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/541Heating or cooling of the substrates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/10Apparatus or processes specially adapted to the manufacture of electroluminescent light sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Luminescent Compositions (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
DE69503934T 1994-02-14 1995-02-13 Reaktives Mehrfachquelle-Abscheideverfahren zur Herstellung blaulichtemittierende Phosphorschichten für AC-TFEL-Vorrichtungen Expired - Fee Related DE69503934T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/195,999 US5505986A (en) 1994-02-14 1994-02-14 Multi-source reactive deposition process for the preparation of blue light emitting phosphor layers for AC TFEL devices

Publications (2)

Publication Number Publication Date
DE69503934D1 DE69503934D1 (de) 1998-09-17
DE69503934T2 true DE69503934T2 (de) 1998-12-10

Family

ID=22723708

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69503934T Expired - Fee Related DE69503934T2 (de) 1994-02-14 1995-02-13 Reaktives Mehrfachquelle-Abscheideverfahren zur Herstellung blaulichtemittierende Phosphorschichten für AC-TFEL-Vorrichtungen

Country Status (4)

Country Link
US (1) US5505986A (de)
EP (1) EP0667383B1 (de)
JP (1) JPH088188A (de)
DE (1) DE69503934T2 (de)

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WO1993021744A1 (en) * 1992-04-16 1993-10-28 Kabushiki Kaisha Komatsu Seisakusho Thin-film el element
JP3564737B2 (ja) * 1994-06-24 2004-09-15 株式会社デンソー エレクトロルミネッセンス素子の製造方法および製造装置
CA2171020C (en) * 1994-07-04 1999-11-02 Yoji Inoue Ternary compound film and manufacturing method therefor
JP2795194B2 (ja) * 1994-09-22 1998-09-10 株式会社デンソー エレクトロルミネッセンス素子とその製造方法
US6074575A (en) * 1994-11-14 2000-06-13 Mitsui Mining & Smelting Co., Ltd. Thin film electro-luminescence device
JPH08134440A (ja) * 1994-11-14 1996-05-28 Mitsui Mining & Smelting Co Ltd 薄膜エレクトロルミネッセンス素子
US5834053A (en) * 1994-11-30 1998-11-10 The Regents Of The University Of California Blue light emitting thiogallate phosphor
JP3735949B2 (ja) * 1996-06-28 2006-01-18 株式会社デンソー 青色発光材料、それを用いたel素子、及びその製造方法
SG151084A1 (en) * 1996-07-29 2009-04-30 Nichia Corp Light emitting device and display
TW383508B (en) 1996-07-29 2000-03-01 Nichia Kagaku Kogyo Kk Light emitting device and display
DE19855476A1 (de) * 1997-12-02 1999-06-17 Murata Manufacturing Co Lichtemittierendes Halbleiterelement mit einer Halbleiterschicht auf GaN-Basis, Verfahren zur Herstellung desselben und Verfahren zur Ausbildung einer Halbleiterschicht auf GaN-Basis
JP3472236B2 (ja) 2000-04-17 2003-12-02 Tdk株式会社 蛍光体薄膜とその製造方法およびelパネル
JP3704057B2 (ja) * 2000-07-07 2005-10-05 ザ ウエステイム コーポレイション 蛍光体薄膜その製造方法、およびelパネル
US6451460B1 (en) 2000-09-08 2002-09-17 Planner Systems, Inc. Thin film electroluminescent device
US20020122895A1 (en) * 2000-09-14 2002-09-05 Cheong Dan Daeweon Magnesium barium thioaluminate and related phosphor materials
US6610352B2 (en) * 2000-12-22 2003-08-26 Ifire Technology, Inc. Multiple source deposition process
US6656610B2 (en) * 2001-04-19 2003-12-02 Tdk Corporation Phosphor thin film, preparation method, and EL panel
US7005198B2 (en) * 2001-04-19 2006-02-28 The Westaim Corporation Phosphor thin film, preparation method, and EL panel
US6627251B2 (en) * 2001-04-19 2003-09-30 Tdk Corporation Phosphor thin film, preparation method, and EL panel
FR2826016B1 (fr) * 2001-06-13 2004-07-23 Rhodia Elect & Catalysis Compose a base d'un alcalino-terreux, de soufre et d'aluminium, de gallium ou d'indium, son procede de preparation et son utilisation comme luminophore
US6686062B2 (en) * 2001-06-13 2004-02-03 Ifire Technology Inc. Magnesium calcium thioaluminate phosphor
US9261460B2 (en) 2002-03-12 2016-02-16 Enzo Life Sciences, Inc. Real-time nucleic acid detection processes and compositions
US6793782B2 (en) 2001-12-21 2004-09-21 Ifire Technology Inc. Sputter deposition process for electroluminescent phosphors
TWI262034B (en) * 2002-02-05 2006-09-11 Semiconductor Energy Lab Manufacturing system, manufacturing method, method of operating a manufacturing apparatus, and light emitting device
TWI285515B (en) * 2002-02-22 2007-08-11 Semiconductor Energy Lab Light-emitting device and method of manufacturing the same, and method of operating manufacturing apparatus
US6838114B2 (en) 2002-05-24 2005-01-04 Micron Technology, Inc. Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces
US6955725B2 (en) 2002-08-15 2005-10-18 Micron Technology, Inc. Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
US7118928B2 (en) * 2002-12-02 2006-10-10 University Of Cincinnati Method of forming a semiconductor phosphor layer by metalorganic chemical vapor deposition for use in light-emitting devices
CN1820551B (zh) * 2002-12-20 2010-10-06 伊菲雷知识产权公司 用于电致发光显示器的氮化铝钝化的荧光体
JP2007527950A (ja) * 2003-07-03 2007-10-04 アイファイアー・テクノロジー・コープ 発光体堆積のための硫化水素注入方法
US7109648B2 (en) * 2003-08-02 2006-09-19 Phosphortech Inc. Light emitting device having thio-selenide fluorescent phosphor
US7581511B2 (en) 2003-10-10 2009-09-01 Micron Technology, Inc. Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes
CA2554756A1 (en) * 2004-03-04 2005-09-15 Ifire Technology Corp. Reactive metal sources and deposition method for thioaluminate phosphors
US8133554B2 (en) 2004-05-06 2012-03-13 Micron Technology, Inc. Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
US7699932B2 (en) 2004-06-02 2010-04-20 Micron Technology, Inc. Reactors, systems and methods for depositing thin films onto microfeature workpieces
JP4849829B2 (ja) * 2005-05-15 2012-01-11 株式会社ソニー・コンピュータエンタテインメント センタ装置
JP6010026B2 (ja) 2010-07-19 2016-10-19 レンセレイアー ポリテクニック インスティテュート フルスペクトル半導体白色光源、製造方法および応用
US10304979B2 (en) * 2015-01-30 2019-05-28 International Business Machines Corporation In situ nitrogen doping of co-evaporated copper-zinc-tin-sulfo-selenide by nitrogen plasma
CN106756782A (zh) * 2017-01-22 2017-05-31 燕园众欣纳米科技(北京)有限公司 一种pvd法制备二硫化钨纳米薄膜的方法

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US4720436A (en) * 1985-09-11 1988-01-19 Ricoh Company, Ltd. Electroluminescence devices and method of fabricating the same
JPS6279285A (ja) * 1985-10-01 1987-04-11 Ricoh Co Ltd 薄膜エレクトロルミネツセンス素子
US5309070A (en) * 1991-03-12 1994-05-03 Sun Sey Shing AC TFEL device having blue light emitting thiogallate phosphor

Also Published As

Publication number Publication date
DE69503934D1 (de) 1998-09-17
JPH088188A (ja) 1996-01-12
EP0667383A2 (de) 1995-08-16
EP0667383A3 (de) 1995-11-22
EP0667383B1 (de) 1998-08-12
US5505986A (en) 1996-04-09

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Legal Events

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8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee