DE69502894T2 - Fotoempfindliches Aufzeichnungsmaterial, fotoempfindliches Aufzeichnungsmedium und ein dieses Medium benutzendes Verfahren zum Herstellen von Hologrammen - Google Patents

Fotoempfindliches Aufzeichnungsmaterial, fotoempfindliches Aufzeichnungsmedium und ein dieses Medium benutzendes Verfahren zum Herstellen von Hologrammen

Info

Publication number
DE69502894T2
DE69502894T2 DE69502894T DE69502894T DE69502894T2 DE 69502894 T2 DE69502894 T2 DE 69502894T2 DE 69502894 T DE69502894 T DE 69502894T DE 69502894 T DE69502894 T DE 69502894T DE 69502894 T2 DE69502894 T2 DE 69502894T2
Authority
DE
Germany
Prior art keywords
photosensitive recording
medium
recording material
producing holograms
recording medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69502894T
Other languages
English (en)
Other versions
DE69502894D1 (de
Inventor
Yasushi Ohe
Hiromitsu Ito
Niro Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Publication of DE69502894D1 publication Critical patent/DE69502894D1/de
Application granted granted Critical
Publication of DE69502894T2 publication Critical patent/DE69502894T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Holo Graphy (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Epoxy Resins (AREA)
DE69502894T 1994-07-29 1995-07-18 Fotoempfindliches Aufzeichnungsmaterial, fotoempfindliches Aufzeichnungsmedium und ein dieses Medium benutzendes Verfahren zum Herstellen von Hologrammen Expired - Fee Related DE69502894T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP06178812A JP3075090B2 (ja) 1994-07-29 1994-07-29 ホログラム感光性記録材料およびホログラム感光性記録媒体並びにそれを用いたホログラム製造方法

Publications (2)

Publication Number Publication Date
DE69502894D1 DE69502894D1 (de) 1998-07-16
DE69502894T2 true DE69502894T2 (de) 1998-12-17

Family

ID=16055096

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69502894T Expired - Fee Related DE69502894T2 (de) 1994-07-29 1995-07-18 Fotoempfindliches Aufzeichnungsmaterial, fotoempfindliches Aufzeichnungsmedium und ein dieses Medium benutzendes Verfahren zum Herstellen von Hologrammen

Country Status (5)

Country Link
US (1) US6045953A (de)
EP (1) EP0697631B1 (de)
JP (1) JP3075090B2 (de)
AU (1) AU693222B2 (de)
DE (1) DE69502894T2 (de)

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US6489065B1 (en) * 1996-05-17 2002-12-03 Polaroid Corporation Holographic medium and process for use thereof
US6323251B1 (en) * 1999-09-24 2001-11-27 3M Innovative Properties Co Thermoplastic/thermoset hybrid foams and methods for making same
LT4842B (lt) 1999-12-10 2001-09-25 Uab "Geola" Hologramų spausdinimo būdas ir įrenginys
US6485306B1 (en) * 2001-07-10 2002-11-26 Aiptek International Inc. Locus-recordable portable handwriting device
US6999397B2 (en) * 2001-03-23 2006-02-14 Daewoo Electronics Corp. Holographic digital data storage system compatible with holographic and reflective medium
JP4155771B2 (ja) * 2001-08-27 2008-09-24 大日本印刷株式会社 体積型ホログラム記録用感光性組成物及びそれを用いた体積型ホログラム記録用感光性媒体
GB0124807D0 (en) 2001-10-16 2001-12-05 Geola Technologies Ltd Fast 2-step digital holographic printer
DE10153028A1 (de) * 2001-10-26 2003-05-08 Xetos Ag Holographisches Aufzeichnungsmaterial und Verfahren zur Bildung eines lichtbeständigen Hologramms
GB0202139D0 (en) 2002-01-30 2002-03-20 Xyz Imaging Inc Methods concerning the preparation of digital data required in holographic printing machines
US7282322B2 (en) * 2002-05-29 2007-10-16 Songvit Setthachayanon Long-term high temperature and humidity stable holographic optical data storage media compositions with exceptional high dynamic range
US7229741B2 (en) 2002-05-29 2007-06-12 Inphase Technologies, Inc. Exceptional high reflective index photoactive compound for optical applications
FR2840269B1 (fr) * 2002-05-30 2005-01-28 Plastic Omnium Cie Piece de style et vehicule automobile comportant une telle piece de style
AU2003247228A1 (en) * 2002-06-20 2004-01-06 Dsm Ip Assets B.V. Compositions comprising a benzophenone photoinitiator
US20060128822A1 (en) * 2002-07-30 2006-06-15 Toagosei Co., Ltd. Composition for holography, method of curing the same, and cured article
WO2004090646A1 (ja) * 2003-04-09 2004-10-21 Konica Minolta Medical & Graphic, Inc. ホログラフィック記録メディア及びその記録方法
GB0424294D0 (en) * 2004-11-03 2004-12-01 Elam T Ltd Buffer layer
US20060199081A1 (en) * 2005-03-04 2006-09-07 General Electric Company Holographic storage medium, article and method
US7799885B2 (en) 2005-11-30 2010-09-21 Corning Incorporated Photo or electron beam curable compositions
US20120075577A1 (en) 2006-03-20 2012-03-29 Ishak Andrew W High performance selective light wavelength filtering providing improved contrast sensitivity
US8882267B2 (en) * 2006-03-20 2014-11-11 High Performance Optics, Inc. High energy visible light filter systems with yellowness index values
JP2010506340A (ja) * 2006-06-27 2010-02-25 ベリロック エルエルシー 著作権侵害に対して保護された光媒体のための被覆系
US20080241706A1 (en) * 2007-03-30 2008-10-02 Industrial Technology Research Institute Holographic data storage medium and fabrication method thereof
WO2009014133A1 (ja) * 2007-07-24 2009-01-29 Kyoeisha Chemical Co., Ltd. ホログラフィック記録媒体用組成物
JP6028455B2 (ja) * 2012-08-24 2016-11-16 大日本印刷株式会社 体積型ホログラム記録用感光性組成物、体積型ホログラム記録用感光性基板、及び、体積型ホログラム記録体
US9207533B2 (en) * 2014-02-07 2015-12-08 Eastman Kodak Company Photopolymerizable compositions for electroless plating methods
KR102463384B1 (ko) 2016-02-19 2022-11-04 애버리 데니슨 코포레이션 접착제를 제조하는 2단계 방법 및 관련 조성물
CN110099939B (zh) 2016-10-25 2022-09-06 艾利丹尼森公司 在主链中具有光引发剂基团的嵌段聚合物及其用于粘合剂组合物中的用途

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE755251A (fr) * 1969-08-25 1971-02-25 Du Pont Enregistrement holographique dans des couches photopoly- merisables
JPS5632551A (en) * 1979-08-23 1981-04-02 Japan Atom Energy Res Inst Aqueous coating resin composition
JPS61231022A (ja) * 1985-04-04 1986-10-15 Nippon Soda Co Ltd 封着用光硬化性組成物
JPS62273226A (ja) * 1986-05-20 1987-11-27 Nippon Soda Co Ltd 無電解メッキ用光硬化性レジスト樹脂組成物
US4942112A (en) * 1988-01-15 1990-07-17 E. I. Du Pont De Nemours And Company Photopolymerizable compositions and elements for refractive index imaging
US5098803A (en) * 1988-01-15 1992-03-24 E. I. Du Pont De Nemours And Company Photopolymerizable compositions and elements for refractive index imaging
US5260149A (en) * 1988-01-15 1993-11-09 E. I. Du Pont De Nemours And Company Photopolymerizable compositions in elements for hologram imaging
WO1989007620A1 (en) * 1988-02-19 1989-08-24 Asahi Denka Kogyo K.K. Resin composition for optical modeling
EP0487086B2 (de) * 1990-11-22 2008-08-13 Canon Kabushiki Kaisha Verfahren zum Herstellen von einem Volumen-Phasenhologram mit einem photoempfindlichen Aufzeichnungsmedium
JP2873126B2 (ja) * 1991-04-17 1999-03-24 日本ペイント株式会社 体積ホログラム記録用感光性組成物
JPH0586149A (ja) * 1991-09-30 1993-04-06 I C I Japan Kk 光立体成形用樹脂組成物並びに立体成形体の形成方法
JPH0594014A (ja) * 1991-10-02 1993-04-16 Nissan Motor Co Ltd ホログラム用感光性樹脂組成物

Also Published As

Publication number Publication date
JPH0844277A (ja) 1996-02-16
JP3075090B2 (ja) 2000-08-07
AU2723595A (en) 1996-02-08
AU693222B2 (en) 1998-06-25
EP0697631B1 (de) 1998-06-10
DE69502894D1 (de) 1998-07-16
EP0697631A1 (de) 1996-02-21
US6045953A (en) 2000-04-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee