AU2003247228A1 - Compositions comprising a benzophenone photoinitiator - Google Patents

Compositions comprising a benzophenone photoinitiator

Info

Publication number
AU2003247228A1
AU2003247228A1 AU2003247228A AU2003247228A AU2003247228A1 AU 2003247228 A1 AU2003247228 A1 AU 2003247228A1 AU 2003247228 A AU2003247228 A AU 2003247228A AU 2003247228 A AU2003247228 A AU 2003247228A AU 2003247228 A1 AU2003247228 A1 AU 2003247228A1
Authority
AU
Australia
Prior art keywords
compositions
benzophenone photoinitiator
photoinitiator
benzophenone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003247228A
Inventor
John Alan Lawton
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DSM IP Assets BV
Original Assignee
DSM IP Assets BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/NL2002/000408 external-priority patent/WO2003001295A1/en
Application filed by DSM IP Assets BV filed Critical DSM IP Assets BV
Publication of AU2003247228A1 publication Critical patent/AU2003247228A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
AU2003247228A 2002-06-20 2003-06-20 Compositions comprising a benzophenone photoinitiator Abandoned AU2003247228A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
AU2002345430 2002-06-20
PCT/NL2002/000408 WO2003001295A1 (en) 2001-06-21 2002-06-20 Radiation-curable resin composition and rapid prototyping process using the same
US41551402P 2002-10-03 2002-10-03
US60/415,514 2002-10-03
PCT/NL2003/000457 WO2004001507A1 (en) 2002-06-20 2003-06-20 Compositions comprising a benzophenone photoinitiator

Publications (1)

Publication Number Publication Date
AU2003247228A1 true AU2003247228A1 (en) 2004-01-06

Family

ID=30002426

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003247228A Abandoned AU2003247228A1 (en) 2002-06-20 2003-06-20 Compositions comprising a benzophenone photoinitiator

Country Status (2)

Country Link
AU (1) AU2003247228A1 (en)
WO (1) WO2004001507A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4874116B2 (en) 2003-11-06 2012-02-15 ハンツマン・アドヴァンスト・マテリアルズ・（スイッツランド）・ゲーエムベーハー Photocurable composition for producing cured articles having high transparency and improved mechanical properties
US20060172230A1 (en) * 2005-02-02 2006-08-03 Dsm Ip Assets B.V. Method and composition for reducing waste in photo-imaging applications

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4623676A (en) * 1985-01-18 1986-11-18 Minnesota Mining And Manufacturing Company Protective coating for phototools
JP2873126B2 (en) * 1991-04-17 1999-03-24 日本ペイント株式会社 Photosensitive composition for volume hologram recording
JP3075090B2 (en) * 1994-07-29 2000-08-07 凸版印刷株式会社 Hologram photosensitive recording material, hologram photosensitive recording medium, and hologram manufacturing method using the same
JP3408331B2 (en) * 1994-09-12 2003-05-19 旭電化工業株式会社 Photocurable hard coat composition and coated article thereof
WO1996035756A1 (en) * 1995-05-12 1996-11-14 Asahi Denka Kogyo Kabushiki Kaisha Stereolithographic resin composition and stereolithographic method
US6287745B1 (en) * 1998-02-18 2001-09-11 Dsm N.V. Photocurable liquid resin composition comprising an epoxy-branched alicyclic compound

Also Published As

Publication number Publication date
WO2004001507A1 (en) 2003-12-31

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase