DE69502741D1 - Lichtempfindliche wässrige Emulsion, lichtempfindlicher Film und Verfahren zur Herstellung - Google Patents

Lichtempfindliche wässrige Emulsion, lichtempfindlicher Film und Verfahren zur Herstellung

Info

Publication number
DE69502741D1
DE69502741D1 DE69502741T DE69502741T DE69502741D1 DE 69502741 D1 DE69502741 D1 DE 69502741D1 DE 69502741 T DE69502741 T DE 69502741T DE 69502741 T DE69502741 T DE 69502741T DE 69502741 D1 DE69502741 D1 DE 69502741D1
Authority
DE
Germany
Prior art keywords
photosensitive
manufacturing
aqueous emulsion
film
photosensitive film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69502741T
Other languages
English (en)
Other versions
DE69502741T2 (de
Inventor
Richard J Kempf
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of DE69502741D1 publication Critical patent/DE69502741D1/de
Publication of DE69502741T2 publication Critical patent/DE69502741T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F3/00—Colour separation; Correction of tonal value
    • G03F3/10—Checking the colour or tonal value of separation negatives or positives
    • G03F3/106—Checking the colour or tonal value of separation negatives or positives using non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, other than silicon containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
DE69502741T 1994-01-10 1995-01-09 Lichtempfindliche wässrige Emulsion, lichtempfindlicher Film und Verfahren zur Herstellung Expired - Fee Related DE69502741T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US17871894A 1994-01-10 1994-01-10

Publications (2)

Publication Number Publication Date
DE69502741D1 true DE69502741D1 (de) 1998-07-09
DE69502741T2 DE69502741T2 (de) 1998-10-01

Family

ID=22653663

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69502741T Expired - Fee Related DE69502741T2 (de) 1994-01-10 1995-01-09 Lichtempfindliche wässrige Emulsion, lichtempfindlicher Film und Verfahren zur Herstellung

Country Status (5)

Country Link
EP (1) EP0666504B1 (de)
JP (1) JP3507569B2 (de)
KR (1) KR950033652A (de)
DE (1) DE69502741T2 (de)
TW (1) TW353728B (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU660882B1 (en) * 1994-01-25 1995-07-06 Morton International, Inc. Waterborne photoresists having non-ionic fluorocarbon surfactants
US5364737A (en) * 1994-01-25 1994-11-15 Morton International, Inc. Waterbone photoresists having associate thickeners
AU661438B1 (en) * 1994-01-25 1995-07-20 Morton International, Inc. Waterborne photoresists having polysiloxanes
AU660881B1 (en) * 1994-01-25 1995-07-06 Morton International, Inc. Waterborne photoresists having binders neutralized with amino acrylates
AU709577B2 (en) * 1995-06-07 1999-09-02 E.I. Du Pont De Nemours And Company Process for using photoimageable films prepared from aqueous photoimageable liquid emulsions
US5925499A (en) * 1995-08-01 1999-07-20 Morton International, Inc. Epoxy-containing waterborne photoimageable composition
US6010821A (en) 1997-05-23 2000-01-04 Minnesota Mining And Manufacturing Company Aqueous developable color proofing elements
JP2002503763A (ja) * 1998-02-23 2002-02-05 ミネソタ マイニング アンド マニュファクチャリング カンパニー インクジェット記録シート
JP2003035953A (ja) * 2001-07-23 2003-02-07 Hitachi Chem Co Ltd 高密度・高解像度用の感光性樹脂組成物及びその用途
US7141614B2 (en) 2001-10-30 2006-11-28 Kaneka Corporation Photosensitive resin composition and photosensitive films and laminates made by using the same
US7605343B2 (en) 2006-05-24 2009-10-20 Electro Scientific Industries, Inc. Micromachining with short-pulsed, solid-state UV laser
KR101811091B1 (ko) * 2011-03-03 2017-12-20 닛코-매터리얼즈 가부시키가이샤 감광성 수지 조성물, 이를 이용한 포토레지스트 필름, 레지스터 패턴의 형성 방법 및 도체 패턴의 형성 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3979342A (en) * 1973-07-24 1976-09-07 E. I. Du Pont De Nemours And Company Manufacture of vesiculated polymer granules
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation
DE59108989D1 (de) * 1990-12-18 1998-06-25 Ciba Geigy Ag Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungs- bzw. Dispersionsmittel
CA2084369A1 (en) * 1991-12-11 1993-06-12 Brent T. Speelman Water-borne photoimageable compositions

Also Published As

Publication number Publication date
EP0666504A1 (de) 1995-08-09
EP0666504B1 (de) 1998-06-03
DE69502741T2 (de) 1998-10-01
KR950033652A (ko) 1995-12-26
TW353728B (en) 1999-03-01
JPH07253667A (ja) 1995-10-03
JP3507569B2 (ja) 2004-03-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee