TW353728B - Liquid photoimageable composition - Google Patents

Liquid photoimageable composition

Info

Publication number
TW353728B
TW353728B TW084100381A TW84100381A TW353728B TW 353728 B TW353728 B TW 353728B TW 084100381 A TW084100381 A TW 084100381A TW 84100381 A TW84100381 A TW 84100381A TW 353728 B TW353728 B TW 353728B
Authority
TW
Taiwan
Prior art keywords
acid
photoimageable composition
liquid composition
liquid photoimageable
precursor polymer
Prior art date
Application number
TW084100381A
Other languages
English (en)
Inventor
Richard J Kempf
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Application granted granted Critical
Publication of TW353728B publication Critical patent/TW353728B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F3/00—Colour separation; Correction of tonal value
    • G03F3/10—Checking the colour or tonal value of separation negatives or positives
    • G03F3/106—Checking the colour or tonal value of separation negatives or positives using non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, other than silicon containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
TW084100381A 1994-01-10 1995-01-17 Liquid photoimageable composition TW353728B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US17871894A 1994-01-10 1994-01-10

Publications (1)

Publication Number Publication Date
TW353728B true TW353728B (en) 1999-03-01

Family

ID=22653663

Family Applications (1)

Application Number Title Priority Date Filing Date
TW084100381A TW353728B (en) 1994-01-10 1995-01-17 Liquid photoimageable composition

Country Status (5)

Country Link
EP (1) EP0666504B1 (zh)
JP (1) JP3507569B2 (zh)
KR (1) KR950033652A (zh)
DE (1) DE69502741T2 (zh)
TW (1) TW353728B (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU661438B1 (en) * 1994-01-25 1995-07-20 Morton International, Inc. Waterborne photoresists having polysiloxanes
AU660881B1 (en) * 1994-01-25 1995-07-06 Morton International, Inc. Waterborne photoresists having binders neutralized with amino acrylates
US5364737A (en) * 1994-01-25 1994-11-15 Morton International, Inc. Waterbone photoresists having associate thickeners
AU660882B1 (en) * 1994-01-25 1995-07-06 Morton International, Inc. Waterborne photoresists having non-ionic fluorocarbon surfactants
AU709577B2 (en) * 1995-06-07 1999-09-02 E.I. Du Pont De Nemours And Company Process for using photoimageable films prepared from aqueous photoimageable liquid emulsions
US5925499A (en) * 1995-08-01 1999-07-20 Morton International, Inc. Epoxy-containing waterborne photoimageable composition
US6010821A (en) 1997-05-23 2000-01-04 Minnesota Mining And Manufacturing Company Aqueous developable color proofing elements
JP2002503763A (ja) * 1998-02-23 2002-02-05 ミネソタ マイニング アンド マニュファクチャリング カンパニー インクジェット記録シート
JP2003035953A (ja) * 2001-07-23 2003-02-07 Hitachi Chem Co Ltd 高密度・高解像度用の感光性樹脂組成物及びその用途
KR100589067B1 (ko) 2001-10-30 2006-06-14 가부시키가이샤 가네카 감광성 수지 조성물, 이것을 이용한 감광성 필름 및 적층체
US7605343B2 (en) 2006-05-24 2009-10-20 Electro Scientific Industries, Inc. Micromachining with short-pulsed, solid-state UV laser
WO2012118031A1 (ja) * 2011-03-03 2012-09-07 ニチゴー・モートン株式会社 感光性樹脂組成物、これを用いたフォトレジストフィルム、レジストパターンの形成方法及び導体パターンの形成方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3979342A (en) * 1973-07-24 1976-09-07 E. I. Du Pont De Nemours And Company Manufacture of vesiculated polymer granules
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation
DE59108989D1 (de) * 1990-12-18 1998-06-25 Ciba Geigy Ag Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungs- bzw. Dispersionsmittel
CA2084369A1 (en) * 1991-12-11 1993-06-12 Brent T. Speelman Water-borne photoimageable compositions

Also Published As

Publication number Publication date
EP0666504A1 (en) 1995-08-09
JPH07253667A (ja) 1995-10-03
KR950033652A (ko) 1995-12-26
DE69502741D1 (de) 1998-07-09
DE69502741T2 (de) 1998-10-01
EP0666504B1 (en) 1998-06-03
JP3507569B2 (ja) 2004-03-15

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees