DE69429648D1 - Aufgedampfter film, verfahren zur messung von dessen form, verfahren zur überwachung des herstellungsprozesses, herstellungsverfahren, formbestimmungsvorrichtung und überwachungsvorrichtung - Google Patents

Aufgedampfter film, verfahren zur messung von dessen form, verfahren zur überwachung des herstellungsprozesses, herstellungsverfahren, formbestimmungsvorrichtung und überwachungsvorrichtung

Info

Publication number
DE69429648D1
DE69429648D1 DE69429648T DE69429648T DE69429648D1 DE 69429648 D1 DE69429648 D1 DE 69429648D1 DE 69429648 T DE69429648 T DE 69429648T DE 69429648 T DE69429648 T DE 69429648T DE 69429648 D1 DE69429648 D1 DE 69429648D1
Authority
DE
Germany
Prior art keywords
monitoring
manufacturing
measuring
manufacturing process
evaporated film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69429648T
Other languages
English (en)
Other versions
DE69429648T2 (de
Inventor
Tugio Yatsushiro
Jun Torikai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Publication of DE69429648D1 publication Critical patent/DE69429648D1/de
Application granted granted Critical
Publication of DE69429648T2 publication Critical patent/DE69429648T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/002—Details
    • H01G4/018—Dielectrics
    • H01G4/06—Solid dielectrics
    • H01G4/14—Organic dielectrics
    • H01G4/145—Organic dielectrics vapour deposited

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physical Vapour Deposition (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE69429648T 1993-06-29 1994-06-23 Aufgedampfter film, verfahren zur messung von dessen form, verfahren zur überwachung des herstellungsprozesses, herstellungsverfahren, formbestimmungsvorrichtung und überwachungsvorrichtung Expired - Lifetime DE69429648T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP5158582A JP2914098B2 (ja) 1993-06-29 1993-06-29 蒸着フィルムの測定、制御方法、装置および製造方法
PCT/JP1994/001006 WO1995001463A1 (fr) 1993-06-29 1994-06-23 Couche deposee, procede de mesure de la forme d'une couche deposee, procede de commande de processus de fabrication, procede de fabrication, appareil de mesure de formes, et appareil de commande de processus de fabrication

Publications (2)

Publication Number Publication Date
DE69429648D1 true DE69429648D1 (de) 2002-02-21
DE69429648T2 DE69429648T2 (de) 2002-08-14

Family

ID=15674843

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69429648T Expired - Lifetime DE69429648T2 (de) 1993-06-29 1994-06-23 Aufgedampfter film, verfahren zur messung von dessen form, verfahren zur überwachung des herstellungsprozesses, herstellungsverfahren, formbestimmungsvorrichtung und überwachungsvorrichtung

Country Status (6)

Country Link
US (1) US5595781A (de)
EP (1) EP0663458B1 (de)
JP (1) JP2914098B2 (de)
KR (1) KR100303257B1 (de)
DE (1) DE69429648T2 (de)
WO (1) WO1995001463A1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3397210B2 (ja) * 1997-03-19 2003-04-14 松下電器産業株式会社 薄膜の製造方法及び製造装置
EP1035553B1 (de) * 1997-11-18 2006-12-27 Matsushita Electric Industrial Co., Ltd. Verfahren zur herstellung von laminat
KR100332802B1 (ko) * 2000-02-07 2002-04-18 구자홍 Ｕｖ 스펙트로미터를 이용한 플라즈마로 중합된 고분자막성능 평가 장치
EP1209252A3 (de) * 2000-09-15 2002-11-27 Shipley Co. L.L.C. Vorrichtung zum kontinuierlichen Beschichten
DE102004032565A1 (de) * 2004-07-05 2006-02-16 Giesecke & Devrient Gmbh Sicherheitselement mit Farbkippeffekt
JP2008203182A (ja) * 2007-02-22 2008-09-04 Yamatake Corp エッジ検出装置
JP5169336B2 (ja) * 2008-03-11 2013-03-27 新日鐵住金株式会社 帯状体の穴・割れ欠陥検出装置
TW201020508A (en) * 2008-11-21 2010-06-01 Chi Mei Materials Technology Corp Measuring device for optical membrane width on production line and measuring method thereof
JP5892086B2 (ja) * 2013-02-18 2016-03-23 住友金属鉱山株式会社 真空成膜装置と成膜方法および金属膜付長尺樹脂フィルムの製造方法
JP6048602B2 (ja) * 2016-02-18 2016-12-21 住友金属鉱山株式会社 位置センサーロール
CN109477210A (zh) * 2016-07-01 2019-03-15 应用材料公司 用以处理柔性基板的处理系统和方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3110624A (en) * 1961-02-06 1963-11-12 Western Electric Co Web aligning mechanism
DE2112405A1 (de) * 1971-03-15 1972-09-21 Siemens Ag Vorrichtung zum Erzeugen metallisierter Laengsstreifen auf Folien
EP0082654A1 (de) * 1981-12-19 1983-06-29 General Engineering Radcliffe 1979 Limited Vorrichtung und Verfahren zum Beschichten einer langen Materialstrecke
JPH0735578B2 (ja) * 1986-07-15 1995-04-19 川崎製鉄株式会社 連続ドライプレ−テイング装置におけるストリツプの蛇行制御装置
US5230923A (en) * 1987-12-17 1993-07-27 Toyo Ink Manufacturing Co., Ltd. Process and apparatus for the substantially continuous manufacture of a silicon oxide deposition film on a flexible plastic film

Also Published As

Publication number Publication date
JP2914098B2 (ja) 1999-06-28
US5595781A (en) 1997-01-21
KR950703072A (ko) 1995-08-23
WO1995001463A1 (fr) 1995-01-12
EP0663458B1 (de) 2002-01-16
EP0663458A4 (de) 1998-03-04
KR100303257B1 (ko) 2001-11-22
DE69429648T2 (de) 2002-08-14
JPH0711441A (ja) 1995-01-13
EP0663458A1 (de) 1995-07-19

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