DE69427538T2 - Aktivierte polierzusammensetzungen - Google Patents

Aktivierte polierzusammensetzungen

Info

Publication number
DE69427538T2
DE69427538T2 DE69427538T DE69427538T DE69427538T2 DE 69427538 T2 DE69427538 T2 DE 69427538T2 DE 69427538 T DE69427538 T DE 69427538T DE 69427538 T DE69427538 T DE 69427538T DE 69427538 T2 DE69427538 T2 DE 69427538T2
Authority
DE
Germany
Prior art keywords
polishing compositions
activated
activated polishing
compositions
polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69427538T
Other languages
English (en)
Other versions
DE69427538D1 (de
Inventor
Melbourne Cook
B Loncki
Gregory Brancaleoni
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rodel Inc
Original Assignee
Rodel Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rodel Inc filed Critical Rodel Inc
Application granted granted Critical
Publication of DE69427538D1 publication Critical patent/DE69427538D1/de
Publication of DE69427538T2 publication Critical patent/DE69427538T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
DE69427538T 1993-09-03 1994-09-02 Aktivierte polierzusammensetzungen Expired - Fee Related DE69427538T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/116,322 US5382272A (en) 1993-09-03 1993-09-03 Activated polishing compositions
PCT/US1994/009845 WO1995006690A1 (en) 1993-09-03 1994-09-02 Activated polishing compositions

Publications (2)

Publication Number Publication Date
DE69427538D1 DE69427538D1 (de) 2001-07-26
DE69427538T2 true DE69427538T2 (de) 2002-04-25

Family

ID=22366501

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69427538T Expired - Fee Related DE69427538T2 (de) 1993-09-03 1994-09-02 Aktivierte polierzusammensetzungen

Country Status (9)

Country Link
US (2) US5382272A (de)
EP (1) EP0717762B1 (de)
JP (1) JP2857722B2 (de)
KR (1) KR100215939B1 (de)
CN (1) CN1042550C (de)
DE (1) DE69427538T2 (de)
MY (1) MY111131A (de)
SG (1) SG43327A1 (de)
WO (1) WO1995006690A1 (de)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5382272A (en) * 1993-09-03 1995-01-17 Rodel, Inc. Activated polishing compositions
US5605490A (en) * 1994-09-26 1997-02-25 The United States Of America As Represented By The Secretary Of The Army Method of polishing langasite
TW274625B (de) * 1994-09-30 1996-04-21 Hitachi Seisakusyo Kk
US5693239A (en) * 1995-10-10 1997-12-02 Rodel, Inc. Polishing slurries comprising two abrasive components and methods for their use
US5899799A (en) * 1996-01-19 1999-05-04 Micron Display Technology, Inc. Method and system to increase delivery of slurry to the surface of large substrates during polishing operations
US6135856A (en) * 1996-01-19 2000-10-24 Micron Technology, Inc. Apparatus and method for semiconductor planarization
US5948697A (en) * 1996-05-23 1999-09-07 Lsi Logic Corporation Catalytic acceleration and electrical bias control of CMP processing
US5916819A (en) 1996-07-17 1999-06-29 Micron Technology, Inc. Planarization fluid composition chelating agents and planarization method using same
FR2754937B1 (fr) * 1996-10-23 1999-01-15 Hoechst France Nouveau procede de polissage mecano-chimique de couches de materiaux isolants a base de derives du silicium ou de silicium
US5725417A (en) * 1996-11-05 1998-03-10 Micron Technology, Inc. Method and apparatus for conditioning polishing pads used in mechanical and chemical-mechanical planarization of substrates
US6110396A (en) * 1996-11-27 2000-08-29 International Business Machines Corporation Dual-valent rare earth additives to polishing slurries
US5876490A (en) * 1996-12-09 1999-03-02 International Business Machines Corporatin Polish process and slurry for planarization
US5759917A (en) * 1996-12-30 1998-06-02 Cabot Corporation Composition for oxide CMP
US5756398A (en) * 1997-03-17 1998-05-26 Rodel, Inc. Composition and method for polishing a composite comprising titanium
WO1998048453A1 (en) 1997-04-23 1998-10-29 Advanced Chemical Systems International, Inc. Planarization compositions for cmp of interlayer dielectrics
US6022400A (en) * 1997-05-22 2000-02-08 Nippon Steel Corporation Polishing abrasive grains, polishing agent and polishing method
US5770103A (en) * 1997-07-08 1998-06-23 Rodel, Inc. Composition and method for polishing a composite comprising titanium
WO1999005232A1 (de) * 1997-07-25 1999-02-04 Infineon Technologies Ag Poliermittel für halbleitersubstrate
US5891205A (en) * 1997-08-14 1999-04-06 Ekc Technology, Inc. Chemical mechanical polishing composition
JPH11256141A (ja) * 1998-03-12 1999-09-21 Sony Corp 研磨スラリーおよび研磨方法
US6177026B1 (en) 1998-05-26 2001-01-23 Cabot Microelectronics Corporation CMP slurry containing a solid catalyst
US6435947B2 (en) 1998-05-26 2002-08-20 Cabot Microelectronics Corporation CMP polishing pad including a solid catalyst
US5928962A (en) * 1998-06-01 1999-07-27 Motorola, Inc. Process for forming a semiconductor device
TW455626B (en) * 1998-07-23 2001-09-21 Eternal Chemical Co Ltd Chemical mechanical abrasive composition for use in semiconductor processing
US6468909B1 (en) 1998-09-03 2002-10-22 Micron Technology, Inc. Isolation and/or removal of ionic contaminants from planarization fluid compositions using macrocyclic polyethers and methods of using such compositions
US6551367B2 (en) 1998-09-22 2003-04-22 Cheil Industries Inc. Process for preparing metal oxide slurry suitable for semiconductor chemical mechanical polishing
US6046112A (en) * 1998-12-14 2000-04-04 Taiwan Semiconductor Manufacturing Company Chemical mechanical polishing slurry
FR2792643B1 (fr) * 1999-04-22 2001-07-27 Clariant France Sa Composition de polissage mecano-chimique de couches en un materiau isolant a base de polymere a faible constante dielectrique
JP3099002B1 (ja) * 1999-06-25 2000-10-16 茂徳科技股▲ふん▼有限公司 ２段階化学機械研磨方法
US6443812B1 (en) 1999-08-24 2002-09-03 Rodel Holdings Inc. Compositions for insulator and metal CMP and methods relating thereto
DE10054345A1 (de) * 2000-11-02 2002-05-08 Degussa Wäßrige Dispersion, Verfahren zu deren Herstellung und Verwendung
EP1234800A1 (de) * 2001-02-22 2002-08-28 Degussa Aktiengesellschaft Wässrige Dispersion, Verfahren zu ihrer Herstellung und Verwendung
US6616514B1 (en) * 2002-06-03 2003-09-09 Ferro Corporation High selectivity CMP slurry
DE602004008880T2 (de) * 2003-02-18 2008-06-26 Parker-Hannifin Corp., Cleveland Polierartikel für elektro-chemisches-mechanisches polieren
US7300478B2 (en) * 2003-05-22 2007-11-27 Ferro Corporation Slurry composition and method of use
KR100582771B1 (ko) * 2004-03-29 2006-05-22 한화석유화학 주식회사 반도체 얕은 트렌치 소자 분리 공정용 화학적 기계적 연마슬러리
US20060205219A1 (en) * 2005-03-08 2006-09-14 Baker Arthur R Iii Compositions and methods for chemical mechanical polishing interlevel dielectric layers
DE102007062572A1 (de) * 2007-12-22 2009-06-25 Evonik Degussa Gmbh Ceroxid und kolloidales Siliciumdioxid enthaltende Dispersion
US8022025B1 (en) 2010-01-27 2011-09-20 Nanophase Technologies Corporation Heterocoagulate, and compositions and method for polishing and surface treatment
JP5689324B2 (ja) * 2011-01-13 2015-03-25 花王株式会社 非晶質ガラス基板用研磨液組成物
US9293339B1 (en) 2015-09-24 2016-03-22 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Method of polishing semiconductor substrate
CN108329842A (zh) * 2018-01-22 2018-07-27 东旭科技集团有限公司 抛光液组合物及其制备方法和玻璃抛光方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2892797A (en) * 1956-02-17 1959-06-30 Du Pont Process for modifying the properties of a silica sol and product thereof
US3301646A (en) * 1963-06-12 1967-01-31 Harbison Walker Refractories Method of making partially stabilized zirconia
US3262766A (en) * 1963-11-21 1966-07-26 Grace W R & Co Rare-earth oxides for polishing glass
US3768989A (en) * 1968-08-19 1973-10-30 N Goetzinger Process for the preparation of a rare earth oxide polishing composition
US3922393A (en) * 1974-07-02 1975-11-25 Du Pont Process for polishing silicon and germanium semiconductor materials
US4169337A (en) * 1978-03-30 1979-10-02 Nalco Chemical Company Process for polishing semi-conductor materials
NL8006410A (nl) * 1980-11-25 1982-06-16 Philips Nv Werkwijze voor de vervaardiging van geintegreerde optische golfgeleider circuits en circuits verkregen met deze werkwijze.
US4436843A (en) * 1982-12-17 1984-03-13 Texaco Inc. High-resilience polyurethane foams having improved resistance to shrinkage
FR2549846B1 (fr) * 1983-07-29 1986-12-26 Rhone Poulenc Spec Chim Nouvelle composition de polissage a base de cerium et son procede de fabrication
US4769046A (en) * 1985-07-25 1988-09-06 Fujimi Kanmazai Kogyo Kabushiki Kaisha Of Japan Process for polishing surface of memory hard disc
DE3721058A1 (de) * 1987-06-26 1989-01-05 Bayer Ag Verfahren zur herstellung von kalthaertenden polyurethan-weichformschaumstoffen
US5228886A (en) * 1990-10-09 1993-07-20 Buehler, Ltd. Mechanochemical polishing abrasive
GB9126740D0 (en) * 1991-12-17 1992-02-12 Ici Plc Polyol compositions
US5382272A (en) * 1993-09-03 1995-01-17 Rodel, Inc. Activated polishing compositions

Also Published As

Publication number Publication date
US5480476A (en) 1996-01-02
JPH08512357A (ja) 1996-12-24
DE69427538D1 (de) 2001-07-26
EP0717762A4 (de) 1997-06-11
WO1995006690A1 (en) 1995-03-09
CN1042550C (zh) 1999-03-17
KR100215939B1 (ko) 1999-08-16
CN1130392A (zh) 1996-09-04
KR960704991A (ko) 1996-10-09
US5382272A (en) 1995-01-17
EP0717762B1 (de) 2001-06-20
EP0717762A1 (de) 1996-06-26
SG43327A1 (en) 1997-10-17
JP2857722B2 (ja) 1999-02-17
MY111131A (en) 1999-08-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee