DE69421249D1 - Verfahren zur Entfernung von Sauerstoff-enthaltenden Verunreinigungen aus Organo-Gallium oder -Indium Verbindungen - Google Patents

Verfahren zur Entfernung von Sauerstoff-enthaltenden Verunreinigungen aus Organo-Gallium oder -Indium Verbindungen

Info

Publication number
DE69421249D1
DE69421249D1 DE69421249T DE69421249T DE69421249D1 DE 69421249 D1 DE69421249 D1 DE 69421249D1 DE 69421249 T DE69421249 T DE 69421249T DE 69421249 T DE69421249 T DE 69421249T DE 69421249 D1 DE69421249 D1 DE 69421249D1
Authority
DE
Germany
Prior art keywords
organo
gallium
oxygen
removal
containing contaminants
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69421249T
Other languages
English (en)
Other versions
DE69421249T2 (de
Inventor
Tadaaki Yako
Yasuo Oga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Application granted granted Critical
Publication of DE69421249D1 publication Critical patent/DE69421249D1/de
Publication of DE69421249T2 publication Critical patent/DE69421249T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F17/00—Metallocenes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
DE69421249T 1993-12-14 1994-12-13 Verfahren zur Entfernung von Sauerstoff-enthaltenden Verunreinigungen aus Organo-Gallium oder -Indium Verbindungen Expired - Lifetime DE69421249T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31338893 1993-12-14

Publications (2)

Publication Number Publication Date
DE69421249D1 true DE69421249D1 (de) 1999-11-25
DE69421249T2 DE69421249T2 (de) 2000-07-13

Family

ID=18040672

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69421249T Expired - Lifetime DE69421249T2 (de) 1993-12-14 1994-12-13 Verfahren zur Entfernung von Sauerstoff-enthaltenden Verunreinigungen aus Organo-Gallium oder -Indium Verbindungen

Country Status (3)

Country Link
US (1) US5455364A (de)
EP (1) EP0658560B1 (de)
DE (1) DE69421249T2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3525371B2 (ja) * 1996-06-25 2004-05-10 信越化学工業株式会社 有機金属化合物の精製方法
US6482968B1 (en) 1999-05-21 2002-11-19 Akzo Nobel Nv Purification of an organometallic compound
JP2006001896A (ja) * 2004-06-18 2006-01-05 Shin Etsu Chem Co Ltd 高純度トリメチルアルミニウム及びトリメチルアルミニウムの精製方法
JP4470682B2 (ja) * 2004-10-13 2010-06-02 住友化学株式会社 トリメチルガリウムの製造方法
JP2006290889A (ja) * 2005-04-12 2006-10-26 Rohm & Haas Electronic Materials Llc 金属含有化合物精製
GB2432364B (en) * 2005-11-18 2009-11-11 Rohm & Haas Elect Mat Organometallic compound purification
US8513447B1 (en) 2012-02-01 2013-08-20 Chemtura Corporation Preparation of tri-alkyl gallium or tri-alkyl indium compounds
CN114773372A (zh) * 2022-05-23 2022-07-22 江苏南大光电材料股份有限公司 Mo源除氧提纯方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2123423B (en) * 1982-06-29 1985-11-27 Secr Defence Purification of trialkyl gallium
JPS62132888A (ja) * 1985-12-03 1987-06-16 Sumitomo Chem Co Ltd 有機金属化合物の精製方法
US4847399A (en) * 1987-01-23 1989-07-11 Morton Thiokol, Inc. Process for preparing or purifying Group III-A organometallic compounds
JPH01100178A (ja) * 1987-10-12 1989-04-18 Nippon Mining Co Ltd トリアルキルインジウムの精製方法
JPH0267230A (ja) * 1988-09-02 1990-03-07 Toyo Stauffer Chem Co 有機金属化合物の精製法
DE4005726A1 (de) * 1989-04-28 1990-10-31 Messer Griesheim Gmbh Verfahren zur herstellung von galliumalkylverbindungen
JPH03112991A (ja) * 1989-09-25 1991-05-14 Sumitomo Chem Co Ltd アルキルアルミニウムの精製方法
US5084128A (en) * 1990-10-23 1992-01-28 E. I. Du Pont De Nemours And Company Low-temperature synthesis of group III-group V semiconductors
DE69202014T2 (de) * 1991-07-17 1995-08-31 Japan Pionics Verfahren zur Reinigung von gasförmigen organometallischen Verbindungen.
TW217415B (de) * 1991-11-19 1993-12-11 Shell Internat Res Schappej B V
US5350869A (en) * 1993-07-27 1994-09-27 Cvd, Incorporated Purification of trialkylgallium, synthesis of trialkylgallium

Also Published As

Publication number Publication date
DE69421249T2 (de) 2000-07-13
EP0658560A1 (de) 1995-06-21
US5455364A (en) 1995-10-03
EP0658560B1 (de) 1999-10-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: SUMITOMO CHEMICAL CO. LTD., TOKIO/TOKYO, JP