DE69416645D1 - Verfahren zur Behandlung von photographischem Abwasser - Google Patents

Verfahren zur Behandlung von photographischem Abwasser

Info

Publication number
DE69416645D1
DE69416645D1 DE69416645T DE69416645T DE69416645D1 DE 69416645 D1 DE69416645 D1 DE 69416645D1 DE 69416645 T DE69416645 T DE 69416645T DE 69416645 T DE69416645 T DE 69416645T DE 69416645 D1 DE69416645 D1 DE 69416645D1
Authority
DE
Germany
Prior art keywords
treatment
waste water
photographic waste
photographic
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69416645T
Other languages
English (en)
Other versions
DE69416645T2 (de
Inventor
Takashi Nakamura
Koji Matsuo
Masaharu Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69416645D1 publication Critical patent/DE69416645D1/de
Application granted granted Critical
Publication of DE69416645T2 publication Critical patent/DE69416645T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C7/00Multicolour photographic processes or agents therefor; Regeneration of such processing agents; Photosensitive materials for multicolour processes
    • G03C7/30Colour processes using colour-coupling substances; Materials therefor; Preparing or processing such materials
    • G03C7/44Regeneration; Replenishers
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/68Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water
    • C02F1/683Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water by addition of complex-forming compounds
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00Nature of the contaminant
    • C02F2101/10Inorganic compounds
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/40Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from the manufacture or use of photosensitive materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S210/00Liquid purification or separation
    • Y10S210/902Materials removed
    • Y10S210/911Cumulative poison
    • Y10S210/912Heavy metal
DE69416645T 1993-11-29 1994-11-29 Verfahren zur Behandlung von photographischem Abwasser Expired - Fee Related DE69416645T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32092893A JP3343162B2 (ja) 1993-11-29 1993-11-29 写真廃液の処理方法

Publications (2)

Publication Number Publication Date
DE69416645D1 true DE69416645D1 (de) 1999-04-01
DE69416645T2 DE69416645T2 (de) 1999-06-17

Family

ID=18126852

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69416645T Expired - Fee Related DE69416645T2 (de) 1993-11-29 1994-11-29 Verfahren zur Behandlung von photographischem Abwasser

Country Status (4)

Country Link
US (1) US5605633A (de)
EP (1) EP0655419B1 (de)
JP (1) JP3343162B2 (de)
DE (1) DE69416645T2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07248582A (ja) * 1994-03-09 1995-09-26 Fuji Photo Film Co Ltd 写真処理廃液の処理方法および除銀装置ならびに写真処理装置
US5728295A (en) * 1996-04-19 1998-03-17 Fuji Hunt Photographic Chemicals, Inc. Apparatus for removing metal ions and/or complexes containing metal ions from a solution
US5965027A (en) 1996-11-26 1999-10-12 Microbar Incorporated Process for removing silica from wastewater
US6428705B1 (en) 1996-11-26 2002-08-06 Microbar Incorporated Process and apparatus for high flow and low pressure impurity removal
US5871648A (en) * 1996-11-26 1999-02-16 Environmental Chemistries, Inc. Wastewater treatment process and apparatus for high flow impurity removal
US5900220A (en) * 1997-01-16 1999-05-04 Microbar Incorporated Soda ash processing method
US6126840A (en) * 1998-08-13 2000-10-03 Fuji Hunt Photographic Chemicals, Inc. Process for removing silver in the presence of iron from waste effluent
WO2000041974A1 (en) * 1999-01-15 2000-07-20 Nalco Chemical Company Composition and method for simultaneously precipitating metal ions from semiconductor wastewater and enhancing microfilter operation
US6398964B1 (en) 1999-08-19 2002-06-04 Koch Microelectronic Service Company, Inc. Process for treating aqueous waste containing copper and copper CMP particles
US6338803B1 (en) 1999-08-30 2002-01-15 Koch Microelectronic Service Co., Inc. Process for treating waste water containing hydrofluoric acid and mixed acid etchant waste
US6203705B1 (en) 1999-10-22 2001-03-20 Koch Microelectronic Service Company, Inc. Process for treating waste water containing copper
US6679274B2 (en) * 2001-08-10 2004-01-20 Eastman Kodak Company Clean-in-place method for cleaning solution delivery systemes/lines
WO2007090260A1 (en) * 2006-02-07 2007-08-16 Piotr Lipert A gas bubble generator
US8083947B2 (en) * 2009-02-24 2011-12-27 Eastman Kodak Company Polymer-containing solvent purifying process
CN101704594B (zh) * 2009-11-27 2011-11-16 波鹰(厦门)科技有限公司 一种印染深度处理废水净化装置及净化方法
CN101921029B (zh) * 2009-12-21 2014-06-18 波鹰(厦门)科技有限公司 纳米催化微电解水净化消毒装置及其方法
CN111424280B (zh) * 2020-03-31 2022-08-23 遂宁市瑞思科环保科技有限公司 一种退锡废液的再生系统及方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5641673B2 (de) * 1972-07-04 1981-09-29
CH634283A5 (de) * 1978-02-24 1983-01-31 Ciba Geigy Ag Verfahren zur entfernung von schwermetallionen aus waesserigen loesungen.
US4578195A (en) * 1982-09-29 1986-03-25 Olin Corporation Process for the purification of effluents and purge streams containing trace elements
JPS61231548A (ja) * 1985-04-05 1986-10-15 Konishiroku Photo Ind Co Ltd 写真廃液の処理方法及び写真自動現像機
US4943377A (en) * 1988-05-06 1990-07-24 Environmental Technology (U.S.), Inc. Method for removing dissolved heavy metals from waste oils, industrial wastewaters, or any polar solvent
JPH03132656A (ja) * 1989-10-18 1991-06-06 Fuji Photo Film Co Ltd ハロゲン化銀感光材料の処理方法および処理装置
US5347071A (en) * 1989-12-20 1994-09-13 Miyoshi Yushi Kabushiki Kaisha Process for the removal of heavy metals from contaminants
US5387365A (en) * 1989-12-20 1995-02-07 Miyoshi Yushi Kabushiki Kaisha Metal scavengers for treating waste water
US5164095A (en) * 1991-10-02 1992-11-17 Nalco Chemical Company Dithiocarbamate polymers
US5205939A (en) * 1992-07-06 1993-04-27 Nalco Chemical Company Removal of silver from aqueous systems
JPH06118589A (ja) * 1992-10-08 1994-04-28 Fuji Photo Film Co Ltd 写真処理方法および処理装置
JPH06118594A (ja) * 1992-10-08 1994-04-28 Fuji Photo Film Co Ltd 写真処理方法
JP3050350B2 (ja) * 1993-03-08 2000-06-12 富士写真フイルム株式会社 ハロゲン化銀感光材料の処理方法および処理装置
EP0619272B1 (de) * 1993-04-05 1998-03-04 Agfa-Gevaert N.V. Verfahren zur Reinigung von Silber enthaltendem Abwasser

Also Published As

Publication number Publication date
US5605633A (en) 1997-02-25
JPH07148492A (ja) 1995-06-13
EP0655419B1 (de) 1999-02-24
EP0655419A1 (de) 1995-05-31
DE69416645T2 (de) 1999-06-17
JP3343162B2 (ja) 2002-11-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee