DE69316294D1 - Aufzeichnungsmaterial - Google Patents

Aufzeichnungsmaterial

Info

Publication number
DE69316294D1
DE69316294D1 DE69316294T DE69316294T DE69316294D1 DE 69316294 D1 DE69316294 D1 DE 69316294D1 DE 69316294 T DE69316294 T DE 69316294T DE 69316294 T DE69316294 T DE 69316294T DE 69316294 D1 DE69316294 D1 DE 69316294D1
Authority
DE
Germany
Prior art keywords
record material
microcapsules
exposure
walls
actinic radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69316294T
Other languages
English (en)
Other versions
DE69316294T2 (de
Inventor
Robert E Miller
Lowell Schleicher
Robert W Brown
Lucy Feldman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Appvion Operations Inc
Original Assignee
Appleton Papers Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Appleton Papers Inc filed Critical Appleton Papers Inc
Publication of DE69316294D1 publication Critical patent/DE69316294D1/de
Application granted granted Critical
Publication of DE69316294T2 publication Critical patent/DE69316294T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/28—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using thermochromic compounds or layers containing liquid crystals, microcapsules, bleachable dyes or heat- decomposable compounds, e.g. gas- liberating
    • B41M5/287—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using thermochromic compounds or layers containing liquid crystals, microcapsules, bleachable dyes or heat- decomposable compounds, e.g. gas- liberating using microcapsules or microspheres only
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/165—Thermal imaging composition
DE69316294T 1992-09-10 1993-09-07 Aufzeichnungsmaterial Expired - Fee Related DE69316294T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/943,090 US5340680A (en) 1992-09-10 1992-09-10 Desensitizable record material

Publications (2)

Publication Number Publication Date
DE69316294D1 true DE69316294D1 (de) 1998-02-19
DE69316294T2 DE69316294T2 (de) 1998-04-30

Family

ID=25479088

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69316294T Expired - Fee Related DE69316294T2 (de) 1992-09-10 1993-09-07 Aufzeichnungsmaterial

Country Status (8)

Country Link
US (2) US5340680A (de)
EP (1) EP0587410B1 (de)
JP (1) JP3441493B2 (de)
AT (1) ATE162139T1 (de)
CA (1) CA2092233C (de)
DE (1) DE69316294T2 (de)
ES (1) ES2111135T3 (de)
FI (1) FI109191B (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5985526A (en) * 1998-06-19 1999-11-16 Eastman Kodak Company Imaging process based on change of optical covering power
US6103378A (en) * 1998-11-23 2000-08-15 The Mead Company Capsules having discrete solvent/color former and diluent capsule encapsulated phases
US6740465B2 (en) 2000-06-01 2004-05-25 Sipix Imaging, Inc. Imaging media containing heat developable photosensitive microcapsules
GB2396355A (en) * 2002-12-20 2004-06-23 Arjo Wiggins Fine Papers Ltd Digital press printing composition and system
US7815723B2 (en) * 2006-04-19 2010-10-19 Crayola Llc Water-based ink system
US7727319B2 (en) * 2006-04-19 2010-06-01 Crayola Llc Water-based ink system
CN108384004A (zh) 2011-12-15 2018-08-10 西默-道尔顿有限责任公司 用于制备聚酰胺酰亚胺的方法
WO2013109268A1 (en) * 2012-01-18 2013-07-25 Fujifilm Hunt Chemicals U.S.A., Inc. Chemical coating composition for forming a laser-markable material and a laser-markable material
US9725617B2 (en) 2014-04-17 2017-08-08 Fujifilm Hunt Chemicals U.S.A., Inc. Low toxicity solvent system for polyamideimide and polyamide amic acid resin coating
US9815941B2 (en) 2014-04-17 2017-11-14 Cymer-Dayton, Llc Low toxicity solvent system for polyamdieimide and polyamide amic acid resin manufacture

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH395152A (fr) * 1959-07-16 1965-07-15 Ncr Co Procédé d'impression
US4343885A (en) * 1978-05-09 1982-08-10 Dynachem Corporation Phototropic photosensitive compositions containing fluoran colorformer
US4454083A (en) * 1981-12-21 1984-06-12 Appleton Papers Inc. Continuous microencapsulation
JPS5991438A (ja) * 1982-11-17 1984-05-26 Fuji Photo Film Co Ltd 感光感熱記録材料
US4552811A (en) * 1983-07-26 1985-11-12 Appleton Papers Inc. Capsule manufacture
JPS60242094A (ja) * 1984-05-17 1985-12-02 Fuji Photo Film Co Ltd 感熱記録材料
DE3666634D1 (en) * 1985-05-30 1989-11-30 Fuji Photo Film Co Ltd Light-sensitive material containing microcapsules and image-recording method using the same
JPS6297638A (ja) * 1985-10-25 1987-05-07 Kanzaki Paper Mfg Co Ltd マイクロカプセルの製造方法
JPS63268777A (ja) * 1987-04-25 1988-11-07 Kanzaki Paper Mfg Co Ltd マイクロカプセルインキ組成物
JPH07101314B2 (ja) * 1987-09-03 1995-11-01 富士写真フイルム株式会社 画像記録方法
GB2210702B (en) * 1987-10-02 1991-11-06 Fuji Photo Film Co Ltd Heat sensitive recording material
US4873168A (en) * 1988-03-07 1989-10-10 The Mead Corporation Imaging system utilizing heat treatment
US5134052A (en) * 1988-10-25 1992-07-28 The Mead Corporation Process for forming images using a low temperature exposure step
US4937119A (en) * 1988-12-15 1990-06-26 Hoechst Celanese Corp. Textured organic optical data storage media and methods of preparation
US5283015A (en) * 1989-03-15 1994-02-01 The Mead Corporation Method for producing amine-formaldehyde microcapsules and photosensitive microcapsules produced thereby
JPH03261588A (ja) * 1990-03-12 1991-11-21 Kanzaki Paper Mfg Co Ltd 感圧複写紙の製造方法

Also Published As

Publication number Publication date
ES2111135T3 (es) 1998-03-01
EP0587410A3 (en) 1996-03-27
CA2092233A1 (en) 1994-03-11
US5427886A (en) 1995-06-27
JPH06206379A (ja) 1994-07-26
EP0587410A2 (de) 1994-03-16
FI933935A0 (fi) 1993-09-08
US5340680A (en) 1994-08-23
CA2092233C (en) 2003-12-09
FI109191B (fi) 2002-06-14
DE69316294T2 (de) 1998-04-30
EP0587410B1 (de) 1998-01-14
ATE162139T1 (de) 1998-01-15
FI933935A (fi) 1994-03-11
JP3441493B2 (ja) 2003-09-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee