DE69309399D1 - Cadmium/Edelgase Entladungslampe vom Kurzbogen-Typ, und Projektions-Belichtungsvorrichtung unter Verwendung derselbe - Google Patents

Cadmium/Edelgase Entladungslampe vom Kurzbogen-Typ, und Projektions-Belichtungsvorrichtung unter Verwendung derselbe

Info

Publication number
DE69309399D1
DE69309399D1 DE69309399T DE69309399T DE69309399D1 DE 69309399 D1 DE69309399 D1 DE 69309399D1 DE 69309399 T DE69309399 T DE 69309399T DE 69309399 T DE69309399 T DE 69309399T DE 69309399 D1 DE69309399 D1 DE 69309399D1
Authority
DE
Germany
Prior art keywords
cadmium
same
discharge lamp
gas discharge
exposure device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69309399T
Other languages
English (en)
Other versions
DE69309399T2 (de
Inventor
Yukio Yasuda
Akiyasu Yamaguchi
Tatsushi Igarashi
Yasuo Oonishi
Kenzo Kai
Masanori Sugihara
Takashi Mori
Akira Miyaji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Ushio Denki KK
Original Assignee
Nikon Corp
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Ushio Denki KK filed Critical Nikon Corp
Publication of DE69309399D1 publication Critical patent/DE69309399D1/de
Application granted granted Critical
Publication of DE69309399T2 publication Critical patent/DE69309399T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70016—Production of exposure light, i.e. light sources by discharge lamps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
    • H01J61/18—Selection of substances for gas fillings; Specified operating pressure or temperature having a metallic vapour as the principal constituent
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/84—Lamps with discharge constricted by high pressure
    • H01J61/86—Lamps with discharge constricted by high pressure with discharge additionally constricted by close spacing of electrodes, e.g. for optical projection

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Discharge Lamp (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69309399T 1992-11-20 1993-11-19 Cadmium/Edelgase Entladungslampe vom Kurzbogen-Typ, und Projektions-Belichtungsvorrichtung unter Verwendung derselbe Expired - Fee Related DE69309399T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP33376592 1992-11-20
JP5286219A JP3020397B2 (ja) 1992-11-20 1993-10-22 ショートアーク型カドミウム希ガス放電ランプおよびこれを搭載した投影露光装置

Publications (2)

Publication Number Publication Date
DE69309399D1 true DE69309399D1 (de) 1997-05-07
DE69309399T2 DE69309399T2 (de) 1997-08-14

Family

ID=26556214

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69309399T Expired - Fee Related DE69309399T2 (de) 1992-11-20 1993-11-19 Cadmium/Edelgase Entladungslampe vom Kurzbogen-Typ, und Projektions-Belichtungsvorrichtung unter Verwendung derselbe

Country Status (5)

Country Link
US (1) US5471278A (de)
EP (1) EP0599229B1 (de)
JP (1) JP3020397B2 (de)
KR (1) KR940012495A (de)
DE (1) DE69309399T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2775694B2 (ja) * 1993-05-07 1998-07-16 ウシオ電機株式会社 放電ランプ
EP0641015B1 (de) * 1993-08-03 1997-04-16 Ushiodenki Kabushiki Kaisha Cadmiumentladungslampe
JPH0845479A (ja) * 1994-07-29 1996-02-16 Ushio Inc 金属蒸気放電ランプ
JPH08195186A (ja) * 1995-01-20 1996-07-30 Ushio Inc ショートアーク型カドミウム希ガス放電ランプ
RU2071619C1 (ru) * 1995-03-22 1997-01-10 Акционерное общество закрытого типа Научно-техническое агентство "Интеллект" Способ получения оптического излучения и разрядная лампа для его осуществления
KR100502799B1 (ko) * 1997-12-31 2005-10-25 삼성전자주식회사 액정 표시 장치의 제조 방법
US5978070A (en) * 1998-02-19 1999-11-02 Nikon Corporation Projection exposure apparatus
JP3065581B2 (ja) * 1998-03-24 2000-07-17 ウシオ電機株式会社 ショートアーク型水銀ランプ、および紫外線発光装置
JP3840054B2 (ja) * 2000-12-08 2006-11-01 フェニックス電機株式会社 超高圧放電灯の点灯方法と該方法が適用されるバラスト及び点灯システム
JP2003130801A (ja) * 2001-10-22 2003-05-08 Ushio Inc 蛍光体の検査方法および装置
JP4247737B2 (ja) * 2003-03-11 2009-04-02 ウシオ電機株式会社 細胞固定用基板の製造方法および細胞固定用基板
JP2005197191A (ja) * 2004-01-09 2005-07-21 Ushio Inc 超高圧水銀ランプおよび該超高圧水銀ランプを用いた光照射装置
US7595583B2 (en) * 2004-02-25 2009-09-29 Panasonic Corporation Cold-cathode fluorescent lamp and backlight unit

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3706000A (en) * 1970-05-11 1972-12-12 Westinghouse Electric Corp Current-rated short-arc lamp for light projection apparatus
JPS5510757A (en) * 1978-07-11 1980-01-25 Ushio Inc Short arc type cadmium rare gas discharge lamp
US4387319A (en) * 1981-03-30 1983-06-07 General Electric Company Metal halide lamp containing ScI3 with added cadmium or zinc
JPS622443A (ja) * 1985-06-28 1987-01-08 Ushio Inc フオトリソグラフイ
US4701664A (en) * 1986-01-09 1987-10-20 Becton, Dickinson And Company Mercury arc lamp suitable for inclusion in a flow cytometry apparatus
US4988918A (en) * 1988-06-23 1991-01-29 Toshiba Lighting And Technology Corporation Short arc discharge lamp
US5264898A (en) * 1991-08-29 1993-11-23 Mitsubishi Denki Kabushiki Kaisha Projection exposure apparatus
JP2803934B2 (ja) * 1991-12-10 1998-09-24 三菱電機株式会社 投影露光装置及び露光方法

Also Published As

Publication number Publication date
US5471278A (en) 1995-11-28
JPH0721980A (ja) 1995-01-24
EP0599229B1 (de) 1997-04-02
KR940012495A (ko) 1994-06-23
JP3020397B2 (ja) 2000-03-15
EP0599229A1 (de) 1994-06-01
DE69309399T2 (de) 1997-08-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee