DE69309252D1 - Silizid-Targets für das Aufstäubungsverfahren und Verfahren zur Herstellung derselben - Google Patents

Silizid-Targets für das Aufstäubungsverfahren und Verfahren zur Herstellung derselben

Info

Publication number
DE69309252D1
DE69309252D1 DE69309252T DE69309252T DE69309252D1 DE 69309252 D1 DE69309252 D1 DE 69309252D1 DE 69309252 T DE69309252 T DE 69309252T DE 69309252 T DE69309252 T DE 69309252T DE 69309252 D1 DE69309252 D1 DE 69309252D1
Authority
DE
Germany
Prior art keywords
producing
same
silicide targets
sputtering
sputtering process
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69309252T
Other languages
English (en)
Other versions
DE69309252T2 (de
Inventor
Osamu Kano
Koichi Yasui
Yasuyuki Sato
Yasuhiro Yamakoshi
Junichi Anan
Hironori Wada
Akio Yasuoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Mining Holdings Inc
Original Assignee
Japan Energy Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP5083941A external-priority patent/JP2789547B2/ja
Priority claimed from JP5112517A external-priority patent/JP2794381B2/ja
Application filed by Japan Energy Corp filed Critical Japan Energy Corp
Publication of DE69309252D1 publication Critical patent/DE69309252D1/de
Application granted granted Critical
Publication of DE69309252T2 publication Critical patent/DE69309252T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0682—Silicides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3491—Manufacturing of targets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE69309252T 1993-03-19 1993-08-09 Silizid-Targets für das Aufstäubungsverfahren und Verfahren zur Herstellung derselben Expired - Lifetime DE69309252T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP5083941A JP2789547B2 (ja) 1993-03-19 1993-03-19 スパッタリング用チタンシリサイドターゲット及びその製造方法
JP5112517A JP2794381B2 (ja) 1993-04-16 1993-04-16 スパッタリング用シリサイドターゲット及びその製造方法

Publications (2)

Publication Number Publication Date
DE69309252D1 true DE69309252D1 (de) 1997-04-30
DE69309252T2 DE69309252T2 (de) 1997-10-30

Family

ID=26424979

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69309252T Expired - Lifetime DE69309252T2 (de) 1993-03-19 1993-08-09 Silizid-Targets für das Aufstäubungsverfahren und Verfahren zur Herstellung derselben

Country Status (3)

Country Link
US (1) US5464520A (de)
EP (1) EP0616045B1 (de)
DE (1) DE69309252T2 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2794382B2 (ja) * 1993-05-07 1998-09-03 株式会社ジャパンエナジー スパッタリング用シリサイドターゲット及びその製造方法
EP1118690A3 (de) * 1993-07-27 2001-09-26 Kabushiki Kaisha Toshiba Refraktärmetallisches Silizidtarget
US5789318A (en) * 1996-02-23 1998-08-04 Varian Associates, Inc. Use of titanium hydride in integrated circuit fabrication
JP3755559B2 (ja) * 1997-04-15 2006-03-15 株式会社日鉱マテリアルズ スパッタリングターゲット
US6713391B2 (en) 1997-07-11 2004-03-30 Honeywell International Inc. Physical vapor deposition targets
JP2003535969A (ja) * 1997-07-11 2003-12-02 ジョンソン マッティー エレクトロニクス インコーポレイテッド 金属間アルミニド及びシリサイドスパッタリングターゲット、及びその製造方法
EP1028824B1 (de) * 1997-07-15 2002-10-09 Tosoh Smd, Inc. Feuerfeste metall-silizid-legierung sputter-targets, dessen verwendung und herstellung
US6423196B1 (en) 1997-11-19 2002-07-23 Tosoh Smd, Inc. Method of making Ni-Si magnetron sputtering targets and targets made thereby
US6183686B1 (en) 1998-08-04 2001-02-06 Tosoh Smd, Inc. Sputter target assembly having a metal-matrix-composite backing plate and methods of making same
US6309556B1 (en) * 1998-09-03 2001-10-30 Praxair S.T. Technology, Inc. Method of manufacturing enhanced finish sputtering targets
JP3820787B2 (ja) 1999-01-08 2006-09-13 日鉱金属株式会社 スパッタリングターゲットおよびその製造方法
US6042777A (en) * 1999-08-03 2000-03-28 Sony Corporation Manufacturing of high density intermetallic sputter targets
US6797137B2 (en) * 2001-04-11 2004-09-28 Heraeus, Inc. Mechanically alloyed precious metal magnetic sputtering targets fabricated using rapidly solidfied alloy powders and elemental Pt metal
JP4596379B2 (ja) * 2001-07-09 2010-12-08 Ｊｘ日鉱日石金属株式会社 ゲート酸化膜形成用ハフニウムシリサイドターゲット
WO2004099458A2 (en) * 2003-05-02 2004-11-18 Tosoh Smd, Inc. METHODS FOR MAKING LOW SILICON CONTENT Ni-Si SPUTTERING TARGETS AND TARGETS MADE THEREBY
US7407882B1 (en) * 2004-08-27 2008-08-05 Spansion Llc Semiconductor component having a contact structure and method of manufacture
US7109116B1 (en) 2005-07-21 2006-09-19 International Business Machines Corporation Method for reducing dendrite formation in nickel silicon salicide processes
US20090028744A1 (en) * 2007-07-23 2009-01-29 Heraeus, Inc. Ultra-high purity NiPt alloys and sputtering targets comprising same
TWI623634B (zh) 2011-11-08 2018-05-11 塔沙Ｓｍｄ公司 具有特殊表面處理和良好顆粒性能之矽濺鍍靶及其製造方法
US10655212B2 (en) 2016-12-15 2020-05-19 Honeywell Internatonal Inc Sputter trap having multimodal particle size distribution
JP6768575B2 (ja) * 2017-03-24 2020-10-14 Ｊｘ金属株式会社 タングステンシリサイドターゲット及びその製造方法
KR20240155356A (ko) * 2018-03-30 2024-10-28 제이엑스금속주식회사 텅스텐 실리사이드 타깃 및 그 제조 방법, 그리고 텅스텐 실리사이드막의 제조 방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4663120A (en) * 1985-04-15 1987-05-05 Gte Products Corporation Refractory metal silicide sputtering target
US4750932A (en) * 1985-04-15 1988-06-14 Gte Products Corporation Refractory metal silicide sputtering target
JPH0791636B2 (ja) * 1987-03-09 1995-10-04 日立金属株式会社 スパツタリングタ−ゲツトおよびその製造方法
DE68913466T2 (de) * 1988-12-21 1994-09-01 Toshiba Kawasaki Kk Sputtertarget und Verfahren zu seiner Herstellung.
WO1991018125A1 (en) * 1990-05-15 1991-11-28 Kabushiki Kaisha Toshiba Sputtering target and production thereof

Also Published As

Publication number Publication date
EP0616045B1 (de) 1997-03-26
DE69309252T2 (de) 1997-10-30
US5464520A (en) 1995-11-07
EP0616045A1 (de) 1994-09-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: NIKKO MATERIALS CO., LTD., TOKIO/TOKYO, JP

8327 Change in the person/name/address of the patent owner

Owner name: NIPPON MINING & METALS CO., LTD., TOKIO/TOKYO, JP

R082 Change of representative

Ref document number: 616045

Country of ref document: EP

Representative=s name: SCHWAN SCHWAN SCHORER, 80796 MUENCHEN, DE