DE69304383D1 - Mikrowellenstrahler und Plasmareaktor unter Verwendung dieser Einrichtung - Google Patents

Mikrowellenstrahler und Plasmareaktor unter Verwendung dieser Einrichtung

Info

Publication number
DE69304383D1
DE69304383D1 DE69304383T DE69304383T DE69304383D1 DE 69304383 D1 DE69304383 D1 DE 69304383D1 DE 69304383 T DE69304383 T DE 69304383T DE 69304383 T DE69304383 T DE 69304383T DE 69304383 D1 DE69304383 D1 DE 69304383D1
Authority
DE
Germany
Prior art keywords
plasma reactor
microwave emitter
emitter
microwave
reactor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69304383T
Other languages
English (en)
Other versions
DE69304383T2 (de
Inventor
Barbara Charlet
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Publication of DE69304383D1 publication Critical patent/DE69304383D1/de
Application granted granted Critical
Publication of DE69304383T2 publication Critical patent/DE69304383T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • H05B6/70—Feed lines
    • H05B6/707—Feed lines using waveguides
    • H05B6/708—Feed lines using waveguides in particular slotted waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32238—Windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32247—Resonators
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • H05B6/70—Feed lines
    • H05B6/705—Feed lines using microwave tuning
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • H05B6/80—Apparatus for specific applications

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Control Of Motors That Do Not Use Commutators (AREA)
  • Plasma Technology (AREA)
DE1993604383 1992-04-03 1993-04-01 Mikrowellenstrahler und Plasmareaktor unter Verwendung dieser Einrichtung Expired - Fee Related DE69304383T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9204079A FR2689717B1 (fr) 1992-04-03 1992-04-03 Dispositif d'application de micro-ondes et reacteur a plasma utilisant ce dispositif.

Publications (2)

Publication Number Publication Date
DE69304383D1 true DE69304383D1 (de) 1996-10-10
DE69304383T2 DE69304383T2 (de) 1997-03-06

Family

ID=9428444

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1993604383 Expired - Fee Related DE69304383T2 (de) 1992-04-03 1993-04-01 Mikrowellenstrahler und Plasmareaktor unter Verwendung dieser Einrichtung

Country Status (3)

Country Link
EP (1) EP0564359B1 (de)
DE (1) DE69304383T2 (de)
FR (1) FR2689717B1 (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4235914A1 (de) * 1992-10-23 1994-04-28 Juergen Prof Dr Engemann Vorrichtung zur Erzeugung von Mikrowellenplasmen
DE4336830A1 (de) * 1993-10-28 1995-05-04 Leybold Ag Plasma-Zerstäubungsanlage mit Mikrowellenunterstützung
DE19600223A1 (de) * 1996-01-05 1997-07-17 Ralf Dr Dipl Phys Spitzl Vorrichtung zur Erzeugung von Plasmen mittels Mikrowellen
JP3727705B2 (ja) * 1996-02-15 2005-12-14 株式会社ブリヂストン マイクロ波プラズマ発生装置
DE19608949A1 (de) * 1996-03-08 1997-09-11 Ralf Dr Spitzl Vorrichtung zur Erzeugung von leistungsfähigen Mikrowellenplasmen
JP3315414B2 (ja) * 1997-04-10 2002-08-19 ニューコン システムズ、インコーポレイション マイクロ波による厚壁セラミック部品の接合方法と接合装置
DE69807006T2 (de) * 1997-05-22 2003-01-02 Canon K.K., Tokio/Tokyo Plasmabehandlungsvorrichtung mit einem mit ringförmigem Wellenleiter versehenen Mikrowellenauftragsgerät und Behandlungsverfahren
DE19726663A1 (de) * 1997-06-23 1999-01-28 Sung Spitzl Hildegard Dr Ing Vorrichtung zur Erzeugung von homogenen Mikrowellenplasmen
US5834744A (en) * 1997-09-08 1998-11-10 The Rubbright Group Tubular microwave applicator
TW385623B (en) * 1997-10-20 2000-03-21 Sumitomo Metal Ind Apparatus and method for microwave plasma process
TW409487B (en) * 1998-04-10 2000-10-21 Sumitomo Metal Ind Microwave plasma treatment apparatus and microwave plasma treatment method
US6870123B2 (en) 1998-10-29 2005-03-22 Canon Kabushiki Kaisha Microwave applicator, plasma processing apparatus having same, and plasma processing method
EP0997927A3 (de) * 1998-10-29 2003-06-25 Canon Kabushiki Kaisha Mikrowellenkoppler mit ringförmigem Wellenleiter, Plasmabehandlungsvorrichtung und -verfahren unter Verwendung desselben
JP3352418B2 (ja) 1999-01-28 2002-12-03 キヤノン株式会社 減圧処理方法及び減圧処理装置
US6652709B1 (en) * 1999-11-02 2003-11-25 Canon Kabushiki Kaisha Plasma processing apparatus having circular waveguide, and plasma processing method
DE10035949A1 (de) * 2000-07-21 2002-02-07 Knn Systemtechnik Gmbh Verfahren und Vorrichtung zum Erzeugen elektromagnetischer Felder hoher Feldstärke und Feldstärkehomogenität
US6677549B2 (en) 2000-07-24 2004-01-13 Canon Kabushiki Kaisha Plasma processing apparatus having permeable window covered with light shielding film
US6753517B2 (en) * 2001-01-31 2004-06-22 Cem Corporation Microwave-assisted chemical synthesis instrument with fixed tuning
JP2003109941A (ja) * 2001-09-28 2003-04-11 Canon Inc プラズマ処理装置および表面処理方法
DE10306209A1 (de) 2003-02-13 2004-08-26 Rieter Ingolstadt Spinnereimaschinenbau Ag Vorrichtung mit einem Mikrowellenresonator für eine oder an einer Spinnereivorbereitungsmaschine
US7557364B2 (en) * 2004-05-25 2009-07-07 Panasonic Corporation Charge neutralizing device
EP2007175A4 (de) * 2006-03-07 2014-05-14 Univ Ryukyus Plasmagenerator und verfahren zum erzeugen von plasma damit
US8674275B2 (en) 2007-06-29 2014-03-18 Corning Incorporated Method of fabricating a honeycomb structure using microwaves
DE202010005946U1 (de) 2010-04-19 2010-08-19 Jenoptik Katasorb Gmbh Mikrowellenreaktor zur mikrowellenunterstützten katalytischen Stoffumsetzung
DE102010015768B4 (de) 2010-04-19 2014-11-20 Jenoptik Katasorb Gmbh Mikrowellenreaktor zur mikrowellenunterstützten katalytischen Stoffumsetzung
DE102010053169A1 (de) 2010-04-19 2011-10-20 Jenoptik Katasorb Gmbh Mikrowellenreaktor zu mikrowellenunterstützten katalytischen Stoffumsetzung eines flüssigen oder gasförmigen Mediums
NL2007968C2 (en) * 2011-12-14 2013-06-17 Draka Comteq Bv An apparatus for performing a plasma chemical vapour deposition process.
EP2854478B1 (de) 2013-09-27 2016-04-06 Anton Paar GmbH Mikrowellenheizsystem
NL2017575B1 (en) 2016-10-04 2018-04-13 Draka Comteq Bv A method and an apparatus for performing a plasma chemical vapour deposition process and a method
NO345369B1 (en) 2017-03-27 2021-01-04 Scanship As Microwave pyrolysis reactor I
CN108811290A (zh) * 2017-04-28 2018-11-13 北京北方华创微电子装备有限公司 等离子体产生装置和半导体设备
CN112888134B (zh) * 2021-01-19 2024-03-08 成都奋羽电子科技有限公司 一种微波等离子体产生装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2599924B1 (fr) * 1986-06-06 1988-09-09 Univ Bordeaux 1 Dispositif modulaire pour l'application de micro-ondes en vue notamment du chauffage, sechage ou torrefaction d'un materiau
JPS6365077A (ja) * 1986-09-05 1988-03-23 Mitsubishi Electric Corp レ−ザｃｖｄ装置
JPS63222424A (ja) * 1987-03-12 1988-09-16 Canon Inc 堆積膜形成法及び堆積膜形成装置
JP2567892B2 (ja) * 1988-01-22 1996-12-25 株式会社日立製作所 プラズマ処理装置
DE3905303C2 (de) * 1988-02-24 1996-07-04 Hitachi Ltd Vorrichtung zur Erzeugung eines Plasmas durch Mikrowellen
JP2805009B2 (ja) * 1988-05-11 1998-09-30 株式会社日立製作所 プラズマ発生装置及びプラズマ元素分析装置
JPH01309973A (ja) * 1988-06-07 1989-12-14 Fujitsu Ltd 薄膜形成装置
FR2636489B1 (fr) * 1988-09-15 1991-05-17 Soulier Joel Perfectionnements apportes aux applicateurs micro-ondes, notamment au dispositif de couplage d'energie sur un materiau absorbant circulant sous pression dans une enceinte metallique quelconque
FR2647293B1 (fr) * 1989-05-18 1996-06-28 Defitech Sa Reacteur a plasma perfectionne muni de moyens de couplage d'ondes electromagnetiques

Also Published As

Publication number Publication date
FR2689717A1 (fr) 1993-10-08
EP0564359A1 (de) 1993-10-06
EP0564359B1 (de) 1996-09-04
DE69304383T2 (de) 1997-03-06
FR2689717B1 (fr) 1994-05-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee