DE69301450T2 - Herstellungsverfahren für mikromechanisches Element - Google Patents

Herstellungsverfahren für mikromechanisches Element

Info

Publication number
DE69301450T2
DE69301450T2 DE69301450T DE69301450T DE69301450T2 DE 69301450 T2 DE69301450 T2 DE 69301450T2 DE 69301450 T DE69301450 T DE 69301450T DE 69301450 T DE69301450 T DE 69301450T DE 69301450 T2 DE69301450 T2 DE 69301450T2
Authority
DE
Germany
Prior art keywords
manufacturing process
micromechanical element
micromechanical
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69301450T
Other languages
English (en)
Other versions
DE69301450D1 (de
Inventor
Jean-Marc Moret
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Safran Colibrys SA
Original Assignee
Centre Suisse D'electronique Et De Microtechnique Sa Neuenburg/neuchatel Ch
Centre Suisse dElectronique et Microtechnique SA CSEM
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre Suisse D'electronique Et De Microtechnique Sa Neuenburg/neuchatel Ch, Centre Suisse dElectronique et Microtechnique SA CSEM filed Critical Centre Suisse D'electronique Et De Microtechnique Sa Neuenburg/neuchatel Ch
Application granted granted Critical
Publication of DE69301450D1 publication Critical patent/DE69301450D1/de
Publication of DE69301450T2 publication Critical patent/DE69301450T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00134Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
    • B81C1/0015Cantilevers
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00Contacts
    • H01H1/0036Switches making use of microelectromechanical systems [MEMS]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00Manufacture or treatment of microstructural devices or systems
    • B81C2201/01Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0102Surface micromachining
    • B81C2201/0105Sacrificial layer
    • B81C2201/0109Sacrificial layers not provided for in B81C2201/0107 - B81C2201/0108
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00Manufacture or treatment of microstructural devices or systems
    • B81C2201/01Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0128Processes for removing material
    • B81C2201/013Etching
    • B81C2201/0132Dry etching, i.e. plasma etching, barrel etching, reactive ion etching [RIE], sputter etching or ion milling
DE69301450T 1992-11-04 1993-11-02 Herstellungsverfahren für mikromechanisches Element Expired - Lifetime DE69301450T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9213352A FR2697536B1 (fr) 1992-11-04 1992-11-04 Procédé de fabrication d'un élément de microstructure mécanique.

Publications (2)

Publication Number Publication Date
DE69301450D1 DE69301450D1 (de) 1996-03-14
DE69301450T2 true DE69301450T2 (de) 1996-09-12

Family

ID=9435280

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69301450T Expired - Lifetime DE69301450T2 (de) 1992-11-04 1993-11-02 Herstellungsverfahren für mikromechanisches Element

Country Status (5)

Country Link
US (1) US5439552A (de)
EP (1) EP0596455B1 (de)
JP (1) JPH06216083A (de)
DE (1) DE69301450T2 (de)
FR (1) FR2697536B1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2731715B1 (fr) * 1995-03-17 1997-05-16 Suisse Electronique Microtech Piece de micro-mecanique et procede de realisation
FR2736654B1 (fr) * 1995-07-13 1997-08-22 Commissariat Energie Atomique Procede de fabrication d'elements de microstructures flottants rigides et dispositif equipe de tels elements
US5940678A (en) * 1997-01-14 1999-08-17 United Microelectronics Corp. Method of forming precisely cross-sectioned electron-transparent samples
EP1136440A1 (de) * 2000-03-24 2001-09-26 Interuniversitair Micro-Elektronica Centrum Vzw Verfahren zur Verbesserung der mechanischen Festigkeit von mikro-elektro-mechanischen Systemen und so hergestellte Anordnungen
US5916179A (en) * 1997-04-18 1999-06-29 Sharrock; Nigel System and method for reducing iatrogenic damage to nerves
FI111457B (fi) * 2000-10-02 2003-07-31 Nokia Corp Mikromekaaninen rakenne
US7326367B2 (en) 2005-04-25 2008-02-05 E.I. Du Pont De Nemours And Company Thick film conductor paste compositions for LTCC tape in microwave applications

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3539705A (en) * 1968-05-31 1970-11-10 Westinghouse Electric Corp Microelectronic conductor configurations and method of making the same
US3620932A (en) * 1969-05-05 1971-11-16 Trw Semiconductors Inc Beam leads and method of fabrication
US3796976A (en) * 1971-07-16 1974-03-12 Westinghouse Electric Corp Microwave stripling circuits with selectively bondable micro-sized switches for in-situ tuning and impedance matching
US4783237A (en) * 1983-12-01 1988-11-08 Harry E. Aine Solid state transducer and method of making same
US4959515A (en) * 1984-05-01 1990-09-25 The Foxboro Company Micromechanical electric shunt and encoding devices made therefrom
US4674180A (en) * 1984-05-01 1987-06-23 The Foxboro Company Method of making a micromechanical electric shunt
US4744863A (en) * 1985-04-26 1988-05-17 Wisconsin Alumni Research Foundation Sealed cavity semiconductor pressure transducers and method of producing the same
US4624741A (en) * 1985-12-13 1986-11-25 Xerox Corporation Method of fabricating electro-mechanical modulator arrays
GB8707854D0 (en) * 1987-04-02 1987-05-07 British Telecomm Radiation deflector assembly
US4997521A (en) * 1987-05-20 1991-03-05 Massachusetts Institute Of Technology Electrostatic micromotor
US4849070A (en) * 1988-09-14 1989-07-18 The United States Of America As Represented By The Secretary Of The Army Process for fabricating three-dimensional, free-standing microstructures
GB8921722D0 (en) * 1989-09-26 1989-11-08 British Telecomm Micromechanical switch
US5068203A (en) * 1990-09-04 1991-11-26 Delco Electronics Corporation Method for forming thin silicon membrane or beam
US5266531A (en) * 1991-01-30 1993-11-30 Cordata Incorporated Dynamic holographic display with cantilever

Also Published As

Publication number Publication date
EP0596455B1 (de) 1996-01-31
FR2697536A1 (fr) 1994-05-06
JPH06216083A (ja) 1994-08-05
EP0596455A1 (de) 1994-05-11
US5439552A (en) 1995-08-08
DE69301450D1 (de) 1996-03-14
FR2697536B1 (fr) 1995-01-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: COLIBRYS S.A., NEUCHATEL, CH