DE69301378T2 - Verfahren zur Diamantherstellung - Google Patents
Verfahren zur DiamantherstellungInfo
- Publication number
- DE69301378T2 DE69301378T2 DE69301378T DE69301378T DE69301378T2 DE 69301378 T2 DE69301378 T2 DE 69301378T2 DE 69301378 T DE69301378 T DE 69301378T DE 69301378 T DE69301378 T DE 69301378T DE 69301378 T2 DE69301378 T2 DE 69301378T2
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing process
- diamond manufacturing
- diamond
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/047—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers
Landscapes
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4182617A JPH0624896A (ja) | 1992-07-09 | 1992-07-09 | ダイヤモンド合成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69301378D1 DE69301378D1 (de) | 1996-03-07 |
DE69301378T2 true DE69301378T2 (de) | 1996-05-30 |
Family
ID=16121425
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69301378T Expired - Fee Related DE69301378T2 (de) | 1992-07-09 | 1993-07-07 | Verfahren zur Diamantherstellung |
Country Status (5)
Country | Link |
---|---|
US (1) | US5387443A (de) |
EP (1) | EP0578232B1 (de) |
JP (1) | JPH0624896A (de) |
CA (1) | CA2100132C (de) |
DE (1) | DE69301378T2 (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0640797A (ja) * | 1992-04-23 | 1994-02-15 | Sumitomo Electric Ind Ltd | ダイヤモンドの加工方法 |
EP0752018A4 (de) * | 1994-05-12 | 1998-09-02 | Qqc Inc | Verfahren zur oberflächenbehandlung |
US5637950A (en) * | 1994-10-31 | 1997-06-10 | Lucent Technologies Inc. | Field emission devices employing enhanced diamond field emitters |
US5826328A (en) * | 1996-03-25 | 1998-10-27 | International Business Machines | Method of making a thin radio frequency transponder |
US7568445B2 (en) | 2000-11-17 | 2009-08-04 | Lockheed Martin Corporation | System and method for the holographic deposition of material |
DE10259174B4 (de) * | 2002-12-18 | 2006-10-12 | Robert Bosch Gmbh | Verwendung eines tribologisch beanspruchten Bauelements |
US7311947B2 (en) * | 2003-10-10 | 2007-12-25 | Micron Technology, Inc. | Laser assisted material deposition |
US7807062B2 (en) * | 2006-07-10 | 2010-10-05 | Micron Technology, Inc. | Electron induced chemical etching and deposition for local circuit repair |
US7791055B2 (en) * | 2006-07-10 | 2010-09-07 | Micron Technology, Inc. | Electron induced chemical etching/deposition for enhanced detection of surface defects |
US7892978B2 (en) | 2006-07-10 | 2011-02-22 | Micron Technology, Inc. | Electron induced chemical etching for device level diagnosis |
US7833427B2 (en) | 2006-08-14 | 2010-11-16 | Micron Technology, Inc. | Electron beam etching device and method |
US7791071B2 (en) | 2006-08-14 | 2010-09-07 | Micron Technology, Inc. | Profiling solid state samples |
US7718080B2 (en) | 2006-08-14 | 2010-05-18 | Micron Technology, Inc. | Electronic beam processing device and method using carbon nanotube emitter |
WO2009028451A1 (ja) * | 2007-08-27 | 2009-03-05 | Toyo University | 炭素含有化合物の分解方法及びカーボン微小構造体の製造方法、並びにカーボン薄膜製造方法 |
US20220127721A1 (en) * | 2020-10-23 | 2022-04-28 | Applied Materials, Inc. | Depositing Low Roughness Diamond Films |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SU339134A1 (ru) * | 1956-07-10 | 1980-05-12 | Институт Физической Химии | Способ наращивани граней алмаза |
US3030188A (en) * | 1958-07-23 | 1962-04-17 | Union Carbide Corp | Synthesis of diamond |
US3030187A (en) * | 1958-07-23 | 1962-04-17 | Union Carbide Corp | Synthesis of diamond |
DD221201A1 (de) * | 1983-12-09 | 1985-04-17 | Univ Magdeburg Tech | Verfahren zur maskenlosen herstellung von kohlenstoffschichten auf substraten |
JPS61236691A (ja) * | 1985-04-09 | 1986-10-21 | Nec Corp | ダイヤモンドの気相合成法 |
US4711790A (en) * | 1985-07-17 | 1987-12-08 | Nec Corporation | Optical CVD method with a strong optical intensity used during an initial period and device therefor |
DE3751755T2 (de) * | 1986-06-30 | 1997-04-03 | Nihon Sinku Gijutsu K K | Verfahren und Vorrichtung zum Abscheiden aus der Gasphase |
JPS63288991A (ja) * | 1987-05-20 | 1988-11-25 | Sumitomo Electric Ind Ltd | ダイヤモンドの気相合成法 |
JPS63288992A (ja) * | 1987-05-20 | 1988-11-25 | Sumitomo Electric Ind Ltd | ダイヤモンドの気相合成法 |
JPH02104668A (ja) * | 1988-10-12 | 1990-04-17 | Sumitomo Metal Ind Ltd | レーザ光を用いた気相反応析出法 |
US4948629A (en) * | 1989-02-10 | 1990-08-14 | International Business Machines Corporation | Deposition of diamond films |
JP2708896B2 (ja) * | 1989-07-19 | 1998-02-04 | 三洋電機株式会社 | 吸収冷凍機 |
JPH03185956A (ja) * | 1989-12-14 | 1991-08-13 | Tadashi Abe | 電話機 |
US5154945A (en) * | 1990-03-05 | 1992-10-13 | Iowa Laser Technology, Inc. | Methods using lasers to produce deposition of diamond thin films on substrates |
-
1992
- 1992-07-09 JP JP4182617A patent/JPH0624896A/ja not_active Withdrawn
-
1993
- 1993-07-07 EP EP93110885A patent/EP0578232B1/de not_active Expired - Lifetime
- 1993-07-07 DE DE69301378T patent/DE69301378T2/de not_active Expired - Fee Related
- 1993-07-08 CA CA002100132A patent/CA2100132C/en not_active Expired - Fee Related
- 1993-07-08 US US08/090,282 patent/US5387443A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0578232B1 (de) | 1996-01-24 |
JPH0624896A (ja) | 1994-02-01 |
DE69301378D1 (de) | 1996-03-07 |
CA2100132A1 (en) | 1994-01-10 |
EP0578232A1 (de) | 1994-01-12 |
CA2100132C (en) | 1998-10-20 |
US5387443A (en) | 1995-02-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8328 | Change in the person/name/address of the agent |
Representative=s name: GROSSE, BOCKHORNI, SCHUMACHER, 81476 MUENCHEN |
|
8339 | Ceased/non-payment of the annual fee |