DE69232758D1 - Organische, funktionnelle, dünne Schicht, Herstellung und Verwendung - Google Patents

Organische, funktionnelle, dünne Schicht, Herstellung und Verwendung

Info

Publication number
DE69232758D1
DE69232758D1 DE69232758T DE69232758T DE69232758D1 DE 69232758 D1 DE69232758 D1 DE 69232758D1 DE 69232758 T DE69232758 T DE 69232758T DE 69232758 T DE69232758 T DE 69232758T DE 69232758 D1 DE69232758 D1 DE 69232758D1
Authority
DE
Germany
Prior art keywords
functional
organic
production
thin layer
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69232758T
Other languages
English (en)
Other versions
DE69232758T2 (de
Inventor
Tetsuzo Yoshimura
Ei Yano
Satoshi Tatsuura
Wataru Sotoyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP3132448A external-priority patent/JP2755272B2/ja
Priority claimed from JP23955991A external-priority patent/JPH0580370A/ja
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Application granted granted Critical
Publication of DE69232758D1 publication Critical patent/DE69232758D1/de
Publication of DE69232758T2 publication Critical patent/DE69232758T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/761—Biomolecules or bio-macromolecules, e.g. proteins, chlorophyl, lipids or enzymes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22—Di-epoxy compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22—Di-epoxy compounds
    • C08G59/28—Di-epoxy compounds containing acyclic nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/50—Amines
    • C08G59/504—Amines containing an atom other than nitrogen belonging to the amine group, carbon and hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/355—Non-linear optics characterised by the materials used
    • G02F1/361—Organic materials
    • G02F1/3615—Organic materials containing polymers
    • G02F1/3616—Organic materials containing polymers having the non-linear optical group in the main chain
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/355—Non-linear optics characterised by the materials used
    • G02F1/361—Organic materials
    • G02F1/3615—Organic materials containing polymers
    • G02F1/3617—Organic materials containing polymers having the non-linear optical group in a side chain
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/701—Organic molecular electronic devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Biochemistry (AREA)
  • Biophysics (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
DE69232758T 1991-03-26 1992-03-25 Organische, funktionnelle, dünne Schicht, Herstellung und Verwendung Expired - Fee Related DE69232758T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP3132448A JP2755272B2 (ja) 1991-03-26 1991-03-26 有機膜の作製方法
JP23955991A JPH0580370A (ja) 1991-09-19 1991-09-19 有機機能薄膜とその作製方法

Publications (2)

Publication Number Publication Date
DE69232758D1 true DE69232758D1 (de) 2002-10-10
DE69232758T2 DE69232758T2 (de) 2003-02-06

Family

ID=26467024

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69232758T Expired - Fee Related DE69232758T2 (de) 1991-03-26 1992-03-25 Organische, funktionnelle, dünne Schicht, Herstellung und Verwendung

Country Status (3)

Country Link
US (1) US5444811A (de)
EP (1) EP0506368B1 (de)
DE (1) DE69232758T2 (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1315006A1 (de) * 1994-06-22 2003-05-28 Fujitsu Limited Verfahren zur Herstellung von Wellenleitersystemen, dessen Verwendung in optischem Bauelement und Koppler sowie optisches Netzwerk und optische Leiterplatte
US5854868A (en) * 1994-06-22 1998-12-29 Fujitsu Limited Optical device and light waveguide integrated circuit
US5723219A (en) * 1995-12-19 1998-03-03 Talison Research Plasma deposited film networks
JP3866809B2 (ja) 1996-12-19 2007-01-10 松下電器産業株式会社 有機膜及びその製造方法
JP4413290B2 (ja) * 1997-06-23 2010-02-10 独立行政法人科学技術振興機構 配向制御又は構造制御された有機薄膜の製造方法
GB9726810D0 (en) 1997-12-19 1998-02-18 Zeneca Ltd Compounds composition & use
US6690845B1 (en) 1998-10-09 2004-02-10 Fujitsu Limited Three-dimensional opto-electronic modules with electrical and optical interconnections and methods for making
US6684007B2 (en) 1998-10-09 2004-01-27 Fujitsu Limited Optical coupling structures and the fabrication processes
US6845184B1 (en) 1998-10-09 2005-01-18 Fujitsu Limited Multi-layer opto-electronic substrates with electrical and optical interconnections and methods for making
US6785447B2 (en) 1998-10-09 2004-08-31 Fujitsu Limited Single and multilayer waveguides and fabrication process
US6343171B1 (en) 1998-10-09 2002-01-29 Fujitsu Limited Systems based on opto-electronic substrates with electrical and optical interconnections and methods for making
US6706546B2 (en) 1998-10-09 2004-03-16 Fujitsu Limited Optical reflective structures and method for making
US6611635B1 (en) 1998-10-09 2003-08-26 Fujitsu Limited Opto-electronic substrates with electrical and optical interconnections and methods for making
US6500510B1 (en) 1999-11-04 2002-12-31 Molecular Storage Technologies, Inc. Molecular level optical information storage devices
JP2001274528A (ja) 2000-01-21 2001-10-05 Fujitsu Ltd 薄膜デバイスの基板間転写方法
US6627998B1 (en) * 2000-07-27 2003-09-30 International Business Machines Corporation Wafer scale thin film package
WO2002045871A1 (en) * 2000-12-06 2002-06-13 Angstron Systems, Inc. System and method for modulated ion-induced atomic layer deposition (mii-ald)
US20030026601A1 (en) * 2001-07-31 2003-02-06 The Arizona Board Of Regents On Behalf Of The University Of Arizona Vapor deposition and in-situ purification of organic molecules
US6809481B2 (en) * 2002-02-28 2004-10-26 Semiconductor Energy Laboratory Co., Ltd. Light emitting device and electric device using the same
TWI336905B (en) * 2002-05-17 2011-02-01 Semiconductor Energy Lab Evaporation method, evaporation device and method of fabricating light emitting device
JP2004014311A (ja) * 2002-06-07 2004-01-15 Sony Corp 有機薄膜の形成方法
US7065285B2 (en) * 2003-12-01 2006-06-20 Lucent Technologies Inc. Polymeric compositions comprising quantum dots, optical devices comprising these compositions and methods for preparing same
CA2500938A1 (en) * 2004-03-24 2005-09-24 Rohm And Haas Company Memory devices based on electric field programmable films
US7709290B2 (en) * 2004-06-30 2010-05-04 Hewlett-Packard Development Company, L.P. Method of forming a self-assembled molecular layer
KR20060116534A (ko) * 2005-05-10 2006-11-15 삼성에스디아이 주식회사 박막 트랜지스터, 그 제조 방법 및 이를 구비한 평판 표시장치
US7521710B2 (en) * 2006-02-16 2009-04-21 Idemitsu Kosan Co., Ltd. Organic thin film transistor
US8017239B2 (en) * 2006-03-31 2011-09-13 Hewlett-Packard Development Company, L.P. Metamaterials and methods of making the same
EP2097179B1 (de) 2006-11-13 2020-01-29 The Regents of the University of Colorado, a body corporate Verfahren zur auftragung einer molekularen schicht für die herstellung organischer bzw. organisch-anorganischer polymere
KR20090042574A (ko) * 2007-10-26 2009-04-30 삼성전자주식회사 반도체 모듈 및 이를 구비하는 전자 장치
US20110151263A1 (en) * 2009-11-10 2011-06-23 Linford Matthew R Multilayer growth by gas phase deposition
US20140030834A1 (en) * 2012-07-27 2014-01-30 Shenzhen China Star Optelectronics Technology Co., Ltd. Film-forming method and film-forming apparatus of organic light-emitting diode

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4657832A (en) * 1983-05-18 1987-04-14 Ciba-Geigy Corporation Photosensitive polymers as coating materials
US4775820A (en) * 1984-07-31 1988-10-04 Canon Kabushiki Kaisha Multilayer electroluminescent device
US4871236A (en) * 1985-09-18 1989-10-03 Kabushiki Kaisha Toshiba Organic thin film display element
JPH0766189B2 (ja) * 1986-09-26 1995-07-19 住友化学工業株式会社 レジスト材料
US4801659A (en) * 1986-10-27 1989-01-31 Hoechst Celanese Corp. Organopolysiloxanes exhibiting nonlinear optical response
US4792208A (en) * 1987-09-28 1988-12-20 Eastman Kodak Company Optical article exhibiting a high level of second order polarization susceptibility
DE68913220T2 (de) * 1988-03-28 1994-07-07 Canon Kk Schaltereinrichtung und Verfahren zu ihrer Herstellung.
US5080832A (en) * 1988-10-13 1992-01-14 Regents Of The University Of Minnesota Optically nonlinear aromatic carboxylic acid complexes
EP0430143A3 (en) * 1989-11-27 1992-01-15 The Dow Chemical Company Novel cured epoxy resins
US5064264A (en) * 1990-10-26 1991-11-12 International Business Machines Corporation Photorefractive materials

Also Published As

Publication number Publication date
EP0506368A3 (en) 1993-06-30
DE69232758T2 (de) 2003-02-06
US5444811A (en) 1995-08-22
EP0506368A2 (de) 1992-09-30
EP0506368B1 (de) 2002-09-04

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