DE69226911T2 - Verfahren zum Feststellen eines strukturellen Defektes eines Films - Google Patents

Verfahren zum Feststellen eines strukturellen Defektes eines Films

Info

Publication number
DE69226911T2
DE69226911T2 DE69226911T DE69226911T DE69226911T2 DE 69226911 T2 DE69226911 T2 DE 69226911T2 DE 69226911 T DE69226911 T DE 69226911T DE 69226911 T DE69226911 T DE 69226911T DE 69226911 T2 DE69226911 T2 DE 69226911T2
Authority
DE
Germany
Prior art keywords
substrate
detecting
film
structural defect
face
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69226911T
Other languages
English (en)
Other versions
DE69226911D1 (de
Inventor
Otto Albrecht
Ken Eguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69226911D1 publication Critical patent/DE69226911D1/de
Publication of DE69226911T2 publication Critical patent/DE69226911T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • General Health & Medical Sciences (AREA)
  • Mathematical Physics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
DE69226911T 1991-06-24 1992-06-24 Verfahren zum Feststellen eines strukturellen Defektes eines Films Expired - Fee Related DE69226911T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3178686A JP3013519B2 (ja) 1991-06-24 1991-06-24 薄膜構造の検査方法及び検査装置

Publications (2)

Publication Number Publication Date
DE69226911D1 DE69226911D1 (de) 1998-10-15
DE69226911T2 true DE69226911T2 (de) 1999-01-28

Family

ID=16052779

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69226911T Expired - Fee Related DE69226911T2 (de) 1991-06-24 1992-06-24 Verfahren zum Feststellen eines strukturellen Defektes eines Films

Country Status (5)

Country Link
US (1) US5305079A (de)
EP (1) EP0522356B1 (de)
JP (1) JP3013519B2 (de)
AT (1) ATE170978T1 (de)
DE (1) DE69226911T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5625722A (en) * 1994-12-21 1997-04-29 Lucent Technologies Inc. Method and apparatus for generating data encoded pulses in return-to-zero format
DE19716264C2 (de) * 1997-04-18 2002-07-25 Fraunhofer Ges Forschung Vorrichtung und Verfahren zur Überprüfung einer Oberfläche eines Gegenstands
US6166366A (en) * 1997-07-23 2000-12-26 Cc1, Inc. System and method for monitoring and controlling the deposition of pattern and overall material coatings
JP2001004347A (ja) * 1999-06-22 2001-01-12 Mitsubishi Electric Corp 欠陥検査装置
JP2006041352A (ja) * 2004-07-29 2006-02-09 Dainippon Screen Mfg Co Ltd 皮膜検査装置、検査システム、プログラム、皮膜検査方法およびプリント基板検査方法
JP2010032265A (ja) * 2008-07-25 2010-02-12 Canon Inc 異物検査装置、露光装置及びデバイス製造方法
CN105738379B (zh) * 2014-12-12 2018-10-19 上海和辉光电有限公司 一种多晶硅薄膜的检测装置及检测方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3782836A (en) * 1971-11-11 1974-01-01 Texas Instruments Inc Surface irregularity analyzing method
US4297032A (en) * 1980-02-14 1981-10-27 The United States Of America As Represented By The Secretary Of The Navy Dark field surface inspection illumination technique
JPS57132044A (en) * 1981-02-10 1982-08-16 Hitachi Metals Ltd Discriminating method of surface defect
US4456374A (en) * 1981-12-11 1984-06-26 Johnson & Johnson Detecting the presence or absence of a coating on a substrate
US4469442A (en) * 1982-01-11 1984-09-04 Japan Crown Cork Co., Ltd. Detecting irregularities in a coating on a substrate
US4679938A (en) * 1985-06-03 1987-07-14 International Business Machines Corporation Defect detection in films on ceramic substrates
JPH01185934A (ja) * 1988-01-21 1989-07-25 Hitachi Ltd 薄膜トランジスタ基板の異物検出装置
JPH0820371B2 (ja) * 1988-01-21 1996-03-04 株式会社ニコン 欠陥検査装置及び欠陥検査方法
US4966455A (en) * 1988-12-05 1990-10-30 Union Camp Corporation Real time mottle measuring device and method
JPH04132942A (ja) * 1990-09-25 1992-05-07 Rikagaku Kenkyusho 光散乱トモグラフイ法

Also Published As

Publication number Publication date
EP0522356A3 (en) 1993-06-30
JP3013519B2 (ja) 2000-02-28
ATE170978T1 (de) 1998-09-15
EP0522356A2 (de) 1993-01-13
JPH051997A (ja) 1993-01-08
DE69226911D1 (de) 1998-10-15
US5305079A (en) 1994-04-19
EP0522356B1 (de) 1998-09-09

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Legal Events

Date Code Title Description
8328 Change in the person/name/address of the agent

Free format text: WESER & KOLLEGEN, 81245 MUENCHEN

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee