DE69225481D1 - Vorrichtung zur neutalisierung eines geladenen körpers - Google Patents

Vorrichtung zur neutalisierung eines geladenen körpers

Info

Publication number
DE69225481D1
DE69225481D1 DE69225481T DE69225481T DE69225481D1 DE 69225481 D1 DE69225481 D1 DE 69225481D1 DE 69225481 T DE69225481 T DE 69225481T DE 69225481 T DE69225481 T DE 69225481T DE 69225481 D1 DE69225481 D1 DE 69225481D1
Authority
DE
Germany
Prior art keywords
realizing
loaded body
loaded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69225481T
Other languages
English (en)
Other versions
DE69225481T2 (de
Inventor
Tadahiro Ohmi
Hitoshi Inaba
Original Assignee
Takasago Thermal Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Takasago Thermal Engineering Co Ltd filed Critical Takasago Thermal Engineering Co Ltd
Application granted granted Critical
Publication of DE69225481D1 publication Critical patent/DE69225481D1/de
Publication of DE69225481T2 publication Critical patent/DE69225481T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05F—STATIC ELECTRICITY; NATURALLY-OCCURRING ELECTRICITY
    • H05F3/00—Carrying-off electrostatic charges
    • H05F3/06—Carrying-off electrostatic charges by means of ionising radiation
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/14—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using charge exchange devices, e.g. for neutralising or changing the sign of the electrical charges of beams
DE69225481T 1991-07-25 1992-07-24 Vorrichtung zur neutalisierung eines geladenen körpers Expired - Fee Related DE69225481T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP3208562A JP2816037B2 (ja) 1991-07-25 1991-07-25 帯電物体の中和装置
PCT/JP1992/000948 WO1993002467A1 (en) 1991-07-25 1992-07-24 Apparatus for neutralizing charged body

Publications (2)

Publication Number Publication Date
DE69225481D1 true DE69225481D1 (de) 1998-06-18
DE69225481T2 DE69225481T2 (de) 1998-10-01

Family

ID=16558242

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69225481T Expired - Fee Related DE69225481T2 (de) 1991-07-25 1992-07-24 Vorrichtung zur neutalisierung eines geladenen körpers

Country Status (5)

Country Link
US (1) US5596478A (de)
EP (1) EP0597103B1 (de)
JP (1) JP2816037B2 (de)
DE (1) DE69225481T2 (de)
WO (1) WO1993002467A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6456480B1 (en) 1997-03-25 2002-09-24 Tokyo Electron Limited Processing apparatus and a processing method
TW398025B (en) * 1997-03-25 2000-07-11 Tokyo Electron Ltd Processing device and method of the same
JP3949333B2 (ja) 1999-04-12 2007-07-25 富士通株式会社 画像計測方法、画像計測装置、および画像計測プログラム記憶媒体
JP3955724B2 (ja) 2000-10-12 2007-08-08 株式会社ルネサステクノロジ 半導体集積回路装置の製造方法
CN101504912B (zh) * 2006-10-16 2010-08-11 上海华虹Nec电子有限公司 防止高压器件工艺制程中产生电荷的方法
BRPI0819522A2 (pt) * 2007-12-21 2015-05-26 3M Innovative Properties Co "alteração de carga com o uso de radiação ultravioleta"
US7796727B1 (en) 2008-03-26 2010-09-14 Tsi, Incorporated Aerosol charge conditioner
WO2012053617A1 (ja) * 2010-10-21 2012-04-26 国立大学法人 東京大学 帯電装置及び帯電体製造方法
US9084334B1 (en) 2014-11-10 2015-07-14 Illinois Tool Works Inc. Balanced barrier discharge neutralization in variable pressure environments
EP3843123A1 (de) * 2017-12-20 2021-06-30 The Swatch Group Research and Development Ltd Anlage zur durchführung eines verfahrens zur implantation von ionen in eine oberfläche eines zu behandelnden objekts

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS603121A (ja) * 1983-06-21 1985-01-09 Oki Electric Ind Co Ltd 半導体ウエハの処理方法
JPS6226756A (ja) * 1985-07-26 1987-02-04 Mitsubishi Electric Corp 半導体製造装置
US4827371A (en) * 1988-04-04 1989-05-02 Ion Systems, Inc. Method and apparatus for ionizing gas with point of use ion flow delivery
US5024968A (en) * 1988-07-08 1991-06-18 Engelsberg Audrey C Removal of surface contaminants by irradiation from a high-energy source
JPH0391915A (ja) * 1989-09-04 1991-04-17 Fujitsu Ltd 半導体装置の製造方法
JPH03125428A (ja) * 1989-10-09 1991-05-28 Matsushita Electric Ind Co Ltd 半導体基板洗浄装置
US5255153A (en) * 1990-07-20 1993-10-19 Tokyo Electron Limited Electrostatic chuck and plasma apparatus equipped therewith
JP2977098B2 (ja) * 1990-08-31 1999-11-10 忠弘 大見 帯電物の中和装置

Also Published As

Publication number Publication date
EP0597103B1 (de) 1998-05-13
US5596478A (en) 1997-01-21
JP2816037B2 (ja) 1998-10-27
DE69225481T2 (de) 1998-10-01
WO1993002467A1 (en) 1993-02-04
JPH0714761A (ja) 1995-01-17
EP0597103A4 (en) 1994-08-17
EP0597103A1 (de) 1994-05-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: OHMI, TADAHIRO, SENDAI, MIYAGI, JP

8339 Ceased/non-payment of the annual fee