DE69221783T2 - Verfahren und Vorrichtung zum automatischen Ätzen von Plättchen - Google Patents

Verfahren und Vorrichtung zum automatischen Ätzen von Plättchen

Info

Publication number
DE69221783T2
DE69221783T2 DE69221783T DE69221783T DE69221783T2 DE 69221783 T2 DE69221783 T2 DE 69221783T2 DE 69221783 T DE69221783 T DE 69221783T DE 69221783 T DE69221783 T DE 69221783T DE 69221783 T2 DE69221783 T2 DE 69221783T2
Authority
DE
Germany
Prior art keywords
platelets
automatic etching
etching
automatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69221783T
Other languages
English (en)
Other versions
DE69221783D1 (de
Inventor
Fumihiko Hasegawa
Shinji Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Handotai Co Ltd
Original Assignee
Shin Etsu Handotai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP15609091A external-priority patent/JP2628415B2/ja
Priority claimed from JP15609191A external-priority patent/JP2871173B2/ja
Application filed by Shin Etsu Handotai Co Ltd filed Critical Shin Etsu Handotai Co Ltd
Publication of DE69221783D1 publication Critical patent/DE69221783D1/de
Application granted granted Critical
Publication of DE69221783T2 publication Critical patent/DE69221783T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE69221783T 1991-05-31 1992-06-01 Verfahren und Vorrichtung zum automatischen Ätzen von Plättchen Expired - Fee Related DE69221783T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP15609091A JP2628415B2 (ja) 1991-05-31 1991-05-31 ウエーハの自動エッチング装置
JP15609191A JP2871173B2 (ja) 1991-05-31 1991-05-31 ウエーハ移替装置及び方法

Publications (2)

Publication Number Publication Date
DE69221783D1 DE69221783D1 (de) 1997-10-02
DE69221783T2 true DE69221783T2 (de) 1998-02-05

Family

ID=26483922

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69221783T Expired - Fee Related DE69221783T2 (de) 1991-05-31 1992-06-01 Verfahren und Vorrichtung zum automatischen Ätzen von Plättchen

Country Status (3)

Country Link
US (1) US5246528A (de)
EP (2) EP0657920A1 (de)
DE (1) DE69221783T2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0162102B1 (ko) * 1991-05-29 1999-02-01 이노우에 아키라 반도체 제조장치
DE4305748A1 (de) * 1993-02-25 1994-09-01 Leybold Ag Vorrichtung zum Beschichten und/oder Ätzen von Substraten in einer Vakuumkammer
US5340437A (en) * 1993-10-08 1994-08-23 Memc Electronic Materials, Inc. Process and apparatus for etching semiconductor wafers
US5950643A (en) * 1995-09-06 1999-09-14 Miyazaki; Takeshiro Wafer processing system
US6090711A (en) * 1997-09-30 2000-07-18 Semitool, Inc. Methods for controlling semiconductor workpiece surface exposure to processing liquids
US6457929B2 (en) 1998-11-03 2002-10-01 Seh America, Inc. Apparatus and method for automatically transferring wafers between wafer holders in a liquid environment
US6494219B1 (en) * 2000-03-22 2002-12-17 Applied Materials, Inc. Apparatus with etchant mixing assembly for removal of unwanted electroplating deposits
DE10319521A1 (de) * 2003-04-30 2004-11-25 Scp Germany Gmbh Verfahren und Vorrichtung zum Behandeln von scheibenförmigen Substraten
JP5478604B2 (ja) * 2008-03-31 2014-04-23 エムイーエムシー・エレクトロニック・マテリアルズ・インコーポレイテッド シリコンウェハの端部をエッチングするための方法
WO2010059556A1 (en) * 2008-11-19 2010-05-27 Memc Electronic Materials, Inc. Method and system for stripping the edge of a semiconductor wafer
US8853054B2 (en) 2012-03-06 2014-10-07 Sunedison Semiconductor Limited Method of manufacturing silicon-on-insulator wafers
CN109300822B (zh) * 2018-11-21 2024-01-26 江苏润达新能源科技有限公司 一种不需放置治具去除qfn细微毛边的蚀刻滚桶槽机台

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2138775B (en) * 1983-04-25 1987-02-04 Ruska Instr Corp Transferring e.g. semi-conductor wafers between carriers
JPS6169983A (ja) * 1984-09-12 1986-04-10 Hitachi Ltd 処理装置
JPS636857A (ja) * 1986-06-26 1988-01-12 Fujitsu Ltd ウエ−ハ移し替え装置
JPS63248449A (ja) * 1987-04-03 1988-10-14 Tadahiro Omi ドラフトチヤンバ
JPH073634Y2 (ja) * 1987-12-28 1995-01-30 株式会社トムコ ウェハ液洗乾燥装置
JPH0785471B2 (ja) * 1990-10-16 1995-09-13 信越半導体株式会社 エッチング装置

Also Published As

Publication number Publication date
DE69221783D1 (de) 1997-10-02
EP0519613A1 (de) 1992-12-23
US5246528A (en) 1993-09-21
EP0519613B1 (de) 1997-08-27
EP0657920A1 (de) 1995-06-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee