DE69220985D1 - Belichtungsapparat mit zwei Beleuchtungssystemen und diesen verwendendes Belichtungsverfahren - Google Patents

Belichtungsapparat mit zwei Beleuchtungssystemen und diesen verwendendes Belichtungsverfahren

Info

Publication number
DE69220985D1
DE69220985D1 DE69220985T DE69220985T DE69220985D1 DE 69220985 D1 DE69220985 D1 DE 69220985D1 DE 69220985 T DE69220985 T DE 69220985T DE 69220985 T DE69220985 T DE 69220985T DE 69220985 D1 DE69220985 D1 DE 69220985D1
Authority
DE
Germany
Prior art keywords
exposure
lighting systems
exposure apparatus
exposure method
lighting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69220985T
Other languages
English (en)
Other versions
DE69220985T2 (de
Inventor
Junji Isohata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69220985D1 publication Critical patent/DE69220985D1/de
Application granted granted Critical
Publication of DE69220985T2 publication Critical patent/DE69220985T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2026—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction
    • G03F7/2028—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction of an edge bead on wafers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69220985T 1991-03-13 1992-03-05 Belichtungsapparat mit zwei Beleuchtungssystemen und diesen verwendendes Belichtungsverfahren Expired - Fee Related DE69220985T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3048101A JP2862385B2 (ja) 1991-03-13 1991-03-13 露光装置

Publications (2)

Publication Number Publication Date
DE69220985D1 true DE69220985D1 (de) 1997-08-28
DE69220985T2 DE69220985T2 (de) 1997-11-27

Family

ID=12793927

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69220985T Expired - Fee Related DE69220985T2 (de) 1991-03-13 1992-03-05 Belichtungsapparat mit zwei Beleuchtungssystemen und diesen verwendendes Belichtungsverfahren

Country Status (4)

Country Link
US (1) US5359389A (de)
EP (1) EP0503847B1 (de)
JP (1) JP2862385B2 (de)
DE (1) DE69220985T2 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6078381A (en) 1993-02-01 2000-06-20 Nikon Corporation Exposure method and apparatus
US5345870A (en) * 1993-02-10 1994-09-13 Miles Inc. "Direct-to-press" positive lithographic printing plate and method for making same
JP3339149B2 (ja) * 1993-12-08 2002-10-28 株式会社ニコン 走査型露光装置ならびに露光方法
JP3384068B2 (ja) * 1993-12-22 2003-03-10 株式会社ニコン 走査型露光装置
JP3376690B2 (ja) * 1994-04-28 2003-02-10 株式会社ニコン 露光装置、及び該装置を用いた露光方法
JP3484684B2 (ja) * 1994-11-01 2004-01-06 株式会社ニコン ステージ装置及び走査型露光装置
US5850280A (en) * 1994-06-16 1998-12-15 Nikon Corporation Stage unit, drive table, and scanning exposure and apparatus using same
US6721034B1 (en) 1994-06-16 2004-04-13 Nikon Corporation Stage unit, drive table, and scanning exposure apparatus using the same
JP3445374B2 (ja) * 1994-09-06 2003-09-08 富士写真フイルム株式会社 写真プリンタの可変マスク機構および可変マスク機構のマスク位置決め方法
US5563684A (en) * 1994-11-30 1996-10-08 Sgs-Thomson Microelectronics, Inc. Adaptive wafer modulator for placing a selected pattern on a semiconductor wafer
JP3506158B2 (ja) 1995-04-14 2004-03-15 株式会社ニコン 露光装置及び走査型露光装置、並びに走査露光方法
WO1996038764A1 (en) * 1995-05-30 1996-12-05 Philips Electronics N.V. Lithographic device with a three-dimensionally positionable mask holder
TW318255B (de) 1995-05-30 1997-10-21 Philips Electronics Nv
JP3237522B2 (ja) * 1996-02-05 2001-12-10 ウシオ電機株式会社 ウエハ周辺露光方法および装置
US6239861B1 (en) * 1996-11-19 2001-05-29 Nikon Corporation Exposure method and scanning type exposure apparatus
US5933216A (en) * 1997-10-16 1999-08-03 Anvik Corporation Double-sided patterning system using dual-wavelength output of an excimer laser
JP3363787B2 (ja) * 1998-05-02 2003-01-08 キヤノン株式会社 露光方法および露光装置
US6618118B2 (en) 2001-05-08 2003-09-09 Asml Netherlands B.V. Optical exposure method, device manufacturing method and lithographic projection apparatus
WO2003032081A1 (en) * 2001-10-09 2003-04-17 Ultratech Stepper, Inc. Method and apparatus for optically defining an exposure exclusion region on a photosensitive workpiece
JP4565799B2 (ja) * 2002-07-01 2010-10-20 大林精工株式会社 横電界方式液晶表示装置、その製造方法、走査露光装置およびミックス走査露光装置
JP4280509B2 (ja) * 2003-01-31 2009-06-17 キヤノン株式会社 投影露光用マスク、投影露光用マスクの製造方法、投影露光装置および投影露光方法
JP3689698B2 (ja) * 2003-01-31 2005-08-31 キヤノン株式会社 投影露光装置、投影露光方法および被露光部材の製造方法
KR100550352B1 (ko) * 2004-07-02 2006-02-08 삼성전자주식회사 반도체 기판의 노광방법 및 이를 이용하는 노광 장치
US8767179B2 (en) * 2009-12-15 2014-07-01 Micron Technology, Inc. Imaging methods in scanning photolithography and a scanning photolithography device used in printing an image of a reticle onto a photosensitive substrate

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1516152A (fr) * 1967-01-25 1968-03-08 Thomson Houston Comp Francaise Perfectionnements aux bancs photographiques répétiteurs
FR2075386A5 (de) * 1970-01-10 1971-10-08 Fuji Photo Film Co Ltd
JPS4943337B1 (de) * 1970-09-03 1974-11-20
JPS4926590B1 (de) * 1970-09-03 1974-07-10
US4620785A (en) * 1982-12-01 1986-11-04 Canon Kabushiki Kaisha Sheet-like member having alignment marks and an alignment apparatus for the same
US4822975A (en) * 1984-01-30 1989-04-18 Canon Kabushiki Kaisha Method and apparatus for scanning exposure
JPS60201626A (ja) * 1984-03-27 1985-10-12 Canon Inc 位置合わせ装置
US4785192A (en) * 1984-06-21 1988-11-15 American Telephone And Telegraph Company, At&T Bell Laboratories Maintaining optical signals in prescribed alignment with respect to workpiece in movable equipment
US4814830A (en) * 1985-04-01 1989-03-21 Canon Kabushiki Kaisha Flat panel display device and manufacturing of the same
JPH0622192B2 (ja) * 1985-04-25 1994-03-23 キヤノン株式会社 表示パネル製造方法
US4676630A (en) * 1985-04-25 1987-06-30 Canon Kabushiki Kaisha Exposure apparatus
US4748477A (en) * 1985-04-30 1988-05-31 Canon Kabushiki Kaisha Exposure apparatus
US4696889A (en) * 1985-08-23 1987-09-29 Yevick George J Method of photoforming optical patterns for VLSI devices
US4770972A (en) * 1987-05-19 1988-09-13 The Mead Corporation Imaging process involving hardening of imaging web border area photosensitive microcapsules and an apparatus useful therein
JPH0617978B2 (ja) * 1987-08-07 1994-03-09 シャープ株式会社 補助露光装置を有する画像形成装置
US4769680A (en) * 1987-10-22 1988-09-06 Mrs Technology, Inc. Apparatus and method for making large area electronic devices, such as flat panel displays and the like, using correlated, aligned dual optical systems

Also Published As

Publication number Publication date
EP0503847A2 (de) 1992-09-16
US5359389A (en) 1994-10-25
JP2862385B2 (ja) 1999-03-03
EP0503847B1 (de) 1997-07-23
JPH04283726A (ja) 1992-10-08
EP0503847A3 (en) 1992-12-30
DE69220985T2 (de) 1997-11-27

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee