DE69208583D1 - Elektronenstrahl-Lithographieverfahren - Google Patents

Elektronenstrahl-Lithographieverfahren

Info

Publication number
DE69208583D1
DE69208583D1 DE69208583T DE69208583T DE69208583D1 DE 69208583 D1 DE69208583 D1 DE 69208583D1 DE 69208583 T DE69208583 T DE 69208583T DE 69208583 T DE69208583 T DE 69208583T DE 69208583 D1 DE69208583 D1 DE 69208583D1
Authority
DE
Germany
Prior art keywords
electron beam
lithography process
beam lithography
electron
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69208583T
Other languages
English (en)
Other versions
DE69208583T2 (de
Inventor
Yoshinori Minamide
Genya Matsuoka
Hiroyoshi Ando
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE69208583D1 publication Critical patent/DE69208583D1/de
Publication of DE69208583T2 publication Critical patent/DE69208583T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
DE69208583T 1991-10-21 1992-10-07 Elektronenstrahl-Lithographieverfahren Expired - Fee Related DE69208583T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3271667A JP2708300B2 (ja) 1991-10-21 1991-10-21 電子線描画方法

Publications (2)

Publication Number Publication Date
DE69208583D1 true DE69208583D1 (de) 1996-04-04
DE69208583T2 DE69208583T2 (de) 1996-10-02

Family

ID=17503209

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69208583T Expired - Fee Related DE69208583T2 (de) 1991-10-21 1992-10-07 Elektronenstrahl-Lithographieverfahren

Country Status (4)

Country Link
US (1) US5285075A (de)
EP (1) EP0538675B1 (de)
JP (1) JP2708300B2 (de)
DE (1) DE69208583T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5523576A (en) * 1993-03-15 1996-06-04 Kabushiki Kaisha Toshiba Charged beam drawing apparatus
US5355306A (en) * 1993-09-30 1994-10-11 Motorola, Inc. Alignment system and method of alignment by symmetrical and asymmetrical analysis
JP3368091B2 (ja) * 1994-04-22 2003-01-20 キヤノン株式会社 投影露光装置及びデバイスの製造方法
JP3453009B2 (ja) * 1995-07-20 2003-10-06 富士通株式会社 電子ビーム露光装置及びこの装置に於けるマーク位置検出方法
KR0165470B1 (ko) * 1995-11-08 1999-02-01 김광호 반도체 소자의 박막형성 프로그램의 자동보정 시스템
JP3946899B2 (ja) * 1999-03-26 2007-07-18 株式会社東芝 エネルギービーム装置における光学系の調整方法
US6781680B1 (en) 1999-03-26 2004-08-24 Kabushiki Kaisha Toshiba Optical system adjusting method for energy beam apparatus

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57211733A (en) * 1981-06-24 1982-12-25 Toshiba Corp Detecting device for electron beam exposing marker
US4546260A (en) * 1983-06-30 1985-10-08 International Business Machines Corporation Alignment technique
JPS6229136A (ja) * 1985-07-29 1987-02-07 Advantest Corp 荷電粒子ビ−ム露光におけるマ−ク位置検出方法及びこの方法を用いた装置
JP2585223B2 (ja) * 1986-06-18 1997-02-26 株式会社日立製作所 電子ビ−ム露光装置におけるマ−ク位置検出装置
US4818885A (en) * 1987-06-30 1989-04-04 International Business Machines Corporation Electron beam writing method and system using large range deflection in combination with a continuously moving table

Also Published As

Publication number Publication date
JP2708300B2 (ja) 1998-02-04
DE69208583T2 (de) 1996-10-02
JPH05109609A (ja) 1993-04-30
EP0538675B1 (de) 1996-02-28
US5285075A (en) 1994-02-08
EP0538675A1 (de) 1993-04-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee