DE69203642D1 - Vorsensibilisierte Platten zum Herstellen von wasserlosen Offsetdruckplatten. - Google Patents

Vorsensibilisierte Platten zum Herstellen von wasserlosen Offsetdruckplatten.

Info

Publication number
DE69203642D1
DE69203642D1 DE69203642T DE69203642T DE69203642D1 DE 69203642 D1 DE69203642 D1 DE 69203642D1 DE 69203642 T DE69203642 T DE 69203642T DE 69203642 T DE69203642 T DE 69203642T DE 69203642 D1 DE69203642 D1 DE 69203642D1
Authority
DE
Germany
Prior art keywords
plates
production
offset printing
presensitized
waterless offset
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
DE69203642T
Other languages
English (en)
Other versions
DE69203642T2 (de
Inventor
Tsumoru Hirano
Yoshihiko Urabe
Tatsuji Higashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=14141559&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69203642(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69203642D1 publication Critical patent/DE69203642D1/de
Application granted granted Critical
Publication of DE69203642T2 publication Critical patent/DE69203642T2/de
Anticipated expiration legal-status Critical
Revoked legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE1992603642 1991-04-25 1992-04-23 Vorsensibilisierte Platten zum Herstellen von wasserlosen Offsetdruckplatten. Revoked DE69203642T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3095581A JP2739387B2 (ja) 1991-04-25 1991-04-25 水無し平版印刷版及びその製版方法

Publications (2)

Publication Number Publication Date
DE69203642D1 true DE69203642D1 (de) 1995-08-31
DE69203642T2 DE69203642T2 (de) 1995-12-21

Family

ID=14141559

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1992603642 Revoked DE69203642T2 (de) 1991-04-25 1992-04-23 Vorsensibilisierte Platten zum Herstellen von wasserlosen Offsetdruckplatten.

Country Status (3)

Country Link
EP (1) EP0510646B1 (de)
JP (1) JP2739387B2 (de)
DE (1) DE69203642T2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0756326A (ja) * 1993-08-12 1995-03-03 Fuji Photo Film Co Ltd 湿し水不要感光性平版印刷版の処理方法
AUPO093296A0 (en) 1996-07-10 1996-08-01 University Of Melbourne, The Electrophoresis gels and crosslinking agents for their preparation
US6596462B2 (en) 1999-12-17 2003-07-22 Konica Corporation Printing plate element and preparation method of printing plate
US7592128B2 (en) 2001-04-04 2009-09-22 Eastman Kodak Company On-press developable negative-working imageable elements
US6582882B2 (en) 2001-04-04 2003-06-24 Kodak Polychrome Graphics Llc Imageable element comprising graft polymer
DE102004034362A1 (de) * 2004-07-16 2006-02-09 Kodak Polychrome Graphics Gmbh Lithographie-Druckplatten mit hoher Auflagenbeständigkeit
CN104356378B (zh) * 2014-09-22 2016-08-24 南京航空航天大学 一种三维打印用低粘度光固化预聚物的制备方法
JP6226255B2 (ja) * 2015-09-28 2017-11-08 東洋紡株式会社 凸版印刷原版用感光性樹脂組成物、及びそれから得られる凸版印刷原版
JP6614494B2 (ja) * 2016-01-19 2019-12-04 東洋紡株式会社 凸版印刷原版用感光性樹脂組成物、及びそれから得られる凸版印刷原版
US20190055403A1 (en) * 2016-03-03 2019-02-21 Ube Industries, Ltd. Polyamide resin and film comprising the same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS589146A (ja) * 1981-07-09 1983-01-19 Nippon Paint Co Ltd 水不要平版用版材
JP2577630B2 (ja) * 1989-03-10 1997-02-05 富士写真フイルム株式会社 湿し水不要感光性平版印刷版
JPH03191356A (ja) * 1989-12-20 1991-08-21 Minolta Camera Co Ltd 感光体の製造方法
JP2577658B2 (ja) * 1990-12-13 1997-02-05 富士写真フイルム株式会社 湿し水不要感光性平版印刷版

Also Published As

Publication number Publication date
EP0510646A1 (de) 1992-10-28
EP0510646B1 (de) 1995-07-26
JPH04324865A (ja) 1992-11-13
DE69203642T2 (de) 1995-12-21
JP2739387B2 (ja) 1998-04-15

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8331 Complete revocation